CA1070855A - Photomasque en electronique - Google Patents
Photomasque en electroniqueInfo
- Publication number
- CA1070855A CA1070855A CA287,526A CA287526A CA1070855A CA 1070855 A CA1070855 A CA 1070855A CA 287526 A CA287526 A CA 287526A CA 1070855 A CA1070855 A CA 1070855A
- Authority
- CA
- Canada
- Prior art keywords
- mask
- gas
- supporting plate
- transparent
- optical exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12060876A JPS5345975A (en) | 1976-10-07 | 1976-10-07 | Mask for exposure |
| JP12984876A JPS5355203A (en) | 1976-10-28 | 1976-10-28 | Mask for exposure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1070855A true CA1070855A (fr) | 1980-01-29 |
Family
ID=26458153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA287,526A Expired CA1070855A (fr) | 1976-10-07 | 1977-09-26 | Photomasque en electronique |
Country Status (4)
| Country | Link |
|---|---|
| CA (1) | CA1070855A (fr) |
| DE (1) | DE2744837A1 (fr) |
| GB (1) | GB1577479A (fr) |
| NL (1) | NL7710996A (fr) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4131363A (en) * | 1977-12-05 | 1978-12-26 | International Business Machines Corporation | Pellicle cover for projection printing system |
| JPS5676531A (en) * | 1979-11-28 | 1981-06-24 | Fujitsu Ltd | Manufacture of semiconductor device |
| AT382040B (de) * | 1983-03-01 | 1986-12-29 | Guenther Stangl | Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter |
| DE3401856C2 (de) * | 1984-01-20 | 1986-04-24 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Kontaktkopiereinrichtung |
| JPH04225360A (ja) * | 1990-12-26 | 1992-08-14 | Adotetsuku Eng:Kk | プリント配線基板の製造におけるフィルムマスクの密着方法及びその装置 |
| CN119292011B (zh) * | 2024-12-16 | 2025-04-11 | 上海图双精密装备有限公司 | 用于提高曝光效果的方法和装置 |
-
1977
- 1977-09-26 CA CA287,526A patent/CA1070855A/fr not_active Expired
- 1977-09-29 GB GB40537/77A patent/GB1577479A/en not_active Expired
- 1977-10-05 DE DE19772744837 patent/DE2744837A1/de not_active Withdrawn
- 1977-10-06 NL NL7710996A patent/NL7710996A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| GB1577479A (en) | 1980-10-22 |
| DE2744837A1 (de) | 1978-04-13 |
| NL7710996A (nl) | 1978-04-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |