CN109141237A - A kind of mistake detecting device surveys the method and device of judgement - Google Patents
A kind of mistake detecting device surveys the method and device of judgement Download PDFInfo
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- CN109141237A CN109141237A CN201810948222.4A CN201810948222A CN109141237A CN 109141237 A CN109141237 A CN 109141237A CN 201810948222 A CN201810948222 A CN 201810948222A CN 109141237 A CN109141237 A CN 109141237A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
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Abstract
The present invention provides a kind of method and device of mistake survey judgement for detecting device, which includes: position acquisition module, the position at the place on each side for obtaining the first pattern to be detected and the second pattern to be detected by detection device；The detection device is used to detect the position offset of the described first pattern to be detected and second pattern to be detected in display panel；Angle obtains module, for the position according to the place on each side of the described first pattern to be detected and second pattern to be detected, obtain respectively each of the described first pattern to be detected while and angle at each of second pattern to be detected between preset reference line；Judgment module, for judging the detection device with the presence or absence of accidentally survey according to the angle.The mistake of detection device of the invention surveys the method and device of judgement, can be improved the yield of recall rate and product that detection device is accidentally surveyed.
Description
[technical field]
The present invention relates to field of display technology, and the method and device of judgement is surveyed more particularly to a kind of mistake for detecting device.
[background technique]
Wire spoke measurement machine (CDO) is used to measure the coincidence between the pattern of current layer and upper one layer of pattern at present
(overlay) precision, to obtain the position offset of the two.But often wire spoke measuring machine is obtaining the pattern of current layer and upper
When the position of one layer of pattern, occur measuring mistake, it at present can only be by by measuring value and the reference for presetting registration accuracy
Range is compared, if measuring value is more than term of reference, judges occur measuring mistake, then further confirmed that by manually whether
Occurrence quantity sniffing misses.
But even if measuring value is in preset term of reference in practical, also can yield sniffing the case where missing, and this
When wire spoke measuring machine can not detect.If by this measuring value, (position between the pattern and upper one layer of pattern of current layer is inclined
Shifting amount) direct compensation to exposure machine easily causes product ultra-specification, reduce product yield.
To avoid the above-mentioned situation that the result for measuring mistake compensation is caused to product yield exception to exposure machine, need mending
The measurement pattern progress of coincidence is manually confirmed one by one before repaying, to reduce the detection efficiency accidentally surveyed, and not can guarantee measurement
As a result accuracy, also cannot achieve the accuracy of the offset of exposure machine, to reduce the yield of product.
Therefore, it is necessary to provide a kind of method and device of mistake survey judgement for detecting device, deposited with solving the prior art
The problem of.
[summary of the invention]
The purpose of the present invention is to provide the method and devices that a kind of mistake for detecting device surveys judgement, can be improved detector
The yield of recall rate and product that part is accidentally surveyed.
In order to solve the above technical problems, the present invention provides a kind of device of mistake survey judgement for detecting device comprising:
Position acquisition module, for obtaining each item of the first pattern to be detected and the second pattern to be detected by detection device
The position at the place on side；The detection device be used to detect the described first pattern to be detected in display panel and described second to
The position offset of detection pattern；
Angle obtains module, for according to each side of the described first pattern to be detected and second pattern to be detected
The position at place, obtain respectively each of the described first pattern to be detected while and at each of second pattern to be detected with it is pre-
If the angle between reference line；
Judgment module, for judging the detection device with the presence or absence of accidentally survey according to the angle.
It is surveyed in the device of judgement in the mistake of detection device of the invention, the angle obtains module and includes:
First generation unit generates described for the position where each side according to the described first pattern to be detected
The linear main extended line of one pattern corresponding sides to be detected；
Second generation unit generates described for the position where each side according to the described second pattern to be detected
The linear secondary extended line of two pattern corresponding sides to be detected；
First acquisition unit, for obtaining the first angle between the main extended line and the preset reference line；
Second acquisition unit, for obtaining the second angle between the secondary extended line and the preset reference line.
It is surveyed in the device of judgement in the mistake of detection device of the invention, first generation unit is specifically used for: according to institute
The position where each side of the first pattern to be detected is stated, the main boundary line of the first pattern corresponding sides to be detected is generated；And
Main extended line is generated according to the main boundary line；Wherein the shape of the main boundary line includes linear type and nonlinear type.
It is surveyed in the device of judgement in the mistake of detection device of the invention, second generation unit is specifically used for: according to institute
The position where each side of the second pattern to be detected is stated, the secondary boundary line of the second pattern corresponding sides to be detected is generated；And
Secondary extended line is generated according to the secondary boundary line；Wherein the shape of the secondary boundary line includes linear type and nonlinear type.
It is surveyed in the device of judgement in the mistake of detection device of the invention, the shape of first pattern to be detected is four sides
Shape, the main extended line include two the first main extended lines and two second to arrange in a second direction along first direction arrangement
Main extended line；The preset reference line includes horizontal line and vertical line；
The first acquisition unit, specifically for obtaining the first angle between the first main extended line and horizontal line；
And the first angle between the acquisition second main extended line and vertical line；The wherein first direction and the second direction
Between there are angles.
It is surveyed in the device of judgement in the mistake of detection device of the invention, the judgment module is specifically used for:
Judge whether the angle is located within the scope of predetermined angle；When the angle exceeds the predetermined angle range,
Then determine that the detection device exists accidentally to survey；When the angle is without departing from the predetermined angle range, then the detection is determined
There is no accidentally survey for device.
It is surveyed in the device of judgement in the mistake of detection device of the invention, first pattern to be detected is the display panel
In projection of the first film layer on the default projection plane, second pattern to be detected is in the display panel
Projection of second film layer on the default projection plane, second film layer are located on the first film layer.
The present invention also provides a kind of methods that the mistake for detecting device surveys judgement comprising:
The position at the place on each side of the first pattern to be detected and the second pattern to be detected is obtained by detection device；Institute
It is inclined to state position of the detection device for detecting the described first pattern to be detected and second pattern to be detected in display panel
Shifting amount；
According to the position at the place on each side of the described first pattern to be detected and second pattern to be detected, obtain respectively
Take each of the described first pattern to be detected while and folder at each of second pattern to be detected between preset reference line
Angle；
Judge the detection device with the presence or absence of accidentally survey according to the angle.
It is surveyed in the method for judgement in the mistake of detection device of the invention, it is described according to the described first pattern to be detected and described
Position where each side of the second pattern to be detected obtains each side and described second of the described first pattern to be detected respectively
The step of angle between each side of pattern to be detected and preset reference line includes:
According to the position where each side of the described first pattern to be detected, the first pattern corresponding sides to be detected are generated
Linear main extended line；
According to the position where each side of the described second pattern to be detected, the second pattern corresponding sides to be detected are generated
Linear secondary extended line；
Obtain the first angle between the main extended line and the preset reference line；
Obtain the second angle between the secondary extended line and the preset reference line.
It is surveyed in the method for judgement in the mistake of detection device of the invention, each item according to the described first pattern to be detected
Position where side, the step of generating the linear main extended line of the first pattern corresponding sides to be detected include:
According to the position where each side of the described first pattern to be detected, the first pattern corresponding sides to be detected are generated
Main boundary line；
Main extended line is generated according to the main boundary line；Wherein the shape of the main boundary line includes linear type and non-rectilinear
Type.
The mistake of detection device of the invention surveys the method and device of judgement, obtains the first pattern to be detected by detection device
With the position at the place on each side of the second pattern to be detected；And according to each of the first pattern to be detected and the second pattern to be detected
The position at the place on side, obtain respectively each of the first pattern to be detected while and at each of the second pattern to be detected with it is default
Angle between reference line；Judge that the detection device with the presence or absence of accidentally surveying, improves detection device and accidentally surveys according to the angle later
Recall rate and product yield.
[Detailed description of the invention]
Fig. 1 is the structural schematic diagram before present invention detection units test.
Fig. 2 is the structural schematic diagram that the mistake of present invention detection device surveys the first step of judgment method.
Fig. 3 is the structural schematic diagram that the mistake of present invention detection device surveys the second step of judgment method.
Fig. 4 is that the mistake of present invention detection device surveys the structural schematic diagram of judgment means.
[specific embodiment]
The explanation of following embodiment is to can be used to the particular implementation of implementation to illustrate the present invention with reference to additional schema
Example.The direction term that the present invention is previously mentioned, such as "upper", "lower", "front", "rear", "left", "right", "inner", "outside", " side "
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the present invention, rather than to
The limitation present invention.The similar unit of structure is to be given the same reference numerals in the figure.
Please referring to Fig. 1 to 3, Fig. 1 is the structural schematic diagram before present invention detection units test.
The method that detection device of the invention is accidentally surveyed includes the following steps:
S101, obtained by detection device the first pattern to be detected and the second pattern to be detected each side place position
It sets；The detection device is used to detect the described first pattern to be detected in display panel and second pattern to be detected pre-
If the position offset on projection plane；
As shown in Figure 1, wherein the detection device 10 is wire spoke measurement machine, and display panel includes the first film layer
With second film layer, second film layer is located on the first film layer, the first film in the display panel
Projection of the layer on default projection plane forms the described first pattern 11 to be detected, and the second film layer in the display panel exists
Projection on default projection plane forms the described second pattern 12 to be detected.First pattern 11 to be detected is the rectangle of the inside,
Second pattern 12 to be detected is the rectangle of outside.Default projection plane is set according to demand.
For example, detection device 10 obtains each of the first pattern 11 to be detected and second pattern 12 to be detected respectively
The coordinate of multiple points in side, obtains the position where each side, can also according to the coordinate of the first 11 each edge of pattern to be detected and
The coordinate of second 121 each edge of pattern to be detected obtains the position offset namely registration accuracy of the two.That is, the detection
The position that device 10 is used to detect the described first pattern 11 to be detected and second pattern 12 to be detected in display panel is inclined
Shifting amount.
S102, the position according to the place on each side of the described first pattern to be detected and second pattern to be detected,
Obtain respectively each of the described first pattern to be detected while and at each of second pattern to be detected with preset reference line it
Between angle；
As shown in Figures 2 and 3, during atual detection due to detection device 10, first got pattern 11 to be detected
With the position of the described second pattern 12 to be detected as shown in Fig. 2, namely it is variant with the home position in Fig. 1, it is therefore desirable to hold
Row method of the invention is to judge to detect whether device 10 the case where accidentally surveying occurs.
For example, according to the coordinate of multiple points in each side of the described first pattern 11 to be detected and second mapping to be checked
The coordinate of multiple points in each side of case 12, obtain respectively the described first pattern 11 to be detected each side and preset reference line it
Between angle and second pattern 12 to be detected each side and preset reference line between angle.The wherein preset reference
Line includes horizontal line and vertical line.
The shape of first pattern 11 to be detected and the shape of second pattern 12 to be detected are all quadrangle, such as
Rectangle.
Above-mentioned steps S102 includes:
S1021, according to the position where each side of the described first pattern to be detected, generate first pattern to be detected
The linear main extended line of corresponding sides；
As shown in Fig. 2, for example, generating each edge according to the coordinate of multiple points in each side of the first pattern 11 to be detected
Corresponding extended line 31-34, extended line 31-34 are straight line.It is step S1021, described according to the described first pattern to be detected
Each side where position, the step of generating the linear main extended line of the first pattern corresponding sides to be detected can wrap
It includes:
S201, according to the position where each side of the described first pattern to be detected, generate first pattern to be detected
The main boundary line of corresponding sides；
S202, main extended line is generated according to the main boundary line；Wherein the shape of the main boundary line include linear type and
Nonlinear type.
For example, generating the boundary line 21- of four edges according to the coordinate of multiple points in each side of the first pattern 11 to be detected
24 namely boundary line can limit the boundary of the first pattern 11 to be detected that detection device 10 detects, which may be
Straight line or curve, wherein the shape of the main boundary line includes linear type and nonlinear type.Later further according to boundary line 21-24
The corresponding extended line 31-34 of each edge is generated, extended line 31-34 is straight line.
It is corresponding to generate the described second pattern to be detected by S1022, the position according to each side of the described second pattern to be detected
The linear secondary extended line on side；
As shown in figure 3, for example, generating each edge according to the coordinate of multiple points in each side of the second pattern 12 to be detected
Corresponding extended line 35-38, extended line 35-38 are straight line.It is step S1022, described according to the described second pattern to be detected
Each side where position, the step of generating the linear secondary extended line of the second pattern corresponding sides to be detected includes:
S205, according to the position where each side of the described second pattern to be detected, generate second pattern to be detected
The secondary boundary line of corresponding sides；
S206, secondary extended line is generated according to the secondary boundary line；
For example, as shown in figure 3, generating four edges according to the coordinate of multiple points in each side of the second pattern 12 to be detected
Boundary line 25-28 namely boundary line can limit the boundary of the second pattern 12 to be detected that detection device 10 detects, the side
Boundary line may include linear type and nonlinear type for the shape of straight line or curve namely the secondary boundary line.Later further according to
Boundary line 25-28 generates the corresponding extended line 35-38 of each edge, and extended line 35-38 is straight line.
The first angle between S1023, the acquisition main extended line and preset reference line；
Above-mentioned steps S1023 namely the step for obtaining the first angle between the main extended line and preset reference line
Suddenly include:
The first angle between S301, the acquisition first main extended line and horizontal line；And
The first angle between S302, the acquisition second main extended line and vertical line；The wherein first direction and institute
State between second direction that there are angles.
For example, the main extended line includes two as shown in Fig. 2, the shape of first pattern 11 to be detected is quadrangle
The the first main extended line 31,32 and the main extended line 33,34 of two second to arrange in a second direction that item is arranged along first direction；Point
Not Huo Qu angle a1, a2 between extended line 31,32 and horizontal line, obtain the folder between extended line 33,34 and vertical line respectively
Angle a3, a4, horizontal line and vertical line are as shown in phantom in FIG..
The second angle between S1024, the acquisition secondary extended line and preset reference line.
Above-mentioned steps S1024 namely the step for obtaining the second angle between the secondary extended line and preset reference line
Suddenly include:
The second angle between S304, the secondary extended line of acquisition described first and horizontal line；And
The second angle between S305, the secondary extended line of acquisition described second and vertical line；The wherein first direction and institute
State between second direction that there are angles.
For example, the pair extended line includes two as shown in figure 3, the shape of second pattern 12 to be detected is quadrangle
The the first secondary extended line 35,36 and two secondary extended lines 37,38 of second to arrange in a second direction that item is arranged along first direction；Point
Not Huo Qu angle a5, a6 between extended line 35,36 and horizontal line, obtain the folder between extended line 37,38 and vertical line respectively
Angle a7, a8, horizontal line and vertical line are as shown in phantom in FIG..
S103, judged the detection device with the presence or absence of accidentally survey according to the angle.
The step includes:
S1031, judge whether the angle is located within the scope of predetermined angle；
If S1032, the angle exceed the predetermined angle range, determines that the detection device exists and accidentally survey；
If S1033, the angle are without departing from the predetermined angle range, determining the detection device, there is no accidentally survey.
For example, judge whether the first angle a1-a4, the second angle a5-a8 are located within the scope of predetermined angle respectively, if there is
One of angle exceeds the predetermined angle range, then determines that the detection device 10 exists and accidentally survey.If all angle a1-
A8 is without departing from the predetermined angle range, then determining the detection device 10, there is no accidentally survey.In one embodiment, described
Predetermined angle range is -5 degree to 5 degree.
As shown in figure 4, the present invention also provides the devices 40 that a kind of mistake for detecting device surveys judgement comprising position acquisition mould
Block 41, angle obtain module 42, judgment module 43.
