BRPI0910657A2 - método de revestimento, peça de trebelho ou ferramenta e sua utilização - Google Patents

método de revestimento, peça de trebelho ou ferramenta e sua utilização

Info

Publication number
BRPI0910657A2
BRPI0910657A2 BRPI0910657A BRPI0910657A BRPI0910657A2 BR PI0910657 A2 BRPI0910657 A2 BR PI0910657A2 BR PI0910657 A BRPI0910657 A BR PI0910657A BR PI0910657 A BRPI0910657 A BR PI0910657A BR PI0910657 A2 BRPI0910657 A2 BR PI0910657A2
Authority
BR
Brazil
Prior art keywords
workpiece
tool
coating method
coating
Prior art date
Application number
BRPI0910657A
Other languages
English (en)
Inventor
Mirjam Arndt
Ralf Tabersky
Original Assignee
Kennametal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kennametal Inc filed Critical Kennametal Inc
Publication of BRPI0910657A2 publication Critical patent/BRPI0910657A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T407/00—Cutters, for shaping
    • Y10T407/19—Rotary cutting tool
    • Y10T407/1904—Composite body of diverse material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Drilling Tools (AREA)
BRPI0910657A 2008-04-17 2009-04-07 método de revestimento, peça de trebelho ou ferramenta e sua utilização BRPI0910657A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008019202A DE102008019202A1 (de) 2008-04-17 2008-04-17 Beschichtungsverfahren , Werkstück oder Werkzeug und dessen Verwendung
PCT/EP2009/002537 WO2009127344A1 (de) 2008-04-17 2009-04-07 Beschichtungsverfahren, werkstück oder werkzeug und dessen verwendung

Publications (1)

Publication Number Publication Date
BRPI0910657A2 true BRPI0910657A2 (pt) 2015-09-22

Family

ID=40718798

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0910657A BRPI0910657A2 (pt) 2008-04-17 2009-04-07 método de revestimento, peça de trebelho ou ferramenta e sua utilização

Country Status (11)

Country Link
US (1) US8702912B2 (pt)
EP (1) EP2268843A1 (pt)
JP (1) JP2011517733A (pt)
KR (1) KR20100135806A (pt)
CN (1) CN101981222A (pt)
BR (1) BRPI0910657A2 (pt)
CA (1) CA2716619A1 (pt)
DE (1) DE102008019202A1 (pt)
MX (1) MX2010011294A (pt)
RU (1) RU2010146622A (pt)
WO (1) WO2009127344A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2554303B1 (en) * 2010-03-29 2017-03-01 Kyocera Corporation Cutting tool
US8409702B2 (en) 2011-02-07 2013-04-02 Kennametal Inc. Cubic aluminum titanium nitride coating and method of making same
CN104011256B (zh) * 2011-09-19 2016-10-26 拉米娜科技 具有涂层的切削工具
WO2013045454A2 (en) * 2011-09-30 2013-04-04 Cemecon Ag Coating of substrates using hipims
DE102012107163A1 (de) * 2012-08-03 2014-05-15 INI Coatings Ltd. Verfahren zur Beschichtung eines Substrats mittels Hochenergieimpulsmagnetronsputtern
US9103036B2 (en) 2013-03-15 2015-08-11 Kennametal Inc. Hard coatings comprising cubic phase forming compositions
DE102013104254A1 (de) 2013-04-26 2014-10-30 Walter Ag Werkzeug mit CVD-Beschichtung
DE102013210155A1 (de) 2013-05-31 2014-12-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden einer transparenten, elektrisch leitfähigen Metalloxidschicht
US9896767B2 (en) 2013-08-16 2018-02-20 Kennametal Inc Low stress hard coatings and applications thereof
US9168664B2 (en) 2013-08-16 2015-10-27 Kennametal Inc. Low stress hard coatings and applications thereof
DE102014103220A1 (de) 2014-03-11 2015-09-17 Walter Ag TiAIN-Schichten mit Lamellenstruktur
DE102014207454B4 (de) * 2014-04-17 2018-07-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Ausbildung einer Beschichtung auf einer Substratoberfläche
US9994958B2 (en) * 2016-01-20 2018-06-12 Sumitomo Electric Hardmetal Corp. Coating, cutting tool, and method of manufacturing coating
KR102064172B1 (ko) * 2017-09-01 2020-01-09 한국야금 주식회사 내마모성과 인성이 우수한 경질피막
CN117548703B (zh) * 2024-01-12 2024-03-12 山东建筑大学 一种仿生圆鳞结构微织构刀具及加工方法

Family Cites Families (21)

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ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
DE4007523A1 (de) * 1990-03-09 1991-09-12 Karl Marx Stadt Tech Hochschul Vorrichtung zur plasmagestuetzten abscheidung von hartstoffschichtsystemen
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
DE4228499C1 (de) * 1992-09-01 1993-10-07 Dresden Vakuumtech Gmbh Verfahren und Einrichtung zur plasmagestützten Beschichtung von Substraten
JP3016703B2 (ja) * 1995-01-31 2000-03-06 日立ツール株式会社 被覆硬質部材
JP3229947B2 (ja) * 1996-04-26 2001-11-19 日立ツール株式会社 表面被覆スローアウェイインサート
JP3382781B2 (ja) * 1996-06-05 2003-03-04 日立ツール株式会社 多層被覆硬質工具
SE9704607D0 (sv) 1997-12-09 1997-12-09 Chemfilt R & D Ab A method and apparatus for magnetically enhanced sputtering
CZ301516B6 (cs) * 1997-09-12 2010-03-31 Oerlikon Trading Ag, Truebbach Nástroj s ochranným vrstvovým systémem a zpusob jeho výroby
US6274249B1 (en) 1997-09-12 2001-08-14 Unaxis Balzers Aktiengesellschaft Tool with tool body and protective layer system
SK287473B6 (sk) * 1997-09-12 2010-11-08 Oerlikon Trading Ag, Tr�Bbach Nástroj s telesom a so sústavou vrstiev a spôsob jeho výroby
JPH11131215A (ja) * 1997-10-29 1999-05-18 Hitachi Tool Eng Ltd 被覆硬質工具
JP3476749B2 (ja) * 2000-06-14 2003-12-10 東芝タンガロイ株式会社 硬質膜被覆超高温高圧焼結体
CA2531028C (en) * 2003-06-27 2009-07-14 Sumitomo Electric Industries, Ltd. Surface-coated high hardness material for tool
US7951275B2 (en) 2003-09-12 2011-05-31 Jx Nippon Mining & Metals Corporation Sputtering target and method for finishing surface of such target
DE102004015230B4 (de) * 2004-03-29 2007-07-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Intensivieren einer gepulsten Magnetronentladung
CN100482854C (zh) 2005-01-27 2009-04-29 中华映管股份有限公司 磁控溅射制造工艺
DE102005021927A1 (de) 2005-05-12 2006-11-16 Fette Gmbh Legierter Körper als Target für das PVD-Verfahren, Verfahren zur Herstellung des legierten Körpers und PVD-Verfahren mit dem legierten Körper
DE102006017382A1 (de) 2005-11-14 2007-05-16 Itg Induktionsanlagen Gmbh Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen
DE102006019000A1 (de) * 2006-04-25 2007-12-13 Vtd Vakuumtechnik Dresden Gmbh Einrichtung und Verfahren zur plasmagestützten Abscheidung von Hartstoffschichten
US8277958B2 (en) * 2009-10-02 2012-10-02 Kennametal Inc. Aluminum titanium nitride coating and method of making same

Also Published As

Publication number Publication date
US8702912B2 (en) 2014-04-22
RU2010146622A (ru) 2012-05-27
US20110020079A1 (en) 2011-01-27
KR20100135806A (ko) 2010-12-27
CA2716619A1 (en) 2009-10-22
DE102008019202A1 (de) 2009-10-22
WO2009127344A1 (de) 2009-10-22
JP2011517733A (ja) 2011-06-16
CN101981222A (zh) 2011-02-23
MX2010011294A (es) 2010-11-09
EP2268843A1 (de) 2011-01-05

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE AS 5A E 6A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2343 DE 01-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.