BRPI1010314A2 - molde e metodo de fabricação do mesmo - Google Patents

molde e metodo de fabricação do mesmo

Info

Publication number
BRPI1010314A2
BRPI1010314A2 BRPI1010314A BRPI1010314A BRPI1010314A2 BR PI1010314 A2 BRPI1010314 A2 BR PI1010314A2 BR PI1010314 A BRPI1010314 A BR PI1010314A BR PI1010314 A BRPI1010314 A BR PI1010314A BR PI1010314 A2 BRPI1010314 A2 BR PI1010314A2
Authority
BR
Brazil
Prior art keywords
mold
manufacture
Prior art date
Application number
BRPI1010314A
Other languages
English (en)
Inventor
Akinobu Isurugi
Hidekazu Hayashi
Kiyoshi Minoura
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of BRPI1010314A2 publication Critical patent/BRPI1010314A2/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3814—Porous moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
BRPI1010314A 2009-04-09 2010-04-06 molde e metodo de fabricação do mesmo BRPI1010314A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009095267 2009-04-09
PCT/JP2010/002518 WO2010116728A1 (ja) 2009-04-09 2010-04-06 型およびその製造方法

Publications (1)

Publication Number Publication Date
BRPI1010314A2 true BRPI1010314A2 (pt) 2016-03-15

Family

ID=42936023

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI1010314A BRPI1010314A2 (pt) 2009-04-09 2010-04-06 molde e metodo de fabricação do mesmo

Country Status (7)

Country Link
US (1) US8580135B2 (pt)
EP (1) EP2418305B1 (pt)
JP (1) JP4648995B2 (pt)
CN (1) CN102227519B (pt)
BR (1) BRPI1010314A2 (pt)
RU (1) RU2482221C1 (pt)
WO (1) WO2010116728A1 (pt)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5511313B2 (ja) * 2008-11-07 2014-06-04 キヤノン株式会社 光学素子成形用金型、光学素子成形用金型の製造方法、光学素子、および光学素子の製造方法
RU2481949C1 (ru) 2009-04-30 2013-05-20 Шарп Кабусики Кайся Пресс-форма и способ ее изготовления
CN102791909B (zh) 2010-03-09 2015-05-20 夏普株式会社 阳极氧化层的形成方法、模具的制造方法以及防反射膜的制造方法
EP2554717B1 (en) * 2010-03-31 2019-10-30 Sharp Kabushiki Kaisha Process for producing a die, and process for producing antireflection film
US9405043B2 (en) * 2010-04-28 2016-08-02 Sharp Kabushiki Kaisha Mold and process for production of mold
WO2012046808A1 (ja) * 2010-10-08 2012-04-12 シャープ株式会社 陽極酸化膜の製造方法
WO2012057073A1 (ja) * 2010-10-25 2012-05-03 シャープ株式会社 太陽熱集熱部材およびその作製方法
KR20120088920A (ko) * 2011-02-01 2012-08-09 삼성전기주식회사 터치패널
US9512535B2 (en) * 2011-04-01 2016-12-06 Sharp Kabushiki Kaisha Mold production method
CN103688193B (zh) 2011-05-17 2016-05-04 佳能电子株式会社 光学滤波器、光学设备、电子设备和防反射复合体
CN102517620B (zh) * 2011-12-06 2014-12-17 中国科学院宁波材料技术与工程研究所 一种渐变折射率减反射膜的制备方法
CN104350183B (zh) 2012-06-06 2016-11-09 夏普株式会社 模具基材、模具基材的制造方法、模具的制造方法以及模具
CN103898447A (zh) * 2012-12-29 2014-07-02 深圳富泰宏精密工业有限公司 不锈钢表面处理方法及由该方法制得的外壳

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4193848A (en) * 1973-08-13 1980-03-18 Swiss Aluminium Ltd. Process for the production of composite material
JP3436983B2 (ja) * 1994-09-02 2003-08-18 富士通株式会社 モールド成形品の分離方法
JP2955704B2 (ja) * 1995-07-25 1999-10-04 株式会社有沢製作所 航空機用の液晶プロジェクター用反射型スクリーン及び液晶プロジェクター用反射型スクリーンの製造方法
DE19708776C1 (de) 1997-03-04 1998-06-18 Fraunhofer Ges Forschung Entspiegelungsschicht sowie Verfahren zur Herstellung derselben
JP3440754B2 (ja) * 1997-05-19 2003-08-25 信越化学工業株式会社 室温硬化性オルガノポリシロキサン組成物
US6140701A (en) * 1999-08-31 2000-10-31 Micron Technology, Inc. Suppression of hillock formation in thin aluminum films
DE10020877C1 (de) 2000-04-28 2001-10-25 Alcove Surfaces Gmbh Prägewerkzeug, Verfahren zum Herstellen desselben, Verfahren zur Strukturierung einer Oberfläche eines Werkstücks und Verwendung einer anodisch oxidierten Oberflächenschicht
US7066234B2 (en) * 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
RU2186159C1 (ru) * 2001-01-19 2002-07-27 Государственное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" Способ нанесения покрытия на деталь из алюминия и алюминиевых сплавов
JP2005008909A (ja) * 2003-06-16 2005-01-13 Canon Inc 構造体の製造方法
JP4406553B2 (ja) 2003-11-21 2010-01-27 財団法人神奈川科学技術アカデミー 反射防止膜の製造方法
JP2006028604A (ja) * 2004-07-16 2006-02-02 Ricoh Co Ltd 微細形状転写方法、鋳型製作方法、鋳型表面処理法及び鋳型
JP2006059686A (ja) 2004-08-20 2006-03-02 Yazaki Corp 平型ケーブル
KR100893251B1 (ko) * 2004-12-03 2009-04-17 샤프 가부시키가이샤 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법
CN101088030B (zh) * 2004-12-03 2013-11-06 夏普株式会社 抗反射材料、光学元件、显示器件及压模的制造方法和使用了压模的抗反射材料的制造方法
US7713768B2 (en) * 2006-06-14 2010-05-11 Kanagawa Academy Of Science And Technology Anti-reflective film and production method thereof, and stamper for producing anti-reflective film and production method thereof
JP5094208B2 (ja) * 2006-08-24 2012-12-12 キヤノン株式会社 構造体の製造方法
US7655127B2 (en) * 2006-11-27 2010-02-02 3M Innovative Properties Company Method of fabricating thin film transistor
JP5365903B2 (ja) 2008-10-07 2013-12-11 富士電機株式会社 アルミニウム合金形成基板及びその製造方法

Also Published As

Publication number Publication date
CN102227519B (zh) 2014-07-02
EP2418305B1 (en) 2016-09-28
US8580135B2 (en) 2013-11-12
EP2418305A1 (en) 2012-02-15
US20120018613A1 (en) 2012-01-26
EP2418305A4 (en) 2013-01-02
JP4648995B2 (ja) 2011-03-09
RU2482221C1 (ru) 2013-05-20
CN102227519A (zh) 2011-10-26
JPWO2010116728A1 (ja) 2012-10-18
WO2010116728A1 (ja) 2010-10-14

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2385 DE 20-09-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.