BRPI0907265A2 - método para a produção de camadas de óxida de metal através de vaporização a arco, alvo de pó metalúrgico, camada de óxido de metal e seu uso. - Google Patents
método para a produção de camadas de óxida de metal através de vaporização a arco, alvo de pó metalúrgico, camada de óxido de metal e seu uso.Info
- Publication number
- BRPI0907265A2 BRPI0907265A2 BRPI0907265A BRPI0907265A BRPI0907265A2 BR PI0907265 A2 BRPI0907265 A2 BR PI0907265A2 BR PI0907265 A BRPI0907265 A BR PI0907265A BR PI0907265 A BRPI0907265 A BR PI0907265A BR PI0907265 A2 BRPI0907265 A2 BR PI0907265A2
- Authority
- BR
- Brazil
- Prior art keywords
- metal oxide
- production
- arc spraying
- metallurgical powder
- oxide layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Drilling Tools (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4759108P | 2008-04-24 | 2008-04-24 | |
| EP08016572A EP2166128B1 (de) | 2008-09-19 | 2008-09-19 | Verfahren zum Herstellen von Metalloxidschichten durch Funkenverdampfung |
| PCT/EP2009/000851 WO2009129879A1 (de) | 2008-04-24 | 2009-02-06 | Verfahren zum herstellen von metalloxidschichten durch funkenverdampfung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0907265A2 true BRPI0907265A2 (pt) | 2015-11-17 |
Family
ID=40297780
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0907265A BRPI0907265A2 (pt) | 2008-04-24 | 2009-02-06 | método para a produção de camadas de óxida de metal através de vaporização a arco, alvo de pó metalúrgico, camada de óxido de metal e seu uso. |
| BRPI0907264A BRPI0907264A2 (pt) | 2008-04-24 | 2009-02-06 | método para a produção de camadas, especificamente de camadas estáveis em altas temperaturas, alvo de liga consistindo de aluminío e de um componente metálico ou semimetálico e camada em estrutura coríndon contendo essencialmente óxido de alumínio. |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0907264A BRPI0907264A2 (pt) | 2008-04-24 | 2009-02-06 | método para a produção de camadas, especificamente de camadas estáveis em altas temperaturas, alvo de liga consistindo de aluminío e de um componente metálico ou semimetálico e camada em estrutura coríndon contendo essencialmente óxido de alumínio. |
Country Status (16)
| Country | Link |
|---|---|
| US (2) | US10323320B2 (pt) |
| EP (2) | EP2166128B1 (pt) |
| JP (3) | JP2011522960A (pt) |
| KR (2) | KR101629909B1 (pt) |
| CN (2) | CN102016108B (pt) |
| AT (1) | ATE532886T1 (pt) |
| AU (2) | AU2009240320B2 (pt) |
| BR (2) | BRPI0907265A2 (pt) |
| CA (2) | CA2722520A1 (pt) |
| ES (2) | ES2377225T3 (pt) |
| MX (2) | MX2010011502A (pt) |
| PL (2) | PL2166128T3 (pt) |
| PT (2) | PT2166128E (pt) |
| RU (2) | RU2528602C2 (pt) |
| TW (2) | TWI410506B (pt) |
| WO (2) | WO2009129879A1 (pt) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8652589B2 (en) * | 2008-01-25 | 2014-02-18 | Oerlikon Trading Ag, Truebbach | Permeation barrier layer |
| PL2294241T3 (pl) * | 2008-07-08 | 2012-05-31 | Bekaert Advanced Coatings | Sposób wytwarzania tarczy tlenkowej do rozpylania jonowego, zawierającej pierwszą i drugą fazę |
