CN108636070B - Exhaust gas treatment system - Google Patents
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- CN108636070B CN108636070B CN201810446850.2A CN201810446850A CN108636070B CN 108636070 B CN108636070 B CN 108636070B CN 201810446850 A CN201810446850 A CN 201810446850A CN 108636070 B CN108636070 B CN 108636070B
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- 239000007789 gas Substances 0.000 claims abstract description 97
- 239000002912 waste gas Substances 0.000 claims abstract description 24
- 238000007599 discharging Methods 0.000 claims abstract description 4
- 230000008878 coupling Effects 0.000 claims description 7
- 238000010168 coupling process Methods 0.000 claims description 7
- 238000005859 coupling reaction Methods 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 7
- 230000000694 effects Effects 0.000 abstract description 7
- 238000004134 energy conservation Methods 0.000 abstract description 4
- 230000007613 environmental effect Effects 0.000 abstract description 4
- 210000002381 plasma Anatomy 0.000 description 44
- 238000000034 method Methods 0.000 description 8
- 239000002440 industrial waste Substances 0.000 description 6
- 239000012855 volatile organic compound Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 238000006065 biodegradation reaction Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- Chemical & Material Sciences (AREA)
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- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses an exhaust gas treatment system, comprising: an exhaust treatment chamber; the low-temperature plasma generation module is arranged corresponding to the waste gas treatment cavity and is used for generating low-temperature plasma by discharging waste gas in the waste gas treatment cavity; the exhaust gas parameter acquisition module is used for acquiring parameters of exhaust gas entering the exhaust gas treatment cavity; and the main controller is respectively connected with the exhaust gas parameter acquisition module and the low-temperature plasma generation module and is used for controlling the low-temperature plasma generation module according to the parameters of the exhaust gas so as to keep the low-temperature plasma in the whole exhaust gas treatment cavity in a stable state. According to the exhaust gas treatment system provided by the invention, the exhaust gas treatment effect can be improved, and the exhaust gas treatment system has the advantages of environmental protection, economy, energy conservation and the like.
Description
Technical Field
The invention relates to the technical field of industrial waste gas treatment, in particular to a waste gas treatment system.
Background
Volatile Organic Compounds (VOCs) are widely available, complex in composition, various in variety and photochemically active, and are important precursor materials for forming fine particulate matters (PM 2.5) and ozone. How to treat industrial VOCs efficiently and economically is becoming an increasing concern. The traditional methods mainly comprise an incineration method, an adsorption method, a biodegradation method and the like. The incineration method for treating the substances requires higher temperature, because some volatile organic compounds have high heat-resistant stability, high energy consumption and high economic cost, and secondary pollution is easy to form; the adsorption method has high purification efficiency, but the adsorbent has large dosage and high equipment investment, and can not thoroughly degrade the waste gas only under a certain humidity condition; the biodegradation method has the advantages of relatively complex equipment, large occupied area, long service life, poor applicability to waste gas with large concentration fluctuation and relatively low treatment efficiency. Therefore, research into low-temperature plasma treatment of industrial waste gas has become a hot spot of research.
The low temperature plasma is the fourth state of matter following the gas, solid, and liquid states. The low temperature plasma contains a large amount of high activity particles, so that a plurality of chemical reactions requiring high activation energy can be carried out, and harmful substances which are difficult to remove by the conventional method can be converted or decomposed. Many people have studied this aspect at present, and domestic people have studied on treating industrial waste gas by using direct current corona plasma, and respectively studied the influence of voltage and gas flow and gas concentration on treating industrial waste gas. Many researchers have designed a complete set of devices for treating industrial waste gas, some of which can be operated at normal temperature. A great deal of research is also being conducted abroad on this aspect, and some use medium barrier discharge technology to produce non-equilibrium plasma to treat simulated flue gas, and some use corona discharge to produce plasma to treat VOCs.
At present, many studies are carried out on low-temperature plasmas, but the studies have not reached the industrial practical stage, and the main reasons are as follows: in the process of actually treating the waste gas, the control object is fuzzy, and effective control is difficult to implement; because the device is influenced by the factors such as the concentration, the flow and the temperature of the waste gas, the waste gas is difficult to be always in a stable low-temperature plasma state, so that the waste gas is not degraded thoroughly or waste of excessive energy.
