CA1161685A - Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere - Google Patents

Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere

Info

Publication number: CA1161685A
Authority: CA; Canada
Prior art keywords: polymer backbone; donor molecule; molecule bonded; donor; polymer
Prior art date: 1979-10-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000358898A

Other languages

English (en)

Inventor

Ari Aviram

Donald C. Hofer

Frank B. Kaufman

Steven R. Kramer

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Business Machines Corp

Original Assignee

International Business Machines Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1979-10-10

Filing date

1980-08-25

Publication date

1984-02-07

1980-08-25 Application filed by International Business Machines Corp filed Critical International Business Machines Corp

1984-02-07 Application granted granted Critical

1984-02-07 Publication of CA1161685A publication Critical patent/CA1161685A/fr

Status Expired legal-status Critical Current

Links

150000008282 halocarbons Chemical class 0.000 title claims abstract description 20
238000000034 method Methods 0.000 claims abstract description 70
DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 claims abstract description 13
239000004793 Polystyrene Substances 0.000 claims abstract description 12
229920002223 polystyrene Polymers 0.000 claims abstract description 12
125000000217 alkyl group Chemical group 0.000 claims abstract description 11
229920002755 poly(epichlorohydrin) Polymers 0.000 claims abstract description 11
229920002643 polyglutamic acid Polymers 0.000 claims abstract description 4
108010020346 Polyglutamic Acid Proteins 0.000 claims abstract description 3
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract 10
229920000915 polyvinyl chloride Polymers 0.000 claims abstract 10
239000004800 polyvinyl chloride Substances 0.000 claims abstract 10
150000001412 amines Chemical class 0.000 claims abstract 9
125000003118 aryl group Chemical group 0.000 claims abstract 9
229920000642 polymer Polymers 0.000 claims description 91
FHCPAXDKURNIOZ-UHFFFAOYSA-N tetrathiafulvalene Chemical compound S1C=CSC1=C1SC=CS1 FHCPAXDKURNIOZ-UHFFFAOYSA-N 0.000 claims description 20
239000002904 solvent Substances 0.000 claims description 19
230000005855 radiation Effects 0.000 claims description 15
229920002120 photoresistant polymer Polymers 0.000 claims description 12
KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 10
WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 8
BZORFPDSXLZWJF-UHFFFAOYSA-N N,N-dimethyl-1,4-phenylenediamine Chemical compound CN(C)C1=CC=C(N)C=C1 BZORFPDSXLZWJF-UHFFFAOYSA-N 0.000 claims description 8
229950000688 phenothiazine Drugs 0.000 claims description 8
239000000758 substrate Substances 0.000 claims description 6
238000004519 manufacturing process Methods 0.000 claims description 3
150000003219 pyrazolines Chemical class 0.000 claims description 2
WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims 8
235000013922 glutamic acid Nutrition 0.000 claims 8
239000004220 glutamic acid Substances 0.000 claims 8
125000000291 glutamic acid group Chemical group N[C@@H](CCC(O)=O)C(=O)* 0.000 claims 8
239000011248 coating agent Substances 0.000 claims 1
238000000576 coating method Methods 0.000 claims 1
150000002990 phenothiazines Chemical class 0.000 abstract 1
239000000463 material Substances 0.000 description 19
239000010408 film Substances 0.000 description 18
-1 poly(acrylic chLoride) Polymers 0.000 description 18
239000000243 solution Substances 0.000 description 16
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 13
239000000203 mixture Substances 0.000 description 13
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
150000003839 salts Chemical class 0.000 description 8
HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 8
238000006243 chemical reaction Methods 0.000 description 7
230000008569 process Effects 0.000 description 7
230000008961 swelling Effects 0.000 description 7
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 6
MCGBIXXDQFWVDW-UHFFFAOYSA-N 4,5-dihydro-1h-pyrazole Chemical compound C1CC=NN1 MCGBIXXDQFWVDW-UHFFFAOYSA-N 0.000 description 5
239000000370 acceptor Substances 0.000 description 5
230000015572 biosynthetic process Effects 0.000 description 5
229920001746 electroactive polymer Polymers 0.000 description 5
125000000524 functional group Chemical group 0.000 description 5
230000007935 neutral effect Effects 0.000 description 5
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
229920001577 copolymer Polymers 0.000 description 4
230000007246 mechanism Effects 0.000 description 4
229920006254 polymer film Polymers 0.000 description 4
238000001556 precipitation Methods 0.000 description 4
230000035945 sensitivity Effects 0.000 description 4
239000007787 solid Substances 0.000 description 4
238000003756 stirring Methods 0.000 description 4
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
239000003638 chemical reducing agent Substances 0.000 description 3
229910052736 halogen Inorganic materials 0.000 description 3
239000012454 non-polar solvent Substances 0.000 description 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
239000004926 polymethyl methacrylate Substances 0.000 description 3
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical class [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
239000000306 component Substances 0.000 description 2
230000008878 coupling Effects 0.000 description 2
238000010168 coupling process Methods 0.000 description 2
238000005859 coupling reaction Methods 0.000 description 2
HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
230000018109 developmental process Effects 0.000 description 2
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
125000005843 halogen group Chemical group 0.000 description 2
150000002367 halogens Chemical class 0.000 description 2
239000011159 matrix material Substances 0.000 description 2
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
239000003960 organic solvent Substances 0.000 description 2
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
230000035515 penetration Effects 0.000 description 2
239000002952 polymeric resin Substances 0.000 description 2
239000002244 precipitate Substances 0.000 description 2
238000004626 scanning electron microscopy Methods 0.000 description 2
238000000926 separation method Methods 0.000 description 2
125000001424 substituent group Chemical group 0.000 description 2
238000003786 synthesis reaction Methods 0.000 description 2
229920003002 synthetic resin Polymers 0.000 description 2
UMAPFAAAQBMYNJ-UHFFFAOYSA-N 1-n,2-n-dimethylbenzene-1,2-diamine Chemical compound CNC1=CC=CC=C1NC UMAPFAAAQBMYNJ-UHFFFAOYSA-N 0.000 description 1
OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 1
UWEMSSWRJJCTJK-UHFFFAOYSA-N 2-(1,3-dithiol-2-ylidene)-1,3-dithiole-4-carboxylic acid Chemical compound S1C(C(=O)O)=CSC1=C1SC=CS1 UWEMSSWRJJCTJK-UHFFFAOYSA-N 0.000 description 1
SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical group CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
229920003060 Poly(vinyl benzyl chloride) Polymers 0.000 description 1
239000004642 Polyimide Substances 0.000 description 1
230000009102 absorption Effects 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
239000002253 acid Substances 0.000 description 1
230000009471 action Effects 0.000 description 1
SOGAXMICEFXMKE-UHFFFAOYSA-N alpha-Methyl-n-butyl acrylate Natural products CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 1
125000000129 anionic group Chemical group 0.000 description 1
230000003466 anti-cipated effect Effects 0.000 description 1
229940073608 benzyl chloride Drugs 0.000 description 1
238000006664 bond formation reaction Methods 0.000 description 1
229910000025 caesium bicarbonate Inorganic materials 0.000 description 1
229940075397 calomel Drugs 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
238000012668 chain scission Methods 0.000 description 1
230000008859 change Effects 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
229920006037 cross link polymer Polymers 0.000 description 1
238000004132 cross linking Methods 0.000 description 1
125000004122 cyclic group Chemical group 0.000 description 1
GPRSOIDYHMXAGW-UHFFFAOYSA-N cyclopenta-1,3-diene cyclopentanecarboxylic acid iron Chemical compound [CH-]1[CH-][CH-][C-]([CH-]1)C(=O)O.[CH-]1C=CC=C1.[Fe] GPRSOIDYHMXAGW-UHFFFAOYSA-N 0.000 description 1
BAJHDUZEIKRKAS-UHFFFAOYSA-N cyclopenta-1,3-diene;cyclopenta-1,3-diene-1-carboxylic acid;iron(2+) Chemical compound [Fe+2].C=1C=C[CH-]C=1.OC(=O)C1=CC=C[CH-]1 BAJHDUZEIKRKAS-UHFFFAOYSA-N 0.000 description 1
BXVLTNLCEUMARW-UHFFFAOYSA-N cyclopenta-1,3-diene;cyclopenta-2,4-diene-1-carboxylic acid;iron(2+) Chemical compound [Fe+2].C1C=CC=[C-]1.OC(=O)C1C=CC=[C-]1 BXVLTNLCEUMARW-UHFFFAOYSA-N 0.000 description 1
230000007423 decrease Effects 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
239000002019 doping agent Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
239000000706 filtrate Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
XEOSBIMHSUFHQH-UHFFFAOYSA-N fulvalene Chemical compound C1=CC=CC1=C1C=CC=C1 XEOSBIMHSUFHQH-UHFFFAOYSA-N 0.000 description 1
239000010931 gold Substances 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
125000004464 hydroxyphenyl group Chemical group 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
239000012046 mixed solvent Substances 0.000 description 1
238000002156 mixing Methods 0.000 description 1
125000000896 monocarboxylic acid group Chemical group 0.000 description 1
239000000178 monomer Substances 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
229920001721 polyimide Polymers 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
239000002243 precursor Substances 0.000 description 1
125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
239000000047 product Substances 0.000 description 1
150000005839 radical cations Chemical class 0.000 description 1
150000003254 radicals Chemical class 0.000 description 1
238000010992 reflux Methods 0.000 description 1
230000007261 regionalization Effects 0.000 description 1
238000001226 reprecipitation Methods 0.000 description 1
239000011347 resin Substances 0.000 description 1
229920005989 resin Polymers 0.000 description 1
229910052711 selenium Inorganic materials 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
239000000126 substance Substances 0.000 description 1
229910052717 sulfur Inorganic materials 0.000 description 1
229910052714 tellurium Inorganic materials 0.000 description 1
238000007669 thermal treatment Methods 0.000 description 1
239000010409 thin film Substances 0.000 description 1
229930192474 thiophene Natural products 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
238000005406 washing Methods 0.000 description 1

