CA1103506A - Mode de preparation de formes d'impression planographique au moyen de rayons laser - Google Patents

Mode de preparation de formes d'impression planographique au moyen de rayons laser

Info

Publication number: CA1103506A
Authority: CA; Canada
Prior art keywords: layer; irradiated; recording layer; oxide layer; preparation
Prior art date: 1977-06-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA306,085A

Other languages

English (en)

Inventor

Fritz Uhlig

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hoechst AG

Original Assignee

Hoechst AG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-06-27

Filing date

1978-06-23

Publication date

1981-06-23

1978-06-23 Application filed by Hoechst AG filed Critical Hoechst AG

1981-06-23 Application granted granted Critical

1981-06-23 Publication of CA1103506A publication Critical patent/CA1103506A/fr

Status Expired legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 15
238000007639 printing Methods 0.000 title claims abstract description 10
238000002360 preparation method Methods 0.000 title claims abstract description 7
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 13
229910052782 aluminium Inorganic materials 0.000 claims abstract description 13
229920005989 resin Polymers 0.000 claims abstract description 12
239000011347 resin Substances 0.000 claims abstract description 12
150000008049 diazo compounds Chemical class 0.000 claims abstract description 9
239000000463 material Substances 0.000 claims abstract description 7
150000001412 amines Chemical class 0.000 claims abstract description 6
239000007788 liquid Substances 0.000 claims abstract description 4
238000005303 weighing Methods 0.000 claims abstract description 4
238000009877 rendering Methods 0.000 claims abstract description 3
239000007859 condensation product Substances 0.000 claims description 6
239000012954 diazonium Substances 0.000 claims description 6
150000001989 diazonium salts Chemical class 0.000 claims description 5
235000010210 aluminium Nutrition 0.000 description 11
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
239000002253 acid Substances 0.000 description 9
239000000243 solution Substances 0.000 description 9
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 6
229910052786 argon Inorganic materials 0.000 description 5
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
-1 aromatic diazonium salts Chemical class 0.000 description 4
ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
239000004922 lacquer Substances 0.000 description 4
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
239000010407 anodic oxide Substances 0.000 description 3
239000007864 aqueous solution Substances 0.000 description 3
239000004202 carbamide Substances 0.000 description 3
235000013877 carbamide Nutrition 0.000 description 3
238000009833 condensation Methods 0.000 description 3
230000005494 condensation Effects 0.000 description 3
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
239000000047 product Substances 0.000 description 3
230000005855 radiation Effects 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
ZOMLUNRKXJYKPD-UHFFFAOYSA-O 1,3,3-trimethyl-2-[2-(2-methyl-1h-indol-3-yl)ethenyl]indol-1-ium;hydrochloride Chemical compound Cl.C1=CC=C2C(C)(C)C(/C=C/C=3C4=CC=CC=C4NC=3C)=[N+](C)C2=C1 ZOMLUNRKXJYKPD-UHFFFAOYSA-O 0.000 description 2
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
229920000877 Melamine resin Polymers 0.000 description 2
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
229920001807 Urea-formaldehyde Polymers 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
238000010924 continuous production Methods 0.000 description 2
239000013078 crystal Substances 0.000 description 2
FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
150000002500 ions Chemical class 0.000 description 2
239000000203 mixture Substances 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
238000007645 offset printing Methods 0.000 description 2
BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
238000007788 roughening Methods 0.000 description 2
230000035945 sensitivity Effects 0.000 description 2
229920002554 vinyl polymer Polymers 0.000 description 2
YDGFWBUHUUSSRS-UHFFFAOYSA-N 1-(methoxymethyl)-4-phenoxybenzene Chemical compound C1=CC(COC)=CC=C1OC1=CC=CC=C1 YDGFWBUHUUSSRS-UHFFFAOYSA-N 0.000 description 1
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
244000228957 Ferula foetida Species 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
239000004640 Melamine resin Substances 0.000 description 1
AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
229910019142 PO4 Inorganic materials 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
239000004115 Sodium Silicate Substances 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
238000002048 anodisation reaction Methods 0.000 description 1
238000007743 anodising Methods 0.000 description 1
150000004982 aromatic amines Chemical class 0.000 description 1
150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
IWLBIFVMPLUHLK-UHFFFAOYSA-N azane;formaldehyde Chemical compound N.O=C IWLBIFVMPLUHLK-UHFFFAOYSA-N 0.000 description 1
235000019445 benzyl alcohol Nutrition 0.000 description 1
150000001728 carbonyl compounds Chemical class 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000000839 emulsion Substances 0.000 description 1
YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
150000002148 esters Chemical class 0.000 description 1
VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 1
BQBKYSPXQYHTIP-UHFFFAOYSA-N ethyl n-butylcarbamate Chemical compound CCCCNC(=O)OCC BQBKYSPXQYHTIP-UHFFFAOYSA-N 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
229910052743 krypton Inorganic materials 0.000 description 1
DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
229910052943 magnesium sulfate Inorganic materials 0.000 description 1
235000019341 magnesium sulphate Nutrition 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
229960000907 methylthioninium chloride Drugs 0.000 description 1
239000011707 mineral Substances 0.000 description 1
235000010755 mineral Nutrition 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
150000007524 organic acids Chemical class 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
150000008379 phenol ethers Chemical class 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
239000010452 phosphate Substances 0.000 description 1
229920000151 polyglycol Polymers 0.000 description 1
239000010695 polyglycol Substances 0.000 description 1
239000011734 sodium Substances 0.000 description 1
235000015424 sodium Nutrition 0.000 description 1
229940083542 sodium Drugs 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
235000019795 sodium metasilicate Nutrition 0.000 description 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
229910052911 sodium silicate Inorganic materials 0.000 description 1
239000000126 substance Substances 0.000 description 1
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
229920002803 thermoplastic polyurethane Polymers 0.000 description 1
AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
150000003673 urethanes Chemical class 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000008096 xylene Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Printing Plates And Materials Therefor (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Manufacture Or Reproduction Of Printing Formes (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Manufacture, Treatment Of Glass Fibers (AREA)