Disclosure of Invention
The present invention aims at least to some extent at the technical problems described above. Therefore, the invention aims to provide an exhaust gas treatment system which can improve the exhaust gas treatment effect and has the advantages of environmental protection, economy, energy conservation and the like.
To achieve the above object, the present invention provides an exhaust gas treatment system comprising: an exhaust treatment chamber; the low-temperature plasma generation module is arranged corresponding to the waste gas treatment cavity and is used for generating low-temperature plasma by discharging waste gas in the waste gas treatment cavity; the exhaust gas parameter acquisition module is used for acquiring parameters of exhaust gas entering the exhaust gas treatment cavity; the main controller is respectively connected with the exhaust gas parameter acquisition module and the low-temperature plasma generation module, and is used for controlling the low-temperature plasma generation module according to the parameters of the exhaust gas so as to keep the low-temperature plasma in the whole exhaust gas treatment cavity in a stable state.
According to the exhaust gas treatment system provided by the embodiment of the invention, the exhaust gas parameter acquisition module is used for acquiring the parameter of the exhaust gas entering the exhaust gas treatment cavity, and the main controller is used for controlling the low-temperature plasma generation module according to the parameter of the exhaust gas so as to keep the low-temperature plasma in the whole exhaust gas treatment cavity in a stable state, so that the exhaust gas treatment effect can be improved, the waste of redundant energy can be avoided, and the exhaust gas treatment system has the advantages of environmental protection, economy, energy conservation and the like.
In addition, the exhaust gas treatment system according to the above embodiment of the present invention may further have the following additional technical features:
The waste gas treatment cavity comprises N low-temperature plasma areas, N is a positive integer, corresponding polar plates are arranged in each low-temperature plasma area, the low-temperature plasma generation module comprises N power supplies, the N power supplies are connected with the polar plates in the N low-temperature plasma areas in a one-to-one correspondence manner, and each power supply supplies power for the corresponding polar plate so as to enable low-temperature plasma to be generated in the corresponding low-temperature plasma area.
The exhaust gas parameter acquisition module comprises a flow sensor, a temperature sensor, a pressure sensor and a conductivity sensor which are arranged corresponding to an air inlet pipeline of the exhaust gas treatment cavity, and the parameters of the exhaust gas comprise mass flow, temperature, pressure, concentration and components of the exhaust gas.
Each of the power supplies includes: the rectification input end of the rectification unit is used as the input end of the power supply and is used for inputting three-phase power; the filtering unit is connected with the rectification output end of the rectification unit; the inversion input end of the inversion unit is connected with the filtering unit; the driving unit is connected with the inversion control end of the inversion unit; and one side of the coupling transformer is connected with the inversion output end of the inversion unit, and the other side of the coupling transformer is used as the output end of the power supply and used for outputting high-voltage alternating current.
Each power supply further comprises a first current sensor, the first current sensor is arranged corresponding to the input end of the power supply, and the first current sensor is used for detecting the input current of the power supply so as to obtain the polar plate current.
The main controller is used for calculating total current density according to the mass flow, temperature, pressure, concentration and composition of the waste gas, the electrode plate current and the area of the electrode plate, and adjusting the power supply current of each power supply to the corresponding electrode plate according to the total current density.
The master controller calculates the total current density according to the following formula:
J＝KA/S Electrode QF，
Wherein J is the total current density, K is a total compensation coefficient, k=k1k2k3k4, wherein K1 is a component compensation coefficient, K2 is a concentration compensation coefficient, K3 is a temperature compensation coefficient, K4 is a pressure compensation coefficient, a is a plate current obtained according to an input current of the power supply, S Electrode is an area of the plate, Q is a mass flow of the exhaust gas, and F is a concentration of the exhaust gas.
Each power supply further comprises a power supply controller which is respectively connected with the driving unit and the main controller, the main controller is used for distributing the current density of each low-temperature plasma region according to the total current density, and the power supply controller is used for controlling the driving unit according to the distributed current density so as to control the power supply current of the power supply to the corresponding polar plate.
