CN101545874B - 用于粒子光学设备的环境室 - Google Patents

用于粒子光学设备的环境室 Download PDF

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Publication number
CN101545874B
CN101545874B CN2009101302811A CN200910130281A CN101545874B CN 101545874 B CN101545874 B CN 101545874B CN 2009101302811 A CN2009101302811 A CN 2009101302811A CN 200910130281 A CN200910130281 A CN 200910130281A CN 101545874 B CN101545874 B CN 101545874B
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CN
China
Prior art keywords
sample
environmental chamber
transparent
secondary radiation
chamber
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Expired - Fee Related
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CN2009101302811A
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English (en)
Chinese (zh)
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CN101545874A (zh
Inventor
B·布伊塞
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FEI Co
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FEI Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/023—Means for mechanically adjusting components not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN2009101302811A 2008-03-28 2009-03-30 用于粒子光学设备的环境室 Expired - Fee Related CN101545874B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08153482A EP2105944A1 (fr) 2008-03-28 2008-03-28 "Cellule environnementale" pour appareil optique à particules chargées
EP08153482.8 2008-03-28

Publications (2)

Publication Number Publication Date
CN101545874A CN101545874A (zh) 2009-09-30
CN101545874B true CN101545874B (zh) 2013-09-25

Family

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Family Applications (1)

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CN2009101302811A Expired - Fee Related CN101545874B (zh) 2008-03-28 2009-03-30 用于粒子光学设备的环境室

Country Status (4)

Country Link
US (2) US8093558B2 (fr)
EP (2) EP2105944A1 (fr)
JP (1) JP5634030B2 (fr)
CN (1) CN101545874B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system

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DE102009020663A1 (de) 2009-05-11 2010-11-25 Carl Zeiss Ag Mikroskopie eines Objektes mit einer Abfolge von optischer Mikroskopie und Teilchenstrahlmikroskopie
EP2430432A4 (fr) * 2009-05-15 2014-07-23 Fei Co Microscope électronique avec détecteur(s) intégré(s)
US20110006205A1 (en) * 2009-07-12 2011-01-13 Raymond Browning Ambient pressure photoelectron microscope
DE102009036701A1 (de) 2009-08-07 2011-03-03 Carl Zeiss Nts Gmbh Teilchenstrahlsystem und Untersuchungsverfahren hierzu
DE112010005188B4 (de) * 2010-01-27 2016-04-07 Hitachi High-Technologies Corp. Vorrichtung zum Bestrahlen mit geladenen Teilchen
JP5320418B2 (ja) * 2011-01-31 2013-10-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9159530B2 (en) * 2011-03-04 2015-10-13 Hitachi High-Technologies Corporation Electron microscope sample holder and sample observation method
DE102011005732B4 (de) * 2011-03-17 2013-08-22 Carl Zeiss Microscopy Gmbh Einrichtung zur Röntgenspektroskopie
JP5699023B2 (ja) 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8624199B2 (en) * 2011-10-28 2014-01-07 Fei Company Sample block holder
EP2631929A1 (fr) 2012-02-27 2013-08-28 FEI Company Ensemble de support pour coopérer avec une cellule environnementale et microscope électronique
CN102621107A (zh) * 2012-03-09 2012-08-01 中国科学院长春光学精密机械与物理研究所 一种用于航天材料空间环境辐照测量的原位光学测量装置
KR101914231B1 (ko) * 2012-05-30 2018-11-02 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
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JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
CN105103262B (zh) * 2013-04-12 2017-10-10 株式会社日立高新技术 带电粒子束装置以及过滤部件
JP5678134B2 (ja) * 2013-07-03 2015-02-25 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6364167B2 (ja) * 2013-09-30 2018-07-25 株式会社日立ハイテクノロジーズ 環境制御型荷電粒子観察システム
KR101524215B1 (ko) * 2013-11-29 2015-05-29 (주)코셈 전자현미경
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
US9478390B2 (en) * 2014-06-30 2016-10-25 Fei Company Integrated light optics and gas delivery in a charged particle lens
JP5923632B2 (ja) * 2015-02-06 2016-05-25 株式会社日立ハイテクノロジーズ 荷電粒子線装置
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TWI594288B (zh) * 2016-03-14 2017-08-01 台灣電鏡儀器股份有限公司 電子顯微鏡
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
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CN106783493B (zh) * 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
CN108155079B (zh) * 2017-12-04 2019-07-05 中国工程物理研究院激光聚变研究中心 用于扫描电子显微镜中的x射线靶组件
US10643817B2 (en) * 2018-03-22 2020-05-05 Flowview Tek Microscope
JP6796611B2 (ja) * 2018-03-26 2020-12-09 日本電子株式会社 液体試料を観察または分析する方法および電子顕微鏡
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CN112285141B (zh) * 2020-10-21 2022-09-13 中国核动力研究设计院 辐照后反应堆结构材料sem试样的制备方法及试样盒
JPWO2022264809A1 (fr) * 2021-06-14 2022-12-22
JP7585153B2 (ja) * 2021-07-13 2024-11-18 株式会社日立製作所 試料ホルダー及び電子顕微鏡

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Publication number Priority date Publication date Assignee Title
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system

Also Published As

Publication number Publication date
JP2009245944A (ja) 2009-10-22
US20090242763A1 (en) 2009-10-01
EP2105943A3 (fr) 2011-05-11
US8658974B2 (en) 2014-02-25
CN101545874A (zh) 2009-09-30
JP5634030B2 (ja) 2014-12-03
EP2105944A1 (fr) 2009-09-30
US8093558B2 (en) 2012-01-10
EP2105943A2 (fr) 2009-09-30
US20120091338A1 (en) 2012-04-19
EP2105943B1 (fr) 2014-05-07

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Granted publication date: 20130925