CN108636070A - Exhaust gas treatment system - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及工业废气处理技术领域，特别涉及一种废气处理系统。The invention relates to the technical field of industrial waste gas treatment, in particular to a waste gas treatment system.
背景技术Background technique
挥发性有机物(VOCs)来源广，组成复杂，种类繁多，具有光化学活性， 是形成细颗粒物(PM2.5)和臭氧的重要前提物质。怎样高效经济地处理工业 VOCs，成为了人们越来越关注的问题。传统的方法主要有焚烧法，吸附法和 生物降解法等。焚烧法处理这些物质需要较高的温度，因为有些挥发性有机物 具有很高的耐热稳定性，能耗大，经济成本高，还容易形成二次污染；吸附法 净化效率高，但吸附剂的用量大且设备投资高，需要一定的湿度条件才能进行， 不能使废气彻底降解；生物降解法，设备相对复杂，占地面积大，用时长，对浓度波动大的废气适用性差，处理效率相对低。因此，对低温等离子体处理工 业废气的研究成为了人们研究的热点。Volatile organic compounds (VOCs) have a wide range of sources, complex compositions, various types, and photochemical activity. They are important prerequisite substances for the formation of fine particulate matter (PM2.5) and ozone. How to deal with industrial VOCs efficiently and economically has become an issue of increasing concern. Traditional methods mainly include incineration, adsorption and biodegradation. The incineration method needs a higher temperature to treat these substances, because some volatile organic compounds have high heat resistance, high energy consumption, high economic cost, and easy to form secondary pollution; the purification efficiency of the adsorption method is high, but the adsorption capacity of the adsorbent The consumption is large and the equipment investment is high, and certain humidity conditions are required to carry out, and the exhaust gas cannot be completely degraded; the biodegradation method requires relatively complicated equipment, a large area, and a long time, poor applicability to exhaust gas with large concentration fluctuations, and relatively low treatment efficiency . Therefore, the research on low-temperature plasma treatment of industrial waste gas has become a hot research topic.
低温等离子体是继气态，固态，液态之后的物质第四态。低温等离子体中 含有大量的高活性粒子，使很多需要高活化能的化学反应得以进行，使常规方 法难以去除的有害物质得以转化或分解。目前已有很多人对这方面做了研究， 国内有人对直流电晕等离子体处理工业废气做了研究，分别研究了电压、气体 流量，气体浓度对处理工业废气的影响。也有很多研究者设计出了一整套处理 工业废气的装置，有的装置可在常温下进行。国外对这方面也做了大量研究， 有人用介质阻隔放电技术产生非平衡等离子体处理模拟烟道废气，有人用电晕 放电产生等离子体处理VOCs等。Low-temperature plasma is the fourth state of matter after gas, solid, and liquid. Low-temperature plasma contains a large number of highly active particles, enabling many chemical reactions that require high activation energy to proceed, and transforming or decomposing harmful substances that are difficult to remove by conventional methods. At present, many people have done research on this aspect. Some people in China have done research on the treatment of industrial waste gas by DC corona plasma, and studied the influence of voltage, gas flow rate and gas concentration on the treatment of industrial waste gas. There are also many researchers who have designed a whole set of devices for treating industrial waste gas, and some devices can be carried out at normal temperature. Abroad has also done a lot of research on this aspect. Some people use dielectric barrier discharge technology to generate non-equilibrium plasma to treat simulated flue exhaust gas, and some people use corona discharge to generate plasma to treat VOCs.
目前人们对低温等离子体的研究很多，但是这些研究还未达到工业实用化 阶段，主要原因如下：在实际处理废气的过程中，控制对象模糊，难以实施有 效控制；由于受废气浓度、流量、温度等因素的影响，目前的装置很难让废气 一直处在稳定的低温等离子体状态下，导致废气降解不彻底或浪费多余能量。At present, there are many studies on low-temperature plasma, but these studies have not yet reached the stage of industrial application. The main reasons are as follows: In the process of actually treating exhaust gas, the control object is vague and it is difficult to implement effective control; due to the influence of exhaust gas concentration, flow rate, and temperature Due to the influence of other factors, it is difficult for the current device to keep the exhaust gas in a stable low-temperature plasma state, resulting in incomplete degradation of the exhaust gas or wasting excess energy.
