CN108398449A - X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized - Google Patents
X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized Download PDFInfo
- Publication number
- CN108398449A CN108398449A CN201810366332.XA CN201810366332A CN108398449A CN 108398449 A CN108398449 A CN 108398449A CN 201810366332 A CN201810366332 A CN 201810366332A CN 108398449 A CN108398449 A CN 108398449A
- Authority
- CN
- China
- Prior art keywords
- ray
- lens
- refractor
- refraction
- combined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
一种用于微型化X射线阵列组合折射透镜集成组件的X射线折光器,所述X射线折光器与X射线阵列组合折射透镜贴近放置,所述X射线折光器具有用于实现入射X射线光束整形的整形结构,所述整形结构是指X射线折光器对X射线阵列组合折射透镜中的正负一级组合透镜折光θ角度,对X射线阵列组合折射透镜中的正负二级组合透镜折光2θ角度,依此类推,最终实现对X射线阵列组合折射透镜中每一个单一组合折射透镜的类平行光入射。本发明应用于微型化X射线阵列组合折射透镜集成组件,可同时实现高微区分辨率和高灵敏度,并可进行现场分析。
An X-ray refractor for miniaturized X-ray array combined refraction lens integrated assembly, the X-ray refractor is placed close to the X-ray array combined refraction lens, and the X-ray refractor has a function for realizing incident X-ray beam shaping The reshaping structure refers to the refraction angle θ of the positive and negative primary combination lenses in the X-ray array combination refraction lens by the X-ray refractor, and the refraction 2θ of the positive and negative secondary combination lenses in the X-ray array combination refraction lens Angles, and so on, finally realize the parallel light incident on each single combined refracting lens in the X-ray array combined refracting lens. The invention is applied to a miniaturized X-ray array combined with a refracting lens integrated component, which can realize high micro-region resolution and high sensitivity at the same time, and can perform on-site analysis.
Description
技术领域technical field
本发明涉及X射线探测和成像领域,尤其是一种用于微束X射线荧光分析系统的X射线阵列组合折射透镜集成组件的X射线折光器。The invention relates to the field of X-ray detection and imaging, in particular to an X-ray refractor used in an X-ray array combined refraction lens integrated assembly of a micro-beam X-ray fluorescence analysis system.
背景技术Background technique
X射线荧光(XRF,X-Ray Fluorescence)分析系统能在常压下对各种形态(固态/液态/粉末等)样品进行简单快速、高分辨率和无损的元素定量测量分析。而微束X射线荧光分析系统(micro-XRF)因其具有更高的微区分辨率而受到广泛关注。The X-ray fluorescence (XRF, X-Ray Fluorescence) analysis system can perform simple, fast, high-resolution and non-destructive elemental quantitative measurement and analysis on samples in various forms (solid/liquid/powder, etc.) under normal pressure. The micro-beam X-ray fluorescence analysis system (micro-XRF) has attracted extensive attention because of its higher micro-resolution.
微束X射线荧光分析系统(micro-XRF)通常都需要配备X射线聚焦器件。使用了X射线聚焦器件的X射线荧光分析系统,虽然微区分辨率大幅度提高(通常可以提高一个数量级以上),但计数率会下降,影响了探测灵敏度。已有技术基于X射线毛细管器件的荧光光谱仪(专利号:201010180956.6),使用X射线毛细管器件进行聚焦,微区分辨率通常只能达到几十微米,不仅微区分辨率不够高,且因计数率下降导致探测灵敏度也有一定程度的降低;同时结构复杂、尺寸庞大,无法实现便携。发明人之前也提出了一种便携式微束X射线荧光光谱仪(专利号:201310356270.1,是与本发明最接近的已有技术),用X射线组合折射透镜获得探测微束,虽然微区分辨率大幅度提高,但计数率低,影响了探测灵敏度。Micro-beam X-ray fluorescence analysis systems (micro-XRF) usually need to be equipped with X-ray focusing devices. In the X-ray fluorescence analysis system using X-ray focusing devices, although the resolution of the micro-area is greatly improved (usually by more than one order of magnitude), the count rate will decrease, which affects the detection sensitivity. The prior art fluorescence spectrometer based on X-ray capillary devices (Patent No.: 201010180956.6) uses X-ray capillary devices for focusing, and the resolution of the micro-area can only reach tens of microns. Not only the micro-area resolution is not high enough, but also the count rate The decline leads to a certain degree of reduction in detection sensitivity; at the same time, the structure is complex and the size is large, and it cannot be portable. The inventor also proposed a portable micro-beam X-ray fluorescence spectrometer before (Patent No.: 201310356270.1, which is the closest existing technology to the present invention), using an X-ray combined refracting lens to obtain a detection micro-beam, although the resolution of the micro-area is large The amplitude is increased, but the count rate is low, which affects the detection sensitivity.
X射线组合折射透镜是集成型微结构器件,数值口径小,X射线光管发出的光不能全部被组合透镜接收,不仅使得计数率降低、而且浪费了X射线光能量,还增加了噪声。如果能发明新的器件结构,尽可能多的利用X射线光管发出的X射线光,则不仅能大幅度增加计数率、进而提高探测灵敏度,同时还能降低能耗、减小噪声。The X-ray combined refracting lens is an integrated microstructure device with a small numerical aperture. All the light emitted by the X-ray light tube cannot be received by the combined lens, which not only reduces the counting rate, but also wastes X-ray light energy and increases noise. If a new device structure can be invented and the X-ray light emitted by the X-ray light tube can be used as much as possible, it will not only greatly increase the count rate, thereby improving the detection sensitivity, but also reduce energy consumption and noise.
发明内容Contents of the invention
为了克服已有X射线荧光光谱仪微区分辨率还不够高,特别是因计数率低而导致的探测灵敏度不够高,且结构复杂、尺寸庞大、无法实现便携的不足,本发明提供一种微型化X射线阵列组合折射透镜集成组件的X射线折光器,将其应用于小型化微束X射线荧光分析系统,可同时实现高微区分辨率和高灵敏度,并可进行现场分析。In order to overcome the shortcomings of the existing X-ray fluorescence spectrometer that the micro-resolution is not high enough, especially the detection sensitivity is not high enough due to the low count rate, and the structure is complex, the size is large, and the lack of portability is not possible. The present invention provides a miniaturized The X-ray refractor of the X-ray array combined with the refraction lens integrated component is applied to a miniaturized micro-beam X-ray fluorescence analysis system, which can simultaneously achieve high micro-area resolution and high sensitivity, and can perform on-site analysis.
本发明解决其技术问题所采用的技术方案是:The technical solution adopted by the present invention to solve its technical problems is:
一种用于微型化X射线阵列组合折射透镜集成组件的X射线折光器,所述X射线折光器与X射线阵列组合折射透镜贴近放置,所述X射线折光器具有用于实现入射X射线光束整形的整形结构,所述整形结构是指X射线折光器对X射线阵列组合折射透镜中的正负一级组合透镜折光θ角度,对X射线阵列组合折射透镜中的正负二级组合透镜折光2θ角度,依此类推,最终实现对X射线阵列组合折射透镜中每一个单一组合折射透镜的类平行光入射。An X-ray refractor for miniaturized X-ray array combined refraction lens integrated assembly, the X-ray refractor is placed close to the X-ray array combined refraction lens, and the X-ray refractor has a function for realizing incident X-ray beam shaping The reshaping structure refers to the refraction angle θ of the positive and negative first-stage combination lenses in the X-ray array combination refraction lens by the X-ray refractor, and the refraction 2θ of the positive and negative second-level combination lenses in the X-ray array combination refraction lens Angles, and so on, finally realize the parallel light incident on each single combined refracting lens in the X-ray array combined refracting lens.
进一步,所述X射线折光器选择折射特性满足下列公式的任何单质或化合物材料,Further, the X-ray refractor selects any simple substance or compound material whose refraction characteristics satisfy the following formula,
X射线波段材料的折射系数: Refractive coefficient of X-ray band material:
其中,NA代表阿伏伽德罗常数,r0代表电子半径,λ代表波长,A代表原子质量,下标i表示化合物中的元素种类,下标j为正整数,ρ代表电子密度,下标i表示化合物中的元素种类,当材料为单质时i=1,v代表原子个数,下标i表示化合物中的元素种类,下标j为正整数,Z代表原子序数,下标i表示化合物中的元素种类。Among them, N A represents Avogadro's constant, r 0 represents the electron radius, λ represents the wavelength, A represents the atomic mass, the subscript i represents the type of element in the compound, the subscript j represents a positive integer, ρ represents the electron density, and The subscript i indicates the type of element in the compound. When the material is a simple substance, i=1, v represents the number of atoms, the subscript i represents the type of element in the compound, the subscript j is a positive integer, Z represents the atomic number, and the subscript i represents The type of element in the compound.
再进一步,所述X射线折光器的非折光区材料厚度用tZ0表示,所述X射线折光器的非折光区宽度尺寸TZ=T0+2G2,T0为零级透光带的宽度;tZ0为非折光区的材料厚度,折光区的材料厚度tZM由下列公式计算得出:Furthermore, the material thickness of the non-refractive zone of the X-ray refractor is represented by t Z0 , the width of the non-refractive zone of the X-ray refractor is T Z =T 0 +2G 2 , and T 0 is the zero-order light transmission zone Width; t Z0 is the material thickness of the non-refractive zone, and the material thickness t ZM of the refractive zone is calculated by the following formula:
tZM=tZ0+TM·tan(0.5M·θ) (2)。t ZM =t Z0 + TM ·tan(0.5M·θ) (2).
其中,G2为正负二级阻光带的宽度,TM为各级透光带的宽度。Among them, G 2 is the width of the positive and negative secondary light-blocking bands, and T M is the width of the light-transmitting bands at all levels.
本发明的有益效果主要表现在:1、利用所发明的X射线折光器,对X射线光束进行整形,结构简单、可一体化批量制作;2、X射线阵列组合折射透镜基于折射效应工作,在对X射线束聚焦时不需要折转光路,因此所形成的探测装置或仪器结构紧凑、尺寸小、重量轻,适合制作便携式仪器装置,可以实现现场分析。The beneficial effects of the present invention are mainly manifested in: 1. Utilize the invented X-ray refractor to shape the X-ray beam, which has a simple structure and can be integrated and produced in batches; 2. The combined refraction lens of the X-ray array works based on the refraction effect. There is no need to bend the optical path when focusing the X-ray beam, so the formed detection device or instrument has a compact structure, small size, and light weight, and is suitable for making a portable instrument device, which can realize on-site analysis.
附图说明Description of drawings
图1是本发明用于微型化X射线阵列组合折射透镜集成组件的X射线折光器的结构示意图(只画出了M≤2的局部结构),其中TZ为非折光区的宽度,tZ0为非折光区的材料厚度、tZM为折光区的材料厚度,(a)正视图,(b)俯视图。Fig. 1 is the structural representation of the X-ray refractor used for the miniaturized X-ray array combined refraction lens integrated assembly of the present invention (only the partial structure of M≤2 is drawn), wherein T Z is the width of the non-refractive zone, t Z0 is the material thickness of the non-refractive zone, t ZM is the material thickness of the refractive zone, (a) front view, (b) top view.
图2是本发明一种微型化X射线阵列组合折射透镜集成组件中X射线光阑的结构示意图(只画出了M≤2的局部结构),其中,T0为零级透光带的宽度,T2为正负一级透光带的宽度,t为X射线光阑的厚度,(a)正视图,(b)俯视图。Fig. 2 is a structural schematic diagram of the X-ray diaphragm in a kind of miniaturized X-ray array combined refracting lens integrated assembly of the present invention (only the local structure of M≤2 is drawn), wherein T 0 is the width of the zero-order light transmission band , T 2 is the width of the positive and negative primary light transmission bands, t is the thickness of the X-ray diaphragm, (a) front view, (b) top view.