Each power supply further comprises a second current sensor and a voltage sensor, the second current sensor and the voltage sensor are arranged corresponding to the output end of the power supply and are connected with the power supply controller, and the second current sensor and the voltage sensor are respectively used for detecting the output current and the output voltage of the power supply so as to respectively carry out overcurrent protection and overvoltage protection.
The exhaust gas treatment system also comprises an air inlet valve which is arranged corresponding to the air inlet pipeline of the exhaust gas treatment cavity, wherein the air inlet valve is connected with the main controller, and the main controller is used for performing closed-loop control on the opening of the air inlet valve according to the mass flow of the exhaust gas detected by the flow sensor so as to keep the mass flow of the exhaust gas relatively stable.
Drawings
FIG. 1 is a block schematic diagram of an exhaust treatment system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of an exhaust treatment system according to one embodiment of the present disclosure;
FIG. 3 is a schematic diagram of a power supply according to one embodiment of the invention;
FIG. 4 is a schematic diagram illustrating operation of an exhaust treatment system according to one embodiment of the present invention.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative and intended to explain the present invention and should not be construed as limiting the invention.
An exhaust treatment system of an embodiment of the present invention is described below with reference to the accompanying drawings.
As shown in fig. 1, an exhaust gas treatment system of an embodiment of the present invention includes: an exhaust treatment chamber 10, a low temperature plasma generation module 20, an exhaust parameter acquisition module 30, and a main controller 40.
Wherein the low temperature plasma generating module 20 is disposed corresponding to the exhaust treatment chamber 10, and the low temperature plasma generating module 20 generates low temperature plasma by discharging exhaust gas in the exhaust treatment chamber 10; the exhaust gas parameter acquisition module 30 is used for acquiring parameters of the exhaust gas entering the exhaust gas treatment cavity 10; the main controller 40 is connected to the exhaust gas parameter acquiring module 30 and the low temperature plasma generating module 20, respectively, and the main controller 40 is used for controlling the low temperature plasma generating module 20 according to the parameters of the exhaust gas so as to maintain the low temperature plasma in the whole exhaust gas treatment chamber 10 in a stable state.
Specifically, as shown in fig. 2, the exhaust gas treatment chamber 10 includes N low-temperature plasma regions CH1 to CHN, where N is a positive integer, each low-temperature plasma region is provided with a corresponding electrode plate (not shown in fig. 2), and the low-temperature plasma generating module 20 includes N power sources CS1 to CSN, where the N power sources are connected to the electrode plates in the N low-temperature plasma regions in a one-to-one correspondence manner, each power source is relatively independent, and each power source can supply power to the corresponding electrode plate to generate low-temperature plasma in the corresponding low-temperature plasma region.
As shown in fig. 2, the exhaust treatment system may further include an exhaust fan 50 disposed corresponding to the intake duct 11 of the exhaust treatment chamber 10, and the exhaust fan 50 may drive the exhaust gas to flow into the exhaust treatment chamber 10 through the intake duct 11 and out after being treated by the exhaust treatment chamber 10. The exhaust gas parameter acquisition module 30 may include a flow sensor LG, a temperature sensor TG, a pressure sensor PG, a conductance sensor SG provided corresponding to the intake pipe 11 of the exhaust gas treatment chamber 10.
As shown in fig. 3, each power supply includes a rectifying unit 01, a filtering unit 02, an inverting unit 03, a driving unit 04, and a coupling transformer 05. The rectification input end of the rectification unit 01 is used as the input end of a power supply and is used for inputting three-phase power; the filtering unit 02 is connected with the rectification output end of the rectification unit 01; the inversion input end of the inversion unit 03 is connected with the filtering unit 02; the driving unit 04 is connected with an inversion control end of the inversion unit 03; one side of the coupling transformer 05 is connected with an inversion output end of the inversion unit 03, and the other side of the coupling transformer 05 is used as an output end of a power supply for outputting high-voltage alternating current.
