CN1142327C - 用于电镀低应力镍的组合物和方法 - Google Patents

用于电镀低应力镍的组合物和方法 Download PDF

Info

Publication number: CN1142327C
Authority: CN; China
Prior art keywords: nickel; grams per; per liter; stress; acid
Prior art date: 1997-06-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CNB981149332A

Other languages

English (en)

Chinese (zh)

Other versions

CN1213019A (zh

Inventor

N・M・马尔季亚克

N·M·马尔季亚克

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Atotech Deutschland GmbH and Co KG

Original Assignee

Atotech Deutschland GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-06-18

Filing date

1998-06-18

Publication date

2004-03-17

1998-06-18 Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG

1999-04-07 Publication of CN1213019A publication Critical patent/CN1213019A/zh

2004-03-17 Application granted granted Critical

2004-03-17 Publication of CN1142327C publication Critical patent/CN1142327C/zh

2018-06-18 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 207
229910052759 nickel Inorganic materials 0.000 title claims abstract description 90
238000009713 electroplating Methods 0.000 title claims abstract description 15
239000000654 additive Substances 0.000 claims abstract description 33
230000000996 additive effect Effects 0.000 claims abstract description 30
230000002378 acidificating effect Effects 0.000 claims abstract description 3
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract 4
239000007788 liquid Substances 0.000 claims description 74
239000011248 coating agent Substances 0.000 claims description 67
238000000576 coating method Methods 0.000 claims description 67
239000002253 acid Substances 0.000 claims description 42
239000000203 mixture Substances 0.000 claims description 37
238000000034 method Methods 0.000 claims description 33
238000007747 plating Methods 0.000 claims description 33
230000006835 compression Effects 0.000 claims description 22
238000007906 compression Methods 0.000 claims description 22
239000010959 steel Substances 0.000 claims description 20
239000000758 substrate Substances 0.000 claims description 20
229910000831 Steel Inorganic materials 0.000 claims description 19
229910052799 carbon Inorganic materials 0.000 claims description 9
GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical group C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 claims description 9
-1 nickelous carbonates Chemical class 0.000 claims description 9
230000009467 reduction Effects 0.000 claims description 9
125000003118 aryl group Chemical group 0.000 claims description 8
239000002002 slurry Substances 0.000 claims description 8
239000000872 buffer Substances 0.000 claims description 7
239000003153 chemical reaction reagent Substances 0.000 claims description 7
XQBCZVOLPUGXRL-UHFFFAOYSA-N methanesulfonic acid;nickel Chemical compound [Ni].CS(O)(=O)=O XQBCZVOLPUGXRL-UHFFFAOYSA-N 0.000 claims description 6
229910000008 nickel(II) carbonate Inorganic materials 0.000 claims description 5
ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 claims description 5
238000004519 manufacturing process Methods 0.000 claims description 3
125000004432 carbon atom Chemical group C* 0.000 claims 3
229910000990 Ni alloy Inorganic materials 0.000 abstract description 3
150000001335 aliphatic alkanes Chemical class 0.000 abstract description 2
239000003929 acidic solution Substances 0.000 abstract 1
239000002659 electrodeposit Substances 0.000 abstract 1
230000035882 stress Effects 0.000 description 55
239000000243 solution Substances 0.000 description 34
229910052751 metal Inorganic materials 0.000 description 20
239000002184 metal Substances 0.000 description 20
150000001875 compounds Chemical class 0.000 description 12
239000000463 material Substances 0.000 description 10
229910045601 alloy Inorganic materials 0.000 description 9
239000000956 alloy Substances 0.000 description 9
AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 8
238000002360 preparation method Methods 0.000 description 8
BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 8
230000008901 benefit Effects 0.000 description 6
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 6
239000004327 boric acid Substances 0.000 description 6
230000003647 oxidation Effects 0.000 description 6
238000007254 oxidation reaction Methods 0.000 description 6
239000002245 particle Substances 0.000 description 6
150000005837 radical ions Chemical class 0.000 description 6
150000001721 carbon Chemical group 0.000 description 5
238000006460 hydrolysis reaction Methods 0.000 description 5
238000003756 stirring Methods 0.000 description 5
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
229910052804 chromium Inorganic materials 0.000 description 4
239000011651 chromium Substances 0.000 description 4
HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 4
238000005323 electroforming Methods 0.000 description 4
DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 4
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
230000008569 process Effects 0.000 description 4
CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 4
IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
125000000217 alkyl group Chemical group 0.000 description 3
230000000994 depressogenic effect Effects 0.000 description 3
230000007062 hydrolysis Effects 0.000 description 3
238000002203 pretreatment Methods 0.000 description 3
239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
150000003839 salts Chemical class 0.000 description 3
239000007787 solid Substances 0.000 description 3
239000010936 titanium Substances 0.000 description 3
229910052719 titanium Inorganic materials 0.000 description 3
229910000838 Al alloy Inorganic materials 0.000 description 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
229910016006 MoSi Inorganic materials 0.000 description 2
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
239000004141 Sodium laurylsulphate Substances 0.000 description 2
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
125000002723 alicyclic group Chemical group 0.000 description 2
238000005275 alloying Methods 0.000 description 2
238000004458 analytical method Methods 0.000 description 2
125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
230000000052 comparative effect Effects 0.000 description 2
229910052802 copper Inorganic materials 0.000 description 2
239000010949 copper Substances 0.000 description 2
238000004070 electrodeposition Methods 0.000 description 2
239000008151 electrolyte solution Substances 0.000 description 2
238000005363 electrowinning Methods 0.000 description 2
125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
229910000457 iridium oxide Inorganic materials 0.000 description 2
239000011133 lead Substances 0.000 description 2
229910001092 metal group alloy Inorganic materials 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
229910052750 molybdenum Inorganic materials 0.000 description 2
239000011733 molybdenum Substances 0.000 description 2
XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
150000002815 nickel Chemical class 0.000 description 2
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
235000019333 sodium laurylsulphate Nutrition 0.000 description 2
239000000126 substance Substances 0.000 description 2
UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
229910052725 zinc Inorganic materials 0.000 description 2
239000011701 zinc Substances 0.000 description 2
RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 1
229910000851 Alloy steel Inorganic materials 0.000 description 1
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
VSRRDIARGZMZMK-UHFFFAOYSA-N C(CC(C)C)[Ni] Chemical compound C(CC(C)C)[Ni] VSRRDIARGZMZMK-UHFFFAOYSA-N 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
239000004215 Carbon black (E152) Substances 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 1
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
229910003289 NiMn Inorganic materials 0.000 description 1
229910005887 NiSn Inorganic materials 0.000 description 1
229910003962 NiZn Inorganic materials 0.000 description 1
229910021607 Silver chloride Inorganic materials 0.000 description 1
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
XZTXVFPVAZMFPZ-UHFFFAOYSA-N [Ni].S(N)(O)(=O)=O.[Ni] Chemical compound [Ni].S(N)(O)(=O)=O.[Ni] XZTXVFPVAZMFPZ-UHFFFAOYSA-N 0.000 description 1
WVVVAOMVAADQBW-UHFFFAOYSA-N [Ni].[CH2]C(C)C Chemical compound [Ni].[CH2]C(C)C WVVVAOMVAADQBW-UHFFFAOYSA-N 0.000 description 1
230000004913 activation Effects 0.000 description 1
239000013543 active substance Substances 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
150000001408 amides Chemical class 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
239000010953 base metal Substances 0.000 description 1
BEHLMOQXOSLGHN-UHFFFAOYSA-N benzenamine sulfate Chemical compound OS(=O)(=O)NC1=CC=CC=C1 BEHLMOQXOSLGHN-UHFFFAOYSA-N 0.000 description 1
MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
230000008859 change Effects 0.000 description 1
VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000005336 cracking Methods 0.000 description 1
238000002425 crystallisation Methods 0.000 description 1
230000008025 crystallization Effects 0.000 description 1
125000000753 cycloalkyl group Chemical group 0.000 description 1
CFBGXYDUODCMNS-UHFFFAOYSA-N cyclobutene Chemical compound C1CC=C1 CFBGXYDUODCMNS-UHFFFAOYSA-N 0.000 description 1
125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
125000003678 cyclohexadienyl group Chemical group C1(=CC=CCC1)* 0.000 description 1
125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000002950 deficient Effects 0.000 description 1
238000006731 degradation reaction Methods 0.000 description 1
229940075933 dithionate Drugs 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000003628 erosive effect Effects 0.000 description 1
HXOWNKKNTHGSEL-UHFFFAOYSA-N ethanesulfonic acid;nickel Chemical compound [Ni].CCS(O)(=O)=O HXOWNKKNTHGSEL-UHFFFAOYSA-N 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
230000006355 external stress Effects 0.000 description 1
BRWIZMBXBAOCCF-UHFFFAOYSA-N hydrazinecarbothioamide Chemical compound NNC(N)=S BRWIZMBXBAOCCF-UHFFFAOYSA-N 0.000 description 1
229930195733 hydrocarbon Natural products 0.000 description 1
GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
230000006872 improvement Effects 0.000 description 1
239000012535 impurity Substances 0.000 description 1
239000000543 intermediate Substances 0.000 description 1
229910000765 intermetallic Inorganic materials 0.000 description 1
229910052741 iridium Inorganic materials 0.000 description 1
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
229910052749 magnesium Inorganic materials 0.000 description 1
239000011777 magnesium Substances 0.000 description 1
229910052748 manganese Inorganic materials 0.000 description 1
239000011572 manganese Substances 0.000 description 1
238000010907 mechanical stirring Methods 0.000 description 1
150000002736 metal compounds Chemical class 0.000 description 1
229910021645 metal ion Inorganic materials 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
238000002156 mixing Methods 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 1
PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
229910001120 nichrome Inorganic materials 0.000 description 1
QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
229910001453 nickel ion Inorganic materials 0.000 description 1
229910000480 nickel oxide Inorganic materials 0.000 description 1
BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
229910021652 non-ferrous alloy Inorganic materials 0.000 description 1
125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
239000006259 organic additive Substances 0.000 description 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
230000000737 periodic effect Effects 0.000 description 1
239000004033 plastic Substances 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
229910052697 platinum Inorganic materials 0.000 description 1
229910003446 platinum oxide Inorganic materials 0.000 description 1
239000010970 precious metal Substances 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
235000017557 sodium bicarbonate Nutrition 0.000 description 1
MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
229950000244 sulfanilic acid Drugs 0.000 description 1
LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
229910052717 sulfur Inorganic materials 0.000 description 1
239000011593 sulfur Substances 0.000 description 1
239000013589 supplement Substances 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
230000002194 synthesizing effect Effects 0.000 description 1
YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
229910052718 tin Inorganic materials 0.000 description 1
239000011135 tin Substances 0.000 description 1
LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)