Landscapes

Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

CA000358898A 1979-10-10 1980-08-25 Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere Expired CA1161685A (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US8349179A	1979-10-10	1979-10-10
US083,491		1987-08-10

Publications (1)

Publication Number	Publication Date
CA1161685A true CA1161685A (fr)	1984-02-07

Family

ID=22178690

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000358898A Expired CA1161685A (fr)	1979-10-10	1980-08-25	Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere

Country Status (3)

Country	Link
JP (1)	JPS5662247A (fr)
AU (1)	AU539640B2 (fr)
CA (1)	CA1161685A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5047445A (en) *	1988-06-20	1991-09-10	Victor Company Of Japan, Ltd.	Electroconductive polymeric material

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS61125019A (ja) *	1984-11-16	1986-06-12	インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション	集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体
JP5819810B2 (ja) *	2012-12-18	2015-11-24	信越化学工業株式会社	ネガ型レジスト材料及びこれを用いたパターン形成方法

1980
- 1980-08-25 CA CA000358898A patent/CA1161685A/fr not_active Expired
- 1980-10-06 AU AU62983/80A patent/AU539640B2/en not_active Ceased
- 1980-10-09 JP JP14068980A patent/JPS5662247A/ja active Granted

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5047445A (en) *	1988-06-20	1991-09-10	Victor Company Of Japan, Ltd.	Electroconductive polymeric material

Also Published As

Publication number	Publication date
JPS5662247A (en)	1981-05-28
AU539640B2 (en)	1984-10-11
JPS6245970B2 (fr)	1987-09-30
AU6298380A (en)	1981-04-16

Legal Events

Date	Code	Title	Description
2001-02-07	MKEX	Expiry

Publication	Publication Date	Title
EP0297443B1 (fr)	1994-06-08	Mélange photosensible pour matériaux de revêtement photosensibles
US7399570B2 (en)	2008-07-15	Water-soluble negative photoresist polymer and composition containing the same
US4091194A (en)	1978-05-23	Dry photopolymer imaging process
US4054635A (en)	1977-10-18	Copolymer of glycidyl methacrylate and allyl glycidyl ether
US3905820A (en)	1975-09-16	Light sensitive copolymers, a process for their manufacture and copying compositions containing them
US4548893A (en)	1985-10-22	High resolution lithographic resist and method
CA1161685A (fr)	1984-02-07	Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere
US4517276A (en)	1985-05-14	Metal-containing organic photoresists
EP0027180B1 (fr)	1984-02-01	Matériaux résistifs négatifs, sensibles à la lumière, aux radiations électroniques et aux rayons X,à base de complexes de transfert consistant en polymères donneurs dopés par un accepteur en halogénohydrocarbure et procédé pour la production d'images résistives négatives
CA1163671A (fr)	1984-03-13	Couche protectrice resistant a un faisceau d'electrons, faite de complexes de transfert donneur - accepteur a base de compose carbone halogene, additionne de polymere
DE2058345A1 (de)	1971-07-01	Lichtempfindliches polymeres azidgruppenhaltiges Material
CA1175990A (fr)	1984-10-09	Couches protectrices a base de complexes de transfert constitues d'un accepteur forme de composes halocarbones et de polymeres, ainsi que d'un donneur
US5998089A (en)	1999-12-07	Photosensitive resin composition comprising fullerene
US4210449A (en)	1980-07-01	Radiation sensitive composition comprising copolymer of glycidyl methacrylate and allyl glycidyl ether and diazonium salt of complex halogenide
JPH0635195A (ja)	1994-02-10	レジスト組成物
JP2662141B2 (ja)	1997-10-08	デバイスの製造方法
US3856523A (en)	1974-12-24	Process for preparing lithographic plates
US3779989A (en)	1973-12-18	Light-sensitive polymers containing a phenyl-diarylcyclopropene moiety,their preparation and use
US3770846A (en)	1973-11-06	Novel compositions
US4456678A (en)	1984-06-26	High resolution lithographic resist of negative working cationic vinyl polymer
US3849144A (en)	1974-11-19	Light-sensitive compositions comprising polymers containing diarylcyclopropene moiety and process of using
US3341472A (en)	1967-09-12	Photoconductors and method of making the same
US3911164A (en)	1975-10-07	Novel compounds and process
US4054452A (en)	1977-10-18	Method of imaging a layer containing copolymer of glycidyl methacrylate and allyl glycidyl ether
US3474071A (en)	1969-10-21	Photosensitive polycarbonamides

CA1161685A - Classe de matieres de protection pour rayons x, a base de complexes de transfert donneurs, accepteurs d'halogenure de carbone et additionnes de polymere - Google Patents

Info

Links

Landscapes

Applications Claiming Priority (2)

Publications (1)

Family

ID=22178690

Family Applications (1)

Country Status (3)

Cited By (1)

Families Citing this family (2)

Cited By (1)

Also Published As

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