CN116445864A - System and method for monitoring and regulating uniformity of coating - Google Patents

Abstract

The embodiment of the present invention provides a coating uniformity monitoring and control system and method, the system includes: a vacuum winding coating device, which includes an unwinding mechanism, an evaporation mechanism and a winding mechanism for evaporating the base film; Measuring device for measuring the temperature value of the evaporation mechanism; surface resistance testing device for measuring the surface resistance value of the base film; control device for according to the temperature value of the evaporation mechanism and the base film The area resistance value is used to control the transmission speed of the base film of the unwinding mechanism and/or the heating power of the evaporation mechanism, so that the thickness of the coating layer along the moving direction of the base film is uniform. The present invention can achieve more consistent coating thickness uniformity in the film running direction based on the matching of temperature control and coating speed.

Description

A coating uniformity monitoring and control system and method

technical field

The invention relates to a uniformity monitoring and regulation control system of a coating film layer in a vacuum winding coating process, especially to verify the uniformity of the coating film in the MD direction (moving direction) of the coating film transmission direction, and specifically relates to a coating uniformity monitoring and control system systems and methods.

Background technique

In the field of vacuum coating, especially large-area flexible substrate surface coating equipment systems, the coating methods include vacuum magnetron sputtering coating and vacuum thermal evaporation system coating. Vacuum thermal evaporation system coating is usually divided into two aspects. One is coating by evaporation boat. For example, coating in the field of packaging film is the most common, that is, there are related wire feeding mechanisms that continuously transport the coating to the surface of the evaporation boat under high temperature. When the material touches or is about to touch the surface of the evaporation boat, it is instantly vaporized and deposited on the surface of the base film because it is much higher than the melting temperature of the material. The advantage of this method is that the heating and cooling process of the relevant mechanism is very fast, but there are fatal The problem is that with the prolongation of the use time of the evaporation boat, serious corrosion pits appear on the surface. When the evaporated material is placed near the corrosion pit, the evaporation process is easy to form a sputtering phenomenon, which causes burning holes in the flexible base film, resulting in the use of coating materials. suppressed.

Based on this problem, another technical means has been developed. First, the evaporated material is placed in a high-temperature resistant container, which is inside the electric heating device and the heat preservation/temperature measuring system. When the electric heating device is turned on, the temperature of the high-temperature resistant container Elevation, resulting in the transformation of the internal evaporated material from a solid-liquid-gas process, and finally the material is deposited on the surface of the substrate. The significant advantage of this method is that the state of the material during the evaporation process is relatively stable, and the problem of sputtering hole burning in the evaporated material is not easy to occur, thus more significantly avoiding the application defects faced by the coated product.

However, this method also has some disadvantages. For example, the system heats the container by means of electric heating and heat conduction, and then the container heats the material to be evaporated, and finally achieves the effect of vaporizing the material to be evaporated. The heating process of the whole system is relatively slow, and it takes longer for the temperature of the material to be evaporated in the container and the temperature of the container/insulation material to reach a relatively stable equilibrium. Large, and the process evaporation is unstable, in an unstable evaporation state, a large amount of these evaporation materials will be evaporated and wasted, especially on the coating baffle and will be wasted, which will cause a certain amount of loading The actual number of meters of the evaporated material that can be coated is greatly reduced.

On the other hand, since the electric heating part of the heater will also change its own heat output with the increase of the thermal environment temperature, so the evaporation amount in the initial state is unstable, so the baffle is opened directly at a certain speed The uniformity of the coating in the MD direction is relatively poor.

Contents of the invention

In view of this, the purpose of the embodiments of the present invention is to provide a coating uniformity monitoring and regulation system and regulation method, so as to solve the problems in the prior art.

In the first aspect, an embodiment of the present invention provides a coating uniformity monitoring and control system, the system comprising:

A vacuum winding coating device, which includes an unwinding mechanism, an evaporation mechanism and a winding mechanism for evaporating the base film;

a temperature measuring device for measuring the temperature value of the evaporation mechanism;

Area resistance testing device, for measuring the area resistance value of described base film;

The control device is used to control the transmission speed of the base film of the unwinding mechanism and/or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, so that the coating layer along the The thickness of the base film in the moving direction has uniformity.

In some possible implementation manners, the control device is specifically configured to, according to the functional relationship between the transmission speed of the base film under the preset surface resistance threshold and the temperature value of the evaporation mechanism, and the real-time The temperature value determines the real-time base film transmission speed of the unwinding mechanism.

In some possible implementations, the evaporating mechanism includes a first evaporating system and a second evaporating system, the first evaporating system is arranged upstream of the second evaporating system along the transport path of the base film;

The temperature measurement device includes: a first temperature detector, arranged on the first evaporation system, for measuring the first temperature value of the first evaporation system; and, a second temperature detector, arranged on the On the second evaporation system, used to measure the second temperature value of the second evaporation system;

The surface resistance testing device includes: a first surface resistance tester, which is arranged on the base film transmission path between the first evaporation system and the second evaporation system, and is used to measure the current coating surface of the base film The first surface resistance value; and, the second surface resistance tester is arranged on the base film transmission path between the second evaporation system and the winding mechanism, and is used to measure both sides of the base film The total areal resistance of the formed coating, and the second areal resistance of another coating surface obtained according to the difference between the total areal resistance and the first areal resistance.

In some possible implementation manners, the control device is specifically configured to, when the first surface resistance value reaches a preset surface resistance threshold, according to the base film transmission speed and The first functional relationship between the temperature values of the first evaporation system and the real-time temperature values of the first evaporation system determines the real-time transmission speed of the base film; according to the base film under the preset area resistance threshold The second functional relationship between the transmission speed and the temperature value of the second evaporation system, and the real-time base film transmission speed, obtain the ideal temperature value of the second evaporation system; according to the ideal temperature value of the second evaporation system As a result of the comparison between the temperature value and the actual temperature value of the second evaporation system, the heating power of the second evaporation system is adjusted.

In some possible implementation manners, the control device is specifically used for:

If the ideal temperature value of the second evaporating system is greater than the actual temperature value of the second evaporating system, control to increase the heating power of the second evaporating system, and control the heating power of the second evaporating system to be greater than the The heating power of the first evaporating system; if the ideal temperature value of the second evaporating system is less than the actual temperature value of the second evaporating system, then control to reduce the heating power of the second evaporating system, and control the first The heating power of the second evaporation system is smaller than the heating power of the first evaporation system.

In some possible implementation manners, the control device is specifically used for:

When the first area resistance reaches the preset area resistance threshold before the second area resistance, according to the base film transmission speed under the preset area resistance threshold and the first evaporation system The first functional relationship between the temperature values and the real-time temperature value of the first evaporation system determine the real-time base film transmission speed; according to the base film transmission speed under the preset area resistance threshold and the second The second functional relationship between the temperature values of the evaporation system and the real-time base film transmission speed obtains the ideal temperature value of the second evaporation system; according to the ideal temperature value of the second evaporation system and the second adjusting the heating power of said second evaporation system as a result of the comparison between the actual temperature values of the evaporation system; or,

When the second area resistance reaches the preset area resistance threshold before the first area resistance value, according to the transmission speed of the base film under the preset area resistance threshold and the second evaporation system The second functional relationship between the temperature values and the real-time temperature value of the second evaporation system determine the real-time base film transmission speed; according to the base film transmission speed under the preset area resistance threshold and the first The first functional relationship between the temperature values of the evaporation system and the real-time base film transmission speed obtains the ideal temperature value of the first evaporation system; according to the ideal temperature value of the first evaporation system and the first As a result of the comparison between the actual temperature values of the evaporation system, the heating power of the first evaporation system is adjusted.

In a second aspect, a coating uniformity monitoring and regulation method is provided, the method comprising:

Obtain the temperature value of the evaporation mechanism;

Obtain the areal resistance of the base film;

According to the temperature value of the evaporation mechanism and the area resistance value of the base film, the transmission speed of the base film of the unwinding mechanism and/or the heating power of the evaporation mechanism are controlled so that the thickness of the coating along the moving direction of the base film has Uniformity.

In some possible implementation manners, the controlling the transmission speed of the base film of the unwinding mechanism according to the temperature value of the evaporation mechanism and the area resistance value of the base film specifically includes:

The real-time base film transmission speed of the unwinding mechanism is determined according to the functional relationship between the base film transmission speed under the preset surface resistance threshold and the temperature value of the evaporation mechanism, and the real-time temperature value of the evaporation mechanism.

In some possible implementations, the evaporating mechanism includes a first evaporating system and a second evaporating system, the first evaporating system is arranged upstream of the second evaporating system along the transport path of the base film; the method specifically include:

acquiring a first temperature value of the first evaporation system, and acquiring a second temperature value of the second evaporation system;

Acquiring the first surface resistance value of the current coating surface of the base film, obtaining the total surface resistance value of the coating layer formed on both sides of the base film, and according to the total surface resistance value and the first surface resistance value The difference of the second surface resistance value of the other coating surface is obtained;

When the first surface resistance value reaches a preset surface resistance threshold value, according to the first functional relationship between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system , and the real-time temperature value of the first evaporation system to determine the real-time base film transmission speed;

According to the second functional relationship between the base film transmission speed under the preset area resistance threshold and the temperature value of the second evaporation system, and the real-time base film transmission speed, the second evaporation system is obtained ideal temperature value;

According to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system, the heating power of the second evaporation system is adjusted.

In some possible implementation manners, the heating power of the second evaporation system is adjusted according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system, Specifically include:

If the ideal temperature value of the second evaporating system is greater than the actual temperature value of the second evaporating system, control to increase the heating power of the second evaporating system, and control the heating power of the second evaporating system to be greater than the The heating power of the first evaporation system or the temperature increase rate of the second evaporation system is greater than the temperature increase rate of the first evaporation system; if the ideal temperature value of the second evaporation system is smaller than the second evaporation system If the actual temperature value is lower, the heating power of the second evaporating system is controlled to be reduced, and the heating power of the second evaporating system is controlled to be smaller than the heating power of the first evaporating system or the temperature of the second evaporating system is controlled to increase. The speed is less than the temperature growth rate of the first evaporation system.

In some possible implementations, the evaporating mechanism includes a first evaporating system and a second evaporating system, the first evaporating system is arranged upstream of the second evaporating system along the transport path of the base film; the method specifically include:

acquiring a first temperature value of the first evaporation system, and acquiring a second temperature value of the second evaporation system;

Obtaining the resistance value of the first surface of the current coating surface of the base film, and obtaining the resistance value of the second surface of both sides of the base film;

When the first area resistance reaches the preset area resistance threshold before the second area resistance, according to the base film transmission speed under the preset area resistance threshold and the first evaporation system The first functional relationship between the temperature values and the real-time temperature value of the first evaporation system determine the real-time base film transmission speed; according to the base film transmission speed under the preset area resistance threshold and the second The second functional relationship between the temperature values of the evaporation system and the real-time base film transmission speed obtains the ideal temperature value of the second evaporation system; according to the ideal temperature value of the second evaporation system and the second adjusting the heating power of said second evaporation system as a result of the comparison between the actual temperature values of the evaporation system; or,

When the second area resistance reaches the preset area resistance threshold before the first area resistance value, according to the transmission speed of the base film under the preset area resistance threshold and the second evaporation system The second functional relationship between the temperature values and the real-time temperature value of the second evaporation system determine the real-time base film transmission speed; according to the base film transmission speed under the preset area resistance threshold and the first The first functional relationship between the temperature values of the evaporation system and the real-time base film transmission speed obtains the ideal temperature value of the first evaporation system; according to the ideal temperature value of the first evaporation system and the first As a result of the comparison between the actual temperature values of the evaporation system, the heating power of the first evaporation system is adjusted.

In a third aspect, a computer-readable storage medium is provided, on which a computer program is stored, and when the program is executed by a processor, any method for monitoring and regulating coating uniformity described in the second aspect is implemented.

In a fourth aspect, a computer device is provided, which includes:

one or more processors;

storage means for storing one or more programs;

When the one or more programs are executed by the one or more processors, the one or more processors are made to implement any method for monitoring and regulating coating uniformity as described in the second aspect.

The above technical scheme has the following beneficial effects:

Under the same coating speed, the value deviation of the surface resistance test in the single-sided MD direction is within the expected range, and the value deviation of the surface resistance test value in the MD direction on both sides is within the control range;

Carry out coating regulation with low evaporation in advance to improve the efficiency of coating and the utilization rate of evaporated materials;

Reduce the ineffective deposition coating on the baffle above the high-temperature resistant evaporation container, so as to reduce the entire evaporation process, because the deposited coating under the baffle is too much and cannot be adhered or handled inconveniently, and eventually falls into the high-temperature resistant container to form a splash phenomenon , to avoid damage to the high temperature evaporation container and damage the apparent quality of the substrate.

Description of drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.

Fig. 1 is a schematic structural diagram of a coating uniformity monitoring and control system according to an embodiment of the present invention;

2 is a schematic flow diagram of a coating uniformity monitoring and control system according to an embodiment of the present invention;

FIG. 3 is a second schematic flow diagram of a coating uniformity monitoring and control system according to an embodiment of the present invention.

Explanation of reference numbers:

A1, Unwinding roller; A2, Rewinding roller;

B1, the first roller; B2, the second roller; B3, the third roller; B4, the fourth roller;

C1, the first flattening roller; C2, the second flattening roller; C3, the third flattening roller;

D1, the first coating cooling drum; D2, the second coating cooling drum;

E1, the first evaporation system; E2, the second evaporation system;

E11, the first temperature detector; E21, the second temperature detector;

E12, the first thermal insulation material; E22, the second thermal insulation material;

E13, the first heating electrode; E23, the second heating electrode;

E14, the first evaporation container; E24, the second evaporation container;

F1, the first surface resistance tester; F2, the second surface resistance tester.

Detailed ways

Features and exemplary embodiments of various aspects of the invention will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some of these specific details. The following description of the embodiments is only to provide a better understanding of the present invention by showing examples of the present invention. In the drawings and the following description, at least some well-known structures and techniques have not been shown in order to avoid unnecessarily obscuring the present invention; and, for clarity, the dimensions of some structures may have been exaggerated. Furthermore, the features, structures, or characteristics described hereinafter may be combined in any suitable manner in one or more embodiments.

Based on the existing vacuum coating system in the industry, there are technical problems such as the change of the evaporation amount of the evaporated material at the evaporation source, the waste of the evaporated material, and the apparent unevenness of the coating thickness in the MD direction (film-moving direction). The embodiment of the present invention intends to use the following technical solutions to better solve the above-mentioned problems, mainly through the dual control of the transmission speed of the base film and the temperature of the evaporation system, so as to realize the early opening of the baffle plate to run the film coating even in the unsteady evaporation stage of the evaporation source system Action, based on the matching of temperature control and coating speed (unwinding end base film transmission speed), the uniformity of coating thickness in MD direction is more consistent.

The technical problems to be solved in the embodiments of the present invention include the following: how to ensure the consistency of the thickness of the film layer in the direction of the film; how to use the coating evaporation system to coat the film efficiently and realize the high utilization rate of the coating material; how to avoid the baffle too fast Depositing a considerable thickness of film will affect subsequent production.

An embodiment of the present invention provides a coating uniformity monitoring and control system, which includes system components with basic vacuum winding coating functions, especially a temperature measuring device that is closest to the high-temperature evaporation source in the evaporation system, a non-contact eddy current resistor The testing device and the speed control device of the coating substrate send instructions to control the coating speed by collecting temperature data and resistance data.

In the embodiment of the present invention, a high-temperature-resistant container is used to hold the coating material, and the coating material is heated by an electric heating device for auxiliary heat preservation to form a thin film on the surface of the substrate after vaporization and evaporation. The thickness uniformity of the film layer in the MD direction of the coating material is controlled, and the control command of the temperature and film speed is issued through the test feedback result of the non-contact surface resistance tester of the substrate.

An embodiment of the present invention provides a coating uniformity monitoring and control system, the system includes:

A vacuum winding coating device, which includes an unwinding mechanism, an evaporation mechanism and a winding mechanism for evaporating the base film;

The temperature measurement device is used to measure the temperature value of the evaporation mechanism, specifically, it can measure the temperature value of the graphite heating electrode.

Surface resistance testing device for measuring the surface resistance of the base film;

The control device is used to control the transmission speed of the base film of the unwinding mechanism and/or the heating power of the evaporation mechanism according to the temperature value of the evaporation mechanism and the area resistance value of the base film, so that the thickness of the coating layer along the moving direction of the base film is uniform. sex.

In some embodiments, a coating baffle is arranged above the evaporation mechanism, and the control device is also used to control the unwinding mechanism to turn on the base film transmission and open the coating baffle when the temperature of the evaporation mechanism reaches the preset coating temperature threshold .

In some embodiments, the control device is specifically used to determine the real-time temperature of the unwinding mechanism according to the functional relationship between the base film transmission speed and the temperature value of the evaporation mechanism under the preset surface resistance threshold, and the real-time temperature value of the evaporation mechanism. Basement membrane transmission speed.

As shown in Figure 1, the coating uniformity monitoring and control system includes: unwinding roller A1, first passing roller B1, first flattening roller C1, first coating cooling drum D1, first evaporation system E1, second passing roller Roller B2, third passing roller B3, first surface resistance tester F1, second flattening roller C2, second coating cold drum D2, second evaporation system E2, fourth passing roller B4, second surface resistance tester F2 , the third flattening roll C3 and winding roll A2.

The first evaporation system E1 is arranged under the first coating cold drum D1, and the first evaporation system E1 includes: a first temperature detector E11, a first heat preservation material E12, a first heating electrode E13 and a first evaporation container E14. At least one hole is arranged in the first heating electrode E13, and one or more first evaporation containers E14 are installed in the corresponding holes of the first heating electrode E13, and the first evaporation container E14 has evaporation materials. The first thermal insulation material E12 may be located around the first heating electrode E13 (such as a graphite heating electrode), and may also be located around the first evaporation container E14 (such as a crucible).

The second evaporation system E2 is arranged below the second coating cold drum D2, and the second evaporation system E2 includes: a second temperature detector E21, a second heat preservation material E22, a second heating electrode E23 and a second evaporation container E24. At least one hole is provided in the second heating electrode E23, and one or more second evaporation containers E24 are installed in the corresponding holes of the second heating electrode E23, and the second evaporation container E24 has evaporation material. The second thermal insulation material E22 can be located around the second heating electrode E23 (such as a graphite heating electrode), and can also be located around the second evaporation container E24 (such as a crucible).

The film to be coated starts from the unwinding roller A1, and passes through the first roller B1, the first flattening roller C1, the first coating cold drum D1, the second roller B2, the third roller B3, and the second flattening roller. C2, the second coating cooling drum D2, the fourth passing roller B4, the third flattening roller C3, reaching the winding roller A2.

The first flattening roll C1 and the second passing roll B2 are respectively arranged on both sides of the first coating cold drum D1, and the second flattening roll C2 and the fourth passing roll B4 are respectively arranged on both sides of the second coating cold drum D2. The first passing roller B1 is arranged between the unwinding roller A1 and the first flattening roller C1, the third passing roller B3 is arranged between the second passing roller B2 and the second flattening roller C2, and the third flattening roller C3 is arranged Between the fourth passing roller B4 and the winding roller A2.

In other embodiments, the number of the above-mentioned passing rolls and flattening rolls can be increased or decreased.

The first areal resistance tester F1 and the second areal resistance tester F2 can perform non-contact measurement of the areal resistance of one or both sides of the film.

In some embodiments, the evaporation mechanism includes a first evaporation system E1 and a second evaporation system E2, and the first evaporation system E1 is arranged upstream of the second evaporation system E2 along the base film transport path;

The temperature measurement device includes: a first temperature detector E11, set on the first evaporation system E1, for measuring the first temperature value of the first evaporation system E1; a second temperature detector E21, set on the second evaporation system E2 , for measuring the second temperature value of the second evaporation system E2;

The area resistance testing device includes: a first area resistance tester F1, which is arranged on the base film transmission path between the first evaporation system E1 and the second evaporation system E2, and is used to measure the first area resistance of the current coating surface of the base film. Value; The second area resistance tester F2 is arranged on the base film transmission path between the second evaporation system E2 and the winding mechanism, and is used to measure the total area resistance of the coating formed on both sides of the base film, and according to The difference between the total surface resistance and the first surface resistance obtains the second surface resistance of the other coating surface;

The control device is specifically used to, when the first surface resistance value reaches the preset surface resistance threshold value, according to the first function between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system E1 relationship, and the real-time temperature value of the first evaporation system E1, determine the real-time base film transmission speed; according to the second functional relationship between the base film transmission speed under the preset area resistance threshold and the temperature value of the second evaporation system E2 , and the real-time base film transmission speed to obtain the ideal temperature value of the second evaporation system E2; according to the comparison result between the ideal temperature value of the second evaporation system E2 and the actual temperature value of the second evaporation system E2, adjust the second evaporation system E2 heating power.

In some embodiments, the control device is specifically used for:

If the ideal temperature value of the second evaporation system E2 is greater than the actual temperature value of the second evaporation system E2, the control increases the heating power of the second evaporation system E2, and controls the heating power of the second evaporation system E2 to be greater than that of the first evaporation system E1 Heating power; if the ideal temperature value of the second evaporating system E2 is less than the actual temperature value of the second evaporating system E2, then control to reduce the heating power of the second evaporating system E2, and control the heating power of the second evaporating system E2 to be less than the first Heating power of evaporation system E1.

In some embodiments, the control device can also be specifically used for:

When the first area resistance value reaches the preset area resistance threshold value before the second area resistance value, according to the first value between the transmission speed of the base film at the preset area resistance threshold value and the temperature value of the first evaporation system E1 Functional relationship, and the real-time temperature value of the first evaporation system E1, determine the real-time base film transmission speed; according to the second function between the base film transmission speed under the preset area resistance threshold and the temperature value of the second evaporation system E2 relationship, and the real-time base film transmission speed to obtain the ideal temperature value of the second evaporation system E2; according to the comparison result between the ideal temperature value of the second evaporation system E2 and the actual temperature value of the second evaporation system E2, adjust the second evaporation heating power of system E2; or,

When the second area resistance value reaches the preset area resistance threshold value before the first area resistance value, according to the second value between the transmission speed of the base film under the preset area resistance threshold value and the temperature value of the second evaporation system E2 Functional relationship, and the real-time temperature value of the second evaporation system E2, determine the real-time base film transmission speed; according to the first function between the base film transmission speed under the preset area resistance threshold and the temperature value of the first evaporation system E1 relationship, and the real-time base film transmission speed to obtain the ideal temperature value of the first evaporation system E1; according to the comparison result between the ideal temperature value of the first evaporation system E1 and the actual temperature value of the first evaporation system E1, adjust the first evaporation Heating power of system E1.

In some embodiments, the control device is also used to control the increase of the base film transmission speed of the unwinding mechanism when the first area resistance exceeds the preset area resistance threshold; and if the second area resistance decreases, increase the second area resistance. The heating power of the second evaporation system E2.

This system can be a single-sided coating method or a double-sided coating method; further, if it is a double-sided coating method, it is necessary to control the temperature near each side of the coating, calculate the surface resistance test, and issue speed control commands. Furthermore, the double-sided coating method finally achieves consistent coating thickness under the same coating speed.

The technical effects achieved by the embodiments of the present invention include:

Under the same coating speed, the value deviation of the surface resistance test in the single-sided MD direction is within the expected range, and the value deviation of the surface resistance test value in the MD direction on both sides is within the control range;

Carry out coating regulation with low evaporation in advance to improve the efficiency of coating and the utilization rate of evaporated materials;

Reduce the ineffective deposition coating on the baffle above the high-temperature resistant evaporation container, so as to reduce the entire evaporation process, because the deposited coating under the baffle is too much and cannot be adhered or handled inconveniently, and eventually falls into the high-temperature resistant container to form a splash phenomenon , to avoid damage to the high temperature evaporation container and damage the apparent quality of the substrate.

A more detailed description is given below:

The vacuum coating system shown in Figure 1, when the high temperature resistant container (the first evaporation container E14 and/or the second evaporation container E24) is filled with the preset material to be evaporated and the related equipment is ready, then start vacuuming, After the vacuum is better than 5*10 ^-2 Pa, start the electric heating device (the first heating electrode E13 and/or the second heating electrode E23) to promote the evaporation system (the first evaporation system E1 and/or the second evaporation system The temperature of E2) gradually increases, and during the continuous temperature increase process, the baffles that block the base film material above the high-temperature resistant containers E14 and E24 are always located at the top, which is mainly used to avoid evaporation of the evaporated material under unexpected conditions. to the surface of the base film material, or radiate excessive heat to the base film material. Materials that need to be evaporated and coated, such as Al, Ag, etc., are placed in the high-temperature resistant evaporation containers E14 and E24. In the embodiment of the present invention, the Al material is taken as an example. Al has begun to melt around 600°C, and gradually changes from a solid state to a liquid state. Finally, as the temperature of the electric heating device increases, the liquid aluminum will gradually gasify, that is, transform It is a gaseous state. Generally, the stable evaporation coating of Al materials requires a temperature of about 1200 ° C. In a vacuum environment, the temperature rise of the electric heating device is mainly carried out by heat conduction and radiation. The main method of the electric heating device is conduction. It takes a long time, such as 60 minutes, to increase the temperature from about 600°C to a stable state of about 1200°C, especially during the period, the closer to the high temperature, the higher the saturated vapor pressure, that is, the greater the evaporation.

Wherein, the electric heating device or electric heater may specifically include a graphite heating electrode; the evaporation system includes a graphite heating electrode, a crucible and an evaporation material, the graphite heating electrode has holes, the crucible is located in the hole, and the crucible has an evaporation material.

Therefore, the technical solution of the embodiment of the present invention is to turn on the transmission of the base film when the temperature increases to a certain range, for example, when the temperature is around 950°C, while maintaining a coating speed of 56m/min, open the baffle plates above the evaporation containers E14 and E24 For coating. The temperature of the heater during the coating process is still rising to a steady state, that is, the evaporation rate or the deposition rate of the film continues to increase. In this process, the coating speed needs to be continuously increased to maintain the same thickness of the coating in the MD direction before and after; Further, the coating speed is comprehensively corrected according to the coating thickness of the non-contact eddy current resistance testing instrument F1 shown in FIG. 1 .

As shown in Figure 1, if it is a single-sided evaporation system, it only involves the coating speed, the first evaporation system E1, the corresponding first temperature detector E11 and the first non-contact eddy current resistance testing instrument F1, wherein the non-contact eddy current The resistance testing instrument F1 only tests the surface resistance of one side, which can be converted into the corresponding coating thickness.

If it is a double-sided coating system, the second evaporation system E2, the related second temperature detector E21 and the second non-contact eddy current resistance testing instrument F2 are added on the basis of the single-sided coating system. The parameters of the coating are comprehensively adjusted for the coating state. The coating speed is determined mainly based on the parameters of the first temperature detector E11, the second temperature detector E21, the first non-contact eddy current resistance tester F1, and the second non-contact eddy current resistance tester F2 and their changing trends. Especially in order to ensure that the thickness of the coating on both sides is the same (or the difference is within the acceptable quality control range) and the speed of the entire coating is set in consideration of the setting of the double-sided simultaneous coating system, it is necessary to use the first The parameters of the temperature detector E11 and the second temperature detector E21 are set.

Before determining the speed control mode, the following parameters need to be determined:

At the beginning of the coating, the first temperature detector E11 tests the temperature T10, the coating speed V1, and the surface resistance test R10; when the coating is in a steady state, the first temperature detector E11 tests the temperature T20, the coating speed V2, and the surface resistance test R11, that is, keep Under the initial state and steady state, the lower resistance test is consistent, that is, the fluctuation range of R10≈R11 is within an acceptable range. In this case, by changing the coating speed to match the evaporation of the material at different temperatures, the relationship between the coating speed and the electric heater temperature under the preset surface resistance is finally obtained. Of course, the process-related electric The input power of the heater and the heating time are all used as the process control conditions in this mode, and the relationship between them can be obtained by fitting the curve through numerical simulation: Y1=0.0623e ^0.0057x1 , where x1 represents the temperature, and Y1 Indicates the unwinding speed. Formula 1 described below is for the first evaporating system E1, x1 represents the temperature value of the first evaporating system E1, Y1 represents the unwinding speed corresponding to the first evaporating system E1; formula 2 is for the second evaporating system E2 In the formula, x1 represents the temperature value of the second evaporation system E2, and Y1 represents the unwinding speed corresponding to the second evaporation system E2.

The above relational expression means that based on the operation at 1000°C when the evaporation baffle is opened at the beginning, the coating speed V1=78m/min reaches the surface resistance R10, and as the heating temperature rises, the evaporation rate gradually increases, and then maintains When R11 and R10 have similar surface resistance after coating, the coating speed will change. For example, at 1200°C, the coating speed is 125m/min; that is, in this case based on the fitting formula x1=1200, Y1=125.

Based on the same idea, if the embodiment of the present invention is to control the double-sided coating, then only the calculation and simulation of the evaporation rate of the second evaporation system E2 can be performed first. That is, when the coating speed of V1=78m/min reaches the surface resistance of R10, the temperature value measured by the temperature detector E21 of the second evaporation system E2, because the temperature and evaporation rate of different evaporation source systems are different, then The process is also based on maintaining the same coating speed during single-sided coating and double-sided coating, and the same surface resistance when coating each side separately, so as to obtain the consistency of surface resistance when coating both sides at the same time. Through a series of data calculations and simulations, the temperature of the second evaporation system E2 is controlled at the coating speed corresponding to the evaporation system E1, that is, the temperature control of the second evaporation system is determined by reverse fitting.

However, in fact, it is formally mentioned above that the electric heater in a vacuum environment is affected by the heat conduction efficiency and heat capacity, and the temperature is difficult to reach the desired control range in a short time, that is, the temperature control has hysteresis. Therefore, in the actual control process, the embodiment of the present invention can use the similar algorithm of temperature control PID to carry out the temperature control of the first evaporation system E1 and the second evaporation system E2 synchronously, so as to ensure that the speed of F1 and F2 is achieved within a certain speed control range. The surface resistance of the newly added coating test is the same or similar (that is, meets the allowable range). Among them, the surface resistance of the newly added coating of the first non-contact eddy current resistance testing instrument F1 and the second non-contact eddy current resistance testing instrument F2 is the same, which can be understood as follows: when double-sided coating, the first non-contact eddy current resistance testing instrument F1 If the surface resistance is 800mΩ, it can be calculated corresponding to a certain thickness d1 under the condition of setting a certain conductivity, and further increase the thickness to 2d1 to calculate the surface resistance control of the second non-contact eddy current resistance testing instrument F2.

The actual control process requires the first evaporation system E1 and the second evaporation system E2 to control the temperature rise or fall, and to control the coating speed. That is, when the first evaporating system E1 and the second evaporating system E2 reach a certain temperature near which the baffle can be opened, the baffle is opened, and then the coating is carried out. In this case, the coating speed of V1 is set, according to the non-contact eddy current resistance tested The results of the test instrument F1 and the non-contact eddy current resistance test instrument F2 are controlled by the speed increment, and the temperature of the first evaporation system E1 and the second evaporation system E2 is gradually increased in the process.

In the case of multiple evaporation sources, the current prior art always uses baffles to block the coating material before the coating film reaches a steady state, which has the problem of wasting the coating material. The MD direction refers to the direction of the film, the greater the surface resistance, the thinner the coating. Since the characteristics of the second evaporation system E2 and the first evaporation system E1 are different, for example, the first evaporation system E1 can make the area resistance reach 800 milliohms at 1300 ° C and 55 m/min; while the second evaporation system E2 At 1400°C and 55m/min, the surface resistance can reach 800 milliohms.

The embodiment of the present invention hopes to embody such a control mode, and the actual fitting empirical formulas of different devices and different square resistance controls of the same device may also be different. In this embodiment, multiple adjustments can be made through the PID algorithm to achieve the same film thickness on both sides of the coating, that is, the square resistance test of one side is carried out with a square resistance meter during contact, and the square resistance shown is very close. . That is, the thickness of the single-sided film layer calculated based on the characteristic resistivity is very close or the difference is within the acceptable range of quality control.

The following example shows that more accurate data is obtained in combination with actual equipment operation, and the previous data is corrected based on this, for example:

First surface data: For example, set the surface resistance to 600mΩ; 900°C-35m/min; 950°C-41m/min; 1000°C-50m/min; 1050°C-62m/min; 92m/min; 1200°C-113m/min; 1250°C-129m/min; 1300°C-132m/min, in order to obtain a relatively stable evaporation state, while considering factors such as effective operation and maintenance of the equipment, the actual The temperature should not be continuously increased.

In this embodiment, the simulation of the empirical formula can be carried out based on the above-mentioned similar values, and the above-mentioned similar empirical formula can also be obtained when the second surface is coated separately. Make adjustments.

In addition, the lower the surface resistance, the thicker the film thickness, and if the evaporation efficiency (which can be regarded as the evaporation temperature) does not change, the coating speed needs to be reduced to obtain a thicker film layer; on the contrary, if the evaporation temperature is higher, the coating speed In the case of constant, the smaller the square resistance value, but the larger the coating thickness.

For example: the square resistance test of the first surface is 600mΩ, and the thickness is calculated to be about 65nm based on specific electrical parameters (if the coating is an Al film). If the coating is a copper film, just substitute the resistivity parameters of the copper film for calculation ; If the Al film is coated, the value of the square resistance testing instrument at the second position is the result measured by the eddy current induction of the coating film on both sides, and the target value should be around 300mΩ, so that the coating thickness of the second side and one side is 65nm It can be understood that 300mΩ is the square resistance value corresponding to the sum of the coating thicknesses on both sides.

FIG. 2 is a flow chart 1 of a coating uniformity monitoring and control method according to an embodiment of the present invention. As shown in Figure 2, the method includes the following steps:

S110: acquiring the temperature value of the evaporation mechanism;

S120: acquiring the areal resistance of the base film;

S130: According to the temperature value of the evaporation mechanism and the area resistance value of the base film, control the transmission speed of the base film of the unwinding mechanism and/or the heating power of the evaporation mechanism, so that the thickness of the coating layer along the moving direction of the base film is uniform.

In some embodiments, in S130, the base film transmission speed of the unwinding mechanism is controlled according to the temperature value of the evaporation mechanism and the surface resistance value of the base film, which specifically includes: according to the transmission speed of the base film under the preset surface resistance threshold and the evaporation The functional relationship between the temperature values of the mechanism and the real-time temperature value of the evaporation mechanism determines the real-time base film transmission speed of the unwinding mechanism.

In some embodiments, the method further includes: when the temperature of the evaporating mechanism reaches a preset coating temperature threshold, controlling the unwinding mechanism to start the base film transmission, and opening the coating baffle on the evaporating mechanism.

In some embodiments, the evaporating mechanism includes a first evaporating system and a second evaporating system, the first evaporating system being disposed upstream of the second evaporating system along the transport path of the base film.

FIG. 3 is a second flow chart of a coating uniformity monitoring and control method according to an embodiment of the present invention. As shown in Figure 3, the method specifically includes the following steps:

S110': Obtain the first temperature value of the first evaporation system, and obtain the second temperature value of the second evaporation system;

S120': Obtain the first surface resistance value of the current coating surface of the base film, obtain the total surface resistance value of the coating layer formed on both sides of the base film, and obtain another value according to the difference between the total surface resistance value and the first surface resistance value The resistance value of the second surface of a coated surface;

S131: When the first area resistance reaches the preset area resistance threshold, according to the first functional relationship between the transmission speed of the base film under the preset area resistance threshold and the temperature value of the first evaporation system, and the first The real-time temperature value of the evaporation system determines the real-time base film transmission speed;

S132: Obtain an ideal temperature value of the second evaporation system according to the second functional relationship between the transmission speed of the base film under the preset area resistance threshold and the temperature value of the second evaporation system, and the real-time transmission speed of the base film;

S133: Adjust the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system.

In some embodiments, in S133, according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system, the heating power of the second evaporation system is adjusted, specifically including:

If the ideal temperature value of the second evaporation system is greater than the actual temperature value of the second evaporation system, the control increases the heating power of the second evaporation system, and the heating power of the second evaporation system is controlled to be greater than the heating power of the first evaporation system or the heating power of the second evaporation system is controlled. The temperature growth rate of the second evaporation system is greater than the temperature growth rate of the first evaporation system; if the ideal temperature value of the second evaporation system is less than the actual temperature value of the second evaporation system, the control reduces the heating power of the second evaporation system, and the control The heating power of the second evaporating system is smaller than that of the first evaporating system or the temperature increasing rate of the second evaporating system is controlled to be smaller than the temperature increasing rate of the first evaporating system.

In some embodiments, the method also includes the steps of:

acquiring a first temperature value of the first evaporation system, and acquiring a second temperature value of the second evaporation system;

Obtain the first surface resistance value of the current coating surface of the base film, obtain the total surface resistance value of the coating layer formed on both sides of the base film, and obtain another coating surface value according to the difference between the total surface resistance value and the first surface resistance value The resistance value of the second surface;

When the first area resistance value reaches the preset area resistance threshold value before the second area resistance value, according to the first function between the base film transmission speed at the preset area resistance threshold value and the temperature value of the first evaporation system relationship, and the real-time temperature value of the first evaporation system, determine the real-time base film transmission speed; according to the second functional relationship between the base film transmission speed under the preset area resistance threshold and the temperature value of the second evaporation system, and Real-time base film transmission speed to obtain the ideal temperature value of the second evaporation system; adjust the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system;

Or, when the second area resistance value reaches the preset area resistance threshold value before the first area resistance value, according to the first value between the transmission speed of the base film under the preset area resistance threshold value and the temperature value of the second evaporation system The second functional relationship, and the real-time temperature value of the second evaporation system, determine the real-time base film transmission speed; according to the first functional relationship between the base film transmission speed under the preset area resistance threshold and the temperature value of the first evaporation system , and the real-time base film transmission speed to obtain the ideal temperature value of the first evaporation system; according to the comparison result between the ideal temperature value of the first evaporation system and the actual temperature value of the first evaporation system, adjust the heating power of the first evaporation system .

The above method is described in detail below:

According to a coating uniformity monitoring and control method of this embodiment, in the coating process, the value measured by the first surface resistance tester F1 needs to be fixed (to reach the target surface resistance value), firstly, the first evaporation system can be obtained For the actual temperature of E1, the unwinding speed can be obtained according to formula 1, and the unwinding speed can be adjusted to the real-time unwinding speed. Since the temperature of the first evaporating system E1 and the second evaporating system E2 keeps rising before reaching the steady state of the coating, the real-time unwinding speed can be obtained according to formula 1 in real time, and the unwinding speed can be adjusted to this speed in real time . At this time, according to Formula 2, with the real-time unwinding speed as input, the ideal temperature value of the second evaporation system E2 can be obtained. At the ideal temperature value of the second evaporation system E2, the square resistance value measured by the second surface resistance tester F2 is converted into a thickness value equal to twice the thickness value measured by the first surface resistance tester F1 , so that the coating thickness on both sides is the same.

According to a coating uniformity monitoring and controlling method of this embodiment, during the entire coating process, the first evaporation system E1 and the second evaporation system E2 both heat up. If the ideal temperature value of the second evaporation system E2 is greater than the actual temperature value of the second evaporation system E2, increase the heating power of the second evaporation system E2, increase the temperature rise rate of the second evaporation system E2, and control the second evaporation system The heating power of E2 is greater than the heating power of the first evaporation system E1, and the temperature increase rate of the second evaporation system E2 is controlled to be greater than the temperature increase rate of the first evaporation system E1; if the ideal temperature value of the second evaporation system E2 is less than that of the second evaporation system E2 The actual temperature value, then reduce the heating power of the second evaporation system E2, reduce the temperature rise rate of the second evaporation system E2, and control the heating power of the second evaporation system E2 to be smaller than the heating power of the first evaporation system E1, control the second evaporation system E2 The temperature rise rate of the system E2 is smaller than the temperature rise rate of the first evaporation system E1. If the ideal temperature value of the second evaporation system E2 is equal to the actual value of the second evaporation system E2, no adjustment is made.

A coating uniformity monitoring and control method of the present embodiment is executed by a control device, the first evaporation system E1 corresponds to formula one, the second evaporation system E2 corresponds to formula two, and the first surface resistance tester F1 is limited to 800 mm Oh, the method includes multiple steps of adjusting the temperature value of the second evaporation system E2 in real time as follows:

Obtain the real-time temperature value of the first evaporation system E1 in real time, and adjust the unwinding speed in real time according to formula 1 and the real-time temperature value of the first evaporation system E1, so that the ideal value of the second evaporation system E2 can be obtained according to formula 2 and the real-time unwinding speed temperature value;

comparing the ideal temperature value of the second evaporation system E2 with the actual temperature value of the second evaporation system E2;

If the ideal temperature value of the second evaporating system E2 is relatively large, the temperature growth rate of the second evaporating system E2 is controlled to be greater than the temperature growth rate of the first evaporating system E1;

If the ideal value of the second evaporating system E2 is small, the temperature increasing rate of the second evaporating system E2 is controlled to be smaller than the temperature increasing rate of the first evaporating system E1 .

It can be seen from the above that if the ideal temperature value of the second evaporation system E2 is greater than its actual temperature value, the control increases the heating power of the second evaporation system E2, and controls the heating power of the second evaporation system E2 to be greater than the heating power of the first evaporation system E1 , that is, the temperature increase rate of the second evaporation system E2 is controlled to be greater than the temperature increase rate of the first evaporation system E1.

The measured value of the first surface resistance tester F1 is always 800 milliohms. With the real-time adjustment of the unwinding speed, the measured value of the second surface resistance tester F2 is always around 800 milliohms, so that the coating thickness meets the quality requirements. .

A coating uniformity monitoring and regulation method in this embodiment is executed by the control device. In order to solve the problem that the adjustment is not appropriate at any time, or the temperature regulation has hysteresis, the following method is adopted:

Determine which of the measured values of the first surface resistance tester F1 and the second surface resistance tester F2 reaches the surface resistance threshold first;

If the first area resistance tester F1 first reaches the area resistance threshold, adjust the real-time unwinding speed according to the temperature value of the first evaporation system E1; and get the ideal temperature of the second evaporation system E2 according to formula 2 and the real-time unwinding speed value, and adjust the actual temperature value of the second evaporation system E2 according to the ideal temperature value of the second evaporation system E2;

If the second surface resistance tester F2 first reaches the surface resistance threshold, adjust the real-time unwinding speed according to the temperature value of the second evaporation system E2; and get the theoretical temperature of the first evaporation system E1 according to formula 1 and the real-time unwinding speed value, and control the heating power through the theoretical temperature value of the first evaporation system E1 to adjust the actual temperature value of the first evaporation system E1.

Further, the coating uniformity monitoring and control method also includes the following steps:

If the thickness measured by the first surface resistance tester F1 exceeds the surface resistance threshold, then the control increases the unwinding speed, so as to avoid the thickness of the first surface resistance tester F1 exceeding the surface resistance threshold; and detect two surface resistance values (F1 and F1 in real time) F2 respectively measured surface resistance), if the thickness or surface resistance measured by the second surface resistance tester F2 decreases at this time, then increase the heating power of the second evaporation system E2.

Furthermore, if the temperature increases too fast, it will be useless to reduce the heating power at that time, so it is better to increase the temperature slowly so that the ideal temperature value of the second evaporation system E2 is always greater than its actual temperature value. Therefore, the coating uniformity monitoring and control method also includes the following steps: when the measured value of the second surface resistance tester F2 is about to reach the lower limit of the surface resistance threshold, the temperature is adjusted to increase by a certain percentage.

The beneficial technical effects of the embodiments of the present invention are:

1. Reduce the waste of evaporated materials in the evaporation boat system during the thin film deposition process;

2. Through the dual control of evaporation system temperature control and coating belt speed, the consistency of the overall thickness of the coating film layer on the surface of the substrate along the MD direction is better achieved;

3. By avoiding the ineffective deposition of the coating on the surface of the baffle, it can reduce the deposition of the coating on the surface of the baffle after the coating is completed. Due to the residual heat of the evaporation system, the deposited coating falls off and affects the performance of the equipment.

In the description of the present invention, it should be noted that the orientation or positional relationship indicated by "upper, lower, inner and outer" in terms is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplified descriptions, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and thus should not be construed as limiting the invention. In addition, the terms "first, second or third" are used for descriptive purposes only, and should not be construed as indicating or implying relative importance.

Unless otherwise specified and limited in the present invention, the term "installation, connection, connection" should be understood in a broad sense, for example: it can be a fixed connection, a detachable connection or an integrated connection; it can also be a mechanical connection, an electrical connection or a direct connection. A connection can also be an indirect connection through an intermediary, or it can be an internal communication between two elements. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

While the invention has been described with reference to a preferred embodiment, various modifications may be made and equivalents may be substituted for parts thereof without departing from the scope of the invention. In particular, as long as there is no structural conflict, the technical features mentioned in the various embodiments can be combined in any manner. The present invention is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims (10)

1. A plating film uniformity monitoring and control system, the system comprising:

the vacuum winding film plating device comprises an unreeling mechanism, an evaporating mechanism and a reeling mechanism, wherein the evaporating mechanism and the reeling mechanism are used for evaporating a base film;

a temperature measuring device for measuring a temperature value of the evaporation mechanism;

the surface resistance testing device is used for measuring the surface resistance value of the base film;

and the control device is used for controlling the base film transmission speed of the unreeling mechanism and/or the heating power of the evaporating mechanism according to the temperature value of the evaporating mechanism and the surface resistance value of the base film so as to ensure that the thickness of the coating along the moving direction of the base film is uniform.

2. The system according to claim 1, wherein the control means is specifically configured to determine the real-time base film transfer speed of the unreeling mechanism based on a functional relationship between the base film transfer speed below a preset surface resistance threshold and the temperature value of the evaporating mechanism, and the real-time temperature value of the evaporating mechanism.

3. The system of claim 1, wherein the system further comprises a controller configured to control the controller,

the evaporation mechanism comprises a first evaporation system and a second evaporation system, wherein the first evaporation system is arranged at the upstream of the second evaporation system along the base film conveying path;

the temperature measurement device includes: the first temperature detector is arranged on the first evaporation system and is used for measuring a first temperature value of the first evaporation system; the second temperature detector is arranged on the second evaporation system and is used for measuring a second temperature value of the second evaporation system;

the surface resistance testing device comprises: the first surface resistance tester is arranged on a base film conveying path between the first evaporation system and the second evaporation system and is used for measuring a first surface resistance value of a current film coating surface of the base film; and the second surface resistance tester is arranged on the base film conveying path between the second evaporation system and the winding mechanism and is used for measuring the total surface resistance value of a coating formed on the two surfaces of the base film and obtaining the second surface resistance value of the other coating surface according to the difference value of the total surface resistance value and the first surface resistance value.

4. A system according to claim 3, characterized in that the control means are specifically adapted to: when the first surface resistance value reaches a preset surface resistance threshold value, determining a real-time base film transmission speed according to a first functional relation between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system and a real-time temperature value of the first evaporation system; obtaining an ideal temperature value of the second evaporation system according to a second functional relation between the base film transmission speed under the preset surface resistance threshold and the temperature value of the second evaporation system and the real-time base film transmission speed; and adjusting the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system.

5. The system according to claim 4, characterized in that said control means are specifically adapted to: if the ideal temperature value of the second evaporation system is larger than the actual temperature value of the second evaporation system, controlling to increase the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be larger than the heating power of the first evaporation system or controlling the temperature acceleration rate of the second evaporation system to be larger than the temperature acceleration rate of the first evaporation system; if the ideal temperature value of the second evaporation system is smaller than the actual temperature value of the second evaporation system, controlling to reduce the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be smaller than the heating power of the first evaporation system or controlling the temperature acceleration rate of the second evaporation system to be smaller than the temperature acceleration rate of the first evaporation system.

6. A system according to claim 3, characterized in that the control means are specifically adapted to:

when the first surface resistance value reaches a preset surface resistance threshold value before the second surface resistance value, determining a real-time base film transmission speed according to a first functional relation between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system and a real-time temperature value of the first evaporation system; obtaining an ideal temperature value of the second evaporation system according to a second functional relation between the base film transmission speed under the preset surface resistance threshold and the temperature value of the second evaporation system and the real-time base film transmission speed; adjusting the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system; or,

When the second surface resistance value reaches a preset surface resistance threshold value before the first surface resistance value, determining a real-time base film transmission speed according to a second functional relation between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the second evaporation system and a real-time temperature value of the second evaporation system; obtaining an ideal temperature value of the first evaporation system according to a first functional relation between the base film transmission speed under the preset surface resistance threshold and the temperature value of the first evaporation system and the real-time base film transmission speed; and adjusting the heating power of the first evaporation system according to the comparison result between the ideal temperature value of the first evaporation system and the actual temperature value of the first evaporation system.

7. A method for monitoring and controlling uniformity of a coating film, the method comprising:

acquiring a temperature value of an evaporation mechanism;

acquiring the surface resistance of the base film;

and controlling the base film transmission speed of the unreeling mechanism and/or the heating power of the evaporating mechanism according to the temperature value of the evaporating mechanism and the surface resistance value of the base film, so that the thickness of the coating along the moving direction of the base film is uniform.

8. The method according to claim 7, wherein the controlling the base film transmission speed of the unreeling mechanism according to the temperature value of the evaporating mechanism and the surface resistance value of the base film specifically comprises:

and determining the real-time base film transmission speed of the unreeling mechanism according to the functional relation between the base film transmission speed below the preset surface resistance threshold value and the temperature value of the evaporating mechanism and the real-time temperature value of the evaporating mechanism.

9. The method of claim 7, wherein the evaporation mechanism comprises a first evaporation system and a second evaporation system, the first evaporation system being disposed upstream of the second evaporation system along a base film transport path; the method specifically comprises the following steps:

acquiring a first temperature value of the first evaporation system and a second temperature value of the second evaporation system;

acquiring a first surface resistance value of a current coating surface of the base film, acquiring a total surface resistance value of a coating formed on two surfaces of the base film, and acquiring a second surface resistance value of another coating surface according to a difference value between the total surface resistance value and the first surface resistance value;

when the first surface resistance value reaches a preset surface resistance threshold value, determining a real-time base film transmission speed according to a first functional relation between the base film transmission speed under the preset surface resistance threshold value and the temperature value of the first evaporation system and a real-time temperature value of the first evaporation system;

Obtaining an ideal temperature value of the second evaporation system according to a second functional relation between the base film transmission speed under the preset surface resistance threshold and the temperature value of the second evaporation system and the real-time base film transmission speed;

and adjusting the heating power of the second evaporation system according to the comparison result between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system.

10. The method according to claim 9, wherein said adjusting the heating power of the second evaporation system based on the comparison between the ideal temperature value of the second evaporation system and the actual temperature value of the second evaporation system, comprises:

if the ideal temperature value of the second evaporation system is larger than the actual temperature value of the second evaporation system, controlling to increase the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be larger than the heating power of the first evaporation system or controlling the temperature acceleration rate of the second evaporation system to be larger than the temperature acceleration rate of the first evaporation system; if the ideal temperature value of the second evaporation system is smaller than the actual temperature value of the second evaporation system, controlling to reduce the heating power of the second evaporation system, and controlling the heating power of the second evaporation system to be smaller than the heating power of the first evaporation system or controlling the temperature acceleration rate of the second evaporation system to be smaller than the temperature acceleration rate of the first evaporation system.