CA306,085A 1977-06-27 1978-06-23 Mode de preparation de formes d'impression planographique au moyen de rayons laser Expired CA1103506A (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE2728947A DE2728947C2 (de)	1977-06-27	1977-06-27	Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen
DEP2728947.0		1977-06-27

Publications (1)

Publication Number	Publication Date
CA1103506A true CA1103506A (fr)	1981-06-23

Family

ID=6012478

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA306,085A Expired CA1103506A (fr)	1977-06-27	1978-06-23	Mode de preparation de formes d'impression planographique au moyen de rayons laser

Country Status (19)

Country	Link
JP (1)	JPS5412906A (fr)
AT (1)	AT373547B (fr)
AU (1)	AU517940B2 (fr)
BE (1)	BE868455A (fr)
BR (1)	BR7804019A (fr)
CA (1)	CA1103506A (fr)
CH (1)	CH634666A5 (fr)
DE (1)	DE2728947C2 (fr)
DK (1)	DK285478A (fr)
ES (1)	ES471136A2 (fr)
FI (1)	FI782029A7 (fr)
FR (1)	FR2396336A2 (fr)
GB (1)	GB1583329A (fr)
IT (1)	IT7849977A0 (fr)
NL (1)	NL7806821A (fr)
NO (1)	NO782197L (fr)
SE (1)	SE7807169L (fr)
SU (1)	SU963453A3 (fr)
ZA (1)	ZA783641B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2822887A1 (de) *	1978-05-26	1979-11-29	Hoechst Ag	Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
EP0164128B1 (fr) *	1984-06-08	1990-12-27	Howard A. Fromson	Procédé pour fabriquer des plaques d'impression lithographiques et plaques lithographiques ainsi fabriquées
GB8703376D0 (en) *	1987-02-13	1987-03-18	Vickers Plc	Printing plate precursors
DE3716848A1 (de) *	1987-05-20	1988-12-01	Hoechst Ag	Verfahren zur bebilderung lichtempfindlichen materials
US5814431A (en)	1996-01-10	1998-09-29	Mitsubishi Chemical Corporation	Photosensitive composition and lithographic printing plate
JP3814961B2 (ja)	1996-08-06	2006-08-30	三菱化学株式会社	ポジ型感光性印刷版
TW202603492A (zh) *	2023-09-29	2026-01-16	德商馬克專利公司	用於邊緣保護層之永續且更環保之解決方案的微影組合物及其使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1125160A (en) *	1965-01-02	1968-08-28	Azoplate Corp	Light-sensitive materials for use in the production of printing plates and printing plates produced therefrom
US3396020A (en) *	1965-11-16	1968-08-06	Azoplate Corp	Planographic printing plate
DE1522503C3 (de) *	1967-01-24	1978-11-09	Hoechst Ag, 6000 Frankfurt	Verfahren zur Herstellung von Druckformen
US3664737A (en) *	1971-03-23	1972-05-23	Ibm	Printing plate recording by direct exposure
JPS5120922B2 (fr) *	1971-10-07	1976-06-29
JPS5015603A (fr) *	1973-06-15	1975-02-19
CA1063415A (fr) *	1974-01-17	1979-10-02	Scott Paper Company	Plaque d'impression planographique comportant une couche de compose diazoique, de carbone et de nitrocellulose
CA1049312A (fr) *	1974-01-17	1979-02-27	John O.H. Peterson	Plaque d'impression presensibilise avec masque formateur d'image au laser en position