Position acquisition module 41 is used to obtain each of the first pattern to be detected and the second pattern to be detected by detection device
The position at the place on side；The detection device is used to detect the described first pattern to be detected and described second in display panel
The position offset of pattern to be detected；
Angle obtains module 42 for each side according to the described first pattern to be detected and second pattern to be detected
Place position, obtain respectively each of the described first pattern to be detected while and at each of second pattern to be detected with
Angle between preset reference line；
Judgment module 43 is used to be judged according to the angle detection device with the presence or absence of accidentally survey.
It includes: the first generation unit 421, the second generation unit 422, first acquisition unit that the angle, which obtains module 42,
423, second acquisition unit 424；
First generation unit 421, for the position where each side according to the described first pattern to be detected, described in generation
The linear main extended line of first pattern corresponding sides to be detected；
Second generation unit 422, for the position where each side according to the described second pattern to be detected, described in generation
The linear secondary extended line of second pattern corresponding sides to be detected；
First acquisition unit 423, for obtaining the first angle between the main extended line and preset reference line；
Second acquisition unit 424, for obtaining the second angle between the secondary extended line and preset reference line.
First generation unit 421 is specifically used for: according to the position where each side of the described first pattern to be detected,
Generate the main boundary line of the described first pattern corresponding sides to be detected；And main extended line is generated according to the main boundary line；Wherein institute
The shape for stating main boundary line includes linear type and nonlinear type.
Second generation unit 422 is specifically used for: according to the position where each side of the described second pattern to be detected,
Generate the secondary boundary line of the described second pattern corresponding sides to be detected；And secondary extended line is generated according to the secondary boundary line；Wherein institute
The shape for stating secondary boundary line includes linear type and nonlinear type.
The shape of first pattern to be detected is quadrangle, and the main extended line includes two and arranges along first direction
First main extended line and two main extended lines of second to arrange in a second direction；The preset reference line includes horizontal line and vertical
Line；
The first acquisition unit 423 is specifically used for obtaining the first folder between the first main extended line and horizontal line
Angle；And the first angle between the acquisition second main extended line and vertical line；The wherein first direction and described second
There are angles between direction.
The judgment module 43 is specifically used for: judging whether the angle is located within the scope of predetermined angle；When the angle
When beyond the predetermined angle range, then determines that the detection device exists and accidentally survey；When the angle is without departing from the preset angle
When spending range, then determining the detection device, there is no accidentally survey.
First pattern to be detected is the first film layer in the display panel on the default projection plane
Projection, second pattern to be detected are throwing of second film layer on the default projection plane in the display panel
Shadow, second film layer are located on the first film layer.
The corresponding method of device that the mistake of detection device of the invention surveys judgement specifically refers to above, no longer superfluous herein
It states.
The mistake of detection device of the invention surveys the method and device of judgement, obtains the first pattern to be detected by detection device
With the position at the place on each side of the second pattern to be detected；And according to each of the first pattern to be detected and the second pattern to be detected
The position at the place on side, obtain respectively each of the first pattern to be detected while and at each of the second pattern to be detected with it is default
Angle between reference line；Judge that detection device with the presence or absence of accidentally surveying, improves the detection that detection device is accidentally surveyed according to angle later
The yield of rate and product.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (10)
1. the device that a kind of mistake for detecting device surveys judgement comprising:
Position acquisition module, for each side by detection device the first pattern to be detected of acquisition and the second pattern to be detected
The position at place；The detection device is used to detect the described first pattern to be detected in display panel and described second to be detected
The position offset of pattern；
Angle obtains module, for the place according to each side of the described first pattern to be detected and second pattern to be detected
Position, obtain respectively each of the described first pattern to be detected while and at each of second pattern to be detected with default ginseng
Examine the angle between line；
Judgment module, for judging the detection device with the presence or absence of accidentally survey according to the angle.
2. the device that the mistake of detection device according to claim 1 surveys judgement, which is characterized in that the angle obtains module
Include:
First generation unit, for the position where each side according to the described first pattern to be detected, generate described first to
The linear main extended line of detection pattern corresponding sides；
Second generation unit, for the position where each side according to the described second pattern to be detected, generate described second to
The linear secondary extended line of detection pattern corresponding sides；
First acquisition unit, for obtaining the first angle between the main extended line and the preset reference line；
Second acquisition unit, for obtaining the second angle between the secondary extended line and the preset reference line.
