CA2010414A1 - Appareil d'impression directe par faisceau electronique - Google Patents

Appareil d'impression directe par faisceau electronique

Info

Publication number
CA2010414A1
CA2010414A1 CA2010414A CA2010414A CA2010414A1 CA 2010414 A1 CA2010414 A1 CA 2010414A1 CA 2010414 A CA2010414 A CA 2010414A CA 2010414 A CA2010414 A CA 2010414A CA 2010414 A1 CA2010414 A1 CA 2010414A1
Authority
CA
Canada
Prior art keywords
electron beam
deflection scanning
dot
printing pattern
scanning data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2010414A
Other languages
English (en)
Other versions
CA2010414C (fr
Inventor
Hiroaki Tobuse
Hidenobu Murakami
Masashi Kamio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of CA2010414A1 publication Critical patent/CA2010414A1/fr
Application granted granted Critical
Publication of CA2010414C publication Critical patent/CA2010414C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S347/00—Incremental printing of symbolic information
    • Y10S347/90—Data processing for electrostatic recording

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Facsimile Scanning Arrangements (AREA)
CA002010414A 1989-04-20 1990-02-20 Appareil d'impression directe par faisceau electronique Expired - Fee Related CA2010414C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1102212A JPH02280315A (ja) 1989-04-20 1989-04-20 電子ビーム直接描画装置
JP1-102212 1989-04-20

Publications (2)

Publication Number Publication Date
CA2010414A1 true CA2010414A1 (fr) 1990-10-20
CA2010414C CA2010414C (fr) 1993-07-20

Family

ID=14321354

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002010414A Expired - Fee Related CA2010414C (fr) 1989-04-20 1990-02-20 Appareil d'impression directe par faisceau electronique

Country Status (4)

Country Link
US (1) US5005138A (fr)
JP (1) JPH02280315A (fr)
CA (1) CA2010414C (fr)
DE (1) DE4007021A1 (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940009838B1 (ko) * 1990-03-14 1994-10-17 후지쓰 가부시끼가이샤 고데이타 전송효율을 갖는 전자 빔 노광시스템
US5751594A (en) * 1993-03-16 1998-05-12 Emc Corporation Aperture control system for printed circuit board fabrication
US5781447A (en) * 1993-08-13 1998-07-14 Micron Eletronics, Inc. System for recreating a printed circuit board from disjointly formatted data
US5909658A (en) * 1996-06-18 1999-06-01 International Business Machines Corporation High speed electron beam lithography pattern processing system
JP3940310B2 (ja) * 2002-04-04 2007-07-04 株式会社日立ハイテクノロジーズ 電子ビーム描画方法及び描画装置、並びにこれを用いた半導体製造方法
EP1842103A2 (fr) * 2005-01-14 2007-10-10 Arradiance, Inc. Systeme lithographique par balayage ligne par ligne synchrone
JP5063320B2 (ja) * 2007-12-11 2012-10-31 株式会社ニューフレアテクノロジー 描画装置及び描画データの変換方法
JP2010028206A (ja) * 2008-07-15 2010-02-04 Canon Inc 画像形成システム、画像形成装置、画像処理装置および画像形成方法
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US7901850B2 (en) 2008-09-01 2011-03-08 D2S, Inc. Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US8039176B2 (en) 2009-08-26 2011-10-18 D2S, Inc. Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
US8057970B2 (en) 2008-09-01 2011-11-15 D2S, Inc. Method and system for forming circular patterns on a surface
US7985514B2 (en) * 2009-10-21 2011-07-26 D2S, Inc. Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
US8473875B2 (en) 2010-10-13 2013-06-25 D2S, Inc. Method and system for forming high accuracy patterns using charged particle beam lithography
US9323140B2 (en) 2008-09-01 2016-04-26 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US20120219886A1 (en) 2011-02-28 2012-08-30 D2S, Inc. Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
US9164372B2 (en) 2009-08-26 2015-10-20 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography
US9448473B2 (en) 2009-08-26 2016-09-20 D2S, Inc. Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
US20120278770A1 (en) 2011-04-26 2012-11-01 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography
US9057956B2 (en) 2011-02-28 2015-06-16 D2S, Inc. Method and system for design of enhanced edge slope patterns for charged particle beam lithography
US9612530B2 (en) 2011-02-28 2017-04-04 D2S, Inc. Method and system for design of enhanced edge slope patterns for charged particle beam lithography
US9034542B2 (en) 2011-06-25 2015-05-19 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
KR102154105B1 (ko) 2012-04-18 2020-09-09 디2에스, 인코포레이티드 하전 입자 빔 리소그라피를 이용하여 패턴들을 형성하기 위한 방법 및 시스템
US9343267B2 (en) 2012-04-18 2016-05-17 D2S, Inc. Method and system for dimensional uniformity using charged particle beam lithography
JP6189933B2 (ja) 2012-04-18 2017-08-30 ディー・ツー・エス・インコーポレイテッドＤ２Ｓ， Ｉｎｃ． 荷電粒子ビームリソグラフィを用いる限界寸法均一性のための方法およびシステム
US10312091B1 (en) * 2015-10-13 2019-06-04 Multibeam Corporation Secure permanent integrated circuit personalization
US10937630B1 (en) 2020-04-27 2021-03-02 John Bennett Modular parallel electron lithography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3815094A (en) * 1970-12-15 1974-06-04 Micro Bit Corp Electron beam type computer output on microfilm printer
US3810165A (en) * 1971-12-28 1974-05-07 Xerox Corp Electronic display device
JPS5456769A (en) * 1977-10-14 1979-05-08 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam exposure device
JPS62154729A (ja) * 1985-12-27 1987-07-09 Hitachi Ltd 電子線描画装置
JPS6431418A (en) * 1987-07-28 1989-02-01 Toshiba Machine Co Ltd Charged particle beam lithography equipment
US4870286A (en) * 1987-07-30 1989-09-26 Mitsubishi Denki Kabushiki Kaisha Electron beam direct drawing device

