CA2000571A1 - Detecteur d'electrons pour usage en milieu gazeux - Google Patents

Detecteur d'electrons pour usage en milieu gazeux

Info

Publication number
CA2000571A1
CA2000571A1 CA2000571A CA2000571A CA2000571A1 CA 2000571 A1 CA2000571 A1 CA 2000571A1 CA 2000571 A CA2000571 A CA 2000571A CA 2000571 A CA2000571 A CA 2000571A CA 2000571 A1 CA2000571 A1 CA 2000571A1
Authority
CA
Canada
Prior art keywords
electron detector
signals
electron
detector
collects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2000571A
Other languages
English (en)
Other versions
CA2000571C (fr
Inventor
Gerasimos D. Danilatos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ElectroScan Corp
Original Assignee
ElectroScan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ElectroScan Corp filed Critical ElectroScan Corp
Publication of CA2000571A1 publication Critical patent/CA2000571A1/fr
Application granted granted Critical
Publication of CA2000571C publication Critical patent/CA2000571C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Geophysics And Detection Of Objects (AREA)
  • Measurement Of Radiation (AREA)
CA002000571A 1988-10-14 1989-10-12 Detecteur d'electrons pour usage en milieu gazeux Expired - Fee Related CA2000571C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US257,754 1988-10-14
US07/257,754 US4897545A (en) 1987-05-21 1988-10-14 Electron detector for use in a gaseous environment

Publications (2)

Publication Number Publication Date
CA2000571A1 true CA2000571A1 (fr) 1990-04-14
CA2000571C CA2000571C (fr) 1994-05-31

Family

ID=22977611

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002000571A Expired - Fee Related CA2000571C (fr) 1988-10-14 1989-10-12 Detecteur d'electrons pour usage en milieu gazeux

Country Status (13)

Country Link
US (1) US4897545A (fr)
EP (1) EP0444085B1 (fr)
JP (1) JPH0650615B2 (fr)
KR (1) KR940009764B1 (fr)
CN (1) CN1018308B (fr)
AT (1) ATE178162T1 (fr)
AU (1) AU4528489A (fr)
CA (1) CA2000571C (fr)
DE (1) DE68928958T2 (fr)
IL (1) IL91971A (fr)
MX (1) MX163919B (fr)
WO (1) WO1990004261A1 (fr)
ZA (1) ZA897751B (fr)

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US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
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JPH07262959A (ja) * 1994-03-24 1995-10-13 Nikon Corp 走査型電子顕微鏡
US5644132A (en) * 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
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US5677531A (en) * 1995-08-08 1997-10-14 Nikon Corporation Scanning electron microscope
US5900667A (en) * 1996-10-04 1999-05-04 Etec Systems, Inc. Operating a solid state particle detector within a magnetic deflection field so as to minimize eddy currents
AU737394B2 (en) * 1997-11-24 2001-08-16 Gerasimos Daniel Danilatos Radiofrequency gaseous detection device (RF-GDD)
US5945672A (en) * 1998-01-29 1999-08-31 Fei Company Gaseous backscattered electron detector for an environmental scanning electron microscope
EP1068630B1 (fr) * 1998-03-10 2005-07-20 Erik Essers Microscope electronique a balayage
DE19845329C2 (de) * 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
US6501077B1 (en) * 1998-09-25 2002-12-31 Hitachi, Ltd. Scanning electron microscope
JP4093662B2 (ja) * 1999-01-04 2008-06-04 株式会社日立製作所 走査形電子顕微鏡
EP1116932A3 (fr) * 2000-01-14 2003-04-16 Leica Microsystems Wetzlar GmbH Appareil de mesure et méthode pour mesurer des structures sur un substrat
US6392231B1 (en) * 2000-02-25 2002-05-21 Hermes-Microvision, Inc. Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
GB0005717D0 (en) * 2000-03-09 2000-05-03 Univ Cambridge Tech Scanning electron microscope
US7462839B2 (en) * 2000-07-07 2008-12-09 Carl Zeiss Nts Gmbh Detector for variable pressure areas and an electron microscope comprising a corresponding detector
AUPQ932200A0 (en) * 2000-08-11 2000-08-31 Danilatos, Gerasimos Daniel Environmental scanning electron microscope
DE10256718B4 (de) * 2002-12-04 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Probenuntersuchung mittels eines atmosphärischen oder druckvariablen Rasterelektronenmikroskops
DE10331137B4 (de) * 2003-07-09 2008-04-30 Carl Zeiss Nts Gmbh Detektorsystem für ein Rasterelektronenmikroskop und Rasterelektronenmikroskop mit einem entsprechenden Detektorsystem
JP4292068B2 (ja) * 2003-12-11 2009-07-08 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP4636897B2 (ja) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ 走査電子顕微鏡
JP4732917B2 (ja) * 2006-02-15 2011-07-27 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡及び欠陥検出装置
JP4597077B2 (ja) * 2006-03-14 2010-12-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
EP2002459B1 (fr) * 2006-03-31 2014-11-26 Fei Company Modèle amélioré de détecteur pour instrument à faisceau de particules chargées
US20080017811A1 (en) * 2006-07-18 2008-01-24 Collart Erik J H Beam stop for an ion implanter
DE102006043895B9 (de) 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
JP5054990B2 (ja) * 2007-01-30 2012-10-24 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
EP1953791A1 (fr) * 2007-02-05 2008-08-06 FEI Company Appareil pour observer un échantillon avec un faicesau de particules et avec un microscope optique
US8921811B2 (en) * 2007-02-06 2014-12-30 Fei Company High pressure charged particle beam system
JP5276860B2 (ja) * 2008-03-13 2013-08-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
EP2105944A1 (fr) 2008-03-28 2009-09-30 FEI Company "Cellule environnementale" pour appareil optique à particules chargées
JP4597207B2 (ja) * 2008-03-31 2010-12-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US7791020B2 (en) * 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
US8222600B2 (en) * 2009-05-24 2012-07-17 El-Mul Technologies Ltd. Charged particle detection system and method
US8791426B2 (en) 2009-11-24 2014-07-29 Lawrence Livermore National Security, Llc. Electron beam diagnostic system using computed tomography and an annular sensor
US8629395B2 (en) * 2010-01-20 2014-01-14 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP5542537B2 (ja) * 2010-06-16 2014-07-09 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
JP5622779B2 (ja) * 2012-03-26 2014-11-12 株式会社東芝 試料分析装置および試料分析方法
US9383460B2 (en) 2012-05-14 2016-07-05 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor
US9535100B2 (en) 2012-05-14 2017-01-03 Bwxt Nuclear Operations Group, Inc. Beam imaging sensor and method for using same
EP2682978B1 (fr) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Électrode de réduction de contamination pour détecteur de particules
PL224742B1 (pl) * 2012-06-06 2017-01-31 Politechnika Wroclawska Zespolony detektor kierunkowy elektronów
EP2706554B1 (fr) * 2012-09-10 2016-05-25 Fei Company Procédé d'utilisation de lentille combinée à particules chargées
JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9190241B2 (en) 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
CN105593966B (zh) * 2013-10-08 2017-05-24 株式会社日立高新技术 带电粒子束装置、带电粒子束装置的控制方法
DE102014226985B4 (de) * 2014-12-23 2024-02-08 Carl Zeiss Microscopy Gmbh Verfahren zum Analysieren eines Objekts, Computerprogrammprodukt sowie Teilchenstrahlgerät zur Durchführung des Verfahrens
US9842724B2 (en) * 2015-02-03 2017-12-12 Kla-Tencor Corporation Method and system for imaging of a photomask through a pellicle
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
AU2016309960B2 (en) * 2015-08-18 2020-11-05 Danilatos, Gerasimos Daniel DR Wide field atmospheric scanning electron microscope
US10068744B2 (en) 2015-12-01 2018-09-04 Carl Zeiss Microscopy Gmbh Charged particle optical apparatus for through-the lens detection of particles
CN111247618B (zh) 2017-09-26 2023-02-17 Asml荷兰有限公司 通过反向散射粒子对掩埋特征的检测
KR20200044100A (ko) * 2017-09-29 2020-04-28 에이에스엠엘 네델란즈 비.브이. 하전 입자에 대한 다중 셀 검출기
CN107976458A (zh) * 2017-10-10 2018-05-01 中国科学院自动化研究所 低能量背散射电子探测器
US10777382B2 (en) 2017-11-21 2020-09-15 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
CN109030518B (zh) * 2018-06-04 2020-04-28 西安交通大学 一种适用于电子致解吸产额测试装置的可替代电子源
CN210155405U (zh) * 2019-03-18 2020-03-17 苏州溢博伦光电仪器有限公司 一种包含光电检测器的显微物镜
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
EP4117016A1 (fr) * 2021-07-05 2023-01-11 ASML Netherlands B.V. Détecteur de particules chargées
US12411099B2 (en) * 2022-09-30 2025-09-09 Fei Company Systems and methods for detecting beam displacement
EP4627613A1 (fr) * 2022-12-02 2025-10-08 ASML Netherlands B.V. Systèmes et procédés de discrimination d'énergie de particules chargées rétrodiffusées
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Also Published As

Publication number Publication date
US4897545A (en) 1990-01-30
IL91971A0 (en) 1990-07-12
EP0444085A4 (en) 1992-06-10
ZA897751B (en) 1991-06-26
MX163919B (es) 1992-06-30
IL91971A (en) 1994-06-24
CA2000571C (fr) 1994-05-31
WO1990004261A1 (fr) 1990-04-19
KR900702558A (ko) 1990-12-07
ATE178162T1 (de) 1999-04-15
EP0444085A1 (fr) 1991-09-04
CN1018308B (zh) 1992-09-16
DE68928958D1 (de) 1999-04-29
AU4528489A (en) 1990-05-01
KR940009764B1 (ko) 1994-10-17
JPH0650615B2 (ja) 1994-06-29
DE68928958T2 (de) 1999-09-23
JPH04504325A (ja) 1992-07-30
CN1042029A (zh) 1990-05-09
EP0444085B1 (fr) 1999-03-24

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