| ATE532886T1 (de) * | 2008-09-19 | 2011-11-15 | Oerlikon Trading Ag | Verfahren zum herstellen von metalloxidschichten durch funkenverdampfung |
| JP2011084804A (ja) * | 2009-09-18 | 2011-04-28 | Kobelco Kaken:Kk | 金属酸化物−金属複合スパッタリングターゲット |
| EP2363509A1 (en) * | 2010-02-28 | 2011-09-07 | Oerlikon Trading AG, Trübbach | Synthesis of metal oxides by reactive cathodic arc evaporation |
| DE102010053751A1 (de) | 2010-10-28 | 2012-05-03 | Oerlikon Trading Ag, Trübbach | Molybdänmonoxidschichten und deren Herstellung mittels PVD |
| RU2015111178A (ru) * | 2012-08-29 | 2016-10-20 | Эрликон Серфиз Солюшнз Аг, Трюббах | Покрытие, нанесенное катодно-дуговым физическим осаждением из паровой фазы, с улучшенными антифрикционными и противоизносными свойствами |
| DE102012023260A1 (de) * | 2012-11-29 | 2014-06-05 | Oerlikon Trading Ag, Trübbach | Verfahren zur Strukturierung von Schichtoberflächen und Vorrichtung dazu |
| EP2954091B1 (en) * | 2013-01-18 | 2022-08-10 | Oerlikon Surface Solutions AG, Pfäffikon | Coating method for producing (al,cr)2o3-based coatings with enhanced properties |
| DE102013006633A1 (de) * | 2013-04-18 | 2014-10-23 | Oerlikon Trading Ag, Trübbach | Funkenverdampfen von metallischen, intermetallischen und keramischen Targetmaterialien um Al-Cr-N Beschichtungen herzustellen |
| MY185599A (en) * | 2013-07-09 | 2021-05-24 | Oerlikon Surface Solutions Ag Pfaeffikon | Target for the reactive sputter deposition of electrically insulating layers |
| DE102014104672A1 (de) * | 2014-04-02 | 2015-10-08 | Kennametal Inc. | Beschichtetes Schneidwerkzeug und Verfahren zu seiner Herstellung |
| EP2980267B1 (en) | 2014-07-28 | 2019-05-01 | Oerlikon Surface Solutions AG, Trübbach | Corundum-type fe-doped cathodic arc evaporated al-cr-o coatings |
| ES2786348T3 (es) * | 2015-12-23 | 2020-10-09 | Materion Advanced Mat Germany Gmbh | Diana de pulverización catódica basada en óxido de circonio |
| DE102016125042A1 (de) * | 2015-12-28 | 2017-06-29 | Oerlikon Surface Solutions Ag, Pfäffikon | Infrarotspiegel mit einer thermisch stabilen Schicht |
| DE102016212874A1 (de) * | 2016-07-14 | 2018-01-18 | Oerlikon Surface Solutions Ag, Pfäffikon | Schutzbeschichtung für eine thermisch beanspruchte Struktur |
| KR20200037797A (ko) * | 2017-07-31 | 2020-04-09 | 발터 악티엔게젤샤프트 | 피복 절삭 공구 및 그 제조 프로세스 |
| US11249234B2 (en) * | 2019-07-29 | 2022-02-15 | Moxtek, Inc. | Polarizer with composite materials |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US5246787A (en) * | 1989-11-22 | 1993-09-21 | Balzers Aktiengesellschaft | Tool or instrument with a wear-resistant hard coating for working or processing organic materials |
| US6099457A (en) * | 1990-08-13 | 2000-08-08 | Endotech, Inc. | Endocurietherapy |
| US5342283A (en) * | 1990-08-13 | 1994-08-30 | Good Roger R | Endocurietherapy |
| US5500301A (en) * | 1991-03-07 | 1996-03-19 | Kabushiki Kaisha Kobe Seiko Sho | A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films |
| US5415829A (en) * | 1992-12-28 | 1995-05-16 | Nikko Kyodo Co., Ltd. | Sputtering target |
| CH688863A5 (de) | 1994-06-24 | 1998-04-30 | Balzers Hochvakuum | Verfahren zum Beschichten mindestens eines Werkstueckes und Anlage hierfuer. |
| US5518597A (en) | 1995-03-28 | 1996-05-21 | Minnesota Mining And Manufacturing Company | Cathodic arc coating apparatus and method |
| JP3484861B2 (ja) | 1995-03-31 | 2004-01-06 | セイコーエプソン株式会社 | 画像形成装置用のローラ及びその成形用金型 |
| RU2163942C2 (ru) * | 1996-07-25 | 2001-03-10 | Сименс Акциенгезелльшафт | Металлическая подложка с оксидным слоем и улучшенным крепежным слоем |
| US6268284B1 (en) * | 1998-10-07 | 2001-07-31 | Tokyo Electron Limited | In situ titanium aluminide deposit in high aspect ratio features |
| JP4155641B2 (ja) * | 1998-10-27 | 2008-09-24 | 住友電工ハードメタル株式会社 | 耐摩耗性被膜およびその製造方法ならびに耐摩耗部材 |
| ATE394523T1 (de) * | 2000-03-09 | 2008-05-15 | Sulzer Metaplas Gmbh | Hartschichten auf komponenten |
| JP4502475B2 (ja) * | 2000-08-04 | 2010-07-14 | 株式会社神戸製鋼所 | 硬質皮膜および耐摩耗部材並びにその製造方法 |
| US6835414B2 (en) * | 2001-07-27 | 2004-12-28 | Unaxis Balzers Aktiengesellschaft | Method for producing coated substrates |
| US6709557B1 (en) * | 2002-02-28 | 2004-03-23 | Novellus Systems, Inc. | Sputter apparatus for producing multi-component metal alloy films and method for making the same |
| JP4216518B2 (ja) * | 2002-03-29 | 2009-01-28 | 株式会社神戸製鋼所 | カソード放電型アークイオンプレーティング用ターゲットおよびその製造方法 |
| FR2838752B1 (fr) * | 2002-04-22 | 2005-02-25 | Snecma Moteurs | Procede de formation d'un revetement ceramique sur un substrat par depot physique en phase vapeur sous faisceau d'electrons |
| US20040185182A1 (en) | 2002-07-31 | 2004-09-23 | General Electric Company | Method for protecting articles, and related compositions |
| US20040022662A1 (en) | 2002-07-31 | 2004-02-05 | General Electric Company | Method for protecting articles, and related compositions |
| US6767627B2 (en) * | 2002-12-18 | 2004-07-27 | Kobe Steel, Ltd. | Hard film, wear-resistant object and method of manufacturing wear-resistant object |
| FR2860790B1 (fr) * | 2003-10-09 | 2006-07-28 | Snecma Moteurs | Cible destinee a etre evaporee sous faisceau d'electrons, son procede de fabrication, barriere thermique et revetement obtenus a partir d'une cible, et piece mecanique comportant un tel revetement |
| EP1536041B1 (en) * | 2003-11-25 | 2008-05-21 | Mitsubishi Materials Corporation | Coated cermet cutting tool with a chipping resistant, hard coating layer |
| US7381282B2 (en) * | 2004-04-07 | 2008-06-03 | Hitachi Metals, Ltd. | Co alloy target and its production method, soft magnetic film for perpendicular magnetic recording and perpendicular magnetic recording medium |
| US7247529B2 (en) * | 2004-08-30 | 2007-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
| TWI282385B (en) * | 2004-12-02 | 2007-06-11 | Taiwan Textile Res Inst | Method for producing durably anti-microbial fibers |
| JP4579709B2 (ja) * | 2005-02-15 | 2010-11-10 | 株式会社神戸製鋼所 | Al−Ni−希土類元素合金スパッタリングターゲット |
| EP2355126B1 (de) | 2005-03-24 | 2015-12-02 | Oerlikon Surface Solutions AG, Trübbach | Hartstoffschicht |
| US9997338B2 (en) | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
