CH689595A5 - Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum. - Google Patents
Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum. Download PDFInfo
- Publication number
- CH689595A5 CH689595A5 CH03356/94A CH335694A CH689595A5 CH 689595 A5 CH689595 A5 CH 689595A5 CH 03356/94 A CH03356/94 A CH 03356/94A CH 335694 A CH335694 A CH 335694A CH 689595 A5 CH689595 A5 CH 689595A5
- Authority
- CH
- Switzerland
- Prior art keywords
- lenses
- coating
- transport
- electrode
- transport path
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 99
- 238000000576 coating method Methods 0.000 title claims description 69
- 239000011248 coating agent Substances 0.000 title claims description 65
- 239000010410 layer Substances 0.000 title claims description 50
- 230000003287 optical effect Effects 0.000 title claims description 18
- 239000011241 protective layer Substances 0.000 title claims description 16
- 230000008569 process Effects 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 16
- 230000005284 excitation Effects 0.000 claims description 7
- 238000010924 continuous production Methods 0.000 claims description 6
- 239000002356 single layer Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 238000001771 vacuum deposition Methods 0.000 claims 2
- 229910017464 nitrogen compound Inorganic materials 0.000 claims 1
- 150000002830 nitrogen compounds Chemical class 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 31
- 238000004519 manufacturing process Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 239000004033 plastic Substances 0.000 description 8
- 229920003023 plastic Polymers 0.000 description 8
- 239000000126 substance Substances 0.000 description 5
- 229910052681 coesite Inorganic materials 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 229910052682 stishovite Inorganic materials 0.000 description 4
- 229910052905 tridymite Inorganic materials 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910020286 SiOxNy Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- -1 diallyl diethylene glycol carbonate Chemical compound 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000012432 intermediate storage Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000013842 nitrous oxide Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000007591 painting process Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4342463A DE4342463C2 (de) | 1993-12-13 | 1993-12-13 | Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH689595A5 true CH689595A5 (de) | 1999-06-30 |
Family
ID=6504874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH03356/94A CH689595A5 (de) | 1993-12-13 | 1994-11-09 | Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum. |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPH07281006A (ja) |
| CH (1) | CH689595A5 (ja) |
| DE (1) | DE4342463C2 (ja) |
| FR (1) | FR2713668B1 (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19523444A1 (de) * | 1995-06-28 | 1997-01-02 | Antec Angewandte Neue Technolo | Verfahren zur Beschichtung von Kunststoffen oder ähnlichen weichen Werkstoffen |
| DE19858849A1 (de) * | 1998-12-19 | 2000-06-29 | Wernicke & Co Gmbh | Verfahren und Vorrichtung zum Herstellen von Brillengläsern aus Kunststoff |
| US6881269B2 (en) * | 2000-08-17 | 2005-04-19 | Novartis Ag | Lens plasma coating system |
| DE10202311B4 (de) * | 2002-01-23 | 2007-01-04 | Schott Ag | Vorrichtung und Verfahren zur Plasmabehandlung von dielektrischen Körpern |
| US8318245B2 (en) | 2007-02-23 | 2012-11-27 | Essilor International (Compagnie Generale D'optique) | Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties |
| FR2913116B1 (fr) * | 2007-02-23 | 2009-08-28 | Essilor Int | Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees |
| DE102014104366A1 (de) * | 2014-03-28 | 2015-10-01 | Von Ardenne Gmbh | Vorrichtung zum Behandeln von Substraten |
| JP7452143B2 (ja) * | 2020-03-19 | 2024-03-19 | セイコーエプソン株式会社 | マルチレンズアレイ、光源装置およびプロジェクター |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2900724C2 (de) * | 1979-01-10 | 1986-05-28 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Beschichtung von Substraten im Vakuum |
| JPS58169980A (ja) * | 1982-03-19 | 1983-10-06 | Matsushita Electric Ind Co Ltd | 光起電力素子の製造方法 |
| JPH0622205B2 (ja) * | 1986-03-03 | 1994-03-23 | 日本真空技術株式会社 | プラズマｃｖｄ装置 |
| DE3632970A1 (de) * | 1986-09-27 | 1988-03-31 | Gewerk Eisenhuette Westfalia | Mehrteilige kettentrommel fuer kettenkratzfoerderer, insbesondere fuer mittel- oder doppelmittelkettenkratzfoerderer mit durchgehender antriebswelle |
| DE4128547A1 (de) * | 1991-08-28 | 1993-03-04 | Leybold Ag | Verfahren und vorrichtung fuer die herstellung einer entspiegelungsschicht auf linsen |
| DE4203631C2 (de) * | 1992-02-08 | 2000-06-08 | Leybold Ag | Vorrichtung für die Behandlung einer Oxidschicht |
-
1993
- 1993-12-13 DE DE4342463A patent/DE4342463C2/de not_active Expired - Fee Related
-
1994
- 1994-11-09 CH CH03356/94A patent/CH689595A5/de not_active IP Right Cessation
- 1994-12-12 JP JP6308011A patent/JPH07281006A/ja active Pending
- 1994-12-13 FR FR9414974A patent/FR2713668B1/fr not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FR2713668A1 (fr) | 1995-06-16 |
| FR2713668B1 (fr) | 1999-04-02 |
| DE4342463A1 (de) | 1995-06-14 |
| JPH07281006A (ja) | 1995-10-27 |
| DE4342463C2 (de) | 1997-03-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |