EP0489542A3
(en )
1992-09-23
Lithographic techniques
AU550809B2
(en )
1986-04-10
Lithographic mask
GB2249189B
(en )
1994-07-27
Exposure apparatus
GB2120009B
(en )
1986-07-16
Lithographic apparatus
EP0440467A3
(en )
1991-10-30
Reticle for photolithographic patterning
GB2270996B
(en )
1996-01-17
Reticle using sub-resolution pattern
EP0489426A3
(en )
1992-09-16
Projection exposure method
EP0263517A3
(en )
1989-09-06
Lithography apparatus
EP0596668A3
(en )
1996-01-17
Process for imaging of photoresist.
EP0459655A3
(en )
1992-11-25
Photoresist process employing an i-line peak light source
EP0497342A3
(en )
1992-09-30
Negative photoresist composition
EP0440120A3
(en )
1991-10-23
Developing apparatus
DE3270758D1
(en )
1986-05-28
Photosensitive lithographic plate
EP0477780A3
(en )
1992-12-16
Sheet resist apparatus
EP0452897A3
(en )
1992-10-28
Developing apparatus
EP0458354A3
(en )
1992-08-05
A compact reticle/wafer alignment system
EP0488146A3
(en )
1993-02-03
Multicolor developing device
EP0443106A3
(en )
1992-02-19
Exposure apparatus
AU6142090A
(en )
1991-02-22
Process for developing selected positive photoresists
EP0434968A3
(en )
1992-04-29
Light-sensitive preparation and process for the fabrication of photoresists and printing plates
EP0476613A3
(en )
1992-06-03
Superhigh contrast negative image forming process
EP0469537A3
(en )
1992-04-29
Photoimageable electrodepositable photoresist composition
AU627998B2
(en )
1992-09-03
Apparatus for processing a photosensitive element
EP0459737A3
(en )
1992-09-23
Reticle for a reduced projection exposure apparatus
EP0484131A3
(en )
1992-09-09
Projection exposure apparatus