CH634666A5 - Method of producing planographic printing forms using laser beams - Google Patents

Method of producing planographic printing forms using laser beams Download PDF

Info

Publication number: CH634666A5
Authority: CH; Switzerland
Prior art keywords: layer; weight; recording layer; irradiated; oxide layer
Prior art date: 1977-06-27

Application number

CH687978A

Other languages

German (de)

English (en)

Inventor

Fritz Dr Uhlig

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-06-27

Filing date

1978-06-23

Publication date

1983-02-15

1978-06-23 Application filed by Hoechst Ag filed Critical Hoechst Ag

1983-02-15 Publication of CH634666A5 publication Critical patent/CH634666A5/de

Links

238000000034 method Methods 0.000 title claims description 11
238000007639 printing Methods 0.000 title claims description 10
229920005989 resin Polymers 0.000 claims description 12
239000011347 resin Substances 0.000 claims description 12
150000008049 diazo compounds Chemical class 0.000 claims description 10
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
229910052782 aluminium Inorganic materials 0.000 claims description 9
239000012954 diazonium Substances 0.000 claims description 6
150000001412 amines Chemical class 0.000 claims description 5
239000007859 condensation product Substances 0.000 claims description 5
239000000463 material Substances 0.000 claims description 5
150000001989 diazonium salts Chemical class 0.000 claims description 4
239000007788 liquid Substances 0.000 claims description 4
238000004519 manufacturing process Methods 0.000 claims description 4
239000000758 substrate Substances 0.000 claims 1
239000000243 solution Substances 0.000 description 12
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
239000002253 acid Substances 0.000 description 5
239000010407 anodic oxide Substances 0.000 description 4
239000000047 product Substances 0.000 description 4
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
229920001807 Urea-formaldehyde Polymers 0.000 description 3
229910000147 aluminium phosphate Inorganic materials 0.000 description 3
229910052786 argon Inorganic materials 0.000 description 3
230000005855 radiation Effects 0.000 description 3
230000035945 sensitivity Effects 0.000 description 3
PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
239000004115 Sodium Silicate Substances 0.000 description 2
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
-1 aromatic diazonium salts Chemical class 0.000 description 2
239000013078 crystal Substances 0.000 description 2
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
239000000975 dye Substances 0.000 description 2
239000000839 emulsion Substances 0.000 description 2
FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
239000004922 lacquer Substances 0.000 description 2
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
239000003973 paint Substances 0.000 description 2
238000006068 polycondensation reaction Methods 0.000 description 2
BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
238000007788 roughening Methods 0.000 description 2
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
229910052911 sodium silicate Inorganic materials 0.000 description 2
ZOMLUNRKXJYKPD-UHFFFAOYSA-O 1,3,3-trimethyl-2-[2-(2-methyl-1h-indol-3-yl)ethenyl]indol-1-ium;hydrochloride Chemical compound Cl.C1=CC=C2C(C)(C)C(/C=C/C=3C4=CC=CC=C4NC=3C)=[N+](C)C2=C1 ZOMLUNRKXJYKPD-UHFFFAOYSA-O 0.000 description 1
LXFQSRIDYRFTJW-UHFFFAOYSA-M 2,4,6-trimethylbenzenesulfonate Chemical compound CC1=CC(C)=C(S([O-])(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-M 0.000 description 1
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
229920000877 Melamine resin Polymers 0.000 description 1
239000004640 Melamine resin Substances 0.000 description 1
AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
206010070834 Sensitisation Diseases 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
239000003929 acidic solution Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
238000002048 anodisation reaction Methods 0.000 description 1
238000007743 anodising Methods 0.000 description 1
239000011260 aqueous acid Substances 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
150000004982 aromatic amines Chemical class 0.000 description 1
150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
238000005452 bending Methods 0.000 description 1
235000019445 benzyl alcohol Nutrition 0.000 description 1
239000004202 carbamide Substances 0.000 description 1
150000001728 carbonyl compounds Chemical class 0.000 description 1
229940112021 centrally acting muscle relaxants carbamic acid ester Drugs 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
238000009833 condensation Methods 0.000 description 1
230000005494 condensation Effects 0.000 description 1
238000010924 continuous production Methods 0.000 description 1
YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
VYXSBFYARXAAKO-UHFFFAOYSA-N ethyl 2-[3-(ethylamino)-6-ethylimino-2,7-dimethylxanthen-9-yl]benzoate;hydron;chloride Chemical compound [Cl-].C1=2C=C(C)C(NCC)=CC=2OC2=CC(=[NH+]CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-UHFFFAOYSA-N 0.000 description 1
BQBKYSPXQYHTIP-UHFFFAOYSA-N ethyl n-butylcarbamate Chemical compound CCCCNC(=O)OCC BQBKYSPXQYHTIP-UHFFFAOYSA-N 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
238000002955 isolation Methods 0.000 description 1
229910052743 krypton Inorganic materials 0.000 description 1
DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
229910052943 magnesium sulfate Inorganic materials 0.000 description 1
235000019341 magnesium sulphate Nutrition 0.000 description 1
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
229960000907 methylthioninium chloride Drugs 0.000 description 1
239000011707 mineral Substances 0.000 description 1
235000010755 mineral Nutrition 0.000 description 1
239000000203 mixture Substances 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
238000007645 offset printing Methods 0.000 description 1
150000007524 organic acids Chemical class 0.000 description 1
150000008379 phenol ethers Chemical class 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
229920000151 polyglycol Polymers 0.000 description 1
239000010695 polyglycol Substances 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
230000008313 sensitization Effects 0.000 description 1
230000001235 sensitizing effect Effects 0.000 description 1
235000019795 sodium metasilicate Nutrition 0.000 description 1
239000001488 sodium phosphate Substances 0.000 description 1
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
229920002803 thermoplastic polyurethane Polymers 0.000 description 1
AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
229910000406 trisodium phosphate Inorganic materials 0.000 description 1
235000019801 trisodium phosphate Nutrition 0.000 description 1
JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
150000003673 urethanes Chemical class 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Printing Plates And Materials Therefor (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Manufacture Or Reproduction Of Printing Formes (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Manufacture, Treatment Of Glass Fibers (AREA)

CH687978A 1977-06-27 1978-06-23 Method of producing planographic printing forms using laser beams CH634666A5 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE2728947A DE2728947C2 (de)	1977-06-27	1977-06-27	Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen

Publications (1)

Publication Number	Publication Date
CH634666A5 true CH634666A5 (en)	1983-02-15

Family

ID=6012478

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CH687978A CH634666A5 (en)	1977-06-27	1978-06-23	Method of producing planographic printing forms using laser beams

Country Status (19)

Country	Link
JP (1)	JPS5412906A (fr)
AT (1)	AT373547B (fr)
AU (1)	AU517940B2 (fr)
BE (1)	BE868455A (fr)
BR (1)	BR7804019A (fr)
CA (1)	CA1103506A (fr)
CH (1)	CH634666A5 (fr)
DE (1)	DE2728947C2 (fr)
DK (1)	DK285478A (fr)
ES (1)	ES471136A2 (fr)
FI (1)	FI782029A7 (fr)
FR (1)	FR2396336A2 (fr)
GB (1)	GB1583329A (fr)
IT (1)	IT7849977A0 (fr)
NL (1)	NL7806821A (fr)
NO (1)	NO782197L (fr)
SE (1)	SE7807169L (fr)
SU (1)	SU963453A3 (fr)
ZA (1)	ZA783641B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2822887A1 (de) *	1978-05-26	1979-11-29	Hoechst Ag	Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
EP0164128B1 (fr) *	1984-06-08	1990-12-27	Howard A. Fromson	Procédé pour fabriquer des plaques d'impression lithographiques et plaques lithographiques ainsi fabriquées
GB8703376D0 (en) *	1987-02-13	1987-03-18	Vickers Plc	Printing plate precursors
DE3716848A1 (de) *	1987-05-20	1988-12-01	Hoechst Ag	Verfahren zur bebilderung lichtempfindlichen materials
US5814431A (en)	1996-01-10	1998-09-29	Mitsubishi Chemical Corporation	Photosensitive composition and lithographic printing plate
JP3814961B2 (ja)	1996-08-06	2006-08-30	三菱化学株式会社	ポジ型感光性印刷版
CN121925597A (zh) *	2023-09-29	2026-04-24	默克专利股份有限公司	用于边缘保护层的可持续且更环保的解决方案的光刻组合物及其使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1125160A (en) *	1965-01-02	1968-08-28	Azoplate Corp	Light-sensitive materials for use in the production of printing plates and printing plates produced therefrom
US3396020A (en) *	1965-11-16	1968-08-06	Azoplate Corp	Planographic printing plate
DE1522503C3 (de) *	1967-01-24	1978-11-09	Hoechst Ag, 6000 Frankfurt	Verfahren zur Herstellung von Druckformen
US3664737A (en) *	1971-03-23	1972-05-23	Ibm	Printing plate recording by direct exposure
JPS5120922B2 (fr) *	1971-10-07	1976-06-29
JPS5015603A (fr) *	1973-06-15	1975-02-19
CA1049312A (fr) *	1974-01-17	1979-02-27	John O.H. Peterson	Plaque d'impression presensibilise avec masque formateur d'image au laser en position
CA1063415A (fr) *	1974-01-17	1979-10-02	Scott Paper Company	Plaque d'impression planographique comportant une couche de compose diazoique, de carbone et de nitrocellulose

1977
- 1977-06-27 DE DE2728947A patent/DE2728947C2/de not_active Expired
1978
- 1978-05-31 GB GB24956/78A patent/GB1583329A/en not_active Expired
- 1978-06-06 AU AU36875/78A patent/AU517940B2/en not_active Expired
- 1978-06-21 JP JP7530578A patent/JPS5412906A/ja active Granted
- 1978-06-22 SE SE7807169A patent/SE7807169L/xx unknown
- 1978-06-22 IT IT7849977A patent/IT7849977A0/it unknown
- 1978-06-23 NO NO782197A patent/NO782197L/no unknown
- 1978-06-23 CH CH687978A patent/CH634666A5/de not_active IP Right Cessation
- 1978-06-23 NL NL7806821A patent/NL7806821A/xx not_active Application Discontinuation
- 1978-06-23 CA CA306,085A patent/CA1103506A/fr not_active Expired
- 1978-06-26 FR FR7818952A patent/FR2396336A2/fr active Granted
- 1978-06-26 BR BR7804019A patent/BR7804019A/pt unknown
- 1978-06-26 SU SU782630253A patent/SU963453A3/ru active
- 1978-06-26 AT AT0463578A patent/AT373547B/de not_active IP Right Cessation
- 1978-06-26 ZA ZA00783641A patent/ZA783641B/xx unknown
- 1978-06-26 ES ES471136A patent/ES471136A2/es not_active Expired
- 1978-06-26 BE BE188840A patent/BE868455A/fr not_active IP Right Cessation
- 1978-06-26 FI FI782029A patent/FI782029A7/fi not_active Application Discontinuation
- 1978-06-26 DK DK285478A patent/DK285478A/da unknown

Also Published As

Publication number	Publication date
FR2396336B2 (fr)	1983-08-12
DE2728947C2 (de)	1983-10-20
SU963453A3 (ru)	1982-09-30
IT7849977A0 (it)	1978-06-22
CA1103506A (fr)	1981-06-23
FI782029A7 (fi)	1978-12-28
AT373547B (de)	1984-01-25
DE2728947A1 (de)	1979-01-18
AU517940B2 (en)	1981-09-03
FR2396336A2 (fr)	1979-01-26
DK285478A (da)	1978-12-28
ES471136A2 (es)	1979-02-01
NO782197L (no)	1978-12-28
GB1583329A (en)	1981-01-28
JPH0334051B2 (fr)	1991-05-21
AU3687578A (en)	1979-12-13
BE868455A (fr)	1978-12-27
ATA463578A (de)	1983-06-15
ZA783641B (en)	1979-06-27
SE7807169L (sv)	1978-12-28
JPS5412906A (en)	1979-01-31
BR7804019A (pt)	1979-04-03
NL7806821A (nl)	1978-12-29

Legal Events

Date	Code	Title	Description
1985-02-28	PL	Patent ceased
2024-10-31	PL	Patent ceased

Publication	Publication Date	Title
DE2607207C2 (de)	1983-07-14	Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen
DE60014207T2 (de)	2005-10-06	Positives planographisches Druckmaterial
EP0048876B1 (fr)	1984-04-11	Mélange durcissable à la lumière et matériau photosensible à copier produit à partir de ce mélange
EP0008038B1 (fr)	1983-05-18	Procédé pour la préparation d'une matière photosensible pour photocopie à base de produits de condensation de sels de diazonium
EP0071881B1 (fr)	1986-02-05	Procédé pour la production des plaques d'impression offset d'un matériel photosensible à base de produits de polycondensation des sels de diazonium
DE69226920T2 (de)	1999-01-28	Lichtempfindliche Zusammensetzung
EP0004569B1 (fr)	1982-11-03	Procédé d'oxydation anodique de l'aluminium et son utilisation comme matériau porteur pour plaques d'impression
DE19803564A1 (de)	1999-08-05	Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
EP0111273A2 (fr)	1984-06-20	Composition photosensible, matériel photosensible pour tirage fabriqué à partir de cette composition et procédé pour fabriquer une plaque d'impression à partir de ce matériel de tirage
DE2821777A1 (de)	1978-11-30	Wasserentwickelbare offsetdruckplatte
DE2843762A1 (de)	1979-04-12	Offsetdruckplatte
DE2707810C2 (de)	1985-07-11	Verfahren zur Herstellung von Offsetdruckplatten
CH634666A5 (en)	1983-02-15	Method of producing planographic printing forms using laser beams
DE4105887B4 (de)	2004-06-09	Vorsensibilisierte Platte zur Verwendung in der Herstellung lithographischer Druckplatten
DE2728858C2 (de)	1986-03-13	Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen
DE60122408T2 (de)	2007-08-16	Wärmeempfindliche lithographische Druckplatte, Träger für die Platte und Verfahren zu deren Herstellung
EP0269851B1 (fr)	1993-06-09	Support en aluminium ou en alliage d'aluminium pour des plaques offset et son procédé de fabrication
EP0474010A1 (fr)	1992-03-11	Composition de développement pour des chouches irradiées radiosensibles à effets positifs et négatifs de même que réversals reprographiques et procédé de développement de telles couches
EP0161461B1 (fr)	1989-12-13	Procédé d'oxydation anodique d'aluminium et son application comme matériau de support pour plaques d'impression offset
EP0141056A1 (fr)	1985-05-15	Procédé d'oxydation anodique en une étape des matériaux supports en aluminium pour plaques d'impression offset
EP0442386B1 (fr)	1996-05-01	Composition radiosensible, matériau d'enregistrement radiosensible produit avec celle-ci et procédé de la production d'enregistrements en relief
DE69224801T2 (de)	1998-07-02	Lichtempfindliche Zusammensetzung
EP0069911B1 (fr)	1986-05-07	Procédé et solution pour la conservation de plaques lithographiques
DE2524701A1 (de)	1976-12-16	Verfahren zur herstellung von flachdruckformen mit laserstrahlen
EP0005778A1 (fr)	1979-12-12	Procédé pour faire des enregistrements en relief