3. the device that the mistake of detection device according to claim 2 surveys judgement, which is characterized in that
First generation unit is specifically used for: according to the position where each side of the described first pattern to be detected, generating institute
State the main boundary line of the first pattern corresponding sides to be detected；And main extended line is generated according to the main boundary line；The wherein main side
The shape in boundary line includes linear type and nonlinear type.
4. the device that the mistake of detection device according to claim 2 surveys judgement, which is characterized in that second generation unit
It is specifically used for: according to the position where each side of the described second pattern to be detected, it is corresponding generates the described second pattern to be detected
The secondary boundary line on side；And secondary extended line is generated according to the secondary boundary line；Wherein the shape of the secondary boundary line includes linear type
And nonlinear type.
5. the device that the mistake of detection device according to claim 2 surveys judgement, which is characterized in that first mapping to be checked
The shape of case be quadrangle, the main extended line include two along first direction arrangement the first main extended line and two along second
Second main extended line of direction arrangement；The preset reference line includes horizontal line and vertical line；
The first acquisition unit, specifically for obtaining the first angle between the first main extended line and horizontal line；And
Obtain the first angle between the described second main extended line and vertical line；Wherein between the first direction and the second direction
There are angles.
6. the device that the mistake of detection device according to claim 1 surveys judgement, which is characterized in that the judgment module is specific
For:
Judge whether the angle is located within the scope of predetermined angle；When the angle exceeds the predetermined angle range, then sentence
The fixed detection device, which exists, accidentally to be surveyed；When the angle is without departing from the predetermined angle range, then the detection device is determined
There is no accidentally survey.
7. the device that the mistake of detection device according to claim 1 surveys judgement, which is characterized in that first mapping to be checked
Case is projection of the first film layer on the default projection plane in the display panel, and second pattern to be detected is
Projection of second film layer on the default projection plane in the display panel, second film layer are located at described the
In one film layer.
8. a kind of method that the mistake for detecting device surveys judgement comprising:
The position at the place on each side of the first pattern to be detected and the second pattern to be detected is obtained by detection device；The inspection
Survey the position offset that device is used to detect the described first pattern to be detected and second pattern to be detected in display panel；
According to the position at the place on each side of the described first pattern to be detected and second pattern to be detected, institute is obtained respectively
State each of the first pattern to be detected while and angle at each of second pattern to be detected between preset reference line；
Judge the detection device with the presence or absence of accidentally survey according to the angle.
9. the method that the mistake of detection device according to claim 8 surveys judgement, which is characterized in that described according to described first
Position where each side of pattern to be detected and second pattern to be detected, obtains the described first pattern to be detected respectively
Each while and the step of angle at each of second pattern to be detected between preset reference line include:
According to the position where each side of the described first pattern to be detected, the straight of the first pattern corresponding sides to be detected is generated
The main extended line of line style；
According to the position where each side of the described second pattern to be detected, the straight of the second pattern corresponding sides to be detected is generated
The secondary extended line of line style；
Obtain the first angle between the main extended line and the preset reference line；
Obtain the second angle between the secondary extended line and the preset reference line.
10. the method that the mistake of detection device according to claim 9 surveys judgement, which is characterized in that described according to described the
Position where each side of one pattern to be detected generates the linear main extended line of the first pattern corresponding sides to be detected
The step of include:
According to the position where each side of the described first pattern to be detected, the master of the first pattern corresponding sides to be detected is generated
Boundary line；
Main extended line is generated according to the main boundary line；Wherein the shape of the main boundary line includes linear type and nonlinear type.
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| CN105225978A (en) * | 2014-06-17 | 2016-01-06 | 联华电子股份有限公司 | Correction method for overlay error |
| CN105988293A (en) * | 2015-01-27 | 2016-10-05 | 志圣工业股份有限公司 | Method and system for detecting negative film error |
| CN107305321A (en) * | 2016-04-21 | 2017-10-31 | 中芯国际集成电路制造(上海)有限公司 | A kind of method for examining lithography alignment accuracy |
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