CA2072384A1 - Compositions a base de fluorure de carbone - Google Patents

Compositions a base de fluorure de carbone

Info

Publication number: CA2072384A1
Authority: CA; Canada
Prior art keywords: carbon; carbon fluoride; substrate; fluoride solid; solid composition
Prior art date: 1991-08-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

CA002072384A

Other languages

English (en)

Inventor

Clifford L. Spiro

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

General Electric Co

Original Assignee

General Electric Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-08-29

Filing date

1992-06-25

Publication date

1993-03-01

1992-06-25 Application filed by General Electric Co filed Critical General Electric Co

1993-03-01 Publication of CA2072384A1 publication Critical patent/CA2072384A1/fr

Status Abandoned legal-status Critical Current

Links

TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 title claims abstract description 34
239000000203 mixture Substances 0.000 title claims abstract description 18
229910052799 carbon Inorganic materials 0.000 claims abstract description 27
238000000034 method Methods 0.000 claims abstract description 26
239000000758 substrate Substances 0.000 claims abstract description 26
150000001875 compounds Chemical class 0.000 claims abstract description 23
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 22
229910052731 fluorine Inorganic materials 0.000 claims abstract description 20
239000011737 fluorine Substances 0.000 claims abstract description 20
239000012634 fragment Substances 0.000 claims abstract description 20
239000008247 solid mixture Substances 0.000 claims abstract description 18
238000000576 coating method Methods 0.000 claims abstract description 17
-1 polytetrafluoroethylene Polymers 0.000 claims abstract description 13
239000004810 polytetrafluoroethylene Substances 0.000 claims abstract description 8
229920001343 polytetrafluoroethylene Polymers 0.000 claims abstract description 6
238000012856 packing Methods 0.000 claims abstract description 4
238000012993 chemical processing Methods 0.000 claims abstract description 3
239000000843 powder Substances 0.000 claims abstract description 3
ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 claims description 16
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 9
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 6
IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 6
239000010453 quartz Substances 0.000 claims description 6
239000000919 ceramic Substances 0.000 claims description 5
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
125000003118 aryl group Chemical group 0.000 claims description 4
NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 4
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
229910052721 tungsten Inorganic materials 0.000 claims description 4
239000010937 tungsten Substances 0.000 claims description 4
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
239000004642 Polyimide Substances 0.000 claims description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
125000001931 aliphatic group Chemical group 0.000 claims description 3
239000011521 glass Substances 0.000 claims description 3
229910052751 metal Inorganic materials 0.000 claims description 3
239000002184 metal Substances 0.000 claims description 3
229910052750 molybdenum Inorganic materials 0.000 claims description 3
239000011733 molybdenum Substances 0.000 claims description 3
238000006303 photolysis reaction Methods 0.000 claims description 3
230000015843 photosynthesis, light reaction Effects 0.000 claims description 3
229920001721 polyimide Polymers 0.000 claims description 3
230000005855 radiation Effects 0.000 claims description 3
229910052710 silicon Inorganic materials 0.000 claims description 3
239000010703 silicon Substances 0.000 claims description 3
239000011780 sodium chloride Substances 0.000 claims description 3
229910001220 stainless steel Inorganic materials 0.000 claims description 3
239000010935 stainless steel Substances 0.000 claims description 3
239000011261 inert gas Substances 0.000 claims description 2
239000004033 plastic Substances 0.000 claims description 2
229920003023 plastic Polymers 0.000 claims description 2
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 9
239000011248 coating agent Substances 0.000 claims 3
235000012239 silicon dioxide Nutrition 0.000 claims 3
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
238000000465 moulding Methods 0.000 claims 1
239000000377 silicon dioxide Substances 0.000 claims 1
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract description 11
239000007787 solid Substances 0.000 abstract description 5
238000005229 chemical vapour deposition Methods 0.000 abstract description 4
238000009736 wetting Methods 0.000 abstract description 3
238000004804 winding Methods 0.000 abstract 1
239000000463 material Substances 0.000 description 6
229940058401 polytetrafluoroethylene Drugs 0.000 description 6
239000007858 starting material Substances 0.000 description 6
239000007789 gas Substances 0.000 description 5
239000000126 substance Substances 0.000 description 5
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
239000004809 Teflon Substances 0.000 description 4
229920006362 Teflon® Polymers 0.000 description 4
238000009833 condensation Methods 0.000 description 4
230000005494 condensation Effects 0.000 description 4
QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical compound C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 description 4
230000015556 catabolic process Effects 0.000 description 3
238000006731 degradation reaction Methods 0.000 description 3
238000000151 deposition Methods 0.000 description 3
239000007788 liquid Substances 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
239000012159 carrier gas Substances 0.000 description 2
238000006243 chemical reaction Methods 0.000 description 2
230000008021 deposition Effects 0.000 description 2
239000000376 reactant Substances 0.000 description 2
241001517013 Calidris pugnax Species 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
239000002033 PVDF binder Substances 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
125000004429 atom Chemical group 0.000 description 1
230000005587 bubbling Effects 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
238000001311 chemical methods and process Methods 0.000 description 1
238000003682 fluorination reaction Methods 0.000 description 1
229920002313 fluoropolymer Polymers 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
238000005259 measurement Methods 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
229920002981 polyvinylidene fluoride Polymers 0.000 description 1
238000012545 processing Methods 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
- C09D201/02—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C09D201/04—Coating compositions based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/103—Diamond-like carbon coating, i.e. DLC

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Life Sciences & Earth Sciences (AREA)
Wood Science & Technology (AREA)
Chemical Vapour Deposition (AREA)
Carbon And Carbon Compounds (AREA)
Application Of Or Painting With Fluid Materials (AREA)

CA002072384A 1991-08-29 1992-06-25 Compositions a base de fluorure de carbone Abandoned CA2072384A1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US75188491A	1991-08-29	1991-08-29
US751,884		1991-08-29

Publications (1)

Publication Number	Publication Date
CA2072384A1 true CA2072384A1 (fr)	1993-03-01

Family

ID=25023925

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA002072384A Abandoned CA2072384A1 (fr)	1991-08-29	1992-06-25	Compositions a base de fluorure de carbone

Country Status (8)

Country	Link
US (1)	US5380557A (fr)
EP (1)	EP0531029A3 (fr)
JP (1)	JPH05230659A (fr)
KR (1)	KR930004420A (fr)
CN (1)	CN1069778A (fr)
AU (1)	AU2128992A (fr)
CA (1)	CA2072384A1 (fr)
ZA (1)	ZA926153B (fr)

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US5942328A (en)	1996-02-29	1999-08-24	International Business Machines Corporation	Low dielectric constant amorphous fluorinated carbon and method of preparation
US6258758B1 (en) *	1996-04-26	2001-07-10	Platinum Research Organization Llc	Catalyzed surface composition altering and surface coating formulations and methods
US5888591A (en) *	1996-05-06	1999-03-30	Massachusetts Institute Of Technology	Chemical vapor deposition of fluorocarbon polymer thin films
JP3637687B2 (ja) *	1996-07-13	2005-04-13	日新電機株式会社	自動車用ダイヤフラムの製造方法
US5804259A (en) *	1996-11-07	1998-09-08	Applied Materials, Inc.	Method and apparatus for depositing a multilayered low dielectric constant film
US6211096B1 (en)	1997-03-21	2001-04-03	Lsi Logic Corporation	Tunable dielectric constant oxide and method of manufacture
JP3178375B2 (ja) *	1997-06-03	2001-06-18	日本電気株式会社	絶縁膜の形成方法
US6649222B1 (en)	1998-09-07	2003-11-18	The Procter & Gamble Company	Modulated plasma glow discharge treatments for making superhydrophobic substrates
EP0985740A1 (fr) *	1998-09-07	2000-03-15	The Procter & Gamble Company	Substrats revêtus super-hydrophobes
EP0985741A1 (fr) *	1998-09-07	2000-03-15	The Procter & Gamble Company	Traitements par plasma de décharge luminescente pour la fabrication de substrats super-hydrophobiques
US6092714A (en) *	1999-03-16	2000-07-25	Mcms, Inc.	Method of utilizing a plasma gas mixture containing argon and CF4 to clean and coat a conductor
CA2487486A1 (fr) *	2002-06-21	2003-12-31	E.I. Du Pont De Nemours And Company	Dielectrique intercouches en fluoropolymeres forme au moyen d'un procede de depot chimique en phase vapeur
CN2898333Y (zh) *	2004-09-14	2007-05-09	日产自动车株式会社	内燃机用部件
US7147634B2 (en)	2005-05-12	2006-12-12	Orion Industries, Ltd.	Electrosurgical electrode and method of manufacturing same
US8814861B2 (en)	2005-05-12	2014-08-26	Innovatech, Llc	Electrosurgical electrode and method of manufacturing same
US20070218344A1 (en) *	2006-03-20	2007-09-20	Chunxin Ji	Diffusion media with vapor deposited fluorocarbon polymer
US8916001B2 (en) *	2006-04-05	2014-12-23	Gvd Corporation	Coated molds and related methods and components
JP2008081831A (ja) *	2006-09-29	2008-04-10	Mitsubishi Chemicals Corp	基体表面処理方法、固形物、蛍光体含有組成物、発光装置、画像表示装置、および照明装置
US7829195B2 (en) *	2006-12-31	2010-11-09	Intel Corporation	Fluorination pre-treatment of heat spreader attachment indium thermal interface material
JP2009025344A (ja) *	2007-07-17	2009-02-05	Kawai Musical Instr Mfg Co Ltd	鍵盤楽器の鍵
US8227025B2 (en) *	2007-11-02	2012-07-24	Gvd Corporation	Conductive polymer coatings and methods of forming the same
EP2349034A4 (fr)	2008-10-24	2013-12-11	Gvd Corp	Procédés de revêtement, systèmes et articles associés
WO2011163592A2 (fr)	2010-06-24	2011-12-29	Board Of Regents, The University Of Texas System	Composés d'alkylphosphorofluoridothioates présentant un faible volume d'usure et procédés de synthèse et d'utilisation de ceux-ci
DE102010050771B4 (de)	2010-11-10	2014-05-08	Schott Ag	Erzeugnis aus Glas oder Glaskeramik mit hochtemperaturstabiler Niedrigenergie-Schicht, Verfahren zur Herstellung derselben und Verwendung des Erzeugnisses
WO2013169779A1 (fr)	2012-05-07	2013-11-14	Board Of Regents, The University Of Texas System	Mélanges synergiques de liquides ioniques avec d'autres liquides ioniques et/ou avec des thiophosphates sans cendres pour des applications anti-usure et/ou de réduction du frottement
CN105121036A (zh)	2013-02-15	2015-12-02	麻省理工学院	用于滴状冷凝的接枝聚合物表面和相关使用及生产方法
CN112659599B (zh) *	2020-11-05	2021-08-06	中国长江三峡集团有限公司	一种防除风机叶片覆冰的基于ptfe膜制备方法及应用

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US4252848A (en) *	1977-04-11	1981-02-24	Rca Corporation	Perfluorinated polymer thin films
US4228142A (en) *	1979-08-31	1980-10-14	Holcombe Cressie E Jun	Process for producing diamond-like carbon
DE3326376A1 (de) *	1983-07-22	1985-01-31	Siemens AG, 1000 Berlin und 8000 München	Verfahren zum erzeugen von glimmpolymerisat-schichten
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US4770940A (en) *	1984-09-10	1988-09-13	Ovonic Synthetic Materials Company	Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
US4718907A (en) *	1985-06-20	1988-01-12	Atrium Medical Corporation	Vascular prosthesis having fluorinated coating with varying F/C ratio
US5238705A (en) *	1987-02-24	1993-08-24	Semiconductor Energy Laboratory Co., Ltd.	Carbonaceous protective films and method of depositing the same
EP0304220B1 (fr) *	1987-08-10	1994-12-07	Semiconductor Energy Laboratory Co., Ltd.	Matériau constitué d'un film fin de carbone et procédé pour son dépôt
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KR930010193B1 (ko) *	1988-09-13	1993-10-15	가부시끼가이샤 한도다이 에네르기겐뀨쇼	세라믹막 및 탄소막으로 덮인 부품과 그 부품 제작방법
US4981717A (en) *	1989-02-24	1991-01-01	Mcdonnell Douglas Corporation	Diamond like coating and method of forming
US5316795A (en) *	1990-05-24	1994-05-31	Houston Advanced Research Center	Halogen-assisted chemical vapor deposition of diamond
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US5045355A (en) *	1990-06-28	1991-09-03	General Electric Company	Carbon chalcogenide macromolecular composition and process for preparation thereof
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1992
- 1992-06-25 CA CA002072384A patent/CA2072384A1/fr not_active Abandoned
- 1992-08-14 ZA ZA926153A patent/ZA926153B/xx unknown
- 1992-08-15 CN CN92109397A patent/CN1069778A/zh active Pending
- 1992-08-21 EP EP19920307675 patent/EP0531029A3/en not_active Withdrawn
- 1992-08-25 AU AU21289/92A patent/AU2128992A/en not_active Abandoned
- 1992-08-28 KR KR1019920015579A patent/KR930004420A/ko not_active Withdrawn
- 1992-08-28 JP JP4229056A patent/JPH05230659A/ja not_active Withdrawn
1993
- 1993-06-03 US US08/073,991 patent/US5380557A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
US5380557A (en)	1995-01-10
AU2128992A (en)	1993-03-04
JPH05230659A (ja)	1993-09-07
CN1069778A (zh)	1993-03-10
EP0531029A2 (fr)	1993-03-10
ZA926153B (en)	1993-05-29
KR930004420A (ko)	1993-03-22
EP0531029A3 (en)	1993-06-30

Legal Events

Date	Code	Title	Description
1994-12-26	FZDE	Dead

Publication	Publication Date	Title
US5380557A (en)	1995-01-10	Carbon fluoride compositions
JP3945664B2 (ja)	2007-07-18	撥水性酸化シリコン皮膜の製造方法
Limb et al.	1996	Growth of fluorocarbon polymer thin films with high CF2 fractions and low dangling bond concentrations by thermal chemical vapor deposition
JP3980650B2 (ja)	2007-09-26	リンを含有するフルオロモノマーおよびそれらのポリマー
Weber et al.	1993	Growth of cubic boron nitride and boron-carbon-nitrogen coatings using N-trimethylborazine in an electron cyclotron resonance plasma process
US4585704A (en)	1986-04-29	Electrically conductive Si3 N4 --C series amorphous material and a method of processing the same
US3771976A (en)	1973-11-13	Metal carbonitride-coated article and method of producing same
EP0714999A1 (fr)	1996-06-05	Procédé pour la sublimation d'un matériau solide et dispositif pour la mise en oeuvre du procédé
JPS63243262A (ja)	1988-10-11	含フツ素樹脂被膜の形成方法
US5606056A (en)	1997-02-25	Carbon nitride and its synthesis
Maeda et al.	1994	Diamond growth from a mixture of fluorocarbon and hydrogen in a microwave plasma
RU2006493C1 (ru)	1994-01-30	Способ обработки пористых изделий
JPH02213474A (ja)	1990-08-24	薄い硫化モリブデンフイルムの製法、硫化モリブデンフイルムおよび自己潤滑性層、電気光学的層および化学触媒作用性層の製法
JPH11116278A (ja)	1999-04-27	フッ素樹脂被覆体の製造方法
JPH02217473A (ja)	1990-08-30	窒化アルミニウムフィルムの形成方法
TWI781585B (zh)	2022-10-21	氟化釔膜及製備和使用氟化釔膜之方法
JPS63201094A (ja)	1988-08-19	ダイヤモンド状物質
Knotek et al.	1996	Superstoichiometric PVD carbide coatings
Rye	1994	Hot‐filament‐activated chemical‐vapor deposition of carbon: Film growth and filament reactions
Parretta et al.	1991	Morphological aspects of silicon carbide chemically vapour-deposited on graphite
Clark et al.	1983	Plasma polymerization. IX. A systematic investigation of materials synthesized in inductively coupled plasmas excited in perfluoropyridine
Pochet et al.	1996	Practical aspects of deposition of CVD SiC and boron silicon carbide onto high temperature composites
JPH0246550B2 (fr)	1990-10-16
EP0039774A1 (fr)	1981-11-18	Structure réfractaire et procédé pour sa préparation
JPS61151096A (ja)	1986-07-09	ダイヤモンド膜又はダイヤモンド状炭素膜の形成方法