CA1070545A - Stratifies a couche contenant des copolymeres sequences stryrene-diene pour les plaques d'imprimerie flexographiques - Google Patents

Stratifies a couche contenant des copolymeres sequences stryrene-diene pour les plaques d'imprimerie flexographiques

Info

Publication number: CA1070545A
Authority: CA; Canada
Prior art keywords: layer; laminates; photocrosslinkable; block copolymer; mixture
Prior art date: 1974-11-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA240,553A

Other languages

English (en)

Inventor

Peter Richter

August Wigger

Gerhard Fahrbach

Erhard Seiler

Helmut Barzynski

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

BASF SE

Original Assignee

BASF SE

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-11-29

Filing date

1975-11-26

Publication date

1980-01-29

1975-11-26 Application filed by BASF SE filed Critical BASF SE

1980-01-29 Application granted granted Critical

1980-01-29 Publication of CA1070545A publication Critical patent/CA1070545A/fr

Status Expired legal-status Critical Current

Links

229920001400 block copolymer Polymers 0.000 title claims abstract description 28
-1 diene hydrocarbon Chemical class 0.000 claims abstract description 18
239000000203 mixture Substances 0.000 claims abstract description 16
239000000178 monomer Substances 0.000 claims abstract description 16
229930195733 hydrocarbon Natural products 0.000 claims abstract description 10
238000004519 manufacturing process Methods 0.000 claims abstract description 10
230000000087 stabilizing effect Effects 0.000 claims abstract description 9
239000004215 Carbon black (E152) Substances 0.000 claims abstract description 6
229920000642 polymer Polymers 0.000 claims description 23
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 18
239000011248 coating agent Substances 0.000 claims description 12
238000000576 coating method Methods 0.000 claims description 12
230000001681 protective effect Effects 0.000 claims description 6
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
230000007704 transition Effects 0.000 claims description 4
239000000654 additive Substances 0.000 claims description 3
125000004432 carbon atom Chemical group C* 0.000 claims description 3
150000001993 dienes Chemical class 0.000 claims description 3
229910052739 hydrogen Inorganic materials 0.000 claims description 3
239000001257 hydrogen Substances 0.000 claims description 3
238000005984 hydrogenation reaction Methods 0.000 claims description 3
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 1
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract description 10
239000003999 initiator Substances 0.000 abstract 1
239000010410 layer Substances 0.000 description 97
235000019589 hardness Nutrition 0.000 description 11
239000000463 material Substances 0.000 description 11
239000000853 adhesive Substances 0.000 description 9
230000001070 adhesive effect Effects 0.000 description 9
239000002904 solvent Substances 0.000 description 9
229920001577 copolymer Polymers 0.000 description 6
229920000728 polyester Polymers 0.000 description 6
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
239000000306 component Substances 0.000 description 5
238000002360 preparation method Methods 0.000 description 5
230000008901 benefit Effects 0.000 description 4
238000005266 casting Methods 0.000 description 4
229920001971 elastomer Polymers 0.000 description 4
239000000976 ink Substances 0.000 description 4
238000000034 method Methods 0.000 description 4
229920000139 polyethylene terephthalate Polymers 0.000 description 4
239000005020 polyethylene terephthalate Substances 0.000 description 4
239000004814 polyurethane Substances 0.000 description 4
JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
238000011161 development Methods 0.000 description 3
230000018109 developmental process Effects 0.000 description 3
238000001035 drying Methods 0.000 description 3
150000002430 hydrocarbons Chemical class 0.000 description 3
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
229920002635 polyurethane Polymers 0.000 description 3
230000008569 process Effects 0.000 description 3
239000000047 product Substances 0.000 description 3
239000005060 rubber Substances 0.000 description 3
230000008961 swelling Effects 0.000 description 3
QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
239000004952 Polyamide Substances 0.000 description 2
239000005062 Polybutadiene Substances 0.000 description 2
239000004793 Polystyrene Substances 0.000 description 2
239000007795 chemical reaction product Substances 0.000 description 2
JXCHMDATRWUOAP-UHFFFAOYSA-N diisocyanatomethylbenzene Chemical compound O=C=NC(N=C=O)C1=CC=CC=C1 JXCHMDATRWUOAP-UHFFFAOYSA-N 0.000 description 2
MCWXGJITAZMZEV-UHFFFAOYSA-N dimethoate Chemical compound CNC(=O)CSP(=S)(OC)OC MCWXGJITAZMZEV-UHFFFAOYSA-N 0.000 description 2
239000000975 dye Substances 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
239000003112 inhibitor Substances 0.000 description 2
NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
229920003023 plastic Polymers 0.000 description 2
239000004033 plastic Substances 0.000 description 2
229920002647 polyamide Polymers 0.000 description 2
229920002857 polybutadiene Polymers 0.000 description 2
239000005056 polyisocyanate Substances 0.000 description 2
229920001228 polyisocyanate Polymers 0.000 description 2
229920002223 polystyrene Polymers 0.000 description 2
239000000126 substance Substances 0.000 description 2
UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
MEYARNKYUHUVBB-UHFFFAOYSA-N 2-hydroxy-1-[2-(hydroxymethyl)phenyl]-2-phenylethanone Chemical compound OCC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 MEYARNKYUHUVBB-UHFFFAOYSA-N 0.000 description 1
OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
ROGIWVXWXZRRMZ-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1 ROGIWVXWXZRRMZ-UHFFFAOYSA-N 0.000 description 1
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
DXIJHCSGLOHNES-UHFFFAOYSA-N 3,3-dimethylbut-1-enylbenzene Chemical compound CC(C)(C)C=CC1=CC=CC=C1 DXIJHCSGLOHNES-UHFFFAOYSA-N 0.000 description 1
GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
101100087530 Caenorhabditis elegans rom-1 gene Proteins 0.000 description 1
241000905957 Channa melasoma Species 0.000 description 1
XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
244000043261 Hevea brasiliensis Species 0.000 description 1
239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
OWIKHYCFFJSOEH-UHFFFAOYSA-N Isocyanic acid Chemical compound N=C=O OWIKHYCFFJSOEH-UHFFFAOYSA-N 0.000 description 1
239000005058 Isophorone diisocyanate Substances 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
101100305983 Mus musculus Rom1 gene Proteins 0.000 description 1
SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical class [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
150000001252 acrylic acid derivatives Chemical class 0.000 description 1
230000009471 action Effects 0.000 description 1
239000012190 activator Substances 0.000 description 1
239000002318 adhesion promoter Substances 0.000 description 1
239000012790 adhesive layer Substances 0.000 description 1
150000001298 alcohols Chemical class 0.000 description 1
150000001408 amides Chemical class 0.000 description 1
239000003963 antioxidant agent Substances 0.000 description 1
238000010923 batch production Methods 0.000 description 1
ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
FACXGONDLDSNOE-UHFFFAOYSA-N buta-1,3-diene;styrene Chemical compound C=CC=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 FACXGONDLDSNOE-UHFFFAOYSA-N 0.000 description 1
MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
238000010924 continuous production Methods 0.000 description 1
230000001276 controlling effect Effects 0.000 description 1
230000002596 correlated effect Effects 0.000 description 1
230000006378 damage Effects 0.000 description 1
CEJLBZWIKQJOAT-UHFFFAOYSA-N dichloroisocyanuric acid Chemical compound ClN1C(=O)NC(=O)N(Cl)C1=O CEJLBZWIKQJOAT-UHFFFAOYSA-N 0.000 description 1
125000005442 diisocyanate group Chemical group 0.000 description 1
239000003085 diluting agent Substances 0.000 description 1
150000002009 diols Chemical class 0.000 description 1
125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
239000000806 elastomer Substances 0.000 description 1
LPUZTLKYAOOFDX-QXMHVHEDSA-N ethenyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC=C LPUZTLKYAOOFDX-QXMHVHEDSA-N 0.000 description 1
229940052303 ethers for general anesthesia Drugs 0.000 description 1
STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
239000004744 fabric Substances 0.000 description 1
239000006260 foam Substances 0.000 description 1
238000010528 free radical solution polymerization reaction Methods 0.000 description 1
239000011521 glass Substances 0.000 description 1
239000003365 glass fiber Substances 0.000 description 1
RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
239000012456 homogeneous solution Substances 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
230000006872 improvement Effects 0.000 description 1
239000011229 interlayer Substances 0.000 description 1
NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
239000007788 liquid Substances 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
229940063557 methacrylate Drugs 0.000 description 1
125000005395 methacrylic acid group Chemical group 0.000 description 1
DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
229920003052 natural elastomer Polymers 0.000 description 1
229920001194 natural rubber Polymers 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
239000002798 polar solvent Substances 0.000 description 1
229920001084 poly(chloroprene) Polymers 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920000570 polyether Polymers 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
239000002861 polymer material Substances 0.000 description 1
229920005862 polyol Polymers 0.000 description 1
150000003077 polyols Chemical class 0.000 description 1
239000005077 polysulfide Substances 0.000 description 1
229920001021 polysulfide Polymers 0.000 description 1
150000008117 polysulfides Polymers 0.000 description 1
230000002028 premature Effects 0.000 description 1
HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
230000033458 reproduction Effects 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
239000007787 solid Substances 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000003756 stirring Methods 0.000 description 1
229920006132 styrene block copolymer Polymers 0.000 description 1
229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 1
125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
150000005846 sugar alcohols Polymers 0.000 description 1
239000004753 textile Substances 0.000 description 1
238000012719 thermal polymerization Methods 0.000 description 1
229920001169 thermoplastic Polymers 0.000 description 1
239000012815 thermoplastic material Substances 0.000 description 1
239000004416 thermosoftening plastic Substances 0.000 description 1
UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
229960000834 vinyl ether Drugs 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
239000004636 vulcanized rubber Substances 0.000 description 1
239000008096 xylene Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Manufacture Or Reproduction Of Printing Formes (AREA)
Printing Methods (AREA)

CA240,553A 1974-11-29 1975-11-26 Stratifies a couche contenant des copolymeres sequences stryrene-diene pour les plaques d'imprimerie flexographiques Expired CA1070545A (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19742456439 DE2456439A1 (de)	1974-11-29	1974-11-29	Mehrschichtenverbundplatten fuer die herstellung von flexodruckformen

Publications (1)

Publication Number	Publication Date
CA1070545A true CA1070545A (fr)	1980-01-29

Family

ID=5932030

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA240,553A Expired CA1070545A (fr)	1974-11-29	1975-11-26	Stratifies a couche contenant des copolymeres sequences stryrene-diene pour les plaques d'imprimerie flexographiques

Country Status (11)

Country	Link
JP (1)	JPS5174703A (fr)
AT (1)	AT342090B (fr)
BE (1)	BE836070A (fr)
CA (1)	CA1070545A (fr)
CH (1)	CH602986A5 (fr)
DE (1)	DE2456439A1 (fr)
DK (1)	DK144344C (fr)
FR (1)	FR2292997A1 (fr)
GB (1)	GB1525965A (fr)
NO (1)	NO144121C (fr)
SE (1)	SE410058B (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS53127004A (en) *	1977-04-11	1978-11-06	Asahi Chemical Ind	Photosensitive elastomer composition
US4179531A (en)	1977-08-23	1979-12-18	W. R. Grace & Co.	Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4234676A (en)	1978-01-23	1980-11-18	W. R. Grace & Co.	Polythiol effect curable polymeric composition
DE2834768A1 (de) *	1977-08-23	1979-03-08	Grace W R & Co	Verfahren zur herstellung einer druckplatte und sie enthaltende haertbare polymerzusammensetzung
DE2823300C2 (de) *	1978-05-29	1986-02-20	Basf Ag, 6700 Ludwigshafen	Verfahren zur Herstellung von klebfreien Oberflächen von photopolymeren Reliefdruckformen
CA1123649A (fr) *	1978-06-22	1982-05-18	Norman E. Hughes	Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle
JPS55135838A (en) *	1979-04-12	1980-10-23	Asahi Chem Ind Co Ltd	Surface treating method for photosensitive elastomer printing plate
US4292150A (en) *	1979-06-26	1981-09-29	Uniroyal, Inc.	Iodine treated elastomeric article
EP0057593A3 (fr) *	1981-02-02	1983-01-19	Uniroyal, Inc.	Plaque d'impression à photopolymère compressible
DE3107741A1 (de)	1981-02-28	1982-09-16	Basf Ag, 6700 Ludwigshafen	Zur herstellung von druck- und reliefformen geeignete mehrschichten-elemente sowie verfahren zu ihrer herstellung
US4427759A (en) *	1982-01-21	1984-01-24	E. I. Du Pont De Nemours And Company	Process for preparing an overcoated photopolymer printing plate
US4582777A (en) *	1983-05-18	1986-04-15	W. R. Grace & Co.	Compressible printing plate
DE3630474A1 (de) *	1986-09-06	1988-03-10	Basf Ag	Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen
DE3744243C2 (de) *	1987-12-24	1995-12-07	Du Pont Deutschland	Verbesserte photopolymerisierbare Aufzeichnungsmaterialien
CA1314752C (fr) *	1988-04-13	1993-03-23	Hisao Satoh	Plaque de resine photosensible destinee a la flexographie
DE19859623A1 (de)	1998-12-23	2000-08-24	Basf Drucksysteme Gmbh	Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen

1974
- 1974-11-29 DE DE19742456439 patent/DE2456439A1/de not_active Withdrawn
1975
- 1975-11-21 NO NO753936A patent/NO144121C/no unknown
- 1975-11-21 JP JP50139351A patent/JPS5174703A/ja active Pending
- 1975-11-25 SE SE7513246A patent/SE410058B/xx unknown
- 1975-11-26 CA CA240,553A patent/CA1070545A/fr not_active Expired
- 1975-11-28 DK DK539075A patent/DK144344C/da not_active IP Right Cessation
- 1975-11-28 AT AT908775A patent/AT342090B/de not_active IP Right Cessation
- 1975-11-28 BE BE162270A patent/BE836070A/fr not_active IP Right Cessation
- 1975-11-28 FR FR7536510A patent/FR2292997A1/fr active Granted
- 1975-11-28 CH CH1548875A patent/CH602986A5/xx not_active IP Right Cessation
- 1975-11-28 GB GB48977/75A patent/GB1525965A/en not_active Expired

Also Published As

Publication number	Publication date
FR2292997A1 (fr)	1976-06-25
AT342090B (de)	1978-03-10
NO753936L (fr)	1976-06-01
GB1525965A (en)	1978-09-27
ATA908775A (de)	1977-07-15
NO144121C (no)	1981-06-24
DK144344C (da)	1982-07-19
NO144121B (no)	1981-03-16
DK144344B (da)	1982-02-22
CH602986A5 (fr)	1978-08-15
AU8702775A (en)	1977-06-02
DE2456439A1 (de)	1976-08-12
SE7513246L (sv)	1976-05-31
FR2292997B1 (fr)	1981-09-25
BE836070A (fr)	1976-05-28
DK539075A (da)	1976-05-30
JPS5174703A (fr)	1976-06-28
SE410058B (sv)	1979-09-17

Legal Events

Date	Code	Title	Description
1997-01-29	MKEX	Expiry

Publication	Publication Date	Title
US4162919A (en)	1979-07-31	Laminates for the manufacture of flexographic printing plates using block copolymers
CA1070545A (fr)	1980-01-29	Stratifies a couche contenant des copolymeres sequences stryrene-diene pour les plaques d'imprimerie flexographiques
US4320188A (en)	1982-03-16	Photopolymerizable compositions containing elastomers and photo-curable elements made therefrom
CA1200713A (fr)	1986-02-18	Melanges photopolymerisables, et elements photodurcissables qui en sont derives
CA1101586A (fr)	1981-05-19	Composes photosensibles
CA1039100A (fr)	1978-09-26	Plaques a relief pour l'impression et produits lamellaires servant a leur fabrication
US3024180A (en)	1962-03-06	Photopolymerizable elements
CA2041023C (fr)	2002-03-12	Elements photodurcissable et planches d'impression flexographiques fabriquees avec ces elements
US6210854B1 (en)	2001-04-03	Aqueous developable flexographic printing plate
US4806452A (en)	1989-02-21	Production of flexographic relief plates by photopolymerization and development with a monoterpene developer
US4340657A (en)	1982-07-20	Novel radiation-sensitive articles
US6037101A (en)	2000-03-14	Photosensitive mixture and recording material produced therefrom
CA1166884A (fr)	1984-05-08	Elements a plusieurs couches, pouvant servir a la fabrication de plaques d'impression et de copies en relief, dont une chouche adhesive a base de resine d'isocyanate durcie et de polycarbonate exempt de oh
US4927738A (en)	1990-05-22	Conjugated diene copolymer, process for producing the same, and photosensitive resin composition comprising the same
US4959285A (en)	1990-09-25	Flexographic relief printing plate
CA1110900A (fr)	1981-10-20	Composition vulcanisable a base d'aromatique monoalcenylique, mono et dienique, a fonction polythiol
US4959296A (en)	1990-09-25	Process for the development of dry PS plates
JPH05273752A (ja)	1993-10-22	凸版印刷版製造用の感光性混合物
CA2076511A1 (fr)	1993-03-17	Composition photodurcissable, articles souples photosensibles connexes et methodes visant a ameliorer la resistance aux solvants et la souplesse de ces articles
CA1272061A (fr)	1990-07-31	Production de surfaces lisses non adhesives de cliches en polymere a relief pour la flexographie
US4401749A (en)	1983-08-30	Multi-layer elements suitable for the production of printing plates and relief plates, and their production
US4248960A (en)	1981-02-03	Radiation responsive relief imageable plastic laminate
US4921775A (en)	1990-05-01	Elements having layers containing mixtures which can be crosslinked by photopolymerization
EP0967523B1 (fr)	2003-03-19	Composition de résine photosensible, son procédé de préparation et matériau de plaque d'impression
US5468596A (en)	1995-11-21	Photosensitive recording element and production of a relief printing plate