CA2268659A1 - Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc - Google Patents

Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc Download PDF

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Publication number
CA2268659A1
CA2268659A1 CA002268659A CA2268659A CA2268659A1 CA 2268659 A1 CA2268659 A1 CA 2268659A1 CA 002268659 A CA002268659 A CA 002268659A CA 2268659 A CA2268659 A CA 2268659A CA 2268659 A1 CA2268659 A1 CA 2268659A1
Authority
CA
Canada
Prior art keywords
steering
plasma
conductor
cathode
target surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002268659A
Other languages
English (en)
Other versions
CA2268659C (fr
Inventor
Vladimir I. Gorokhovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
G&H Technologies LLC
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CA002268659A priority Critical patent/CA2268659C/fr
Application filed by Individual filed Critical Individual
Priority to GB0125844A priority patent/GB2368597B/en
Priority to PCT/CA2000/000380 priority patent/WO2000062327A2/fr
Priority to DE10084452.9T priority patent/DE10084452B3/de
Priority to JP2000611303A priority patent/JP4689843B2/ja
Priority to AU39509/00A priority patent/AU762277B2/en
Publication of CA2268659A1 publication Critical patent/CA2268659A1/fr
Priority to US10/667,279 priority patent/US6929727B2/en
Application granted granted Critical
Publication of CA2268659C publication Critical patent/CA2268659C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CA002268659A 1999-04-12 1999-04-12 Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc Expired - Fee Related CA2268659C (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CA002268659A CA2268659C (fr) 1999-04-12 1999-04-12 Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc
PCT/CA2000/000380 WO2000062327A2 (fr) 1999-04-12 2000-04-07 Source d'arc cathodique rectangulaire et procede de controle d'un point d'arc
DE10084452.9T DE10084452B3 (de) 1999-04-12 2000-04-07 Lichtbogenquelle mit rechteckiger Kathode und Verfahren zur Lenkung eines Lichtbogenflecks
JP2000611303A JP4689843B2 (ja) 1999-04-12 2000-04-07 矩形陰極アーク源およびアークスポットの指向方法
GB0125844A GB2368597B (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot
AU39509/00A AU762277B2 (en) 1999-04-12 2000-04-07 Rectangular cathodic arc source and method of steering an arc spot
US10/667,279 US6929727B2 (en) 1999-04-12 2003-09-18 Rectangular cathodic arc source and method of steering an arc spot

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002268659A CA2268659C (fr) 1999-04-12 1999-04-12 Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc

Publications (2)

Publication Number Publication Date
CA2268659A1 true CA2268659A1 (fr) 2000-10-12
CA2268659C CA2268659C (fr) 2008-12-30

Family

ID=4163456

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002268659A Expired - Fee Related CA2268659C (fr) 1999-04-12 1999-04-12 Source rectangulaire pour arc cathodique et methode permettant de diriger le point d'un arc

Country Status (6)

Country Link
JP (1) JP4689843B2 (fr)
AU (1) AU762277B2 (fr)
CA (1) CA2268659C (fr)
DE (1) DE10084452B3 (fr)
GB (1) GB2368597B (fr)
WO (1) WO2000062327A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2382118C1 (ru) * 2009-01-28 2010-02-20 Открытое акционерное общество "Национальный институт авиационных технологий" Вакуумно-дуговой источник плазмы

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
US6929727B2 (en) 1999-04-12 2005-08-16 G & H Technologies, Llc Rectangular cathodic arc source and method of steering an arc spot
CA2305938C (fr) 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Methode et appareillage de depot d'arc cathodique filtre
JP2004138128A (ja) 2002-10-16 2004-05-13 Nissan Motor Co Ltd 自動車エンジン用摺動部材
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP3891433B2 (ja) 2003-04-15 2007-03-14 日産自動車株式会社 燃料噴射弁
EP1479946B1 (fr) 2003-05-23 2012-12-19 Nissan Motor Co., Ltd. Piston pour un moteur à combustion interne
JP2004360649A (ja) 2003-06-06 2004-12-24 Nissan Motor Co Ltd エンジン用ピストンピン
JP4863152B2 (ja) 2003-07-31 2012-01-25 日産自動車株式会社 歯車
JP4973971B2 (ja) 2003-08-08 2012-07-11 日産自動車株式会社 摺動部材
JP2005054617A (ja) 2003-08-08 2005-03-03 Nissan Motor Co Ltd 動弁機構
JP4117553B2 (ja) 2003-08-13 2008-07-16 日産自動車株式会社 チェーン駆動装置
DE602004008547T2 (de) 2003-08-13 2008-05-21 Nissan Motor Co., Ltd., Yokohama Struktur zur Verbindung von einem Kolben mit einer Kurbelwelle
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
JP4539205B2 (ja) 2003-08-21 2010-09-08 日産自動車株式会社 冷媒圧縮機
EP1508611B1 (fr) 2003-08-22 2019-04-17 Nissan Motor Co., Ltd. Boîte de vitesse comprenant une composition d`huile de transmission
US7381311B2 (en) * 2003-10-21 2008-06-03 The United States Of America As Represented By The Secretary Of The Air Force Filtered cathodic-arc plasma source
DE102010020737A1 (de) * 2010-05-17 2011-11-17 Oerlikon Trading Ag, Trübbach Target für Funkenverdampfung mit räumlicher Begrenzung der Ausbreitung des Funkens
CN103132020B (zh) * 2013-03-17 2018-04-20 广东世创金属科技股份有限公司 一种改进结构的电弧靶及其控制系统
KR102037910B1 (ko) 2017-03-27 2019-10-30 세메스 주식회사 코팅 장치 및 코팅 방법
SK500322019A3 (sk) * 2019-07-11 2021-01-13 STATON, s. r. o. Zdroj plazmy využívajúci katódový vákuový oblúk s vylepšenou konfiguráciou magnetického poľa a spôsob jeho činnosti
CN119811976B (zh) * 2025-03-17 2025-06-27 温州职业技术学院 直管磁过滤径向电弧源

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
JPH04236770A (ja) * 1991-01-17 1992-08-25 Kobe Steel Ltd 真空アーク蒸着のアークスポットの制御方法及び蒸発源
CA2065581C (fr) * 1991-04-22 2002-03-12 Andal Corp. Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
DE4223592C2 (de) * 1992-06-24 2001-05-17 Leybold Ag Lichtbogen-Verdampfungsvorrichtung
US5380421A (en) * 1992-11-04 1995-01-10 Gorokhovsky; Vladimir I. Vacuum-arc plasma source
US5435900A (en) * 1992-11-04 1995-07-25 Gorokhovsky; Vladimir I. Apparatus for application of coatings in vacuum
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
KR100230279B1 (ko) * 1997-03-31 1999-11-15 윤종용 음극 아크 방전을 이용한 박막 증착장치
DE19739527C2 (de) * 1997-09-09 2003-10-16 Rossendorf Forschzent Vakuumbogen-Plasmaquelle mit Magnet-Partikelfilter
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2382118C1 (ru) * 2009-01-28 2010-02-20 Открытое акционерное общество "Национальный институт авиационных технологий" Вакуумно-дуговой источник плазмы

Also Published As

Publication number Publication date
GB2368597B (en) 2003-08-27
DE10084452B3 (de) 2016-03-17
WO2000062327A3 (fr) 2001-01-18
AU3950900A (en) 2000-11-14
JP4689843B2 (ja) 2011-05-25
AU762277B2 (en) 2003-06-19
GB0125844D0 (en) 2001-12-19
CA2268659C (fr) 2008-12-30
JP2002541335A (ja) 2002-12-03
DE10084452T1 (de) 2002-06-20
WO2000062327A2 (fr) 2000-10-19
GB2368597A (en) 2002-05-08

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