发明内容Contents of the invention
本发明旨在至少在一定程度上述技术问题。为此，本发明的目的在于提出 一种废气处理系统，能够提高废气处理效果，具有环保、经济和节能等优点。The present invention addresses at least in part the above technical problems. Therefore, the object of the present invention is to propose a waste gas treatment system, which can improve the waste gas treatment effect and has the advantages of environmental protection, economy and energy saving.
为达到上述目的，本发明提出了一种废气处理系统，包括：废气处理腔； 低温等离子体产生模块，所述低温等离子体产生模块对应所述废气处理腔设 置，所述低温等离子体产生模块通过对所述废气处理腔内的废气放电以产生低 温等离子体；废气参数获取模块，所述废气参数获取模块用于获取进入所述废 气处理腔的废气的参数；主控制器，所述主控制器分别与所述废气参数获取模 块和所述低温等离子体产生模块相连，所述主控制器用于根据所述废气的参数 对所述低温等离子体产生模块进行控制，以使整个所述废气处理腔内的低温等 离子体保持稳定状态。In order to achieve the above object, the present invention proposes an exhaust gas treatment system, comprising: an exhaust gas treatment chamber; a low-temperature plasma generation module, the low-temperature plasma generation module is set corresponding to the exhaust gas treatment chamber, and the low-temperature plasma generation module passes Discharging the exhaust gas in the exhaust gas treatment chamber to generate low-temperature plasma; the exhaust gas parameter acquisition module, the exhaust gas parameter acquisition module is used to acquire the parameters of the exhaust gas entering the exhaust gas treatment chamber; the main controller, the main controller respectively connected to the exhaust gas parameter acquisition module and the low-temperature plasma generation module, and the main controller is used to control the low-temperature plasma generation module according to the parameters of the exhaust gas, so that the entire exhaust gas treatment chamber The low-temperature plasma remains stable.
根据本发明实施例的废气处理系统，通过废气参数获取模块获取进入 废气处理腔的废气的参数，通过主控制器根据废气的参数对低温等离子体 产生模块进行控制，以使整个废气处理腔内的低温等离子体保持稳定状态， 由此，能够提高废气处理效果，并能够避免浪费多余的能量，具有环保、 经济和节能等优点。According to the exhaust gas treatment system of the embodiment of the present invention, the parameters of the exhaust gas entering the exhaust gas treatment chamber are acquired by the exhaust gas parameter acquisition module, and the low-temperature plasma generation module is controlled by the main controller according to the parameters of the exhaust gas, so that the whole exhaust gas treatment chamber The low-temperature plasma maintains a stable state, thereby improving the exhaust gas treatment effect and avoiding wasting excess energy, which has the advantages of environmental protection, economy and energy saving.
另外，根据本发明上述实施例提出的废气处理系统还可以具有如下附加的 技术特征：In addition, the waste gas treatment system proposed according to the above-mentioned embodiments of the present invention may also have the following additional technical features:
所述废气处理腔包括N个低温等离子体区，其中，N为正整数，每个低 温等离子区内设置有对应的极板，所述低温等离子体产生模块包括N个电源， 所述N个电源与所述N个低温等离子区内的极板一一对应相连，每个所述电 源为对应的极板供电以使对应的低温等离子区内产生低温等离子体。The exhaust gas treatment chamber includes N low-temperature plasma regions, wherein N is a positive integer, and each low-temperature plasma region is provided with a corresponding electrode plate, and the low-temperature plasma generation module includes N power supplies, and the N power supplies The plates in the N low-temperature plasma regions are connected in one-to-one correspondence, and each power supply supplies power to the corresponding plates to generate low-temperature plasma in the corresponding low-temperature plasma regions.
所述废气参数获取模块包括对应所述废气处理腔的进气管道设置的流量 传感器、温度传感器、压力传感器、电导传感器，所述废气的参数包括所述废 气的质量流量、温度、压力、浓度和成分。The exhaust gas parameter acquisition module includes a flow sensor, a temperature sensor, a pressure sensor, and a conductance sensor set corresponding to the intake pipe of the exhaust gas treatment chamber, and the parameters of the exhaust gas include mass flow, temperature, pressure, concentration and Element.
每个所述电源包括：整流单元，所述整流单元的整流输入端作为所述电源 的输入端，用以输入三相电；滤波单元，所述滤波单元与所述整流单元的整流 输出端相连；逆变单元，所述逆变单元的逆变输入端与所述滤波单元相连；驱 动单元，所述驱动单元与所述逆变单元的逆变控制端相连；耦合变压器，所述 耦合变压器的一侧与所述逆变单元的逆变输出端相连，所述耦合变压器的另一 侧作为所述电源的输出端，用以输出高压交流电。Each of the power supplies includes: a rectification unit, the rectification input end of the rectification unit is used as the input end of the power supply to input three-phase power; a filter unit, the filter unit is connected to the rectification output end of the rectification unit ; an inverter unit, the inverter input terminal of the inverter unit is connected to the filter unit; a drive unit, the drive unit is connected to the inverter control terminal of the inverter unit; a coupling transformer, the coupling transformer One side is connected to the inverter output terminal of the inverter unit, and the other side of the coupling transformer is used as the output terminal of the power supply to output high-voltage alternating current.
每个所述电源还包括第一电流传感器，所述第一电流传感器对应所述电源 的输入端设置，所述第一电流传感器用于检测所述电源的输入电流，以用以得 到极板电流。Each of the power supplies also includes a first current sensor, the first current sensor is set corresponding to the input end of the power supply, and the first current sensor is used to detect the input current of the power supply to obtain the plate current .
所述主控制器用于根据所述废气的质量流量、温度、压力、浓度和成分以 及所述极板电流和所述极板的面积计算总电流密度，并根据所述总电流密度对 每个所述电源对对应的极板的供电电流进行调整。The main controller is used to calculate the total current density according to the mass flow, temperature, pressure, concentration and composition of the exhaust gas, the current of the plate and the area of the plate, and calculate the total current density for each The above-mentioned power supply adjusts the supply current of the corresponding plate.
所述主控制器根据以下公式计算所述总电流密度：The main controller calculates the total current density according to the following formula:
J＝KA/S极QF，J=KA/S extremely QF,
其中，J为所述总电流密度，K为总补偿系数，K＝K1K2K3K4，其中，K1 为成分补偿系数，K2为浓度补偿系数，K3为温度补偿系数，K4为压力补偿 系数，A为根据所述电源的输入电流得到的极板电流，S极为所述极板的面积， Q为所述废气的质量流量，F为所述废气的浓度。Wherein, J is the total current density, K is the total compensation coefficient, K=K1K2K3K4, wherein, K1 is the component compensation coefficient, K2 is the concentration compensation coefficient, K3 is the temperature compensation coefficient, K4 is the pressure compensation coefficient, and A is the The plate current obtained by the input current of the power supply, S is the area of the plate, Q is the mass flow rate of the waste gas, and F is the concentration of the waste gas.
每个所述电源还包括电源控制器，所述电源控制器分别与所述驱动单元和 所述主控制器相连，所述主控制器用于根据所述总电流密度分配每个低温等离 子区的电流密度，所述电源控制器用于根据分配的电流密度对驱动单元进行控 制，以控制所述电源对对应的极板的供电电流。Each of the power supplies also includes a power controller, the power controller is respectively connected with the drive unit and the main controller, and the main controller is used for distributing the current of each low-temperature plasma area according to the total current density Density, the power supply controller is used to control the driving unit according to the distributed current density, so as to control the supply current of the power supply to the corresponding plate.
每个所述电源还包括第二电流传感器和电压传感器，所述第二电流传感器 和所述电压传感器对应所述电源的输出端设置，并均与所述电源控制器相连， 所述第二电流传感器和所述电压传感器分别用于检测所述电源的输出电流和 输出电压以分别进行过流保护和过压保护。Each of the power supplies also includes a second current sensor and a voltage sensor, the second current sensor and the voltage sensor are set corresponding to the output terminals of the power supply, and are both connected to the power supply controller, and the second current sensor The sensor and the voltage sensor are respectively used to detect the output current and output voltage of the power supply to perform over-current protection and over-voltage protection respectively.
所述的废气处理系统还包括对应所述废气处理腔的进气管道设置的进气 阀门，所述进气阀门与所述主控制器相连，所述主控制器用于根据所述流量传 感器检测到的所述废气的质量流量对所述进气阀门的开度进行闭环控制，以保 持所述废气的质量流量的相对稳定。The exhaust gas treatment system further includes an intake valve corresponding to the intake pipe of the exhaust gas treatment chamber, the intake valve is connected to the main controller, and the main controller is used to detect The mass flow rate of the exhaust gas performs closed-loop control on the opening of the intake valve, so as to keep the mass flow rate of the exhaust gas relatively stable.
附图说明Description of drawings
图1为根据本发明实施例的废气处理系统的方框示意图；1 is a schematic block diagram of an exhaust gas treatment system according to an embodiment of the present invention;
图2为根据本发明一个实施例的废气处理系统的结构示意图；Fig. 2 is a schematic structural view of an exhaust gas treatment system according to an embodiment of the present invention;
图3为根据本发明一个实施例的电源的结构示意图；3 is a schematic structural diagram of a power supply according to an embodiment of the present invention;
图4为根据本发明一个实施例的废气处理系统的工作示意图。Fig. 4 is a working diagram of an exhaust gas treatment system according to an embodiment of the present invention.
具体实施方式Detailed ways
下面详细描述本发明的实施例，所述实施例的示例在附图中示出，其中自 始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元 件。下面通过参考附图描述的实施例是示例性的，旨在用于解释本发明，而不 能理解为对本发明的限制。Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, in which the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.
下面结合附图来描述本发明实施例的废气处理系统。The exhaust gas treatment system of the embodiment of the present invention will be described below in conjunction with the accompanying drawings.
如图1所示，本发明实施例的废气处理系统包括：废气处理腔10、低温 等离子体产生模块20、废气参数获取模块30和主控制器40。As shown in FIG. 1 , the exhaust gas treatment system of the embodiment of the present invention includes: an exhaust gas treatment chamber 10 , a low-temperature plasma generation module 20 , an exhaust gas parameter acquisition module 30 and a main controller 40 .
其中，低温等离子体产生模块20对应废气处理腔10设置，低温等离子体 产生模块20通过对废气处理腔10内的废气放电以产生低温等离子体；废气参 数获取模块30用于获取进入废气处理腔10的废气的参数；主控制器40分别 与废气参数获取模块30和低温等离子体产生模块20相连，主控制器40用于 根据废气的参数对低温等离子体产生模块20进行控制，以使整个废气处理腔 10内的低温等离子体保持稳定状态。Among them, the low-temperature plasma generation module 20 is set corresponding to the exhaust gas treatment chamber 10, and the low-temperature plasma generation module 20 generates low-temperature plasma by discharging the exhaust gas in the exhaust gas treatment chamber 10; the exhaust gas parameter acquisition module 30 is used to acquire The parameters of the waste gas; the main controller 40 is respectively connected with the waste gas parameter acquisition module 30 and the low-temperature plasma generation module 20, and the main controller 40 is used to control the low-temperature plasma generation module 20 according to the parameters of the waste gas, so that the whole waste gas treatment The low temperature plasma in the chamber 10 remains stable.
具体地，如图2所示，废气处理腔10包括N个低温等离子体区CH1～CHN， 其中，N为正整数，每个低温等离子区内设置有对应的极板(图2中未示出)， 低温等离子体产生模块20包括N个电源CS1～CSN，N个电源与N个低温等 离子区内的极板一一对应相连，每个电源相对独立，每个电源可为对应的极板 供电以使对应的低温等离子区内产生低温等离子体。Specifically, as shown in FIG. 2, the exhaust gas treatment chamber 10 includes N low-temperature plasma regions CH1˜CHN, wherein N is a positive integer, and each low-temperature plasma region is provided with a corresponding electrode plate (not shown in FIG. 2 ), the low-temperature plasma generation module 20 includes N power supplies CS1-CSN, and the N power supplies are connected to the plates in the N low-temperature plasma regions in one-to-one correspondence. Each power supply is relatively independent, and each power supply can supply power to the corresponding plates. In order to generate low-temperature plasma in the corresponding low-temperature plasma region.
如图2所示，废气处理系统还可包括对应废气处理腔10的进气管道11设 置的抽风机50，抽风机50可驱动废气通过进气管道11流入废气处理腔10， 并在经废气处理腔10处理后流出。废气参数获取模块30可包括对应废气处理 腔10的进气管道11设置的流量传感器LG、温度传感器TG、压力传感器PG、 电导传感器SG。As shown in Figure 2, the exhaust gas treatment system can also include an exhaust fan 50 arranged corresponding to the intake pipe 11 of the exhaust gas treatment chamber 10, the exhaust fan 50 can drive the exhaust gas to flow into the exhaust gas treatment chamber 10 through the intake pipe 11, and after exhaust gas treatment The cavity 10 is treated and outflowed. The exhaust gas parameter acquisition module 30 may include a flow sensor LG, a temperature sensor TG, a pressure sensor PG, and a conductance sensor SG arranged corresponding to the intake pipe 11 of the exhaust gas treatment chamber 10.
如图3所示，每个电源包括整流单元01、滤波单元02、逆变单元03、驱 动单元04、耦合变压器05。其中，整流单元01的整流输入端作为电源的输入 端，用以输入三相电；滤波单元02与整流单元01的整流输出端相连；逆变单 元03的逆变输入端与滤波单元02相连；驱动单元04与逆变单元03的逆变控 制端相连；耦合变压器05的一侧与逆变单元03的逆变输出端相连，耦合变压 器05的另一侧作为电源的输出端，用以输出高压交流电。As shown in Figure 3, each power supply includes a rectification unit 01, a filter unit 02, an inverter unit 03, a drive unit 04, and a coupling transformer 05. Wherein, the rectification input end of the rectification unit 01 is used as the input end of the power supply to input three-phase power; the filter unit 02 is connected to the rectification output end of the rectification unit 01; the inverter input end of the inverter unit 03 is connected to the filter unit 02; The drive unit 04 is connected to the inverter control terminal of the inverter unit 03; one side of the coupling transformer 05 is connected to the inverter output terminal of the inverter unit 03, and the other side of the coupling transformer 05 is used as the output terminal of the power supply to output high voltage alternating current.
如图3所示，每个电源还包括第一电流传感器A1，第一电流传感器A1对 应电源的输入端设置，第一电流传感器A1用于检测电源的输入电流，以用以 得到极板电流。通过上述电源的结构可知，第一电流传感器A1测量的是每个 电源输入端的三相交流电的大小，第一电流传感器A1测量的电流值A1可用 以计算极板电流A，因为极板电流A不稳定，不容易测量，这里A1＝mA，其 中，A1为第一电流传感器A1的示数，m为常系数，A为极板电流。As shown in FIG. 3 , each power supply also includes a first current sensor A 1 . The first current sensor A 1 is set corresponding to the input terminal of the power supply. The first current sensor A 1 is used to detect the input current of the power supply to obtain the pole plate current. It can be seen from the structure of the above power supply that the first current sensor A1 measures the magnitude of the three-phase alternating current at the input end of each power supply, and the current value A1 measured by the first current sensor A1 can be used to calculate the plate current A, because the plate current A is unstable and difficult to measure, where A1=mA, where A1 is the indication of the first current sensor A1, m is a constant coefficient, and A is the plate current.
在本发明的一个实施例中，废气的参数可包括通过流量传感器LG检测的 质量流量、通过温度传感器TG检测的温度、通过压力传感器PG检测的压力， 以及结合电导传感器SG检测的电导进行离线实验而得到的浓度和成分。每个 低温等离子区内的极板的面积相等，均为S极。主控制器40可根据废气的质量 流量、温度、压力、浓度和成分以及极板电流A和极板的面积S极计算总电流 密度，即单位质量工业废气在单位面积内的电流大小，并根据总电流密度对每 个电源对对应的极板的供电电流进行调整。In one embodiment of the present invention, the exhaust gas parameters may include the mass flow detected by the flow sensor LG, the temperature detected by the temperature sensor TG, the pressure detected by the pressure sensor PG, and the conductance detected by the conductance sensor SG for off-line experiments And get the concentration and composition. The area of the pole plates in each low-temperature plasma area is equal, and they are all S poles . The main controller 40 can calculate the total current density according to the mass flow rate, temperature, pressure, concentration and composition of the waste gas, the plate current A and the area S of the plate, that is, the current size per unit mass of industrial waste gas in a unit area, and according to The total current density adjusts the supply current for each power pair corresponding to the plates.
进一步地，主控制器可根据以下公式计算总电流密度：Further, the main controller can calculate the total current density according to the following formula:
J＝KA/S极QF，J=KA/S extremely QF,
其中，J为总电流密度，K为总补偿系数，K＝K1K2K3K4，其中，K1为 成分补偿系数，K2为浓度补偿系数，K3为温度补偿系数，K4为压力补偿系 数，A为根据电源的输入电流得到的极板电流，S极为极板的面积，Q为废气 的质量流量，F为废气的浓度。Among them, J is the total current density, K is the total compensation coefficient, K=K1K2K3K4, among them, K1 is the composition compensation coefficient, K2 is the concentration compensation coefficient, K3 is the temperature compensation coefficient, K4 is the pressure compensation coefficient, A is the input according to the power supply The plate current obtained by the current, S is the area of the plate, Q is the mass flow rate of the exhaust gas, and F is the concentration of the exhaust gas.
如图3所示，每个电源还包括电源控制器06，电源控制器06分别与驱动 单元04和主控制器40相连，参照图2，N个电源CS1～CSN分别包括对应的 电源控制器TI1～TIN。主控制器40可根据总电流密度分配每个低温等离子区 的电流密度，电源控制器06可根据分配的电流密度对驱动单元04进行控制， 以控制电源对对应的极板的供电电流。As shown in Figure 3, each power supply also includes a power supply controller 06, which is respectively connected to the drive unit 04 and the main controller 40, referring to Figure 2, the N power supplies CS1-CSN respectively include corresponding power supply controllers TI1 ~TIN. The main controller 40 can distribute the current density of each low-temperature plasma region according to the total current density, and the power controller 06 can control the drive unit 04 according to the distributed current density, so as to control the supply current of the power supply to the corresponding plates.
此外，如图3所示，每个电源还可包括第二电流传感器A2和电压传感器 V，第二电流传感器A2和电压传感器V对应电源的输出端设置，并均与电源 控制器06相连，第二电流传感器A2和电压传感器V分别用于检测电源的输 出电流和输出电压以分别进行过流保护和过压保护。In addition, as shown in Figure 3, each power supply can also include a second current sensor A 2 and a voltage sensor V, the second current sensor A 2 and the voltage sensor V are set corresponding to the output terminals of the power supply, and are all connected to the power supply controller 06 , the second current sensor A 2 and the voltage sensor V are used to detect the output current and output voltage of the power supply to perform over-current protection and over-voltage protection respectively.
在本发明的一个实施例中，废气处理系统还可包括对应废气处理腔10的 进气管道11设置的进气阀门60，进气阀门60与主控制器40相连，主控制器 40可根据流量传感器LG检测到的废气的质量流量对进气阀门60的开度进行 闭环控制，以保持废气的质量流量的相对稳定。In one embodiment of the present invention, the exhaust gas treatment system may further include an intake valve 60 set corresponding to the intake pipe 11 of the exhaust gas treatment chamber 10, the intake valve 60 is connected with the main controller 40, and the main controller 40 can The mass flow rate of the exhaust gas detected by the sensor LG performs closed-loop control on the opening of the intake valve 60 to keep the mass flow rate of the exhaust gas relatively stable.
在本发明的一个具体实施例中，主控制器40为可编程控制器，主控制器 40可通过专家系统分析得到总电流密度，并依据总电流密度分配比生成各低 温等离子体区的电流密度jx。如图4所示，主控制器40可分为控制器1、控制 器2和控制器3三个部分，其中，给定废气的质量流量QG和质量流量传感器 检测到的质量流量Q作为控制器1的输入，控制器1根据QG和Q对执行器即 上述的进气阀门60进行控制，使管道输出实际质量流量为Q的废气，即实现 废气的质量流量的闭环控制。如图4所示，废气的实际质量流量Q、废弃的浓 度F、分配的该低温等离子体区的电流密度jx作为主控制器2的输入，控制器 2可输出极板的给定电流AG。极板的给定电流AG和第一电流传感器获取的极 板电流A作为控制器3的输入，控制器3根据AG和A对电源进行控制，可使 电源输出相应的电流A，实现对极板的供电电流的闭环控制。In a specific embodiment of the present invention, the main controller 40 is a programmable controller, and the main controller 40 can obtain the total current density through expert system analysis, and generate the current density of each low-temperature plasma region according to the distribution ratio of the total current density j x . As shown in Figure 4, the main controller 40 can be divided into three parts: controller 1, controller 2 and controller 3, wherein the mass flow Q G of the given exhaust gas and the mass flow Q detected by the mass flow sensor are used as the control The controller 1 controls the actuator, that is, the above-mentioned intake valve 60 according to Q G and Q, so that the pipeline outputs the exhaust gas with an actual mass flow rate of Q, that is, realizes the closed-loop control of the mass flow rate of the exhaust gas. As shown in Figure 4, the actual mass flow Q of waste gas, the waste concentration F, and the current density jx of the low-temperature plasma area allocated are used as the input of the main controller 2, and the controller 2 can output the given current A of the plate G. The given current A G of the pole plate and the plate current A obtained by the first current sensor are used as the input of the controller 3, and the controller 3 controls the power supply according to A G and A, so that the power supply can output the corresponding current A, realizing the control of Closed-loop control of the supply current of the plates.
由此，通过主控制器40的专家系统可实现各个低温等离子体区电流密度 的动态分配，使低温等离子体保持稳定状态，从而废气可在相对稳定的低温等 离子体状态下得到充分的降解、净化，大大提高废气处理效果。Thus, the expert system of the main controller 40 can realize the dynamic distribution of current density in each low-temperature plasma region, and keep the low-temperature plasma in a stable state, so that the exhaust gas can be fully degraded and purified in a relatively stable low-temperature plasma state , greatly improving the effect of waste gas treatment.
在本发明的一个实施例中，主控制器40还可实时接收各电源的工作状态 反馈，当电源出现故障时，主控制器40可对各低温等离子体区重新分配电流 密度，使整个系统处于新的稳定工作状态，达到较佳的废气处理效果。In one embodiment of the present invention, the main controller 40 can also receive feedback on the working status of each power supply in real time. When the power supply fails, the main controller 40 can redistribute the current density to each low-temperature plasma area, so that the entire system is at The new stable working state achieves better waste gas treatment effect.
综上所述，根据本发明实施例的废气处理系统，通过废气参数获取模块获 取进入废气处理腔的废气的参数，通过主控制器根据废气的参数对低温等离子 体产生模块进行控制，以使整个废气处理腔内的低温等离子体保持稳定状态， 由此，能够提高废气处理效果，并能够避免浪费多余的能量，具有环保、经济 和节能等优点。In summary, according to the exhaust gas treatment system of the embodiment of the present invention, the parameters of the exhaust gas entering the exhaust gas treatment chamber are obtained through the exhaust gas parameter acquisition module, and the low-temperature plasma generation module is controlled by the main controller according to the parameters of the exhaust gas, so that the entire The low-temperature plasma in the waste gas treatment chamber maintains a stable state, thereby improving the effect of waste gas treatment and avoiding waste of excess energy, which has the advantages of environmental protection, economy and energy saving.
在本发明的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、 “宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、 “底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方 位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和 简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定 的方位构造和操作，因此不能理解为对本发明的限制。In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and therefore should not be construed as limitations on the invention.
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相 对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第 二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明的描述 中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of these features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、 “固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接， 或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过 中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。 对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中 的具体含义。In the present invention, terms such as "installation", "connection", "connection" and "fixation" should be interpreted in a broad sense, for example, it can be a fixed connection or a detachable connection unless otherwise clearly specified and limited. , or integrated; it can be mechanically or electrically connected; it can be directly connected or indirectly connected through an intermediary, and it can be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific situations.
在本发明中，除非另有明确的规定和限定，第一特征在第二特征“上” 或“下”可以是第一和第二特征直接接触，或第一和第二特征通过中间媒介 间接接触。而且，第一特征在第二特征“之上”、“上方”和“上面”可是第一特 征在第二特征正上方或斜上方，或仅仅表示第一特征水平高度高于第二特 征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特 征正下方或斜下方，或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise clearly specified and limited, the first feature may be "on" or "under" the second feature, which may be that the first and second features are in direct contact, or the first and second features are indirectly contacted through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply mean that the first feature is less horizontally than the second feature.
在本说明书的描述中，参考术语“一个实施例”、“一些实施例”、“示例”、 “具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特 征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明 书中，对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且， 描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以 合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本 说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和 组合。In the description of this specification, reference to the terms "one embodiment", "some embodiments", "example", "specific examples", or "some examples" means that specific features described in connection with the embodiment or example , structure, material or characteristic is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine different embodiments or examples and features of different embodiments or examples described in this specification without conflicting with each other.
尽管上面已经示出和描述了本发明的实施例，可以理解的是，上述实施例 是示例性的，不能理解为对本发明的限制，本领域的普通技术人员在本发明的 范围内可以对上述实施例进行变化、修改、替换和变型。Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present invention, those skilled in the art can make the above-mentioned The embodiments are subject to changes, modifications, substitutions and variations.
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