CA2305070A1 - Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible - Google Patents

Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible Download PDF

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Publication number
CA2305070A1
CA2305070A1 CA 2305070 CA2305070A CA2305070A1 CA 2305070 A1 CA2305070 A1 CA 2305070A1 CA 2305070 CA2305070 CA 2305070 CA 2305070 A CA2305070 A CA 2305070A CA 2305070 A1 CA2305070 A1 CA 2305070A1
Authority
CA
Canada
Prior art keywords
recording
slits
diffraction
gratings
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA 2305070
Other languages
English (en)
Other versions
CA2305070C (fr
Inventor
Francois Trepanier
Pierre Langlois
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institut National dOptique
Original Assignee
Institut National dOptique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA002272008A external-priority patent/CA2272008A1/fr
Application filed by Institut National dOptique filed Critical Institut National dOptique
Priority to CA 2305070 priority Critical patent/CA2305070C/fr
Publication of CA2305070A1 publication Critical patent/CA2305070A1/fr
Application granted granted Critical
Publication of CA2305070C publication Critical patent/CA2305070C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
CA 2305070 1999-05-11 2000-04-13 Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible Expired - Lifetime CA2305070C (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA 2305070 CA2305070C (fr) 1999-05-11 2000-04-13 Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CA002272008A CA2272008A1 (fr) 1999-05-11 1999-05-11 Dispositif et methode d'enregistrement de franges d'interference dans un support photosensible
CA2,272,008 1999-05-11
CA 2305070 CA2305070C (fr) 1999-05-11 2000-04-13 Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible

Publications (2)

Publication Number Publication Date
CA2305070A1 true CA2305070A1 (fr) 2000-11-11
CA2305070C CA2305070C (fr) 2006-06-13

Family

ID=25680958

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2305070 Expired - Lifetime CA2305070C (fr) 1999-05-11 2000-04-13 Dispositif et methode d'enregistrement de motifs d'interference dans un milieu photosensible

Country Status (1)

Country Link
CA (1) CA2305070C (fr)

Also Published As

Publication number Publication date
CA2305070C (fr) 2006-06-13

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Effective date: 20200413