CNB981149332A 1997-06-18 1998-06-18 用于电镀低应力镍的组合物和方法 Expired - Fee Related CN1142327C (zh)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date
US5014097P	1997-06-18	1997-06-18
US60/050,140		1997-06-18
US6492398A	1998-04-23	1998-04-23
US09/064,923		1998-04-23

Publications (2)

Publication Number	Publication Date
CN1213019A CN1213019A (zh)	1999-04-07
CN1142327C true CN1142327C (zh)	2004-03-17

Family

ID=26727930

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CNB981149332A Expired - Fee Related CN1142327C (zh)	1997-06-18	1998-06-18	用于电镀低应力镍的组合物和方法

Country Status (5)

Country	Link
EP (1)	EP0892087A3 (fr)
JP (1)	JPH1171695A (fr)
CN (1)	CN1142327C (fr)
CA (1)	CA2236933A1 (fr)
SG (1)	SG63851A1 (fr)

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JP4707844B2 (ja) *	2001-02-09	2011-06-22	住友電工ファインポリマー株式会社	電鋳ニッケルベルト、被覆ニッケルベルト、及び被覆ニッケルベルトの製造方法
FR2895206B1 (fr) *	2005-12-16	2008-03-21	Framatome Anp Sas	Canne chauffante pour pressuriseur de circuit primaire d'un reacteur nucleaire a eau sous pression.
MY151755A (en) *	2007-12-28	2014-06-30	Shinetsu Chemical Co	Outer blade cutting wheel and making method
CN101831675B (zh) *	2010-05-21	2012-03-14	南通市申海特种镀饰有限责任公司	超导材料镀镍工艺
CN103160868A (zh) *	2011-12-17	2013-06-19	鞍钢重型机械有限责任公司	一种用于生产含硫活性镍的电解液及其使用方法
CN103422150A (zh) *	2012-05-22	2013-12-04	泰州宏瑞新材料有限责任公司	用于电镀的重金属离子浓度调节槽及电镀装置
CN102677103B (zh) *	2012-06-05	2014-10-29	湖北联合天诚防伪技术股份有限公司	电铸版图案尺寸扩大的方法
CN105200462A (zh) *	2015-10-19	2015-12-30	姜少群	一种结晶器铜管的单质镍过渡层电镀方法
CN114717612A (zh) *	2022-03-29	2022-07-08	集美大学	利用Cr纳米层实现微结构光学铜模保护和脱模的方法
EP4716770A1 (fr)	2023-05-22	2026-04-01	Tata Steel IJmuiden B.V.	Procédé de préparation d'un électrolyte au nickel et son utilisation dans un procédé d'électrodéposition
KR20260071271A (ko)	2023-12-25	2026-05-19	딥솔 가부시키가이샤	전기 도금액 및 그것을 사용하여 물품을 전기 도금하는 방법
CN119640348B (zh) *	2025-01-23	2025-11-25	中国恩菲工程技术有限公司	一种电解法生产镍箔的方法

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GB1000311A (en) *	1962-10-25	1965-08-04	Albright & Wilson Mfg Ltd	Electrodeposition of nickel
FR1582093A (fr) *	1968-05-31	1969-09-26
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1998
- 1998-06-10 CA CA 2236933 patent/CA2236933A1/fr not_active Abandoned
- 1998-06-11 EP EP98304642A patent/EP0892087A3/fr not_active Withdrawn
- 1998-06-12 SG SG1998001409A patent/SG63851A1/en unknown
- 1998-06-17 JP JP18572298A patent/JPH1171695A/ja not_active Withdrawn
- 1998-06-18 CN CNB981149332A patent/CN1142327C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CA2236933A1 (fr)	1998-12-18
JPH1171695A (ja)	1999-03-16
CN1213019A (zh)	1999-04-07
EP0892087A3 (fr)	2000-06-07
SG63851A1 (en)	1999-03-30
EP0892087A2 (fr)	1999-01-20

Legal Events

Date	Code	Title
1999-04-07	C06	Publication
1999-04-07	PB01	Publication
2000-08-09	C10	Entry into substantive examination
2000-08-09	SE01	Entry into force of request for substantive examination
2004-03-17	C14	Grant of patent or utility model
2004-03-17	GR01	Patent grant
2009-08-19	C19	Lapse of patent right due to non-payment of the annual fee
2009-08-19	CF01	Termination of patent right due to non-payment of annual fee

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