CA3030941C - Plaque de cathode de depot electrolytique de metal et son procede de production - Google Patents

Plaque de cathode de depot electrolytique de metal et son procede de production Download PDF

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Publication number
CA3030941C
CA3030941C CA3030941A CA3030941A CA3030941C CA 3030941 C CA3030941 C CA 3030941C CA 3030941 A CA3030941 A CA 3030941A CA 3030941 A CA3030941 A CA 3030941A CA 3030941 C CA3030941 C CA 3030941C
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CA
Canada
Prior art keywords
conductive film
cathode plate
nickel
protrusion
metal plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA3030941A
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English (en)
Other versions
CA3030941A1 (fr
Inventor
Hiroto Watanabe
Itsumi MATSUOKA
Yusuke SENBA
Hiroshi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Publication of CA3030941A1 publication Critical patent/CA3030941A1/fr
Application granted granted Critical
Publication of CA3030941C publication Critical patent/CA3030941C/fr
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/06—Operating or servicing
    • C25C7/08—Separating of deposited metals from the cathode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

Cette invention concerne une plaque de cathode de dépôt électrolytique de métal, dont le film non conducteur n'est pas susceptible aux défaillances et qui peut être utilisée de façon répétée, ainsi que son procédé de production. Ladite plaque de cathode (1) comprend une plaque métallique (2) sur laquelle sont formées de multiples protubérances en forme de disque (2a), et un film non conducteur (3) formé sur des zones planes (2b) sans protubérance (2a) de la plaque métallique (2). L'épaisseur de film minimale Y du film non conducteur (3) à des positions entre les centres de protubérances adjacentes (2a) est supérieure ou égale à la hauteur X des protubérances (2a). De préférence, la hauteur X des protubérances (2a) va de 50 à 1000 µm.
CA3030941A 2016-07-21 2017-07-10 Plaque de cathode de depot electrolytique de metal et son procede de production Active CA3030941C (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016143531A JP6724624B2 (ja) 2016-07-21 2016-07-21 金属電着用陰極板及びその製造方法
JP2016-143531 2016-07-21
PCT/JP2017/025093 WO2018016362A1 (fr) 2016-07-21 2017-07-10 Plaque de cathode de dépôt électrolytique de métal et son procédé de production

Publications (2)

Publication Number Publication Date
CA3030941A1 CA3030941A1 (fr) 2018-01-25
CA3030941C true CA3030941C (fr) 2020-12-15

Family

ID=60992989

Family Applications (1)

Application Number Title Priority Date Filing Date
CA3030941A Active CA3030941C (fr) 2016-07-21 2017-07-10 Plaque de cathode de depot electrolytique de metal et son procede de production

Country Status (6)

Country Link
US (1) US20190233960A1 (fr)
EP (1) EP3489395A4 (fr)
JP (1) JP6724624B2 (fr)
CN (1) CN109415832A (fr)
CA (1) CA3030941C (fr)
WO (1) WO2018016362A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6638589B2 (ja) * 2016-07-21 2020-01-29 住友金属鉱山株式会社 金属電着用陰極板及びその製造方法
WO2019146474A1 (fr) 2018-01-29 2019-08-01 コニカミノルタ株式会社 Composition de résine pour moulage 3d, et article moulé en 3d ainsi que procédé de fabrication de celui-ci
KR102017567B1 (ko) * 2018-11-27 2019-09-03 주식회사 웨스코일렉트로드 전해 제련용 전극 조립체
JP7188219B2 (ja) * 2019-03-25 2022-12-13 住友金属鉱山株式会社 金属電着用の陰極板

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS46919Y1 (fr) * 1966-04-04 1971-01-13
US4040915A (en) * 1976-06-15 1977-08-09 The International Nickel Company, Inc. Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits
JPS6038678Y2 (ja) * 1981-05-15 1985-11-19 住友金属鉱山株式会社 金属電着用母板
JPS6288754U (fr) * 1985-11-25 1987-06-06
JPH10317197A (ja) * 1997-05-14 1998-12-02 Sumitomo Metal Mining Co Ltd メッキ用電気ニッケル、その製造用陰極板及び製造方法
JP2008106292A (ja) * 2006-10-24 2008-05-08 Sumitomo Metal Mining Co Ltd 特殊形状電気ニッケルの電解採取用カソードの製造方法
CN102149854A (zh) * 2008-09-09 2011-08-10 斯提奥摩有限公司 阴极和阴极形成方法

Also Published As

Publication number Publication date
US20190233960A1 (en) 2019-08-01
EP3489395A4 (fr) 2020-04-08
CA3030941A1 (fr) 2018-01-25
EP3489395A1 (fr) 2019-05-29
JP2018012865A (ja) 2018-01-25
WO2018016362A1 (fr) 2018-01-25
JP6724624B2 (ja) 2020-07-15
CN109415832A (zh) 2019-03-01

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