CS245691A3 - Process for reducing or removing defects of a film being caused by hydrogen generation during said film electrodeposition - Google Patents

Process for reducing or removing defects of a film being caused by hydrogen generation during said film electrodeposition Download PDF

Info

Publication number: CS245691A3
Authority: CS; Czechoslovakia
Prior art keywords: group; hydrogen; substituted; alkyl; alkyl group
Prior art date: 1990-09-20

Application number

CS912456A

Other languages

Czech (cs)

English (en)

Inventor

Mark Robert Winkle

Original Assignee

Rohm & Haas

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-09-20

Filing date

1991-08-08

Publication date

1992-04-15

1991-08-08 Application filed by Rohm & Haas filed Critical Rohm & Haas

1992-04-15 Publication of CS245691A3 publication Critical patent/CS245691A3/cs

Links

239000001257 hydrogen Substances 0.000 title claims abstract description 118
229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 118
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 114
238000000034 method Methods 0.000 title claims abstract description 31
230000008569 process Effects 0.000 title claims description 11
230000007547 defect Effects 0.000 title abstract description 30
238000004070 electrodeposition Methods 0.000 title abstract description 5
150000001875 compounds Chemical class 0.000 claims abstract description 49
239000000203 mixture Substances 0.000 claims abstract description 21
239000000839 emulsion Substances 0.000 claims description 42
125000002887 hydroxy group Chemical class [H]O* 0.000 claims description 38
125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 34
238000000151 deposition Methods 0.000 claims description 33
230000008021 deposition Effects 0.000 claims description 32
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
229920000642 polymer Polymers 0.000 claims description 17
125000000217 alkyl group Chemical group 0.000 claims description 15
125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 13
150000002431 hydrogen Chemical class 0.000 claims description 13
KIPMDPDAFINLIV-UHFFFAOYSA-N 2-nitroethanol Chemical compound OCC[N+]([O-])=O KIPMDPDAFINLIV-UHFFFAOYSA-N 0.000 claims description 12
LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 claims description 12
230000029142 excretion Effects 0.000 claims description 10
239000007864 aqueous solution Substances 0.000 claims description 8
LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 claims description 7
230000009467 reduction Effects 0.000 claims description 7
125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 6
FGLBSLMDCBOPQK-UHFFFAOYSA-N 2-nitropropane Chemical compound CC(C)[N+]([O-])=O FGLBSLMDCBOPQK-UHFFFAOYSA-N 0.000 claims description 6
YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 6
238000001652 electrophoretic deposition Methods 0.000 claims description 6
MVGJRISPEUZYAQ-UHFFFAOYSA-N 2-methyl-2-nitropropan-1-ol Chemical compound OCC(C)(C)[N+]([O-])=O MVGJRISPEUZYAQ-UHFFFAOYSA-N 0.000 claims description 5
PCNWBUOSTLGPMI-UHFFFAOYSA-N 2-nitro-1-propanol Chemical compound OCC(C)[N+]([O-])=O PCNWBUOSTLGPMI-UHFFFAOYSA-N 0.000 claims description 5
OJVOGABFNZDOOZ-UHFFFAOYSA-N 3-nitrobutan-2-ol Chemical compound CC(O)C(C)[N+]([O-])=O OJVOGABFNZDOOZ-UHFFFAOYSA-N 0.000 claims description 5
JKTYGPATCNUWKN-UHFFFAOYSA-N 4-nitrobenzyl alcohol Chemical compound OCC1=CC=C([N+]([O-])=O)C=C1 JKTYGPATCNUWKN-UHFFFAOYSA-N 0.000 claims description 5
MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 claims description 5
238000004132 cross linking Methods 0.000 claims description 4
239000000178 monomer Substances 0.000 claims description 4
JSZOAYXJRCEYSX-UHFFFAOYSA-N 1-nitropropane Chemical compound CCC[N+]([O-])=O JSZOAYXJRCEYSX-UHFFFAOYSA-N 0.000 claims description 3
LQNUZADURLCDLV-IDEBNGHGSA-N nitrobenzene Chemical group [O-][N+](=O)[13C]1=[13CH][13CH]=[13CH][13CH]=[13CH]1 LQNUZADURLCDLV-IDEBNGHGSA-N 0.000 claims description 3
230000001464 adherent effect Effects 0.000 claims description 2
125000006273 (C1-C3) alkyl group Chemical group 0.000 claims 1
239000000853 adhesive Substances 0.000 claims 1
230000001070 adhesive effect Effects 0.000 claims 1
150000004945 aromatic hydrocarbons Chemical group 0.000 claims 1
238000009792 diffusion process Methods 0.000 claims 1
150000005181 nitrobenzenes Chemical group 0.000 claims 1
238000005868 electrolysis reaction Methods 0.000 abstract description 13
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 10
230000002452 interceptive effect Effects 0.000 abstract description 3
230000003247 decreasing effect Effects 0.000 abstract 1
239000010408 film Substances 0.000 description 67
238000011156 evaluation Methods 0.000 description 12
239000002245 particle Substances 0.000 description 12
239000003054 catalyst Substances 0.000 description 11
239000010406 cathode material Substances 0.000 description 11
239000003792 electrolyte Substances 0.000 description 11
239000000243 solution Substances 0.000 description 10
239000000126 substance Substances 0.000 description 10
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
230000008030 elimination Effects 0.000 description 7
238000003379 elimination reaction Methods 0.000 description 7
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
230000000694 effects Effects 0.000 description 6
XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 6
238000012360 testing method Methods 0.000 description 6
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
238000007792 addition Methods 0.000 description 5
150000001412 amines Chemical class 0.000 description 5
230000015572 biosynthetic process Effects 0.000 description 5
238000000576 coating method Methods 0.000 description 5
229910052751 metal Inorganic materials 0.000 description 5
239000002184 metal Substances 0.000 description 5
229910001220 stainless steel Inorganic materials 0.000 description 5
239000010935 stainless steel Substances 0.000 description 5
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 4
229910052802 copper Inorganic materials 0.000 description 4
239000010949 copper Substances 0.000 description 4
238000005984 hydrogenation reaction Methods 0.000 description 4
JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
229910052697 platinum Inorganic materials 0.000 description 4
229920006254 polymer film Polymers 0.000 description 4
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
LVDKZNITIUWNER-UHFFFAOYSA-N Bronopol Chemical compound OCC(Br)(CO)[N+]([O-])=O LVDKZNITIUWNER-UHFFFAOYSA-N 0.000 description 3
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
239000002253 acid Substances 0.000 description 3
239000012736 aqueous medium Substances 0.000 description 3
238000009903 catalytic hydrogenation reaction Methods 0.000 description 3
125000002091 cationic group Chemical group 0.000 description 3
238000011161 development Methods 0.000 description 3
-1 hydroxide ions Chemical class 0.000 description 3
229910052742 iron Inorganic materials 0.000 description 3
239000010410 layer Substances 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
229910052759 nickel Inorganic materials 0.000 description 3
150000002828 nitro derivatives Chemical class 0.000 description 3
239000000047 product Substances 0.000 description 3
239000000758 substrate Substances 0.000 description 3
239000010409 thin film Substances 0.000 description 3
229910052725 zinc Inorganic materials 0.000 description 3
239000011701 zinc Substances 0.000 description 3
JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 2
OLQJQHSAWMFDJE-UHFFFAOYSA-N 2-(hydroxymethyl)-2-nitropropane-1,3-diol Chemical compound OCC(CO)(CO)[N+]([O-])=O OLQJQHSAWMFDJE-UHFFFAOYSA-N 0.000 description 2
YADISKICBOYXFS-UHFFFAOYSA-N 2-ethyl-2-nitropropane-1,3-diol Chemical compound CCC(CO)(CO)[N+]([O-])=O YADISKICBOYXFS-UHFFFAOYSA-N 0.000 description 2
MHIHRIPETCJEMQ-UHFFFAOYSA-N 2-nitrobutan-1-ol Chemical compound CCC(CO)[N+]([O-])=O MHIHRIPETCJEMQ-UHFFFAOYSA-N 0.000 description 2
LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
239000008346 aqueous phase Substances 0.000 description 2
239000006227 byproduct Substances 0.000 description 2
238000006243 chemical reaction Methods 0.000 description 2
239000006185 dispersion Substances 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
239000011888 foil Substances 0.000 description 2
238000011990 functional testing Methods 0.000 description 2
