CN101474772A - 衬底保持设备以及抛光装置 - Google Patents

衬底保持设备以及抛光装置 Download PDF

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Publication number
CN101474772A
CN101474772A CNA200910006163XA CN200910006163A CN101474772A CN 101474772 A CN101474772 A CN 101474772A CN A200910006163X A CNA200910006163X A CN A200910006163XA CN 200910006163 A CN200910006163 A CN 200910006163A CN 101474772 A CN101474772 A CN 101474772A
Authority
CN
China
Prior art keywords
elastic membrane
substrate
membrane
circumferential
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA200910006163XA
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English (en)
Chinese (zh)
Inventor
户川哲二
吉田博
锅谷治
福岛诚
深谷孝一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of CN101474772A publication Critical patent/CN101474772A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CNA200910006163XA 2004-12-10 2005-12-06 衬底保持设备以及抛光装置 Pending CN101474772A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004358859A JP5112614B2 (ja) 2004-12-10 2004-12-10 基板保持装置および研磨装置
JP2004358859 2004-12-10

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB200580042189XA Division CN100509287C (zh) 2004-12-10 2005-12-06 衬底保持设备以及抛光装置

Publications (1)

Publication Number Publication Date
CN101474772A true CN101474772A (zh) 2009-07-08

Family

ID=36578042

Family Applications (2)

Application Number Title Priority Date Filing Date
CNA200910006163XA Pending CN101474772A (zh) 2004-12-10 2005-12-06 衬底保持设备以及抛光装置
CNB200580042189XA Expired - Lifetime CN100509287C (zh) 2004-12-10 2005-12-06 衬底保持设备以及抛光装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB200580042189XA Expired - Lifetime CN100509287C (zh) 2004-12-10 2005-12-06 衬底保持设备以及抛光装置

Country Status (8)

Country Link
US (1) US7635292B2 (2)
EP (1) EP1833640B1 (2)
JP (1) JP5112614B2 (2)
KR (1) KR20070091186A (2)
CN (2) CN101474772A (2)
DE (1) DE602005016602D1 (2)
TW (1) TWI430388B (2)
WO (1) WO2006062232A1 (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110520971A (zh) * 2017-04-13 2019-11-29 三菱电线工业株式会社 Cmp装置的晶圆保持用的弹性膜
CN110509179A (zh) * 2018-05-21 2019-11-29 株式会社荏原制作所 基板保持装置、基板研磨装置、弹性构件以及基板保持装置的制造方法

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TWI323017B (en) 2003-02-10 2010-04-01 Ebara Corp Substrate holding apparatus and polishing apparatus
JP4814677B2 (ja) * 2006-03-31 2011-11-16 株式会社荏原製作所 基板保持装置および研磨装置
US7575504B2 (en) * 2006-11-22 2009-08-18 Applied Materials, Inc. Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly
US7727055B2 (en) * 2006-11-22 2010-06-01 Applied Materials, Inc. Flexible membrane for carrier head
JP5464820B2 (ja) * 2007-10-29 2014-04-09 株式会社荏原製作所 研磨装置
JP5042778B2 (ja) * 2007-10-31 2012-10-03 信越半導体株式会社 ワーク研磨用ヘッド及びこの研磨ヘッドを備えた研磨装置
US20100210192A1 (en) * 2007-11-20 2010-08-19 Shin-Etsu Handotai Co., Ltd. Polishing head and polishing apparatus
USD634719S1 (en) 2009-08-27 2011-03-22 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD633452S1 (en) 2009-08-27 2011-03-01 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD711330S1 (en) 2010-12-28 2014-08-19 Ebara Corporation Elastic membrane for semiconductor wafer polishing
US20120264359A1 (en) * 2011-04-13 2012-10-18 Nanya Technology Corporation Membrane
KR101239377B1 (ko) * 2011-07-18 2013-03-05 주식회사 케이씨텍 캐리어 헤드
JP5635482B2 (ja) 2011-11-30 2014-12-03 株式会社荏原製作所 弾性膜
KR101223010B1 (ko) 2012-06-29 2013-01-17 주식회사 케이씨텍 화학 기계적 연마 장치의 캐리어 헤드용 멤브레인
US10532441B2 (en) 2012-11-30 2020-01-14 Applied Materials, Inc. Three-zone carrier head and flexible membrane
KR101410358B1 (ko) * 2013-02-25 2014-06-20 삼성전자주식회사 화학적 기계적 연마장치용 멤브레인 및 화학적 기계적 연마장치용 연마헤드
TWI658899B (zh) * 2014-03-31 2019-05-11 Ebara Corporation 研磨裝置及研磨方法
JP6336893B2 (ja) * 2014-11-11 2018-06-06 株式会社荏原製作所 研磨装置
KR102173323B1 (ko) 2014-06-23 2020-11-04 삼성전자주식회사 캐리어 헤드, 화학적 기계식 연마 장치 및 웨이퍼 연마 방법
USD918161S1 (en) 2017-12-19 2021-05-04 Ebara Corporation Elastic membrane
SG10202008012WA (en) 2019-08-29 2021-03-30 Ebara Corp Elastic membrane and substrate holding apparatus
JP7344048B2 (ja) * 2019-08-29 2023-09-13 株式会社荏原製作所 弾性膜、および基板保持装置
JP7536601B2 (ja) * 2020-11-04 2024-08-20 株式会社荏原製作所 研磨ヘッドおよび研磨装置
JP7642086B2 (ja) * 2021-03-04 2025-03-07 アプライド マテリアルズ インコーポレイテッド 変動的なエッジ制御を含む研磨キャリアヘッド
JP7762522B2 (ja) 2021-09-01 2025-10-30 株式会社荏原製作所 弾性膜および弾性膜の製造方法
JP7851849B2 (ja) * 2021-12-23 2026-04-27 グローバルウェーハズ カンパニー リミテッド 凹部およびキャップを有する研磨ヘッドアセンブリ
CN115673910B (zh) * 2023-01-03 2023-03-21 北京特思迪半导体设备有限公司 一种液涨控制的压盘及其用于基材抛光的面型控制方法
CN117484382A (zh) * 2023-11-14 2024-02-02 北京子牛亦东科技有限公司 一种用于化学机械研磨设备的研磨头的隔膜

