CA1131806A - Appareil de lithographie a rayons x - Google Patents
Appareil de lithographie a rayons xInfo
- Publication number
- CA1131806A CA1131806A CA383,970A CA383970A CA1131806A CA 1131806 A CA1131806 A CA 1131806A CA 383970 A CA383970 A CA 383970A CA 1131806 A CA1131806 A CA 1131806A
- Authority
- CA
- Canada
- Prior art keywords
- tungsten
- target
- ray
- line
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001015 X-ray lithography Methods 0.000 title claims abstract description 10
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 34
- 239000010937 tungsten Substances 0.000 claims abstract description 34
- 230000005855 radiation Effects 0.000 claims abstract description 19
- 229910052790 beryllium Inorganic materials 0.000 claims description 12
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 229910001080 W alloy Inorganic materials 0.000 claims description 2
- 150000003658 tungsten compounds Chemical class 0.000 claims 1
- 238000001459 lithography Methods 0.000 abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 description 21
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 19
- 239000006096 absorbing agent Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 229910052763 palladium Inorganic materials 0.000 description 9
- 238000013461 design Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000011161 development Methods 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000928610 Coula Species 0.000 description 1
- 241001634830 Geometridae Species 0.000 description 1
- IWYRWIUNAVNFPE-UHFFFAOYSA-N Glycidaldehyde Chemical compound O=CC1CO1 IWYRWIUNAVNFPE-UHFFFAOYSA-N 0.000 description 1
- 241001364889 Helius Species 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 241001296096 Probles Species 0.000 description 1
- 206010037742 Rabies Diseases 0.000 description 1
- 229910000691 Re alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000012668 chain scission Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- RYGMFSIKBFXOCR-AKLPVKDBSA-N copper-67 Chemical compound [67Cu] RYGMFSIKBFXOCR-AKLPVKDBSA-N 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 235000019988 mead Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 101150066242 outO gene Proteins 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA383,970A CA1131806A (fr) | 1978-01-16 | 1981-08-14 | Appareil de lithographie a rayons x |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US869,541 | 1978-01-16 | ||
| US05/869,541 US4215192A (en) | 1978-01-16 | 1978-01-16 | X-ray lithography apparatus and method of use |
| CA383,970A CA1131806A (fr) | 1978-01-16 | 1981-08-14 | Appareil de lithographie a rayons x |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1131806A true CA1131806A (fr) | 1982-09-14 |
Family
ID=25669403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA383,970A Expired CA1131806A (fr) | 1978-01-16 | 1981-08-14 | Appareil de lithographie a rayons x |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1131806A (fr) |
-
1981
- 1981-08-14 CA CA383,970A patent/CA1131806A/fr not_active Expired
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4837794A (en) | Filter apparatus for use with an x-ray source | |
| CA1118914A (fr) | Appareil lithographique a rayon x et methode d'utilisation | |
| US4184078A (en) | Pulsed X-ray lithography | |
| CA1310734C (fr) | Microlithographie a ions hydrogene | |
| US5989776A (en) | Photoresist composition for extreme ultraviolet lithography | |
| US4266138A (en) | Diamond targets for producing high intensity soft x-rays and a method of exposing x-ray resists | |
| Herrlin et al. | Generation of x rays for medical imaging by high-power lasers: preliminary results. | |
| JP2003229298A (ja) | Ｘ線発生装置及び露光装置 | |
| US5344501A (en) | Solar cell | |
| US4477921A (en) | X-Ray lithography source tube | |
| CA1131806A (fr) | Appareil de lithographie a rayons x | |
| Turcu et al. | X-ray lithography using a KrF laser-plasma source at hν≈ 1 keV | |
| US4453262A (en) | X-Ray lithography apparatus and method of use | |
| US4342917A (en) | X-ray lithography apparatus and method of use | |
| Kitayama et al. | Proposal for a 50 nm proximity x-ray lithography system and extension to 35 nm by resist material selection | |
| Bhattacharya et al. | A controlled radiation source and electron/X-ray flux ratios in an electron beam metal evaporator | |
| CA1136775A (fr) | Methode de fabrication de resist cop utilise en lithographie a rayons x | |
| Bijkerk et al. | Laser plasma as x-ray source for lithographic imaging of submicron structures onto experimental x-ray resist | |
| Heuberger et al. | Present status and problems of x-ray lithography | |
| EP0093970A1 (fr) | Générateur de rayons X mous | |
| O'Neill et al. | Plasma x-ray sources for lithography generated by a 0.5 J KrF laser | |
| Tomie et al. | X-ray lithography using a KrF laser-produced plasma | |
| CA1224839A (fr) | Lithographie a rayons x | |
| DellaGuardia et al. | X-ray transmission through low atomic number particles | |
| US4665541A (en) | X-ray lithography |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry | ||
| MKEX | Expiry |
Effective date: 19990914 |