As shown in fig. 3, each power supply further includes a first current sensor a 1, where the first current sensor a 1 is disposed corresponding to an input terminal of the power supply, and the first current sensor a 1 is configured to detect an input current of the power supply, so as to obtain a plate current. As can be seen from the above power supply structure, the first current sensor a 1 measures the magnitude of the three-phase ac power at each power supply input end, and the current value A1 measured by the first current sensor a 1 can be used to calculate the plate current a, where a1=ma is not easy to measure because the plate current a is unstable, where A1 is an indication of the first current sensor a 1, m is a constant coefficient, and a is the plate current.
In one embodiment of the invention, the parameters of the exhaust gas may include mass flow detected by flow sensor LG, temperature detected by temperature sensor TG, pressure detected by pressure sensor PG, and concentration and composition obtained by offline experiments in combination with conductance detected by conductance sensor SG. The area of the polar plates in each low-temperature plasma region is equal and is S Electrode . The main controller 40 can calculate the total current density, i.e. the current of the industrial waste gas with unit mass in unit area, according to the mass flow, temperature, pressure, concentration and composition of the waste gas, the plate current A and the plate area S Electrode , and adjust the power supply current of the corresponding plate for each power supply according to the total current density.
Further, the master controller may calculate the total current density according to the following formula:
J＝KA/S Electrode QF，
Wherein J is the total current density, K is the total compensation coefficient, k=k1k2k3k4, wherein K1 is the component compensation coefficient, K2 is the concentration compensation coefficient, K3 is the temperature compensation coefficient, K4 is the pressure compensation coefficient, a is the plate current obtained from the input current of the power supply, S Electrode is the plate area, Q is the mass flow of the exhaust gas, and F is the concentration of the exhaust gas.
As shown in fig. 3, each power supply further includes a power supply controller 06, and the power supply controller 06 is respectively connected to the driving unit 04 and the main controller 40, and referring to fig. 2, the n power supplies CS1 to CSN include corresponding power supply controllers TI1 to TIN, respectively. The main controller 40 may distribute the current density of each low temperature plasma region according to the total current density, and the power supply controller 06 may control the driving unit 04 according to the distributed current density to control the power supply current of the power supply to the corresponding electrode plate.
In addition, as shown in fig. 3, each power supply may further include a second current sensor a 2 and a voltage sensor V, where the second current sensor a 2 and the voltage sensor V are disposed corresponding to the output terminals of the power supply and are both connected to the power supply controller 06, and the second current sensor a 2 and the voltage sensor V are respectively used for detecting the output current and the output voltage of the power supply to perform over-current protection and over-voltage protection, respectively.
In one embodiment of the present invention, the exhaust gas treatment system may further include an intake valve 60 disposed corresponding to the intake pipe 11 of the exhaust gas treatment chamber 10, the intake valve 60 being connected to the main controller 40, and the main controller 40 may perform closed-loop control on the opening of the intake valve 60 according to the mass flow rate of the exhaust gas detected by the flow sensor LG to maintain the mass flow rate of the exhaust gas relatively stable.
In one embodiment of the present invention, the main controller 40 is a programmable controller, and the main controller 40 can obtain the total current density through expert system analysis, and generate the current density j x of each low-temperature plasma region according to the total current density distribution ratio. As shown in fig. 4, the main controller 40 may be divided into three parts of the controller 1, the controller 2 and the controller 3, wherein, given the mass flow Q G of the exhaust gas and the mass flow Q detected by the mass flow sensor as inputs of the controller 1, the controller 1 controls the actuator, i.e. the above-mentioned intake valve 60, according to Q G and Q, so that the pipeline outputs the exhaust gas with the actual mass flow Q, i.e. the closed loop control of the mass flow of the exhaust gas is realized. As shown in fig. 4, the actual mass flow Q of the exhaust gas, the waste concentration F, and the assigned current density j x of the low-temperature plasma region are taken as inputs to the main controller 2, and the controller 2 can output a given current a G of the plate. The given current A G of the polar plate and the polar plate current A acquired by the first current sensor are used as the input of the controller 3, the controller 3 controls the power supply according to A G and A, so that the power supply outputs the corresponding current A, and the closed-loop control of the power supply current of the polar plate is realized.
Therefore, the expert system of the main controller 40 can realize the dynamic distribution of the current density of each low-temperature plasma region, so that the low-temperature plasma is kept in a stable state, and the waste gas can be fully degraded and purified in a relatively stable low-temperature plasma state, thereby greatly improving the waste gas treatment effect.
In one embodiment of the present invention, the main controller 40 may also receive the feedback of the working state of each power supply in real time, and when the power supply fails, the main controller 40 may redistribute the current density to each low temperature plasma region, so that the whole system is in a new stable working state, and a better waste gas treatment effect is achieved.
In summary, according to the exhaust gas treatment system of the embodiment of the invention, the exhaust gas parameter acquisition module acquires the parameter of the exhaust gas entering the exhaust gas treatment cavity, and the main controller controls the low-temperature plasma generation module according to the parameter of the exhaust gas, so that the low-temperature plasma in the whole exhaust gas treatment cavity is kept in a stable state, thereby improving the exhaust gas treatment effect, avoiding wasting excessive energy, and having the advantages of environmental protection, economy, energy conservation and the like.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the present invention, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
Claims (4)
1. An exhaust treatment system, comprising:
An exhaust treatment chamber;
the low-temperature plasma generation module is arranged corresponding to the waste gas treatment cavity and is used for generating low-temperature plasma by discharging waste gas in the waste gas treatment cavity;
The exhaust gas parameter acquisition module is used for acquiring parameters of exhaust gas entering the exhaust gas treatment cavity;
The main controller is respectively connected with the exhaust gas parameter acquisition module and the low-temperature plasma generation module, and is used for controlling the low-temperature plasma generation module according to the parameters of the exhaust gas so as to keep the low-temperature plasma in the whole exhaust gas treatment cavity in a stable state'
The waste gas treatment cavity comprises N low-temperature plasma areas, wherein N is a positive integer, a corresponding polar plate is arranged in each low-temperature plasma area, the low-temperature plasma generation module comprises N power supplies, the N power supplies are connected with the polar plates in the N low-temperature plasma areas in a one-to-one correspondence manner, and each power supply supplies power for the corresponding polar plate so as to enable low-temperature plasma to be generated in the corresponding low-temperature plasma area;
The exhaust gas parameter acquisition module comprises a flow sensor, a temperature sensor, a pressure sensor and a conductivity sensor which are arranged corresponding to an air inlet pipeline of the exhaust gas treatment cavity, and the parameters of the exhaust gas comprise the mass flow, the temperature, the pressure, the concentration and the components of the exhaust gas;
The exhaust gas treatment system also comprises an exhaust fan which is arranged corresponding to the air inlet pipeline of the exhaust gas treatment cavity, and the exhaust fan drives the exhaust gas to flow into the exhaust gas treatment cavity through the air inlet pipeline and flow out after being treated by the exhaust gas treatment cavity;
Each of the power supplies includes:
The rectification input end of the rectification unit is used as the input end of the power supply and is used for inputting three-phase power;
the filtering unit is connected with the rectification output end of the rectification unit;
The inversion input end of the inversion unit is connected with the filtering unit;
The driving unit is connected with the inversion control end of the inversion unit;
The coupling transformer is connected with the inversion output end of the inversion unit on one side, and the other side of the coupling transformer is used as the output end of the power supply and used for outputting high-voltage alternating current;
Each power supply further comprises a first current sensor, wherein the first current sensor is arranged corresponding to the input end of the power supply and is used for detecting the input current of the power supply so as to obtain the polar plate current;
The main controller is used for calculating total current density according to the mass flow, temperature, pressure, concentration and composition of the waste gas, the electrode plate current and the area of the electrode plate, and adjusting the power supply current of the electrode plate corresponding to each power supply according to the total current density;
the master controller calculates the total current density according to the following formula:
j=ka/S-pole QF,
Wherein J is the total current density, K is a total compensation coefficient, k=k1k2k3k4, wherein K1 is a component compensation coefficient, K2 is a concentration compensation coefficient, K3 is a temperature compensation coefficient, K4 is a pressure compensation coefficient, a is a plate current obtained according to an input current of the power supply, S is an area of the plate, Q is a mass flow of the exhaust gas, and F is a concentration of the exhaust gas.
