CA2268659C - Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc - Google Patents

Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc Download PDF

Info

Publication number: CA2268659C
Authority: CA; Canada
Prior art keywords: steering; arc; conductors; coating apparatus; evaporation surface
Prior art date: 1999-04-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CA002268659A

Other languages

English (en)

Other versions

CA2268659A1 (fr

Inventor

Vladimir I. Gorokhovsky

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

G&H Technologies LLC

Original Assignee

G&H Technologies LLC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-04-12

Filing date

1999-04-12

Publication date

2008-12-30

1999-04-12 Priority to CA002268659A priority Critical patent/CA2268659C/fr

1999-04-12 Application filed by G&H Technologies LLC filed Critical G&H Technologies LLC

2000-04-07 Priority to DE10084452.9T priority patent/DE10084452B3/de

2000-04-07 Priority to AU39509/00A priority patent/AU762277B2/en

2000-04-07 Priority to JP2000611303A priority patent/JP4689843B2/ja

2000-04-07 Priority to PCT/CA2000/000380 priority patent/WO2000062327A2/fr

2000-04-07 Priority to GB0125844A priority patent/GB2368597B/en

2000-10-12 Publication of CA2268659A1 publication Critical patent/CA2268659A1/fr

2003-09-18 Priority to US10/667,279 priority patent/US6929727B2/en

2008-12-30 Application granted granted Critical

2008-12-30 Publication of CA2268659C publication Critical patent/CA2268659C/fr

2019-04-12 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims description 12
239000004020 conductor Substances 0.000 claims abstract description 234
238000000576 coating method Methods 0.000 claims abstract description 168
239000011248 coating agent Substances 0.000 claims abstract description 155
230000008020 evaporation Effects 0.000 claims abstract description 107
238000001704 evaporation Methods 0.000 claims abstract description 107
239000000758 substrate Substances 0.000 claims abstract description 70
230000003628 erosive effect Effects 0.000 claims abstract description 48
230000003287 optical effect Effects 0.000 claims 3
239000007787 solid Substances 0.000 claims 1
230000008021 deposition Effects 0.000 abstract description 30
230000007935 neutral effect Effects 0.000 abstract description 8
238000009826 distribution Methods 0.000 abstract description 5
239000000356 contaminant Substances 0.000 abstract description 2
238000000151 deposition Methods 0.000 description 29
239000000463 material Substances 0.000 description 22
150000002500 ions Chemical class 0.000 description 16
238000004140 cleaning Methods 0.000 description 11
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
230000000694 effects Effects 0.000 description 9
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
230000001154 acute effect Effects 0.000 description 8
229910052751 metal Inorganic materials 0.000 description 8
239000002184 metal Substances 0.000 description 8
239000010936 titanium Substances 0.000 description 8
229910052782 aluminium Inorganic materials 0.000 description 7
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
230000015572 biosynthetic process Effects 0.000 description 7
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
238000010891 electric arc Methods 0.000 description 6
229910002804 graphite Inorganic materials 0.000 description 6
239000010439 graphite Substances 0.000 description 6
229910052719 titanium Inorganic materials 0.000 description 6
229910052786 argon Inorganic materials 0.000 description 5
230000009977 dual effect Effects 0.000 description 5
238000005513 bias potential Methods 0.000 description 4
239000002826 coolant Substances 0.000 description 4
238000005121 nitriding Methods 0.000 description 4
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
0 C*1(C)C(C2)C2CC1 Chemical compound C*1(C)C(C2)C2CC1 0.000 description 3
230000006978 adaptation Effects 0.000 description 3
238000009792 diffusion process Methods 0.000 description 3
239000011521 glass Substances 0.000 description 3
239000010410 layer Substances 0.000 description 3
230000003472 neutralizing effect Effects 0.000 description 3
229910052757 nitrogen Inorganic materials 0.000 description 3
230000008569 process Effects 0.000 description 3
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
229910000831 Steel Inorganic materials 0.000 description 2
238000013459 approach Methods 0.000 description 2
229910052799 carbon Inorganic materials 0.000 description 2
239000010406 cathode material Substances 0.000 description 2
239000011247 coating layer Substances 0.000 description 2
238000011109 contamination Methods 0.000 description 2
239000007789 gas Substances 0.000 description 2
238000010849 ion bombardment Methods 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
230000008018 melting Effects 0.000 description 2
238000002844 melting Methods 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
229910052750 molybdenum Inorganic materials 0.000 description 2
239000011733 molybdenum Substances 0.000 description 2
229910052697 platinum Inorganic materials 0.000 description 2
125000006850 spacer group Chemical group 0.000 description 2
239000010959 steel Substances 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
230000004913 activation Effects 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
239000013590 bulk material Substances 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
239000002131 composite material Substances 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000001125 extrusion Methods 0.000 description 1
238000005242 forging Methods 0.000 description 1
230000006872 improvement Effects 0.000 description 1
238000005468 ion implantation Methods 0.000 description 1
230000001788 irregular Effects 0.000 description 1
238000002955 isolation Methods 0.000 description 1
230000000670 limiting effect Effects 0.000 description 1
238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
239000000203 mixture Substances 0.000 description 1
229910052755 nonmetal Inorganic materials 0.000 description 1
238000013021 overheating Methods 0.000 description 1
230000036961 partial effect Effects 0.000 description 1
238000009832 plasma treatment Methods 0.000 description 1
230000002028 premature Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
230000002829 reductive effect Effects 0.000 description 1
238000009877 rendering Methods 0.000 description 1
230000002441 reversible effect Effects 0.000 description 1
230000006641 stabilisation Effects 0.000 description 1
238000011105 stabilization Methods 0.000 description 1
230000003068 static effect Effects 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
230000002195 synergetic effect Effects 0.000 description 1
230000007704 transition Effects 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)

CA002268659A 1999-04-12 1999-04-12 Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc Expired - Fee Related CA2268659C (fr)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
CA002268659A CA2268659C (fr)	1999-04-12	1999-04-12	Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc
AU39509/00A AU762277B2 (en)	1999-04-12	2000-04-07	Rectangular cathodic arc source and method of steering an arc spot
JP2000611303A JP4689843B2 (ja)	1999-04-12	2000-04-07	矩形陰極アーク源およびアークスポットの指向方法
PCT/CA2000/000380 WO2000062327A2 (fr)	1999-04-12	2000-04-07	Source d'arc cathodique rectangulaire et procede de controle d'un point d'arc
DE10084452.9T DE10084452B3 (de)	1999-04-12	2000-04-07	Lichtbogenquelle mit rechteckiger Kathode und Verfahren zur Lenkung eines Lichtbogenflecks
GB0125844A GB2368597B (en)	1999-04-12	2000-04-07	Rectangular cathodic arc source and method of steering an arc spot
US10/667,279 US6929727B2 (en)	1999-04-12	2003-09-18	Rectangular cathodic arc source and method of steering an arc spot

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CA002268659A CA2268659C (fr)	1999-04-12	1999-04-12	Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc

Publications (2)

Publication Number	Publication Date
CA2268659A1 CA2268659A1 (fr)	2000-10-12
CA2268659C true CA2268659C (fr)	2008-12-30

Family

ID=4163456

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA002268659A Expired - Fee Related CA2268659C (fr)	1999-04-12	1999-04-12	Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc

Country Status (6)

Country	Link
JP (1)	JP4689843B2 (fr)
AU (1)	AU762277B2 (fr)
CA (1)	CA2268659C (fr)
DE (1)	DE10084452B3 (fr)
GB (1)	GB2368597B (fr)
WO (1)	WO2000062327A2 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3555844B2 (ja)	1999-04-09	2004-08-18	三宅正二郎	摺動部材およびその製造方法
US6929727B2 (en) *	1999-04-12	2005-08-16	G & H Technologies, Llc	Rectangular cathodic arc source and method of steering an arc spot
CA2305938C (fr)	2000-04-10	2007-07-03	Vladimir I. Gorokhovsky	Methode et appareillage de depot d'arc cathodique filtre
JP2004138128A (ja)	2002-10-16	2004-05-13	Nissan Motor Co Ltd	自動車エンジン用摺動部材
US6969198B2 (en)	2002-11-06	2005-11-29	Nissan Motor Co., Ltd.	Low-friction sliding mechanism
JP3891433B2 (ja)	2003-04-15	2007-03-14	日産自動車株式会社	燃料噴射弁
EP1479946B1 (fr)	2003-05-23	2012-12-19	Nissan Motor Co., Ltd.	Piston pour un moteur à combustion interne
JP2004360649A (ja)	2003-06-06	2004-12-24	Nissan Motor Co Ltd	エンジン用ピストンピン
JP4863152B2 (ja)	2003-07-31	2012-01-25	日産自動車株式会社	歯車
JP2005054617A (ja)	2003-08-08	2005-03-03	Nissan Motor Co Ltd	動弁機構
JP4973971B2 (ja)	2003-08-08	2012-07-11	日産自動車株式会社	摺動部材
JP4117553B2 (ja)	2003-08-13	2008-07-16	日産自動車株式会社	チェーン駆動装置
DE602004008547T2 (de)	2003-08-13	2008-05-21	Nissan Motor Co., Ltd., Yokohama	Struktur zur Verbindung von einem Kolben mit einer Kurbelwelle
JP4539205B2 (ja)	2003-08-21	2010-09-08	日産自動車株式会社	冷媒圧縮機
US7771821B2 (en)	2003-08-21	2010-08-10	Nissan Motor Co., Ltd.	Low-friction sliding member and low-friction sliding mechanism using same
EP1508611B1 (fr)	2003-08-22	2019-04-17	Nissan Motor Co., Ltd.	Boîte de vitesse comprenant une composition d`huile de transmission
US7381311B2 (en) *	2003-10-21	2008-06-03	The United States Of America As Represented By The Secretary Of The Air Force	Filtered cathodic-arc plasma source
RU2382118C1 (ru) *	2009-01-28	2010-02-20	Открытое акционерное общество "Национальный институт авиационных технологий"	Вакуумно-дуговой источник плазмы
DE102010020737A1 (de) *	2010-05-17	2011-11-17	Oerlikon Trading Ag, Trübbach	Target für Funkenverdampfung mit räumlicher Begrenzung der Ausbreitung des Funkens
CN103132020B (zh) *	2013-03-17	2018-04-20	广东世创金属科技股份有限公司	一种改进结构的电弧靶及其控制系统
KR102037910B1 (ko)	2017-03-27	2019-10-30	세메스 주식회사	코팅 장치 및 코팅 방법
SK500322019A3 (sk) *	2019-07-11	2021-01-13	STATON, s. r. o.	Zdroj plazmy využívajúci katódový vákuový oblúk s vylepšenou konfiguráciou magnetického poľa a spôsob jeho činnosti
CN119811976B (zh) *	2025-03-17	2025-06-27	温州职业技术学院	直管磁过滤径向电弧源

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US3793179A (en) *	1971-07-19	1974-02-19	L Sablev	Apparatus for metal evaporation coating
US4448659A (en) *	1983-09-12	1984-05-15	Vac-Tec Systems, Inc.	Method and apparatus for evaporation arc stabilization including initial target cleaning
US4673477A (en) *	1984-03-02	1987-06-16	Regents Of The University Of Minnesota	Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) *	1984-08-13	1988-02-09	Vac-Tec Systems, Inc.	Method and apparatus for arc evaporating large area targets
US5215640A (en) *	1987-02-03	1993-06-01	Balzers Ag	Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US5298136A (en) *	1987-08-18	1994-03-29	Regents Of The University Of Minnesota	Steered arc coating with thick targets
JPH04236770A (ja) *	1991-01-17	1992-08-25	Kobe Steel Ltd	真空アーク蒸着のアークスポットの制御方法及び蒸発源
CA2065581C (fr) *	1991-04-22	2002-03-12	Andal Corp.	Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
DE4223592C2 (de) *	1992-06-24	2001-05-17	Leybold Ag	Lichtbogen-Verdampfungsvorrichtung
US5435900A (en) *	1992-11-04	1995-07-25	Gorokhovsky; Vladimir I.	Apparatus for application of coatings in vacuum
US5380421A (en) *	1992-11-04	1995-01-10	Gorokhovsky; Vladimir I.	Vacuum-arc plasma source
US5480527A (en) *	1994-04-25	1996-01-02	Vapor Technologies, Inc.	Rectangular vacuum-arc plasma source
US5468363A (en) *	1994-04-25	1995-11-21	Regents Of The University Of California	Magnetic-cusp, cathodic-arc source
US5587207A (en) *	1994-11-14	1996-12-24	Gorokhovsky; Vladimir I.	Arc assisted CVD coating and sintering method
KR100230279B1 (ko) *	1997-03-31	1999-11-15	윤종용	음극 아크 방전을 이용한 박막 증착장치
DE19739527C2 (de) *	1997-09-09	2003-10-16	Rossendorf Forschzent	Vakuumbogen-Plasmaquelle mit Magnet-Partikelfilter
US5997705A (en) *	1999-04-14	1999-12-07	Vapor Technologies, Inc.	Rectangular filtered arc plasma source

1999
- 1999-04-12 CA CA002268659A patent/CA2268659C/fr not_active Expired - Fee Related
2000
- 2000-04-07 GB GB0125844A patent/GB2368597B/en not_active Expired - Fee Related
- 2000-04-07 JP JP2000611303A patent/JP4689843B2/ja not_active Expired - Fee Related
- 2000-04-07 AU AU39509/00A patent/AU762277B2/en not_active Ceased
- 2000-04-07 WO PCT/CA2000/000380 patent/WO2000062327A2/fr not_active Ceased
- 2000-04-07 DE DE10084452.9T patent/DE10084452B3/de not_active Expired - Fee Related

Also Published As

Publication number	Publication date
WO2000062327A3 (fr)	2001-01-18
CA2268659A1 (fr)	2000-10-12
AU762277B2 (en)	2003-06-19
WO2000062327A2 (fr)	2000-10-19
DE10084452T1 (de)	2002-06-20
GB0125844D0 (en)	2001-12-19
AU3950900A (en)	2000-11-14
GB2368597B (en)	2003-08-27
DE10084452B3 (de)	2016-03-17
JP4689843B2 (ja)	2011-05-25
JP2002541335A (ja)	2002-12-03
GB2368597A (en)	2002-05-08

Legal Events

Date	Code	Title	Description
2002-08-01	EEER	Examination request
2017-05-24	MKLA	Lapsed	Effective date: 20170412

Publication	Publication Date	Title
US6645354B1 (en)	2003-11-11	Rectangular cathodic arc source and method of steering an arc spot
US6929727B2 (en)	2005-08-16	Rectangular cathodic arc source and method of steering an arc spot
CA2268659C (fr)	2008-12-30	Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc
JP4264474B2 (ja)	2009-05-20	ペニング放電プラズマ源
EP0495447B1 (fr)	1999-05-06	Procédé pour commander un point à l'arc dans le dépÔt sous vide par arc, et source d'évaporation
US9028660B2 (en)	2015-05-12	Low impedance plasma
CA2305938C (fr)	2007-07-03	Methode et appareillage de depot d'arc cathodique filtre
KR100361620B1 (ko)	2003-02-17	진공아크방전장치,진공아크방전용플라즈마도관,플라즈마빔발생장치및아크방전제어방법
KR20090023352A (ko)	2009-03-04	이중 플라즈마 비임 소스 및 그 방법
KR20140143352A (ko)	2014-12-16	여과된 음극 아크 증착 장치 및 방법
WO2005027191A2 (fr)	2005-03-24	Source d'ions avec electrode maintenue a des potentiels autres que la terre par une ou des diodes zener, un ou des thyristors et/ou similaires
US7023128B2 (en)	2006-04-04	Dipole ion source
US20150243484A1 (en)	2015-08-27	Plasma Source
GB2255105A (en)	1992-10-28	Dual magnetron/cathodic arc vapour source
RU2098512C1 (ru)	1997-12-10	Вакуумно-дуговой источник плазмы
RU2180472C2 (ru)	2002-03-10	Вакуумно-дуговой источник плазмы