CH627791A5 - Process for covering the surface of an electrically conductive article, plant for making use of the process and application of the process - Google Patents
Process for covering the surface of an electrically conductive article, plant for making use of the process and application of the process Download PDFInfo
- Publication number
- CH627791A5 CH627791A5 CH602678A CH602678A CH627791A5 CH 627791 A5 CH627791 A5 CH 627791A5 CH 602678 A CH602678 A CH 602678A CH 602678 A CH602678 A CH 602678A CH 627791 A5 CH627791 A5 CH 627791A5
- Authority
- CH
- Switzerland
- Prior art keywords
- enclosure
- coating
- cathodes
- gas
- covered
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 34
- 238000000576 coating method Methods 0.000 claims description 35
- 239000011248 coating agent Substances 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 20
- 229910052804 chromium Inorganic materials 0.000 claims description 19
- 239000011651 chromium Substances 0.000 claims description 19
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 18
- 229910000831 Steel Inorganic materials 0.000 claims description 14
- 239000010959 steel Substances 0.000 claims description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 12
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 11
- 229910003470 tongbaite Inorganic materials 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 8
- 239000000788 chromium alloy Substances 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 230000002159 abnormal effect Effects 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 5
- 238000010849 ion bombardment Methods 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 150000001722 carbon compounds Chemical class 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 2
- 150000001768 cations Chemical class 0.000 claims 1
- 230000000295 complement effect Effects 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 150000002739 metals Chemical group 0.000 claims 1
- 230000035939 shock Effects 0.000 claims 1
- 150000003568 thioethers Chemical class 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 3
- 229910000604 Ferrochrome Inorganic materials 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- -1 methane Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR777717439A FR2393854A1 (fr) | 1977-06-07 | 1977-06-07 | Procede de recouvrement de la surface d'une piece conductrice de l'electricite |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH627791A5 true CH627791A5 (en) | 1982-01-29 |
Family
ID=9191791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH602678A CH627791A5 (en) | 1977-06-07 | 1978-06-01 | Process for covering the surface of an electrically conductive article, plant for making use of the process and application of the process |
Country Status (11)
| Country | Link |
|---|---|
| JP (1) | JPS544246A (de) |
| AT (1) | AT364217B (de) |
| BE (1) | BE867913A (de) |
| CH (1) | CH627791A5 (de) |
| DE (1) | DE2820183C3 (de) |
| FR (1) | FR2393854A1 (de) |
| GB (1) | GB1574677A (de) |
| IT (1) | IT1109053B (de) |
| NL (1) | NL7806125A (de) |
| SE (1) | SE7806503L (de) |
| ZA (1) | ZA782794B (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0106638A1 (de) * | 1982-10-12 | 1984-04-25 | National Research Development Corporation | Verfahren und Vorrichtung zum Züchten von Material mittels einer Glimmentladung |
| US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
| DE3606529A1 (de) * | 1986-02-28 | 1987-09-03 | Glyco Metall Werke | Verfahren zur herstellung von schichtwerkstoff oder schichtwerkstuecken durch aufdampfen mindestens eines metallischen werkstoffes auf ein metallisches substrat |
| FI85793C (fi) * | 1990-05-18 | 1992-05-25 | Plasmapiiri Oy | Foerfarande och anordning foer framstaellning av kretskort. |
| IL115713A0 (en) * | 1995-10-22 | 1996-01-31 | Ipmms Dev & Production Ltd | Sputter deposit method and apparatus |
| DE10159907B4 (de) * | 2001-12-06 | 2008-04-24 | Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co. | Beschichtungsverfahren |
-
1977
- 1977-06-07 FR FR777717439A patent/FR2393854A1/fr active Granted
-
1978
- 1978-05-05 GB GB18044/78A patent/GB1574677A/en not_active Expired
- 1978-05-09 DE DE2820183A patent/DE2820183C3/de not_active Expired
- 1978-05-11 JP JP5612478A patent/JPS544246A/ja active Granted
- 1978-05-16 ZA ZA00782794A patent/ZA782794B/xx unknown
- 1978-05-18 IT IT68139/78A patent/IT1109053B/it active
- 1978-06-01 CH CH602678A patent/CH627791A5/fr not_active IP Right Cessation
- 1978-06-02 SE SE7806503A patent/SE7806503L/xx unknown
- 1978-06-06 NL NL7806125A patent/NL7806125A/xx not_active Application Discontinuation
- 1978-06-07 BE BE188403A patent/BE867913A/xx not_active IP Right Cessation
- 1978-06-07 AT AT0413078A patent/AT364217B/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BE867913A (fr) | 1978-12-07 |
| DE2820183B2 (de) | 1980-11-20 |
| SE7806503L (sv) | 1978-12-08 |
| FR2393854B1 (de) | 1980-01-18 |
| IT7868139A0 (it) | 1978-05-18 |
| ZA782794B (en) | 1979-05-30 |
| GB1574677A (en) | 1980-09-10 |
| DE2820183C3 (de) | 1981-09-10 |
| IT1109053B (it) | 1985-12-16 |
| NL7806125A (nl) | 1978-12-11 |
| JPS544246A (en) | 1979-01-12 |
| JPS5615780B2 (de) | 1981-04-13 |
| DE2820183A1 (de) | 1978-12-14 |
| ATA413078A (de) | 1981-02-15 |
| FR2393854A1 (fr) | 1979-01-05 |
| AT364217B (de) | 1981-10-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |