BRPI0918511A2 - película antirreflexiva e método de produção desta - Google Patents

película antirreflexiva e método de produção desta

Info

Publication number
BRPI0918511A2
BRPI0918511A2 BRPI0918511A BRPI0918511A BRPI0918511A2 BR PI0918511 A2 BRPI0918511 A2 BR PI0918511A2 BR PI0918511 A BRPI0918511 A BR PI0918511A BR PI0918511 A BRPI0918511 A BR PI0918511A BR PI0918511 A2 BRPI0918511 A2 BR PI0918511A2
Authority
BR
Brazil
Prior art keywords
production method
reflective film
reflective
film
production
Prior art date
Application number
BRPI0918511A
Other languages
English (en)
Inventor
Akiyoshi Fujii
Kazuhiko Tsuda
Takao Imaoku
Tokio Taguchi
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of BRPI0918511A2 publication Critical patent/BRPI0918511A2/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Laminated Bodies (AREA)
BRPI0918511A 2008-09-17 2009-09-01 película antirreflexiva e método de produção desta BRPI0918511A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008238051 2008-09-17
PCT/JP2009/065271 WO2010032610A1 (ja) 2008-09-17 2009-09-01 反射防止膜及びその製造方法

Publications (1)

Publication Number Publication Date
BRPI0918511A2 true BRPI0918511A2 (pt) 2015-12-01

Family

ID=42039444

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0918511A BRPI0918511A2 (pt) 2008-09-17 2009-09-01 película antirreflexiva e método de produção desta

Country Status (7)

Country Link
US (1) US8747994B2 (pt)
EP (1) EP2333590B1 (pt)
JP (1) JP5148712B2 (pt)
CN (1) CN102066987B (pt)
BR (1) BRPI0918511A2 (pt)
RU (1) RU2480796C2 (pt)
WO (1) WO2010032610A1 (pt)

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DE102007051752B4 (de) * 2007-10-30 2010-01-28 X-Fab Semiconductor Foundries Ag Licht blockierende Schichtenfolge und Verfahren zu deren Herstellung
JP5511313B2 (ja) * 2008-11-07 2014-06-04 キヤノン株式会社 光学素子成形用金型、光学素子成形用金型の製造方法、光学素子、および光学素子の製造方法
KR20100064215A (ko) * 2008-12-04 2010-06-14 삼성전자주식회사 표시 장치
KR20130129887A (ko) * 2010-07-12 2013-11-29 데쿠세리아루즈 가부시키가이샤 원반의 제조 방법, 배향막의 제조 방법, 위상차판의 제조 방법 및 표시 장치의 제조 방법
CN103119486A (zh) * 2010-10-01 2013-05-22 住友电木株式会社 光波导、光波导的制造方法、光波导模块、光波导模块的制造方法以及电子设备
US20130309452A1 (en) * 2011-02-01 2013-11-21 Sharp Kabushiki Kaisha Laminate and method for producing laminate
JP6006718B2 (ja) * 2011-05-17 2016-10-12 キヤノン電子株式会社 光学フィルタ、光学機器、電子機器及び反射防止複合体
JP2012252224A (ja) * 2011-06-03 2012-12-20 Dainippon Printing Co Ltd 反射防止フィルム
TWI525229B (zh) * 2011-11-18 2016-03-11 財團法人工業技術研究院 氧化鋅抗反射層與其製法
JP5903943B2 (ja) * 2012-03-13 2016-04-13 大日本印刷株式会社 反射防止フィルムの製造方法、賦型用金型の製造方法及び反射防止フィルム
JP2013254130A (ja) * 2012-06-08 2013-12-19 Dexerials Corp 光学素子およびその製造方法、表示素子、ならびに投射型画像表示装置
JP6386700B2 (ja) 2012-07-04 2018-09-05 キヤノン株式会社 構造体、光学部材、反射防止膜、撥水性膜、質量分析用基板、位相板、構造体の製造方法、及び反射防止膜の製造方法
TWI490574B (zh) * 2013-04-03 2015-07-01 聚森股份有限公司 發電模組及其導光膜
TWI547378B (zh) * 2013-04-05 2016-09-01 三菱麗陽股份有限公司 積層結構體及其製造方法、物品
JP6167005B2 (ja) * 2013-10-04 2017-07-19 富士フイルム株式会社 反射防止フィルム、偏光板、カバーガラス、及び画像表示装置
US10254169B2 (en) * 2014-09-09 2019-04-09 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Optical detector based on an antireflective structured dielectric surface and a metal absorber
JP6293916B2 (ja) * 2014-10-07 2018-03-14 シャープ株式会社 透明フィルム、及び、透明フィルムの製造方法
JP6495625B2 (ja) * 2014-11-11 2019-04-03 株式会社ジャパンディスプレイ 表示装置
EP3257054B1 (en) * 2015-02-10 2019-10-16 Carl Zeiss SMT GmbH Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror
JP6730803B2 (ja) 2015-12-18 2020-07-29 デクセリアルズ株式会社 反射防止光学体の形成方法、ディスプレイパネルおよび光学フィルム
JP6623058B2 (ja) * 2015-12-18 2019-12-18 デクセリアルズ株式会社 反射防止光学体の形成方法およびディスプレイパネル
US10877181B2 (en) * 2016-11-11 2020-12-29 AGC Inc. Substrate with low-reflection property and manufacturing method thereof
CN107065041A (zh) * 2017-05-10 2017-08-18 武汉华星光电技术有限公司 一种偏光片的制备方法、偏光片及显示装置
JP7025892B2 (ja) * 2017-11-07 2022-02-25 デクセリアルズ株式会社 積層体、反射防止構造体及びカメラモジュール搭載装置
CN108445564A (zh) * 2018-05-17 2018-08-24 浙江彩丞照明科技有限公司 一种具有非直线棱角锥微结构的防眩光板
JP7208765B2 (ja) * 2018-11-08 2023-01-19 デクセリアルズ株式会社 積層体、積層体の製造方法、光学体の形成方法及びカメラモジュール搭載装置
US12085692B2 (en) 2019-04-26 2024-09-10 Huawei Technologies Co., Ltd. Antireflection film, optical element, camera module, and terminal
PH12022550694A1 (en) * 2019-09-25 2023-04-03 Basf Coatings Gmbh Method for transferring an embossed structure to the surface of a coating, and composite employable as embossing mold
CN113905556A (zh) * 2021-09-27 2022-01-07 Oppo广东移动通信有限公司 壳体及其制作方法、电子设备
EP4522289A4 (en) * 2022-05-08 2025-08-20 Bagira Systems Ltd HANDHELD GAME CONSOLE

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JP4253862B2 (ja) 1998-04-22 2009-04-15 株式会社ブリヂストン 反射防止フィルム
JP4281137B2 (ja) * 1999-01-14 2009-06-17 住友化学株式会社 反射防止膜
JP2003240903A (ja) * 2002-02-20 2003-08-27 Dainippon Printing Co Ltd 反射防止物品
JP4197100B2 (ja) 2002-02-20 2008-12-17 大日本印刷株式会社 反射防止物品
JP2003279705A (ja) * 2002-03-25 2003-10-02 Sanyo Electric Co Ltd 反射防止部材
JP2003344855A (ja) * 2002-05-30 2003-12-03 Mitsubishi Chemicals Corp フロントライト用導光板
JP2004205990A (ja) 2002-12-26 2004-07-22 Dainippon Printing Co Ltd 反射防止性能を有する微細凹凸パターンの作製方法及び反射防止物品
JP4270968B2 (ja) * 2003-07-10 2009-06-03 オリンパス株式会社 反射防止面付光学素子を持つ光学系を備えた光学機器
JP2006018062A (ja) 2004-07-02 2006-01-19 Konica Minolta Opto Inc 反射防止フィルム、偏光板及び表示装置
JP2007079392A (ja) 2005-09-16 2007-03-29 Fujifilm Corp 光学フィルム、表示装置、偏向板
JP2007196397A (ja) 2006-01-23 2007-08-09 Fujifilm Corp 凹凸状シートの製造方法及び装置
KR101389914B1 (ko) 2006-08-21 2014-04-29 가부시키가이샤 소니 디에이디씨 광학 소자, 광학 소자 제작용 원반의 제조 방법, 및 광전변환 장치
WO2008069223A1 (en) 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Anti-reflection film and display device
WO2008069164A1 (en) 2006-12-05 2008-06-12 Semiconductor Energy Laboratory Co., Ltd. Antireflection film and display device
JP2008194977A (ja) 2007-02-14 2008-08-28 Hitachi Maxell Ltd 成形体の製造方法及び製造装置
JP2008209540A (ja) * 2007-02-26 2008-09-11 Mitsubishi Rayon Co Ltd 反射防止物品
JP5050605B2 (ja) 2007-03-27 2012-10-17 栗田工業株式会社 有機物処理方法及び有機物処理装置

Also Published As

Publication number Publication date
CN102066987B (zh) 2016-06-22
WO2010032610A1 (ja) 2010-03-25
US8747994B2 (en) 2014-06-10
RU2480796C2 (ru) 2013-04-27
RU2011107603A (ru) 2012-10-27
EP2333590A4 (en) 2011-09-07
EP2333590B1 (en) 2017-06-21
JP5148712B2 (ja) 2013-02-20
JPWO2010032610A1 (ja) 2012-02-09
EP2333590A1 (en) 2011-06-15
CN102066987A (zh) 2011-05-18
US20110123777A1 (en) 2011-05-26

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Legal Events

Date Code Title Description
B08F Application fees: dismissal - article 86 of industrial property law

Free format text: REFERENTE A 7A ANUIDADE.

B08K Lapse as no evidence of payment of the annual fee has been furnished to inpi (acc. art. 87)

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2383 DE 06-09-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.