图3是本发明一种微型化X射线阵列组合折射透镜集成组件的结构示意图,其中1代表X射线光阑、2代表X射线折光器、3代表X射线阵列组合折射透镜、4代表组件承载台。Fig. 3 is a structural schematic diagram of a miniaturized X-ray array combined refracting lens integrated assembly of the present invention, in which 1 represents the X-ray diaphragm, 2 represents the X-ray refractor, 3 represents the X-ray array combined refracting lens, and 4 represents the assembly platform .
图4是本发明一种微型化X射线阵列组合折射透镜集成组件中X射线阵列组合折射透镜的结构示意图(只画出了M≤2的局部结构),其中T0为折射单元的口径、l为折射单元的轴向厚度尺寸。Fig. 4 is a structural representation of the X-ray array combined refracting lens in a kind of miniaturized X-ray array combined refracting lens integrated assembly of the present invention (only the local structure of M≤2 is drawn), wherein T 0 is the aperture of the refracting unit, l is the axial thickness dimension of the refraction element.
具体实施方式Detailed ways
下面结合附图对本发明作进一步描述。The present invention will be further described below in conjunction with the accompanying drawings.
参照图1~图4,一种用于微型化X射线阵列组合折射透镜集成组件的X射线折光器,所述X射线折光器与X射线阵列组合折射透镜贴近放置,所述X射线折光器具有用于实现入射X射线光束整形的整形结构,所述整形结构是指X射线折光器对X射线阵列组合折射透镜中的正负一级组合透镜折光θ角度,对X射线阵列组合折射透镜中的正负二级组合透镜折光2θ角度,依此类推,最终实现对X射线阵列组合折射透镜中每一个单一组合折射透镜的类平行光入射。Referring to Figures 1 to 4, an X-ray refractor for an integrated component of a miniaturized X-ray array combined refraction lens, the X-ray refractor is placed close to the X-ray array combined refraction lens, and the X-ray refractor has a function In order to realize the shaping structure of the incident X-ray beam shaping, the shaping structure refers to the refraction angle θ angle of the X-ray refractor to the positive and negative first-stage combined lenses in the X-ray array combined refraction lens, and to the positive and negative one-stage combined lens in the X-ray array combined refraction lens. The negative secondary combination lens refracts the 2θ angle, and so on, finally realizes the parallel light incident on each single combination refraction lens in the X-ray array combination refraction lens.
进一步,所述X射线折光器选择折射特性满足下列公式的任何单质或化合物材料,Further, the X-ray refractor selects any simple substance or compound material whose refraction characteristics satisfy the following formula,
X射线波段材料的折射系数: Refractive coefficient of X-ray band material:
其中,NA代表阿伏伽德罗常数,r0代表电子半径,λ代表波长,A代表原子质量,下标i表示化合物中的元素种类,下标j为正整数,ρ代表电子密度,下标i代表化合物中的元素种类,当材料为单质时i=1,v代表原子个数,下标i表示化合物中的元素种类,下标j为正整数,Z代表原子序数,下标i表示化合物中的元素种类。Among them, N A represents Avogadro's constant, r 0 represents the electron radius, λ represents the wavelength, A represents the atomic mass, the subscript i represents the type of element in the compound, the subscript j represents a positive integer, ρ represents the electron density, and The subscript i represents the type of element in the compound. When the material is a simple substance, i=1, v represents the number of atoms, the subscript i represents the type of element in the compound, the subscript j is a positive integer, Z represents the atomic number, and the subscript i represents The type of element in the compound.
再进一步,所述X射线折光器的非折光区材料厚度用tZ0表示,所述X射线折光器的非折光区宽度尺寸TZ=T0+2G2,T0为零级透光带的宽度;tZ0为非折光区的材料厚度,折光区的材料厚度tZM由下列公式计算得出:Furthermore, the material thickness of the non-refractive zone of the X-ray refractor is represented by t Z0 , the width of the non-refractive zone of the X-ray refractor is T Z =T 0 +2G 2 , and T 0 is the zero-order light transmission zone Width; t Z0 is the material thickness of the non-refractive zone, and the material thickness t ZM of the refractive zone is calculated by the following formula:
tZM=tZ0+TM·tan(0.5M·θ) (2)。t ZM =t Z0 + TM ·tan(0.5M·θ) (2).
其中,G2为正负二级阻光带的宽度,由公式(8)取M=2时计算得出;TM为透光带的宽度,由公式(7)计算得出。Among them, G 2 is the width of the positive and negative secondary light-blocking bands, calculated by formula (8) when M=2; T M is the width of the light-transmitting band, calculated by formula (7).
将本实施例的X射线折光器应用于微型化X射线阵列组合折射透镜集成组件,所述集成组件包括X射线光阑1、X射线折光器2、X射线阵列组合透镜3和组件承载台4,X射线光束照射在所述X射线阵列组合折射透镜集成组件上,首先被X射线光阑接收,并进行第一次整形和滤波,所述第一次整形是指依据所述X射线阵列组合折射透镜的数值口径,对入射X射线光波进行整形;所述滤波是指将入射X射线光波分裂形成多个子光束,子光束的数目与X射线阵列组合折射透镜中的组合折射透镜数目相同。已分裂成多个子光束的X射线光波接着入射进所述X射线折光器,经X射线折光器进行光束第二次整形,所述光束的第二次整形保证从X射线折光器出射的多个X射线子光束,均以类平行光的方式入射阵列中对应的X射线组合折射透镜。所述X射线阵列组合折射透镜对入射的多个X射线子光束分别进行聚焦,所述X射线阵列组合折射透镜的阵列结构布局,保证每一个子光束所形成的聚焦焦斑在同一位置,并位于光轴上。所述组件承载台用于承载所述X射线光阑、X射线折光器、X射线阵列组合折射透镜,并在所述X射线光阑、X射线折光器、X射线阵列组合折射透镜的相对位置和光轴调整完毕后进行固定。The X-ray refractor of this embodiment is applied to a miniaturized X-ray array combined refracting lens integrated assembly, which includes an X-ray diaphragm 1, an X-ray refractor 2, an X-ray array combined lens 3 and an assembly carrier 4 , the X-ray beam is irradiated on the X-ray array combination refracting lens integrated assembly, first received by the X-ray diaphragm, and subjected to the first shaping and filtering, the first shaping refers to the X-ray array combination The numerical aperture of the refracting lens is used to shape the incident X-ray light wave; the filtering refers to splitting the incident X-ray light wave to form multiple sub-beams, and the number of sub-beams is the same as the number of combined refracting lenses in the combined refracting lens of the X-ray array. The X-ray light wave that has been split into multiple sub-beams is then incident into the X-ray refractor, and the beam is reshaped for the second time by the X-ray refractor. The second reshaping of the beam ensures that the multiple beams emitted from the X-ray refractor The X-ray sub-beams all enter the corresponding X-ray combination refracting lens in the array in a parallel light-like manner. The X-ray array combined refraction lens focuses the incident X-ray sub-beams respectively, and the array structure layout of the X-ray array combined refraction lens ensures that the focal spot formed by each sub-beam is at the same position, and on the optical axis. The component carrier is used to carry the X-ray diaphragm, X-ray refractor, and X-ray array combined refraction lens, and is positioned at the relative positions of the X-ray diaphragm, X-ray refractor, and X-ray array combined refraction lens. Fix it after adjusting the optical axis.
进一步地,所述X射线阵列组合折射透镜中包含(M+1)个X射线组合折射透镜,所述M为正整数且为偶数。所述X射线阵列组合折射透镜沿其光轴呈轴对称分布,所述X射线阵列组合折射透镜的光轴与阵列中零级X射线组合折射透镜的光轴重合,所述X射线阵列组合折射透镜的光轴与阵列中的正负一级X射线组合折射透镜的光轴夹角为θ,所述X射线阵列组合折射透镜的光轴与阵列中的正负二级X射线组合折射透镜的光轴夹角为2θ,依此类推。Further, the X-ray array combination refraction lens includes (M+1) X-ray combination refraction lenses, and M is a positive integer and an even number. The X-ray array combined refraction lens is distributed axially symmetrically along its optical axis, the optical axis of the X-ray array combined refraction lens coincides with the optical axis of the zero-order X-ray combined refraction lens in the array, and the X-ray array combined refraction lens The angle between the optical axis of the lens and the positive and negative primary X-ray combined refracting lens in the array is θ, and the optical axis of the X-ray array combined refracting lens and the positive and negative secondary X-ray combined refracting lens in the array The angle between the optical axis is 2θ, and so on.
再进一步,所述X射线阵列组合折射透镜中(M+1)个组合折射透镜的布局结构,使得所有(M+1)个X射线组合折射透镜聚焦的焦斑在相同位置,且位于光轴上。Still further, the layout structure of (M+1) combined refractive lenses in the X-ray array combined refractive lenses makes the focal spots focused by all (M+1) X-ray combined refractive lenses be at the same position and located on the optical axis superior.
进一步地,所述(M+1)个X射线组合折射透镜的结构和性能参数,依据下列公式得出:Further, the structure and performance parameters of the (M+1) X-ray combined refracting lenses are obtained according to the following formula:
X射线波段的光学常数:n=1-δ+iβ (3)Optical constants in the X-ray band: n=1-δ+iβ (3)
X射线组合折射透镜的焦距: The focal length of the combined X-ray refracting lens:
X射线组合折射透镜的焦斑尺寸: The focal spot size of the combined X-ray refracting lens:
X射线组合折射透镜的数值口径: Numerical aperture of X-ray combined refracting lens:
其中n代表光学常数,δ代表X射线波段材料的折射,β代表X射线波段材料的吸收,N代表X射线组合折射透镜中折射单元的个数,以抛物面型折射单元为例,组合折射透镜抛物面顶点的曲率半径为R,抛物面的开口尺寸为R0,f代表X射线组合折射透镜的焦距,λ代表波长,μ代表X射线的线吸收系数, Among them, n represents the optical constant, δ represents the refraction of the X-ray band material, β represents the absorption of the X-ray band material, and N represents the number of refraction units in the X-ray combined refraction lens. Taking the parabolic refraction unit as an example, the combined refraction lens paraboloid The radius of curvature of the vertex is R, the opening size of the paraboloid is R 0 , f represents the focal length of the combined X-ray refracting lens, λ represents the wavelength, and μ represents the linear absorption coefficient of X-rays,
更进一步,所述X射线折光器,与所述X射线阵列组合折射透镜贴近放置,实现入射X射线光束的第二次整形,所述第二次整形,是指X射线折光器可对X射线阵列组合折射透镜中的正负一级组合透镜折光θ角度,对X射线阵列组合折射透镜中的正负二级组合透镜折光2θ角度,依此类推,最终实现对X射线阵列组合折射透镜中每一个单一组合折射透镜的类平行光入射。Furthermore, the X-ray refractor is placed close to the combined refracting lens of the X-ray array to realize the second shaping of the incident X-ray beam. The second shaping means that the X-ray refractor can correct the X-ray The positive and negative first-stage combined lenses in the combined refracting lens of the array refract the θ angle, and the positive and negative secondary combined lenses in the X-ray combined refracting lens refract the 2θ angle, and so on. Parallel-like incidence of a single composite refractive lens.
再进一步,所述X射线光阑的结构尺寸,根据所述X射线阵列组合折射透镜的结构尺寸确定,实现入射X射线光束的第一次整形和滤波,所述光束的第一次整形,是指利用X射线光阑结构阻隔射入X射线阵列组合折射透镜之外的杂散光并对光束进行初步准直的功能;所述滤波是指X射线光阑结构中透光带和阻光带交替布置的滤波结构,并通过滤波结构将X射线光波分裂成多个子光束。Still further, the structural size of the X-ray diaphragm is determined according to the structural size of the X-ray array combined refracting lens to realize the first shaping and filtering of the incident X-ray beam, and the first shaping of the beam is Refers to the function of using the X-ray diaphragm structure to block the stray light entering the X-ray array combination refracting lens and to initially collimate the beam; the filtering refers to the alternating light-transmitting and blocking bands in the X-ray diaphragm structure The filter structure is arranged, and the X-ray light wave is split into multiple sub-beams through the filter structure.
所述透光带的数目为(M+1)个,与所述X射线阵列组合折射透镜中组合折射透镜的数目相同。所述透光带和阻光带的宽度分别由下列公式计算得出:The number of the light-transmitting zones is (M+1), which is the same as the number of combined refractive lenses in the X-ray array combined refractive lenses. The widths of the light-transmitting zone and the light-blocking zone are calculated by the following formulas:
零级透光带T0,与X射线组合折射透镜的数值口径尺寸相同,正负一级透光带、正负二级透光带…,依此类推,透光带宽度表示为:The zero-order light transmission zone T 0 is the same as the numerical aperture size of the X-ray combined refracting lens, the positive and negative first-order light transmission zones, the positive and negative second-order light transmission zones..., and so on. The width of the light transmission zone is expressed as:
正负一级阻光带、正负二级阻光带…,依此类推,阻光带宽度表示为:Positive and negative first-level light-blocking bands, positive and negative second-level light-blocking bands..., and so on, the width of the light-blocking bands is expressed as:
GM=L·tan(0.5M·θ) (8)G M = L·tan(0.5M·θ) (8)
其中L代表X射线组合折射透镜的几何长度,表示为L=N·l,其中l为折射单元轴向厚度尺寸。Where L represents the geometric length of the X-ray combined refraction lens, expressed as L=N·l, where l is the axial thickness dimension of the refraction unit.
所述X射线光阑可选择吸收特性满足下列公式的任何材料,通常选择铜、铅等金属材料,The X-ray aperture can choose any material whose absorption characteristics satisfy the following formula, usually metal materials such as copper and lead are selected,
X射线波段材料的吸收系数: Absorption coefficient of materials in the X-ray band:
其中NA代表阿伏伽德罗常数,r0代表电子半径,A代表原子质量,f2代表原子散射因子,ρ代表电子密度,i代表化合物中的元素种类,当材料为单质是i=1。Among them, N A represents Avogadro's constant, r 0 represents the electron radius, A represents the atomic mass, f 2 represents the atomic scattering factor, ρ represents the electron density, and i represents the element type in the compound. When the material is a simple substance, i=1 .
所述X射线光阑的材料厚度t满足表达式e-β·t<<1。The material thickness t of the X-ray aperture satisfies the expression e −β·t <<1.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810366332.XA CN108398449B (en) | 2018-04-23 | 2018-04-23 | X-ray refractor for miniaturized integrated assembly of X-ray array combined with refractive lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810366332.XA CN108398449B (en) | 2018-04-23 | 2018-04-23 | X-ray refractor for miniaturized integrated assembly of X-ray array combined with refractive lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108398449A true CN108398449A (en) | 2018-08-14 |
| CN108398449B CN108398449B (en) | 2020-06-30 |
Family
ID=63099303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810366332.XA Active CN108398449B (en) | 2018-04-23 | 2018-04-23 | X-ray refractor for miniaturized integrated assembly of X-ray array combined with refractive lens |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108398449B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06245122A (en) * | 1993-02-17 | 1994-09-02 | Toshiba Corp | Image pickup device |
| KR20060086076A (en) * | 2005-01-26 | 2006-07-31 | 최재호 | Method of manufacturing X-ray composite refractive lens system |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | A device and method for focusing and leveling based on a microlens array |
| CN103454298A (en) * | 2013-08-15 | 2013-12-18 | 浙江工业大学 | Microbeam X-ray fluorescence analytical method |
| CN208432556U (en) * | 2018-04-23 | 2019-01-25 | 浙江工业大学 | For the X-ray dioptric apparatus of X-ray array combination refractor integrated package to be miniaturized |
-
2018
- 2018-04-23 CN CN201810366332.XA patent/CN108398449B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06245122A (en) * | 1993-02-17 | 1994-09-02 | Toshiba Corp | Image pickup device |
| KR20060086076A (en) * | 2005-01-26 | 2006-07-31 | 최재호 | Method of manufacturing X-ray composite refractive lens system |
| CN101201549A (en) * | 2007-11-30 | 2008-06-18 | 北京理工大学 | A device and method for focusing and leveling based on a microlens array |
| CN103454298A (en) * | 2013-08-15 | 2013-12-18 | 浙江工业大学 | Microbeam X-ray fluorescence analytical method |
| CN208432556U (en) * | 2018-04-23 | 2019-01-25 | 浙江工业大学 | For the X-ray dioptric apparatus of X-ray array combination refractor integrated package to be miniaturized |
Non-Patent Citations (1)
| Title |
|---|
| 乐孜纯等: "高能X射线组合透镜聚焦性能的实验结果", 《光学学报》 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108398449B (en) | 2020-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5990734B2 (en) | X-ray fluorescence analyzer | |
| CN107110798B (en) | Grazing incidence fluorescent X-ray analysis device and method | |
| JP6139543B2 (en) | Highly aligned monochromatic X-ray optical element and support structure for an X-ray analysis engine and analyzer | |
| JP2020514764A (en) | Method and X-ray absorption spectroscopy system for performing X-ray spectroscopy | |
| WO1992008235A1 (en) | Device for controlling beams of particles, x-ray and gamma quanta and uses thereof | |
| JP2008032749A (en) | X-ray fluorescence spectroscopy system and x-ray fluorescence spectroscopy method | |
| JP2013528804A (en) | Hybrid X-ray optical instrument and method | |
| Dhez et al. | Instrumental aspects of x-ray microbeams in the range above 1 keV | |
| JP2004333131A (en) | Total reflection fluorescence xafs measuring apparatus | |
| CN117079856A (en) | Hard X-ray micro-focusing Nb/Al multilayer film Laue lens | |
| CN208188021U (en) | MICRO-BEAM XRF ANALYSIS system based on X-ray array combination refractor | |
| CN108459037B (en) | Microbeam X-ray Fluorescence Analysis Method Based on X-ray Array Combined Refractive Lens | |
| CN114354661A (en) | A Micro-area X-ray Spectroscopy System | |
| CN108398449A (en) | X-ray dioptric apparatus for X-ray array combination refractor integrated package to be miniaturized | |
| CN208780643U (en) | A miniaturized X-ray array combined refractive lens integrated assembly | |
| CN208432556U (en) | For the X-ray dioptric apparatus of X-ray array combination refractor integrated package to be miniaturized | |
| CN108398448B (en) | X-ray diaphragm for miniaturized X-ray array combined refractive lens assembly | |
| CN108318516A (en) | A kind of micromation X-ray array combination refractor integrated package | |
| JP6430208B2 (en) | X-ray irradiation equipment | |
| CN208334244U (en) | For the x-ray diAN_SNhragm of X-ray array combination refractor integrated package to be miniaturized | |
| CN108709899B (en) | Microbeam X-ray fluorescence analysis system based on X-ray array combined refraction lens | |
| CN217359672U (en) | A Micro-area X-ray Spectroscopy System | |
| CN106531281B (en) | A kind of compound refractor of anaberration X ray and its design method | |
| JPH02271300A (en) | X-ray collector | |
| JP6116407B2 (en) | X-ray focusing apparatus and X-ray apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20251022 Address after: 311113 Zhejiang Province, Hangzhou City, Yuhang District, Liangzhu Street, Donglian Village, Group 8, Muzhao Tou, No. 36, 5th floor, Room 501 Patentee after: Hangzhou Zhuoying Intelligent Equipment Co.,Ltd. Country or region after: China Address before: The city Zhaohui six districts Chao Wang Road Hangzhou City, Zhejiang province 310014 18 Patentee before: JIANG University OF TECHNOLOGY Country or region before: China |
|
| TR01 | Transfer of patent right |