2. The exhaust treatment system of claim 1, wherein each of the power supplies further comprises a power supply controller respectively connected to the drive unit and the main controller, the main controller being configured to distribute a current density of each of the cryogenic plasma regions according to the total current density, the power supply controller being configured to control the drive unit according to the distributed current density to control a supply current to a corresponding plate of the power supply.
3. The exhaust treatment system of claim 1, wherein each of the power supplies further comprises a second current sensor and a voltage sensor disposed in correspondence with an output of the power supply and each connected to the power supply controller, the second current sensor and the voltage sensor being configured to detect an output current and an output voltage of the power supply, respectively, for over-current protection and over-voltage protection, respectively.
4. The exhaust treatment system of claim 1, further comprising an intake valve disposed in correspondence with an intake conduit of the exhaust treatment chamber, the intake valve being coupled to the main controller, the main controller being configured to perform closed-loop control of an opening of the intake valve based on the mass flow of the exhaust gas detected by the flow sensor to maintain a relatively stable mass flow of the exhaust gas.
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| CN114653171A (en) * | 2020-12-22 | 2022-06-24 | 陕西青朗万城环保科技有限公司 | A kind of flue gas treatment method and control system thereof |
| CN114950122A (en) * | 2022-07-29 | 2022-08-30 | 天津市英格环保科技有限公司 | VOCs organic waste gas treatment tower based on data analysis |
| CN116371164A (en) * | 2023-05-12 | 2023-07-04 | 安徽臻环生态科技有限公司 | Low-temperature plasma waste gas treatment system and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103949131A (en) * | 2014-05-08 | 2014-07-30 | 上海兰宝环保科技有限公司 | Photochemistry coupling low-temperature plasma waste gas treatment device |
| CN204380490U (en) * | 2014-12-15 | 2015-06-10 | 山东派力迪环保工程有限公司 | For the low-temperature plasma equipment of garbage transfer station foul gas purification |
| CN208660764U (en) * | 2018-05-11 | 2019-03-29 | 江苏师范大学 | Exhaust gas treatment system |
Family Cites Families (9)
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| JP3364668B2 (en) * | 1994-03-31 | 2003-01-08 | 日立造船株式会社 | Exhaust gas purification system by plasma method |
| JP2000303177A (en) * | 1999-04-19 | 2000-10-31 | Canon Inc | Exhaust gas treatment method |
| JP4543603B2 (en) * | 2001-05-28 | 2010-09-15 | ダイキン工業株式会社 | Plasma gas purifier and streamer discharge circuit |
| EP1451850A2 (en) * | 2001-11-02 | 2004-09-01 | Plasmasol Corporation | Non-thermal plasma slit discharge apparatus |
| JP4400573B2 (en) * | 2004-01-13 | 2010-01-20 | ダイキン工業株式会社 | Discharge device and air purification device |
| JP2007107450A (en) * | 2005-10-13 | 2007-04-26 | Hino Motors Ltd | Exhaust purification device |
| US20140102522A1 (en) * | 2010-11-16 | 2014-04-17 | Tel Solar Ag | A-si:h absorber layer for a-si single- and multijunction thin film silicon solar cell |
| CN205356790U (en) * | 2016-02-03 | 2016-06-29 | 湖南工程学院 | A device for generating a stable and uniform discharge |
| CN205760519U (en) * | 2016-07-08 | 2016-12-07 | 天津天迈节能设备有限公司 | A kind of plasma waste gas cleaning equipment |
-
2018
- 2018-05-11 CN CN201810446850.2A patent/CN108636070B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103949131A (en) * | 2014-05-08 | 2014-07-30 | 上海兰宝环保科技有限公司 | Photochemistry coupling low-temperature plasma waste gas treatment device |
| CN204380490U (en) * | 2014-12-15 | 2015-06-10 | 山东派力迪环保工程有限公司 | For the low-temperature plasma equipment of garbage transfer station foul gas purification |
| CN208660764U (en) * | 2018-05-11 | 2019-03-29 | 江苏师范大学 | Exhaust gas treatment system |
Non-Patent Citations (1)
| Title |
|---|
| 低温等离子体处理VOCs的控制系统设计;芈婉;电子测量技术;20190808;第42卷(第15期);35-41 * |
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