CN105353433B - 用于极紫外光刻的反射镜的基底 - Google Patents

用于极紫外光刻的反射镜的基底 Download PDF

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Publication number
CN105353433B
CN105353433B CN201510870929.4A CN201510870929A CN105353433B CN 105353433 B CN105353433 B CN 105353433B CN 201510870929 A CN201510870929 A CN 201510870929A CN 105353433 B CN105353433 B CN 105353433B
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China
Prior art keywords
base body
substrate
alloy
mirror
phase
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CN201510870929.4A
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English (en)
Chinese (zh)
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CN105353433A (zh
Inventor
C.埃克斯坦
H.马尔特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/12—Alloys based on aluminium with copper as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201510870929.4A 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底 Active CN105353433B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161434869P 2011-01-21 2011-01-21
DE102011002953.2 2011-01-21
DE201110002953 DE102011002953A1 (de) 2011-01-21 2011-01-21 Substrat für Spiegel für die EUV-Lithographie
US61/434,869 2011-01-21
CN201280006089.1A CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201280006089.1A Division CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Publications (2)

Publication Number Publication Date
CN105353433A CN105353433A (zh) 2016-02-24
CN105353433B true CN105353433B (zh) 2019-08-23

Family

ID=46510655

Family Applications (3)

Application Number Title Priority Date Filing Date
CN201510870929.4A Active CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201280006089.1A Active CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201280006089.1A Active CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Country Status (9)

Country Link
US (3) US20130301151A1 (2)
EP (2) EP3489374B1 (2)
JP (1) JP6023083B2 (2)
KR (1) KR102080180B1 (2)
CN (3) CN105353433B (2)
DE (1) DE102011002953A1 (2)
ES (1) ES2933686T3 (2)
PL (1) PL3489374T3 (2)
WO (1) WO2012098062A2 (2)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
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DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102013107192A1 (de) * 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
DE102013215541A1 (de) 2013-08-07 2015-02-12 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US12017264B2 (en) * 2016-03-16 2024-06-25 Toyo Aluminium Kabushiki Kaisha Aluminum foil for ultraviolet light reflecting materials and method for producing same
DE102016209359A1 (de) * 2016-05-31 2017-11-30 Carl Zeiss Smt Gmbh EUV-Kollektor
CA3099808C (en) 2018-05-09 2024-01-02 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Mirror support for a composite optical mirror and method for its production
KR102774704B1 (ko) * 2018-08-27 2025-02-27 마테리온 코포레이션 디스플레이 제작을 위한 uv 반사 미러
WO2021121986A1 (en) * 2019-12-19 2021-06-24 Asml Netherlands B.V. Enhanced thermal conductivity in vacuum
CN112662918A (zh) * 2020-12-02 2021-04-16 国网电力科学研究院武汉南瑞有限责任公司 Al2O3-TiC颗粒增强铝基复合材料及其制备方法
WO2025201772A1 (en) 2024-03-28 2025-10-02 Asml Netherlands B.V. Substrate and method for a high power laser system

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CN101088031A (zh) * 2004-12-23 2007-12-12 弗劳恩霍弗实用研究促进协会 用于euv光谱区域的热稳定的多层的反射镜

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EP0939467A2 (en) * 1998-02-26 1999-09-01 Nikon Corporation Mirror for an ultraviolet laser and method
JP2005259949A (ja) * 2004-03-11 2005-09-22 Nikon Corp ミラー及び照明光学装置
CN101088031A (zh) * 2004-12-23 2007-12-12 弗劳恩霍弗实用研究促进协会 用于euv光谱区域的热稳定的多层的反射镜
CN1719287A (zh) * 2005-06-29 2006-01-11 中国人民解放军国防科学技术大学 三明治式结构SiC基复合材料轻质反射镜及其制备方法

Also Published As

Publication number Publication date
EP2665839A2 (en) 2013-11-27
KR20140018245A (ko) 2014-02-12
JP2014506724A (ja) 2014-03-17
EP3489374A1 (en) 2019-05-29
WO2012098062A3 (en) 2012-10-18
CN103328664B (zh) 2016-01-20
US20130301151A1 (en) 2013-11-14
WO2012098062A2 (en) 2012-07-26
ES2933686T3 (es) 2023-02-13
CN110376670B (zh) 2022-03-22
KR102080180B1 (ko) 2020-02-24
JP6023083B2 (ja) 2016-11-09
US10935704B2 (en) 2021-03-02
EP3489374B1 (en) 2022-09-21
CN105353433A (zh) 2016-02-24
US20170160447A1 (en) 2017-06-08
DE102011002953A1 (de) 2012-07-26
PL3489374T3 (pl) 2023-01-30
EP2665839B1 (en) 2018-12-26
CN103328664A (zh) 2013-09-25
CN110376670A (zh) 2019-10-25
US20210149093A1 (en) 2021-05-20

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