CA1136775A - Methode de fabrication de resist cop utilise en lithographie a rayons x - Google Patents

Methode de fabrication de resist cop utilise en lithographie a rayons x

Info

Publication number
CA1136775A
CA1136775A CA000383971A CA383971A CA1136775A CA 1136775 A CA1136775 A CA 1136775A CA 000383971 A CA000383971 A CA 000383971A CA 383971 A CA383971 A CA 383971A CA 1136775 A CA1136775 A CA 1136775A
Authority
CA
Canada
Prior art keywords
resist
developing
tungsten
ray
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000383971A
Other languages
English (en)
Inventor
William D. Buckley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/869,541 external-priority patent/US4215192A/en
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Priority to CA000383971A priority Critical patent/CA1136775A/fr
Application granted granted Critical
Publication of CA1136775A publication Critical patent/CA1136775A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA000383971A 1978-01-16 1981-08-14 Methode de fabrication de resist cop utilise en lithographie a rayons x Expired CA1136775A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000383971A CA1136775A (fr) 1978-01-16 1981-08-14 Methode de fabrication de resist cop utilise en lithographie a rayons x

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US05/869,541 US4215192A (en) 1978-01-16 1978-01-16 X-ray lithography apparatus and method of use
CA000383971A CA1136775A (fr) 1978-01-16 1981-08-14 Methode de fabrication de resist cop utilise en lithographie a rayons x
US869,541 1986-06-02

Publications (1)

Publication Number Publication Date
CA1136775A true CA1136775A (fr) 1982-11-30

Family

ID=25669404

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000383971A Expired CA1136775A (fr) 1978-01-16 1981-08-14 Methode de fabrication de resist cop utilise en lithographie a rayons x

Country Status (1)

Country Link
CA (1) CA1136775A (fr)

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 19991130