| US7450295B2 (en) * | 2006-03-02 | 2008-11-11 | Qualcomm Mems Technologies, Inc. | Methods for producing MEMS with protective coatings using multi-component sacrificial layers |
| US7857948B2 (en) | 2006-07-19 | 2010-12-28 | Oerlikon Trading Ag, Trubbach | Method for manufacturing poorly conductive layers |
| TWI411696B (zh) | 2006-07-19 | 2013-10-11 | Oerlikon Trading Ag | 沉積電絕緣層之方法 |
| US7939181B2 (en) * | 2006-10-11 | 2011-05-10 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
| US8436051B2 (en) | 2007-06-08 | 2013-05-07 | Aptalis Pharma Canada Inc. | Mesalamine suppository |
| ATE532886T1 (de) * | 2008-09-19 | 2011-11-15 | Oerlikon Trading Ag | Verfahren zum herstellen von metalloxidschichten durch funkenverdampfung |
-
2008
- 2008-09-19 AT AT08016572T patent/ATE532886T1/de active
- 2008-09-19 EP EP08016572A patent/EP2166128B1/de not_active Not-in-force
- 2008-09-19 PT PT08016572T patent/PT2166128E/pt unknown
- 2008-09-19 ES ES08016572T patent/ES2377225T3/es active Active
- 2008-09-19 PL PL08016572T patent/PL2166128T3/pl unknown
-
2009
- 2009-02-06 CA CA2722520A patent/CA2722520A1/en not_active Abandoned
- 2009-02-06 WO PCT/EP2009/000851 patent/WO2009129879A1/de not_active Ceased
- 2009-02-06 PL PL09734873T patent/PL2265744T3/pl unknown
- 2009-02-06 RU RU2010147448/02A patent/RU2528602C2/ru not_active IP Right Cessation
- 2009-02-06 JP JP2011505377A patent/JP2011522960A/ja active Pending
- 2009-02-06 JP JP2011505376A patent/JP2011518949A/ja active Pending
- 2009-02-06 KR KR1020107026388A patent/KR101629909B1/ko not_active Expired - Fee Related
- 2009-02-06 AU AU2009240320A patent/AU2009240320B2/en not_active Ceased
- 2009-02-06 CA CA2722380A patent/CA2722380A1/en not_active Abandoned
- 2009-02-06 WO PCT/EP2009/000852 patent/WO2009129880A1/de not_active Ceased
- 2009-02-06 MX MX2010011502A patent/MX2010011502A/es active IP Right Grant
- 2009-02-06 EP EP09734873.4A patent/EP2265744B1/de not_active Not-in-force
- 2009-02-06 CN CN200980114303.3A patent/CN102016108B/zh not_active Expired - Fee Related
- 2009-02-06 ES ES09734873.4T patent/ES2485909T3/es active Active
- 2009-02-06 CN CN200980114304.8A patent/CN102016104B/zh not_active Expired - Fee Related
- 2009-02-06 MX MX2010011496A patent/MX2010011496A/es active IP Right Grant
- 2009-02-06 BR BRPI0907265A patent/BRPI0907265A2/pt not_active IP Right Cessation
- 2009-02-06 AU AU2009240321A patent/AU2009240321B2/en not_active Ceased
- 2009-02-06 BR BRPI0907264A patent/BRPI0907264A2/pt not_active IP Right Cessation
- 2009-02-06 RU RU2010147450/02A patent/RU2525949C2/ru not_active IP Right Cessation
- 2009-02-06 KR KR1020107026387A patent/KR101629905B1/ko not_active Expired - Fee Related
- 2009-02-06 PT PT97348734T patent/PT2265744E/pt unknown
- 2009-04-23 US US12/428,699 patent/US10323320B2/en active Active
- 2009-04-24 TW TW098113824A patent/TWI410506B/zh not_active IP Right Cessation
- 2009-04-24 US US12/429,252 patent/US9611538B2/en active Active
- 2009-04-24 TW TW098113822A patent/TWI390061B/zh not_active IP Right Cessation
-
2014
- 2014-09-16 JP JP2014188025A patent/JP5876123B2/ja not_active Expired - Fee Related
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