CA2056308A1 - Methode de fabrication de photomasques de memoire optique - Google Patents

Methode de fabrication de photomasques de memoire optique

Info

Publication number
CA2056308A1
CA2056308A1 CA2056308A CA2056308A CA2056308A1 CA 2056308 A1 CA2056308 A1 CA 2056308A1 CA 2056308 A CA2056308 A CA 2056308A CA 2056308 A CA2056308 A CA 2056308A CA 2056308 A1 CA2056308 A1 CA 2056308A1
Authority
CA
Canada
Prior art keywords
thin film
exposed
light
photoresist film
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2056308A
Other languages
English (en)
Other versions
CA2056308C (fr
Inventor
Junji Hirokane
Tetsuya Inui
Michinobu Mieda
Kenji Ohta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2056308A1 publication Critical patent/CA2056308A1/fr
Application granted granted Critical
Publication of CA2056308C publication Critical patent/CA2056308C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA002056308A 1990-11-30 1991-11-27 Methode de fabrication de photomasques de memoire optique Expired - Fee Related CA2056308C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP33975890A JP2585861B2 (ja) 1990-11-30 1990-11-30 光メモリ素子用フォトマスクの製造方法
JPHEI2(1990)-339758 1990-11-30

Publications (2)

Publication Number Publication Date
CA2056308A1 true CA2056308A1 (fr) 1992-05-31
CA2056308C CA2056308C (fr) 1996-09-17

Family

ID=18330529

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002056308A Expired - Fee Related CA2056308C (fr) 1990-11-30 1991-11-27 Methode de fabrication de photomasques de memoire optique

Country Status (6)

Country Link
US (1) US5286583A (fr)
EP (1) EP0490547B1 (fr)
JP (1) JP2585861B2 (fr)
KR (1) KR940007790B1 (fr)
CA (1) CA2056308C (fr)
DE (1) DE69126851T2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06188270A (ja) * 1992-12-15 1994-07-08 Mitsubishi Electric Corp 電界効果トランジスタの製造方法及びパターン転写マスク
NL9400225A (nl) * 1994-02-14 1995-09-01 Od & Me Bv Werkwijze voor het zonder tussenkomst van een master vervaardigen van een stamper voor het voortbrengen van optische schijven.
KR100234292B1 (ko) * 1997-10-08 1999-12-15 윤종용 광디스크 제작용 마스터 디스크 제조방법
JPH11250504A (ja) * 1998-02-27 1999-09-17 Sony Corp 光記録媒体及びその製造方法
EP2158589A1 (fr) 2007-06-06 2010-03-03 Maiworm & Dr. Bosien Grundstücks GBR Système maître
WO2009088947A2 (fr) * 2008-01-02 2009-07-16 Arcscan, Inc. Composants pour un appareil de balayage en arc ultrasonore
US8617799B2 (en) * 2008-09-22 2013-12-31 Api Technologies Corp. Post arrays and methods of making the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1313792C (fr) * 1986-02-28 1993-02-23 Junji Hirokane Methode de fabrication de photomasques et photomasque fabrique selon cette methode
JPS62241149A (ja) * 1986-04-11 1987-10-21 Sharp Corp 光メモリ素子用フォトマスク及びその製造方法
JPH0229955A (ja) * 1988-07-18 1990-01-31 Nec Corp 光ディスク製造方法
JPH0273545A (ja) * 1988-09-09 1990-03-13 Seiko Epson Corp フォーマット入り光メモリー用ガラスマスターの製造方法

Also Published As

Publication number Publication date
US5286583A (en) 1994-02-15
EP0490547B1 (fr) 1997-07-16
CA2056308C (fr) 1996-09-17
DE69126851T2 (de) 1998-02-05
JPH04204944A (ja) 1992-07-27
EP0490547A1 (fr) 1992-06-17
JP2585861B2 (ja) 1997-02-26
KR940007790B1 (ko) 1994-08-25
DE69126851D1 (de) 1997-08-21

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Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed