CA1149086A - Balayage de trame avec spot de dimensions variables dans un systeme a exposition a un faisceau electronique - Google Patents

Balayage de trame avec spot de dimensions variables dans un systeme a exposition a un faisceau electronique

Info

Publication number
CA1149086A
CA1149086A CA000270570A CA270570A CA1149086A CA 1149086 A CA1149086 A CA 1149086A CA 000270570 A CA000270570 A CA 000270570A CA 270570 A CA270570 A CA 270570A CA 1149086 A CA1149086 A CA 1149086A
Authority
CA
Canada
Prior art keywords
aperture
image
mask plate
spot
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000270570A
Other languages
English (en)
Inventor
Michael G.R. Thomson
Robert J. Collier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1149086A publication Critical patent/CA1149086A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
CA000270570A 1976-02-05 1977-01-27 Balayage de trame avec spot de dimensions variables dans un systeme a exposition a un faisceau electronique Expired CA1149086A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65542776A 1976-02-05 1976-02-05
US655,427 1976-02-05

Publications (1)

Publication Number Publication Date
CA1149086A true CA1149086A (fr) 1983-06-28

Family

ID=24628844

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000270570A Expired CA1149086A (fr) 1976-02-05 1977-01-27 Balayage de trame avec spot de dimensions variables dans un systeme a exposition a un faisceau electronique

Country Status (5)

Country Link
JP (1) JPS52103967A (fr)
CA (1) CA1149086A (fr)
DE (1) DE2704441A1 (fr)
FR (1) FR2340616A1 (fr)
GB (1) GB1557924A (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1166766A (fr) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Methode et dispositif pour obtenir un faisceau electronique de grosseur variable
CA1100237A (fr) * 1977-03-23 1981-04-28 Roger F.W. Pease Traduction non-disponible
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS5744684Y2 (fr) * 1981-01-22 1982-10-02
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (ja) * 1981-08-18 1983-02-21 松下電器産業株式会社 脱水機
DE3134348A1 (de) * 1981-08-31 1983-03-10 Hoechst Ag, 6000 Frankfurt Verfahren zur reinigung und rueckgewinnung der bei der carbonylierung von methylacetat und/oder dimethylether anfallenden, verunreinigten katalysatorloesung

Also Published As

Publication number Publication date
JPS5426875B2 (fr) 1979-09-06
JPS52103967A (en) 1977-08-31
GB1557924A (en) 1979-12-19
DE2704441A1 (de) 1977-08-11
FR2340616A1 (fr) 1977-09-02

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Legal Events

Date Code Title Description
MKEX Expiry