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US5624299A (en) * 1993-12-27 1997-04-29 Applied Materials, Inc. Chemical mechanical polishing apparatus with improved carrier and method of use
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US6036587A (en) 1996-10-10 2000-03-14 Applied Materials, Inc. Carrier head with layer of conformable material for a chemical mechanical polishing system
US6183354B1 (en) * 1996-11-08 2001-02-06 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
US6056632A (en) 1997-02-13 2000-05-02 Speedfam-Ipec Corp. Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head
US5851140A (en) 1997-02-13 1998-12-22 Integrated Process Equipment Corp. Semiconductor wafer polishing apparatus with a flexible carrier plate
US5964653A (en) 1997-07-11 1999-10-12 Applied Materials, Inc. Carrier head with a flexible membrane for a chemical mechanical polishing system
US6080050A (en) 1997-12-31 2000-06-27 Applied Materials, Inc. Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
US6106379A (en) 1998-05-12 2000-08-22 Speedfam-Ipec Corporation Semiconductor wafer carrier with automatic ring extension
US5985094A (en) 1998-05-12 1999-11-16 Speedfam-Ipec Corporation Semiconductor wafer carrier
US6210255B1 (en) * 1998-09-08 2001-04-03 Applied Materials, Inc. Carrier head for chemical mechanical polishing a substrate
US6159079A (en) 1998-09-08 2000-12-12 Applied Materials, Inc. Carrier head for chemical mechanical polishing a substrate
US6277014B1 (en) 1998-10-09 2001-08-21 Applied Materials, Inc. Carrier head with a flexible membrane for chemical mechanical polishing
US6244942B1 (en) 1998-10-09 2001-06-12 Applied Materials, Inc. Carrier head with a flexible membrane and adjustable edge pressure
US6132298A (en) 1998-11-25 2000-10-17 Applied Materials, Inc. Carrier head with edge control for chemical mechanical polishing
JP2000127026A (ja) 1998-10-26 2000-05-09 Speedfam-Ipec Co Ltd ウエハ研磨装置
US6165058A (en) * 1998-12-09 2000-12-26 Applied Materials, Inc. Carrier head for chemical mechanical polishing
US6422927B1 (en) * 1998-12-30 2002-07-23 Applied Materials, Inc. Carrier head with controllable pressure and loading area for chemical mechanical polishing
US6162116A (en) 1999-01-23 2000-12-19 Applied Materials, Inc. Carrier head for chemical mechanical polishing
US6358121B1 (en) * 1999-07-09 2002-03-19 Applied Materials, Inc. Carrier head with a flexible membrane and an edge load ring
JP2001260011A (ja) * 2000-03-15 2001-09-25 Mitsubishi Materials Corp ウェーハ研磨用ヘッド及びこれを用いた研磨装置
KR20010030213A (ko) * 1999-09-02 2001-04-16 아끼모토 유미 연마 헤드, 이것을 이용한 연마 장치, 및 연마 상태 검출방법
US6722965B2 (en) * 2000-07-11 2004-04-20 Applied Materials Inc. Carrier head with flexible membranes to provide controllable pressure and loading area
US6857945B1 (en) * 2000-07-25 2005-02-22 Applied Materials, Inc. Multi-chamber carrier head with a flexible membrane
US20040005842A1 (en) * 2000-07-25 2004-01-08 Chen Hung Chih Carrier head with flexible membrane
US6676497B1 (en) 2000-09-08 2004-01-13 Applied Materials Inc. Vibration damping in a chemical mechanical polishing system
JP3770790B2 (ja) * 2000-11-15 2006-04-26 シャープ株式会社 アッシング方法
JP3520916B2 (ja) 2000-12-25 2004-04-19 株式会社東京精密 ウェーハ研磨装置
TWI323017B (en) * 2003-02-10 2010-04-01 Ebara Corp Substrate holding apparatus and polishing apparatus
JP4583729B2 (ja) * 2003-02-10 2010-11-17 株式会社荏原製作所 基板保持装置、研磨装置、及び該基板保持装置に用いられる弾性部材
US7033252B2 (en) * 2004-03-05 2006-04-25 Strasbaugh Wafer carrier with pressurized membrane and retaining ring actuator
US7063604B2 (en) * 2004-03-05 2006-06-20 Strasbaugh Independent edge control for CMP carriers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110520971A (zh) * 2017-04-13 2019-11-29 三菱电线工业株式会社 Cmp装置的晶圆保持用的弹性膜
CN110520971B (zh) * 2017-04-13 2023-08-25 三菱电线工业株式会社 Cmp装置的晶圆保持用的弹性膜
CN110509179A (zh) * 2018-05-21 2019-11-29 株式会社荏原制作所 基板保持装置、基板研磨装置、弹性构件以及基板保持装置的制造方法
CN110509179B (zh) * 2018-05-21 2023-03-10 株式会社荏原制作所 基板保持装置、基板研磨装置、弹性构件以及基板保持装置的制造方法

Also Published As

Publication number Publication date
TWI430388B (zh) 2014-03-11
KR20070091186A (ko) 2007-09-07
DE602005016602D1 (de) 2009-10-22
JP5112614B2 (ja) 2013-01-09
CN100509287C (zh) 2009-07-08
EP1833640B1 (en) 2009-09-09
EP1833640A4 (en) 2008-02-06
CN101072658A (zh) 2007-11-14
US20070293129A1 (en) 2007-12-20
EP1833640A1 (en) 2007-09-19
JP2006159392A (ja) 2006-06-22
WO2006062232A1 (en) 2006-06-15
TW200625510A (en) 2006-07-16
US7635292B2 (en) 2009-12-22

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SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
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Application publication date: 20090708