CN106830708A - Half-reflection and half-transmission glass with electro-magnetic screen function - Google Patents

Abstract

The invention discloses a semi-reflective and semi-transparent glass with electromagnetic shielding function, which comprises a glass substrate, on which a multi-layer dielectric film is arranged from inside to outside, and the dielectric film adopts a high refractive index layer and a low refractive index layer to intersect. ; wherein the innermost and outermost dielectric films are high-refractive-index layers; among the other high-refractive-index layers except the outermost dielectric film, one of the high-refractive-index layers is made of a high-refractive-index transparent conductive material, specifically The material is indium tin oxide, zinc aluminum oxide or fluorine-doped tin oxide, and the refractive index is 1.8~2.5. The glass integrates electromagnetic shielding and transflective functions. On the one hand, it reduces the production process and production cost. On the other hand, the transparent conductive material placed in the inner layer will be better protected and has a more reliable electromagnetic shielding function.

Description

Transflective and translucent glass with electromagnetic shielding function

technical field

The invention relates to the field of transparent conductive glass, in particular to a semi-reflective and semi-transparent glass with electromagnetic shielding function.

Background technique

However, with the rapid development of electronic technology, the density of electronic equipment is increasing, and the electromagnetic interference is becoming more and more prominent. In order to ensure that the electronic device will not be disturbed by the external electromagnetic field when it is working, and at the same time not cause unacceptable electromagnetic interference to other equipment in the environment, the electromagnetic shielding film and its design have become particularly important.

Transflective and transflective displays are more and more widely used in vehicle rearview mirrors, smart homes, etc. The current transflective display is mainly realized by arranging glass with transflective optical properties outside the display screen. The optical properties of semi-reflective and semi-transparent mainly utilize the interference principle of light, and are realized by setting multiple layers of high- and low-refractive-index film systems with specific thicknesses. For the treatment of electromagnetic shielding, it is often realized by setting a separate conductive film layer, such as directly depositing a transparent conductive layer ITO on the display module. The structure of this kind of product is complex, on the one hand, new processes and costs are added, on the other hand, conductive materials are often not effectively protected, resulting in serious attenuation of the shielding effect.

Contents of the invention

The technical problem to be solved by the present invention is to provide a semi-reflective and semi-transparent glass with electromagnetic shielding function. The transparent conductive material is placed in the inner layer, which can reduce the production process, reduce the production cost, and improve the reliability of electromagnetic shielding.

In order to solve the above-mentioned technical problems, the technical solution adopted in the present invention is: a kind of semi-reflective and semi-transparent glass with electromagnetic shielding function, including a glass substrate, and a multi-layer dielectric film is arranged on the glass substrate from the inside to the outside, and the dielectric film adopts high The refractive index layer and the low refractive index layer are arranged crosswise; the innermost and outermost dielectric films are high refractive index layers; among the other high refractive index layers except the outermost dielectric film, one of the high refractive index layers Made of transparent conductive material with high refractive index, the specific material is indium tin oxide, zinc aluminum oxide or fluorine-doped tin oxide, and the refractive index is 1.8-2.5.

The material of the high refractive index layer of the outermost dielectric film and other non-high refractive index transparent conductive materials is TiO ₂ , Nb ₂ O ₅ , Si ₃ N ₄ , Ta ₂ O ₅ or ZrO ₂ , The refractive index is 1.8-2.5, and the refractive index is 1.8-2.5.

The material of the low refractive index layer is SiO ₂ , MgF ₂ , SiON; the refractive index is 1.35˜1.65.

The glass substrate is provided with a high-refractive index layer, a low-refractive-index layer and a high-refractive-index layer from the inside to the outside; the high-refractive-index layer located between the glass substrate and the low-refractive-index layer is made of a high-refractive-index transparent conductive material .

Further, the thickness of the high refractive index layer made of high refractive index transparent conductive material is 50-80nm, the thickness of the other high refractive index layer is 40-70nm, and the thickness of the low refractive index layer is 50-80nm.

For the transflective and semi-transparent structure with three layers of electromagnetic shielding function, it is expressed as: substrate/H1/L/H, where H represents high refractive index materials, TiO ₂ , Nb ₂ O ₅ , Si ₃ N ₄ , Ta ₂ O ₅ or ZrO ₂ , the refractive index is 1.8-2.5, corresponding to the film thickness range of 40-70nm; L represents the low refractive index material, and the material of the low refractive index layer is SiO ₂ , MgF ₂ , SiON; the refractive index is 1.35-1.65, corresponding to The film thickness is 50-80nm; H1 is a transparent conductive oxide with high refractive index. For 40-25 euros.

The glass substrate is provided with a high-refractive index layer, a low-refractive-index layer, a high-refractive-index layer, a low-refractive-index layer and a high-refractive-index layer from inside to outside; Among the layers, a certain high-refractive-index layer is made of a high-refractive-index transparent conductive material.

Further, the thickness of the high refractive index layer made of high refractive index transparent conductive material is 20-120nm, among other high refractive index layers, the thickness of the high refractive index layer close to the substrate is 25-45nm, and the thickness of the high refractive index layer away from the substrate is 20-120nm. The thickness of the high refractive index layer is 50-70nm, the thickness of the low refractive index layer close to the substrate is 0-20nm, and the thickness of the low refractive index layer far away from the substrate is 80-120nm.

For 5, the semi-reflective and semi-transparent structure with electromagnetic shielding function is expressed as: substrate/H1/L/H/L/H or substrate/H/L/H1/L/H, where H represents high refractive index materials, TiO ₂ , Nb ₂ O ₅ , Si ₃ N ₄ , Ta ₂ O ₅ or ZrO ₂ , the refractive index is 1.8-2.5, the thickness of the H layer close to the substrate is in the range of 25-45nm, and the thickness of the H layer far away from the substrate is in the range of 50-70nm; L stands for low refractive index material, the material of the low refractive index layer is SiO ₂ , MgF ₂ , SiON; the refractive index is 1.35-1.65, the film thickness of the L layer close to the substrate is in the range of 0-20nm, and the film thickness of the L layer far away from the substrate The range is 80-120nm; H1 is a transparent conductive oxide with high refractive index, the specific material is indium tin oxide, zinc aluminum oxide or fluorine-doped tin oxide, the refractive index is 1.8-2.5, the film thickness is 20-120nm, and the sheet resistance is 100-12 Euros.

In the traditional production scheme, the semi-reflective mirror and the shielding functional layer belong to two categories, and are often realized separately by two processes. Semi-reflective half-lens products are realized by stacking high and low refractive index insulating dielectric films; for shielding layers, they are often realized by coating conductive coatings or vacuum-depositing conductive metals. In the present invention, the transparent conductive material is used as a layer in the semi-reflective and semi-lens film system, so as to integrate the semi-reflective optical and shielding performance, and at the same time, the transparent conductive material is not easy to be damaged and corroded as a low-layer film, and has excellent reliability .

The present invention has the following beneficial effects:

In the present invention, the transparent conductive film layer is used as a layer of high refractive index film layer in the semi-reflective and semi-transparent film system, which integrates the electromagnetic shielding and semi-reflective and semi-transparent functions. On the one hand, the production process is reduced, and the production cost is reduced. On the one hand, the transparent conductive material placed in the inner layer will be better protected. As a low-layer film, the transparent conductive material is not easy to be damaged and corroded, has excellent reliability, has a more reliable electromagnetic shielding function, and can realize semi-reflective Translucent optical effect.

detailed description

Below in conjunction with embodiment, further illustrate the present invention. These examples should be understood as only for illustrating the present invention but not for limiting the protection scope of the present invention. After reading the contents of the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent changes and modifications also fall within the scope defined by the claims of the present invention.

In the following examples and comparative examples, the H layer represents a high refractive index material, specifically Nb ₂ O ₅ , with a refractive index of 2.5, L is a low refractive index material, specifically SiO ₂ , with a refractive index of 1.46, and the H1 layer is ITO. The refractive index is 2.1. Nb ₂ O ₅ , SiO ₂ , and ITO were all prepared by vacuum magnetron sputtering, the background vacuum was 3*10 ^-4 Pa, and the substrate temperature was 330°C. The deposition of Nb ₂ O ₅ layer adopts NbOx target (X=1.5), the process gas is 200 sccm argon, and the oxygen is 80 sccm; the deposition of SiO ₂ layer adopts pure silicon target, the process gas is 200 sccm argon, and the oxygen is 50 sccm; The ITO target was used for the deposition, the process gas was 200 sccm argon, and the oxygen was 2 sccm.

Comparative example 1: The semi-reflective and semi-transparent structure of the three-layer common film system is: substrate/H/L/H, where H represents a high refractive index material, the substrate is a transparent substrate glass, and the H layer is Nb ₂ O ₅ , with a refractive index of 2.5 , the film thickness of the bottom H layer is 50nm, and the film thickness of the top H layer is 50nm; L represents a low refractive index material, choose SiO ₂ , the refractive index is 1.46, and the film thickness is 60nm. The reflectance measured from the air surface (non-film layer) of the substrate is 45%, and the reflection is blue-green. In the uniform chromaticity space (L, a, b), L=72, a=-10, b=-22.

Comparative example 2: The semi-reflective and semi-transparent structure of the three-layer common film system is: substrate/H/L/H1, where the substrate is a transparent substrate glass, H represents a high refractive index material, and the H layer is Nb ₂ O ₅ with a refractive index of 2.5 , the film thickness is 50nm; L represents a low-refractive index material, SiO ₂ is selected, the refractive index is 1.46, and the film thickness is 78nm. The H1 layer is ITO with a refractive index of 2.1, a film thickness of 60nm, and a sheet resistance of 30Ω. The reflectance measured from the air surface (non-film layer) of the substrate is 40%, and the reflection is blue-green. In the uniform chromaticity space (L, a, b), L=70, a=-10, b=-22.

Comparative Example 3: The semi-reflective and semi-transparent structure of the three-layer common film system is: H1/substrate/H/L/H, where H represents a high refractive index material. In this example, the substrate is selected as a transparent substrate glass, and the H layer is Nb ₂ O ₅ , the refractive index is 2.5, the film thickness of the bottom H layer is 50nm, and the film thickness of the top H layer is 50nm; L represents a low refractive index material. In this example, SiO ₂ is selected with a refractive index of 1.46 and a film thickness of 60nm. The H1 layer is ITO with a refractive index of 2.1, a film thickness of 60nm, and a sheet resistance of 30Ω. The reflectance measured from the air surface (non-film layer) of the substrate is 48%, and the reflection is blue-green. In the uniform chromaticity space (L, a, b), L=73, a=-10, b=-22.

Example 1: The semi-reflective and semi-transparent structure of the three-layer common film system is: substrate/H1/L/H, wherein H represents a high refractive index material. In this example, the substrate is selected as a transparent substrate glass, and the H layer is Nb ₂ O ₅ . The refractive index is 2.5, and the film thickness of the top H layer is 50nm; L represents a low refractive index material. In this example, SiO ₂ is selected, with a refractive index of 1.46, and a film thickness of 80nm. The H1 layer is ITO with a refractive index of 2.1, a film thickness of 60nm, and a sheet resistance of 30Ω. The reflectance measured from the air surface (non-film layer) of the substrate is 50%, and the reflection is blue-green. In the uniform chromaticity space (L, a, b), L=73, a=-10, b=-22.

Comparative example 1-3 is compared with embodiment 1, and its shielding effectiveness and reflectivity are shown in the following table 1:

Table 1

Comparative Example 1 is a conventional semi-reflective and semi-lens film system, and its film layers are all insulating media without electromagnetic shielding function. In Comparative Example 2, the ITO film was placed on the surface layer, and in Comparative Example 3, the ITO layer was placed on the other side of the substrate. The ITO layer of Comparative Examples 2 and 3 is exposed outside the film layer, which is easily corroded and damaged, and the electromagnetic shielding and weather resistance of the entire film layer are also greatly reduced. The H1 film layer in the film system in Example 1 is a transparent conductive material, and it is arranged at the bottom of the film layer, and the film layer is protected outside, which has the function of electromagnetic shielding and good weather resistance.

Comparative example 4: The semi-reflective and semi-transparent structure of the five-layer common film system is: substrate/H/L/H/L/H, where H represents a high refractive index material. In this example, the substrate is selected as a transparent substrate glass, and the H layer is Nb ₂ O ₅ , the refractive index is 2.5, the film thickness of the bottom H layer is 15nm, the film thickness of the middle layer H layer is 84nm, and the film thickness of the top H layer is 50nm; L represents a low refractive index material, and SiO ₂ is selected in this example , the refractive index is 1.46, the film thickness of the bottom L layer is 22nm, and the film thickness of the upper L layer is 88nm. The reflectance measured from the air surface (non-film surface) of the substrate is 50%, the reflection color is almost colorless, and L=76, a=0, b=-1 in the uniform chromaticity space (L, a, b).

Comparative example 5: The semi-reflective and semi-transparent structure of the five-layer common film system is: H1/substrate/H/L/H/L/H, where H represents a high refractive index material. In this example, the substrate is selected as a transparent substrate glass, and the H layer is Nb ₂ O ₅ , the refractive index is 2.5, the film thickness of the bottom H layer is 15nm, the film thickness of the middle layer H layer is 84nm, and the film thickness of the top H layer is 50nm; L represents a low refractive index material, which is selected in this example SiO ₂ has a refractive index of 1.46, the film thickness of the bottom L layer is 22 nm, and the film thickness of the upper L layer is 88 nm. The reflectance measured from the air side of the substrate (non-film layer) is 55%; the H1 layer on the other side of the substrate is ITO with a refractive index of 2.1, a film thickness of 95nm, and a sheet resistance of 17 ohms. The reflectance measured from the air surface (non-film surface) of the substrate is 50%, the reflection color is almost colorless, and L=76, a=0, b=-2 in the uniform chromaticity space (L, a, b).

Example 2: The semi-reflective and semi-transparent structure of the five-layer common film system is: substrate/H1/L/H/L/H, wherein H represents a high refractive index material. In this example, the substrate is selected as a transparent substrate glass, and the H layer is Nb ₂ O ₅ , the refractive index is 2.5, the film thickness of the bottom H layer is 33nm, and the film thickness of the top H layer is 65nm; L represents a low refractive index material. In this example, SiO ₂ is selected, and the film thickness of the bottom L layer is 1.46. The thickness was 2 nm, and the film thickness of the upper L layer was 90 nm. The H1 layer on the other side of the substrate is ITO with a refractive index of 2.1, a film thickness of 95nm, and a sheet resistance of 17 ohms. The reflectance measured from the air surface (non-film surface) of the substrate is 48%, the reflection color is almost colorless, and L=75, a=0, b=-1 in the uniform chromaticity space (L, a, b).

Comparative example 4-5 is compared with embodiment 2, and its shielding effectiveness and reflectivity are shown in the following table 2:

Table 2

Comparative Example 4 is a conventional semi-reflective and semi-lens film system, and its film layers are all insulating media without electromagnetic shielding function. In Comparative Example 5, a conductive ITO film was disposed on the other side of the substrate. The ITO layer of Comparative Example 5 is exposed outside the film layer, which is easily corroded and damaged, and the electromagnetic shielding and weather resistance of the entire film layer are also greatly reduced. The H1 film layer in the film system in Example 2 is a transparent conductive material, and it is arranged at the bottom of the film layer, and there is a film layer wave protection on the outside, which has the function of electromagnetic shielding and good weather resistance.

In addition, the high-refractive index layer made of high-refractive index transparent conductive materials can also be made of zinc oxide aluminum or fluorine-doped tin oxide, with a refractive index of 1.8 to 2.5; other high-refractive index materials can also be selected from TiO ₂ , Si ₃ N ₄ , Ta ₂ O ₅ or ZrO ₂ , the refractive index is 1.8-2.5; MgF ₂ or SiON can also be used for the low-refractive index layer; the refractive index is 1.35-1.65.

Claims (7)

1. a kind of half-reflection and half-transmission glass with electro-magnetic screen function, it is characterised in that：Including glass substrate, on glass substrate by Inside to multilayer dielectric film is externally provided with, deielectric-coating is carried out arranged in a crossed manner using high refractive index layer and low-index layer；Wherein innermost layer It is high refractive index layer with outermost layer dielectric；In except other high refractive index layers of outermost layer dielectric, wherein a certain floor height is reflected Rate layer is made of high refractive index transparent conductive material, and specific material is tin indium oxide, zinc oxide aluminum or fluorine doped tin oxide, refraction Rate is 1.8 ~ 2.5.

2. glass according to claim 1, it is characterised in that：The high refractive index layer of the outermost layer dielectric is non-with other The material that high refractive index transparent conductive material is made high refractive index layer is TiO₂、Nb₂O₅、Si₃N₄、Ta₂O₅Or ZrO₂, refractive index is 1.8~2.5。

3. glass according to claim 1, it is characterised in that：The material of the low-index layer is SiO₂、MgF₂、SiON； Refractive index is 1.35 ~ 1.65.

4. glass according to claim 1, it is characterised in that：High index of refraction is provided with from the inside to the outside on the glass substrate Layer, low-index layer and high refractive index layer；High refractive index layer between glass substrate and low-index layer is reflected using high Rate transparent conductive material is made.

5. glass according to claim 4, it is characterised in that：The height that the use high refractive index transparent conductive material is made The thickness of index layer is 50-80nm, and the thickness of high refractive index layer in addition is 40-70nm, and the thickness of low-index layer is 50- 80nm。

6. glass according to claim 1, it is characterised in that：High index of refraction is provided with from the inside to the outside on the glass substrate Layer, low-index layer, high refractive index layer, low-index layer and high refractive index layer；Other in addition to outermost layer high refractive index layer In high refractive index layer, a certain high refractive index layer is made of high refractive index transparent conductive material.

7. glass according to claim 6, it is characterised in that：The height that the use high refractive index transparent conductive material is made The thickness of index layer is 20-120nm, is 25- near the thickness of the high refractive index layer of substrate in other high refractive index layers 45nm, the thickness away from the high refractive index layer of substrate is 50-70nm, and the thickness for pressing close to the low-index layer of substrate is 0-20nm, Thickness away from the low-index layer of substrate is 80-120nm.