Also Published As

Publication number Publication date
US5005138A (en) 1991-04-02
JPH02280315A (ja) 1990-11-16
DE4007021A1 (de) 1990-10-25
CA2010414C (fr) 1993-07-20
DE4007021C2 (fr) 1993-05-13

Similar Documents

Publication Publication Date Title
CA2010414A1 (fr) Appareil d'impression directe par faisceau electronique
JPS6184960A (ja) 文書原画の斜め姿勢補正方法および装置
JPH0310511B2 (fr)
GB1390459A (en) Recognition unit for optical character reading system
US4511980A (en) Electron beam exposure apparatus
DE69120471D1 (de) Gerät zur Erzeugung einer gerasterten Reproduktion eines Bildes
JPS5764875A (en) Print format control system of printer
US4625219A (en) Video signal generating apparatus for laser beam printer
US4642622A (en) Video signal generating circuit
KR950009899A (ko) 전자빔 노광장치 및 전자빔 노광방법
AU6519790A (en) Method and device for writing and reading information from a support based on ferroelectric material
EP0450940A1 (fr) Procédé et appareil pour traiter des signes
GB2214028A (en) Image processor
JPS55103636A (en) Display unit
JPS5684066A (en) Facsimile read and editing system
JPH01249482A (ja) データ出力装置
US5608822A (en) Apparatus and method for generating half-tone dot in image reproduction
JPH03108712A (ja) 電子ビーム描画装置
JPS57182743A (en) Pattern forming method for printed circuit plate
JPS5690383A (en) Print control system
JPS5453835A (en) Character pattern generation system
EP0391670A3 (fr) Générateur de signaux de configuration de points
KR880001919B1 (en) Laser marker with galvano meter seaner
JPS602982A (ja) フオントメモリ
TW324810B (en) Character processing apparatus and method

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed