CH521607A - Photopolymerisierbarer Lack mit erhöhter Lichtempfindlichkeit - Google Patents

Photopolymerisierbarer Lack mit erhöhter Lichtempfindlichkeit

Info

Publication number
CH521607A
CH521607A CH1702469A CH1702469A CH521607A CH 521607 A CH521607 A CH 521607A CH 1702469 A CH1702469 A CH 1702469A CH 1702469 A CH1702469 A CH 1702469A CH 521607 A CH521607 A CH 521607A
Authority
CH
Switzerland
Prior art keywords
light
increased sensitivity
photopolymerizable
varnish
photopolymerizable varnish
Prior art date
Application number
CH1702469A
Other languages
English (en)
Inventor
Pietsch Herward Dr Prof
Charlotte Dr Rabe
Baumbach Wolfgang
Kuhnert Lothar
Original Assignee
Wolfen Filmfab Veb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wolfen Filmfab Veb filed Critical Wolfen Filmfab Veb
Publication of CH521607A publication Critical patent/CH521607A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH1702469A 1969-04-10 1969-11-17 Photopolymerisierbarer Lack mit erhöhter Lichtempfindlichkeit CH521607A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13913469 1969-04-10

Publications (1)

Publication Number Publication Date
CH521607A true CH521607A (de) 1972-04-15

Family

ID=5481102

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1702469A CH521607A (de) 1969-04-10 1969-11-17 Photopolymerisierbarer Lack mit erhöhter Lichtempfindlichkeit

Country Status (6)

Country Link
AT (1) AT303514B (de)
BE (1) BE745070R (de)
BG (1) BG23010A3 (de)
CH (1) CH521607A (de)
DE (1) DE1952878A1 (de)
FR (1) FR2038356A6 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU6751896A (en) * 1996-09-09 1998-03-26 Destiny Oil Anstalt Method of selective chemisorption of reactive-active gases

Also Published As

Publication number Publication date
DE1952878A1 (de) 1970-10-22
AT303514B (de) 1972-10-15
BE745070R (nl) 1970-07-01
FR2038356A6 (en) 1971-01-08
BG23010A3 (bg) 1977-05-20

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Legal Events

Date Code Title Description
PL Patent ceased