1977
- 1977-06-27 DE DE2728947A patent/DE2728947C2/de not_active Expired
1978
- 1978-05-31 GB GB24956/78A patent/GB1583329A/en not_active Expired
- 1978-06-06 AU AU36875/78A patent/AU517940B2/en not_active Expired
- 1978-06-21 JP JP7530578A patent/JPS5412906A/ja active Granted
- 1978-06-22 SE SE7807169A patent/SE7807169L/xx unknown
- 1978-06-22 IT IT7849977A patent/IT7849977A0/it unknown
- 1978-06-23 CH CH687978A patent/CH634666A5/de not_active IP Right Cessation
- 1978-06-23 CA CA306,085A patent/CA1103506A/fr not_active Expired
- 1978-06-23 NL NL7806821A patent/NL7806821A/xx not_active Application Discontinuation
- 1978-06-23 NO NO782197A patent/NO782197L/no unknown
- 1978-06-26 FR FR7818952A patent/FR2396336A2/fr active Granted
- 1978-06-26 BE BE188840A patent/BE868455A/fr not_active IP Right Cessation
- 1978-06-26 BR BR7804019A patent/BR7804019A/pt unknown
- 1978-06-26 AT AT0463578A patent/AT373547B/de not_active IP Right Cessation
- 1978-06-26 SU SU782630253A patent/SU963453A3/ru active
- 1978-06-26 DK DK285478A patent/DK285478A/da unknown
- 1978-06-26 ZA ZA00783641A patent/ZA783641B/xx unknown
- 1978-06-26 FI FI782029A patent/FI782029A7/fi not_active Application Discontinuation
- 1978-06-26 ES ES471136A patent/ES471136A2/es not_active Expired

Also Published As

Publication number	Publication date
ATA463578A (de)	1983-06-15
SU963453A3 (ru)	1982-09-30
ES471136A2 (es)	1979-02-01
NL7806821A (nl)	1978-12-29
GB1583329A (en)	1981-01-28
CH634666A5 (en)	1983-02-15
JPS5412906A (en)	1979-01-31
NO782197L (no)	1978-12-28
JPH0334051B2 (fr)	1991-05-21
ZA783641B (en)	1979-06-27
BR7804019A (pt)	1979-04-03
SE7807169L (sv)	1978-12-28
AU517940B2 (en)	1981-09-03
AU3687578A (en)	1979-12-13
DE2728947A1 (de)	1979-01-18
FR2396336B2 (fr)	1983-08-12
FI782029A7 (fi)	1978-12-28
DK285478A (da)	1978-12-28
AT373547B (de)	1984-01-25
FR2396336A2 (fr)	1979-01-26
DE2728947C2 (de)	1983-10-20
IT7849977A0 (it)	1978-06-22
BE868455A (fr)	1978-12-27

Legal Events

Date	Code	Title	Description
1998-06-23	MKEX	Expiry

Publication	Publication Date	Title
CA1094376A (fr)	1981-01-27	Methode de preparation de plaques d'impression planographique a l'aide de rayons laser
EP0536690B1 (fr)	1998-09-09	Composition photosensible
CA1098752A (fr)	1981-04-07	Revelateur aqueux pour plaques d'impression diazoiques, lithographiques, contenant un derive de benzylalcool ou de glycolether et un sulfite
US4288520A (en)	1981-09-08	Process of manufacturing light-sensitive copying material based on diazonium salt condensation products
US4104072A (en)	1978-08-01	Water developable lithographic printing plate having dual photosensitive layering
US6514656B1 (en)	2003-02-04	Positive type image forming material
DE69423800T2 (de)	2000-08-03	Positiv arbeitende fotoempfindliche Zusammensetzung
EP0033232B1 (fr)	1984-06-06	Développateurs et procédés de développement de plaques sensibles à la radiation les utilisant
US4171974A (en)	1979-10-23	Aqueous alkali developable negative working lithographic printing plates
US4511640A (en)	1985-04-16	Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
US5080999A (en)	1992-01-14	Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
CA1183382A (fr)	1985-03-05	Production de copies en relief par traitement aux ultrasons d'une couche photosensible
EP0243863B1 (fr)	1992-07-01	Plaque d'impression présensibilisée
US6451491B1 (en)	2002-09-17	Aqueous developable negative acting photosensitive composition having improved image contrast
GB1583329A (en)	1981-01-28	Process for preparing printing forms and forms produced thereby
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