CN105668573A - 用于制备硅烷的方法和系统 - Google Patents

用于制备硅烷的方法和系统 Download PDF

Info

Publication number: CN105668573A
Authority: CN; China
Prior art keywords: alkaline; alkali; earth metal; silicon; reactor
Prior art date: 2010-12-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

CN201610065439.1A

Other languages

English (en)

Chinese (zh)

Inventor

P·古普塔

H·F·厄尔克

A·格拉贝

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Star Company Limited

Original Assignee

Edison Sunpower Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2010-12-23

Filing date

2011-12-13

Publication date

2016-06-15

2010-12-23 Priority claimed from US12/978,209 external-priority patent/US8821825B2/en

2010-12-23 Priority claimed from US12/978,189 external-priority patent/US8388914B2/en

2011-12-13 Application filed by Edison Sunpower Corp filed Critical Edison Sunpower Corp

2016-06-15 Publication of CN105668573A publication Critical patent/CN105668573A/zh

Status Pending legal-status Critical Current

Links

BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 121
229910000077 silane Inorganic materials 0.000 title claims abstract description 116
229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 265
150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 181
239000003513 alkali Substances 0.000 claims abstract description 167
229910052739 hydrogen Inorganic materials 0.000 claims abstract description 151
239000001257 hydrogen Substances 0.000 claims abstract description 151
229910052736 halogen Inorganic materials 0.000 claims abstract description 110
150000002367 halogens Chemical class 0.000 claims abstract description 110
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 79
238000005868 electrolysis reaction Methods 0.000 claims abstract description 47
-1 halide salt Chemical class 0.000 claims description 235
229910052710 silicon Inorganic materials 0.000 claims description 193
239000010703 silicon Substances 0.000 claims description 193
239000007789 gas Substances 0.000 claims description 162
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 131
239000002904 solvent Substances 0.000 claims description 75
239000002585 base Substances 0.000 claims description 68
229910052751 metal Inorganic materials 0.000 claims description 68
239000002184 metal Substances 0.000 claims description 68
238000006243 chemical reaction Methods 0.000 claims description 67
239000000203 mixture Substances 0.000 claims description 54
230000005540 biological transmission Effects 0.000 claims description 45
150000004678 hydrides Chemical class 0.000 claims description 41
230000026030 halogenation Effects 0.000 claims description 35
238000005658 halogenation reaction Methods 0.000 claims description 35
239000012535 impurity Substances 0.000 claims description 24
229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 22
229920005591 polysilicon Polymers 0.000 claims description 21
150000003839 salts Chemical class 0.000 claims description 18
150000002431 hydrogen Chemical class 0.000 claims description 17
150000004756 silanes Chemical class 0.000 claims description 17
239000000376 reactant Substances 0.000 claims description 14
238000007323 disproportionation reaction Methods 0.000 claims description 10
230000005587 bubbling Effects 0.000 claims description 9
238000002360 preparation method Methods 0.000 claims description 5
238000000926 separation method Methods 0.000 claims description 5
238000003860 storage Methods 0.000 claims description 3
239000006185 dispersion Substances 0.000 claims 1
238000000034 method Methods 0.000 abstract description 116
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
150000001875 compounds Chemical class 0.000 description 16
239000000460 chlorine Substances 0.000 description 15
239000011734 sodium Substances 0.000 description 15
LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 14
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 14
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 13
229910052801 chlorine Inorganic materials 0.000 description 13
229910052708 sodium Inorganic materials 0.000 description 13
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 12
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 12
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 11
229910052799 carbon Inorganic materials 0.000 description 10
239000003054 catalyst Substances 0.000 description 10
238000001816 cooling Methods 0.000 description 9
229910001507 metal halide Inorganic materials 0.000 description 9
150000005309 metal halides Chemical class 0.000 description 9
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
229910052783 alkali metal Inorganic materials 0.000 description 8
150000001340 alkali metals Chemical class 0.000 description 8
239000000463 material Substances 0.000 description 8
229910001538 sodium tetrachloroaluminate Inorganic materials 0.000 description 8
239000011575 calcium Substances 0.000 description 7
SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 7
239000011780 sodium chloride Substances 0.000 description 7
UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 6
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 6
239000001110 calcium chloride Substances 0.000 description 6
229910001628 calcium chloride Inorganic materials 0.000 description 6
239000011737 fluorine Substances 0.000 description 6
229910052731 fluorine Inorganic materials 0.000 description 6
239000007788 liquid Substances 0.000 description 6
229910000029 sodium carbonate Inorganic materials 0.000 description 6
125000006850 spacer group Chemical group 0.000 description 6
238000005979 thermal decomposition reaction Methods 0.000 description 6
ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 5
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 5
239000002841 Lewis acid Substances 0.000 description 5
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 5
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
229910052788 barium Inorganic materials 0.000 description 5
DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 5
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
229910052794 bromium Inorganic materials 0.000 description 5
229910052791 calcium Inorganic materials 0.000 description 5
230000002596 correlated effect Effects 0.000 description 5
239000011630 iodine Substances 0.000 description 5
229910052740 iodine Inorganic materials 0.000 description 5
150000007517 lewis acids Chemical class 0.000 description 5
229910052744 lithium Inorganic materials 0.000 description 5
239000011777 magnesium Substances 0.000 description 5
229910052749 magnesium Inorganic materials 0.000 description 5
239000011591 potassium Substances 0.000 description 5
229910052700 potassium Inorganic materials 0.000 description 5
238000001556 precipitation Methods 0.000 description 5
239000007787 solid Substances 0.000 description 5
238000011109 contamination Methods 0.000 description 4
238000010586 diagram Methods 0.000 description 4
238000001704 evaporation Methods 0.000 description 4
VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical group CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 4
101100373011 Drosophila melanogaster wapl gene Proteins 0.000 description 3
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
229910000831 Steel Inorganic materials 0.000 description 3
229910045601 alloy Inorganic materials 0.000 description 3
239000000956 alloy Substances 0.000 description 3
230000008020 evaporation Effects 0.000 description 3
150000004820 halides Chemical class 0.000 description 3
210000004483 pasc Anatomy 0.000 description 3
230000008569 process Effects 0.000 description 3
FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 3
239000010959 steel Substances 0.000 description 3
238000003756 stirring Methods 0.000 description 3
239000006200 vaporizer Substances 0.000 description 3
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
240000003537 Ficus benghalensis Species 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
229910003910 SiCl4 Inorganic materials 0.000 description 2
KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
229910052796 boron Inorganic materials 0.000 description 2
239000006227 byproduct Substances 0.000 description 2
238000009833 condensation Methods 0.000 description 2
230000005494 condensation Effects 0.000 description 2
230000000875 corresponding effect Effects 0.000 description 2
238000009795 derivation Methods 0.000 description 2
238000004821 distillation Methods 0.000 description 2
239000012530 fluid Substances 0.000 description 2
239000008187 granular material Substances 0.000 description 2
239000003960 organic solvent Substances 0.000 description 2
239000011574 phosphorus Substances 0.000 description 2
229910052698 phosphorus Inorganic materials 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
239000000047 product Substances 0.000 description 2
238000010926 purge Methods 0.000 description 2
238000000746 purification Methods 0.000 description 2
239000010453 quartz Substances 0.000 description 2
230000009467 reduction Effects 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
239000002002 slurry Substances 0.000 description 2
230000001502 supplementing effect Effects 0.000 description 2
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
239000005052 trichlorosilane Substances 0.000 description 2
229910000975 Carbon steel Inorganic materials 0.000 description 1
229920002449 FKM Polymers 0.000 description 1
229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
229910000792 Monel Inorganic materials 0.000 description 1
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
229910003822 SiHCl3 Inorganic materials 0.000 description 1
239000004809 Teflon Substances 0.000 description 1
229920006362 Teflon® Polymers 0.000 description 1
229920006172 Tetrafluoroethylene propylene Polymers 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
238000005276 aerator Methods 0.000 description 1
229910001413 alkali metal ion Inorganic materials 0.000 description 1
229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
150000001399 aluminium compounds Chemical class 0.000 description 1
DNEHKUCSURWDGO-UHFFFAOYSA-N aluminum sodium Chemical compound [Na].[Al] DNEHKUCSURWDGO-UHFFFAOYSA-N 0.000 description 1
229910052785 arsenic Inorganic materials 0.000 description 1
238000010923 batch production Methods 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
238000009835 boiling Methods 0.000 description 1
230000003139 buffering effect Effects 0.000 description 1
150000001722 carbon compounds Chemical class 0.000 description 1
239000010962 carbon steel Substances 0.000 description 1
210000004027 cell Anatomy 0.000 description 1
230000008859 change Effects 0.000 description 1
239000003610 charcoal Substances 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
VJTAZCKMHINUKO-UHFFFAOYSA-M chloro(2-methoxyethyl)mercury Chemical compound [Cl-].COCC[Hg+] VJTAZCKMHINUKO-UHFFFAOYSA-M 0.000 description 1
229910052681 coesite Inorganic materials 0.000 description 1
238000010924 continuous production Methods 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
229910052906 cristobalite Inorganic materials 0.000 description 1
238000006731 degradation reaction Methods 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
239000012776 electronic material Substances 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
239000004744 fabric Substances 0.000 description 1
238000001914 filtration Methods 0.000 description 1
229920002313 fluoropolymer Polymers 0.000 description 1
239000011521 glass Substances 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
230000005484 gravity Effects 0.000 description 1
229910000856 hastalloy Inorganic materials 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
150000002430 hydrocarbons Chemical class 0.000 description 1
229910000039 hydrogen halide Inorganic materials 0.000 description 1
239000012433 hydrogen halide Substances 0.000 description 1
229910001026 inconel Inorganic materials 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
150000008040 ionic compounds Chemical class 0.000 description 1
239000002608 ionic liquid Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
238000003754 machining Methods 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
238000005259 measurement Methods 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
230000008018 melting Effects 0.000 description 1
238000002844 melting Methods 0.000 description 1
229910001510 metal chloride Inorganic materials 0.000 description 1
239000011707 mineral Substances 0.000 description 1
239000002808 molecular sieve Substances 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
239000003921 oil Substances 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
239000002245 particle Substances 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000011069 regeneration method Methods 0.000 description 1
230000004044 response Effects 0.000 description 1
239000004576 sand Substances 0.000 description 1
ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
239000004071 soot Substances 0.000 description 1
229910052682 stishovite Inorganic materials 0.000 description 1
239000013589 supplement Substances 0.000 description 1
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
229910021654 trace metal Inorganic materials 0.000 description 1
229910052905 tridymite Inorganic materials 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/04—Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/14—Alkali metal compounds
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/18—Alkaline earth metal compounds or magnesium compounds
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Metallurgy (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Life Sciences & Earth Sciences (AREA)
General Life Sciences & Earth Sciences (AREA)
Geology (AREA)
Silicon Compounds (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

CN201610065439.1A 2010-12-23 2011-12-13 用于制备硅烷的方法和系统 Pending CN105668573A (zh)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
US12/978,209 US8821825B2 (en)	2010-12-23	2010-12-23	Methods for producing silane
US12/978,189		2010-12-23
US12/978,189 US8388914B2 (en)	2010-12-23	2010-12-23	Systems for producing silane
US12/978,209		2010-12-23

Related Parent Applications (1)

Application Number	Title	Priority Date	Filing Date
CN201180068094.0A Division CN103384640B (zh)	2010-12-23	2011-12-13	用于制备硅烷的方法和系统

Publications (1)

Publication Number	Publication Date
CN105668573A true CN105668573A (zh)	2016-06-15

Family

ID=45464866

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
CN201610065439.1A Pending CN105668573A (zh)	2010-12-23	2011-12-13	用于制备硅烷的方法和系统
CN201180068094.0A Active CN103384640B (zh)	2010-12-23	2011-12-13	用于制备硅烷的方法和系统

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
CN201180068094.0A Active CN103384640B (zh)	2010-12-23	2011-12-13	用于制备硅烷的方法和系统

Country Status (6)

Country	Link
EP (1)	EP2655247A1 (fr)
KR (1)	KR101949542B1 (fr)
CN (2)	CN105668573A (fr)
BR (1)	BR112013015955A2 (fr)
TW (3)	TWI486307B (fr)
WO (1)	WO2012087653A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE102012224202A1 (de) *	2012-12-21	2014-07-10	Evonik Industries Ag	Verfahren zum Hydrieren höherer Halogen-haltiger Silanverbindungen

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3163590A (en) *	1961-04-27	1964-12-29	Union Carbide Corp	Hydrogenation of groups iii, iv and v elements
US4601798A (en) *	1982-08-31	1986-07-22	Rhone-Poulenc Specialites Chimiques	Continuous preparation of silane, SiH4
US4684513A (en) *	1982-11-05	1987-08-04	Union Carbide Corporation	Zone heating for fluidized bed silane pyrolysis

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4340574A (en) *	1980-08-28	1982-07-20	Union Carbide Corporation	Process for the production of ultrahigh purity silane with recycle from separation columns
US4818495A (en) *	1982-11-05	1989-04-04	Union Carbide Corporation	Reactor for fluidized bed silane decomposition
US4632816A (en)	1982-12-13	1986-12-30	Ethyl Corporation	Process for production of silane
DE3247362A1 (de) *	1982-12-22	1984-06-28	Studiengesellschaft Kohle mbH, 4330 Mülheim	Verfahren zur herstellung von silicium-wasserstoff-verbindungen, insbesondere des silans
US4554141A (en)	1984-05-14	1985-11-19	Ethyl Corporation	Gas stream purification
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TWI486307B (zh)	2015-06-01
TWI429588B (zh)	2014-03-11
EP2655247A1 (fr)	2013-10-30
TW201332893A (zh)	2013-08-16
CN103384640A (zh)	2013-11-06
KR101949542B1 (ko)	2019-02-18
TW201414674A (zh)	2014-04-16
BR112013015955A2 (pt)	2018-11-21
TW201231394A (en)	2012-08-01
CN103384640B (zh)	2016-03-02
WO2012087653A1 (fr)	2012-06-28

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