239000010439 graphite Substances 0.000 description 2
229910002804 graphite Inorganic materials 0.000 description 2
230000002209 hydrophobic effect Effects 0.000 description 2
239000004310 lactic acid Substances 0.000 description 2
235000014655 lactic acid Nutrition 0.000 description 2
239000000463 material Substances 0.000 description 2
238000005259 measurement Methods 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
238000002156 mixing Methods 0.000 description 2
229910000510 noble metal Inorganic materials 0.000 description 2
PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
229920002120 photoresistant polymer Polymers 0.000 description 2
239000004014 plasticizer Substances 0.000 description 2
238000003756 stirring Methods 0.000 description 2
238000004381 surface treatment Methods 0.000 description 2
125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
KUEFXPHXHHANKS-UHFFFAOYSA-N 5-nitro-1h-1,2,4-triazole Chemical compound [O-][N+](=O)C1=NC=NN1 KUEFXPHXHHANKS-UHFFFAOYSA-N 0.000 description 1
HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
235000015854 Heliotropium curassavicum Nutrition 0.000 description 1
244000301682 Heliotropium curassavicum Species 0.000 description 1
241000283973 Oryctolagus cuniculus Species 0.000 description 1
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
230000006978 adaptation Effects 0.000 description 1
239000000654 additive Substances 0.000 description 1
230000000996 additive effect Effects 0.000 description 1
125000004429 atom Chemical group 0.000 description 1
239000010953 base metal Substances 0.000 description 1
DGHQMSLDUXOQEO-UHFFFAOYSA-N butan-2-yl 2-hydroxypropanoate Chemical compound CCC(C)OC(=O)C(C)O DGHQMSLDUXOQEO-UHFFFAOYSA-N 0.000 description 1
239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
230000003197 catalytic effect Effects 0.000 description 1
239000002800 charge carrier Substances 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
238000004581 coalescence Methods 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
239000002131 composite material Substances 0.000 description 1
239000004020 conductor Substances 0.000 description 1
239000011889 copper foil Substances 0.000 description 1
229920006037 cross link polymer Polymers 0.000 description 1
230000002939 deleterious effect Effects 0.000 description 1
230000001627 detrimental effect Effects 0.000 description 1
238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 1
239000000975 dye Substances 0.000 description 1
239000008151 electrolyte solution Substances 0.000 description 1
230000001804 emulsifying effect Effects 0.000 description 1
OUGJKAQEYOUGKG-UHFFFAOYSA-N ethyl 2-methylidenebutanoate Chemical compound CCOC(=O)C(=C)CC OUGJKAQEYOUGKG-UHFFFAOYSA-N 0.000 description 1
238000009472 formulation Methods 0.000 description 1
150000002240 furans Chemical class 0.000 description 1
239000011521 glass Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000012456 homogeneous solution Substances 0.000 description 1
150000002430 hydrocarbons Chemical group 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
230000006872 improvement Effects 0.000 description 1
230000001939 inductive effect Effects 0.000 description 1
238000011835 investigation Methods 0.000 description 1
238000002386 leaching Methods 0.000 description 1
ZDGGJQMSELMHLK-UHFFFAOYSA-N m-Trifluoromethylhippuric acid Chemical compound OC(=O)CNC(=O)C1=CC=CC(C(F)(F)F)=C1 ZDGGJQMSELMHLK-UHFFFAOYSA-N 0.000 description 1
VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
239000011976 maleic acid Substances 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
150000002736 metal compounds Chemical class 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000000615 nonconductor Substances 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
238000001556 precipitation Methods 0.000 description 1
229960005335 propanol Drugs 0.000 description 1
230000009993 protective function Effects 0.000 description 1
239000008262 pumice Substances 0.000 description 1
238000010791 quenching Methods 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
229910052703 rhodium Inorganic materials 0.000 description 1
239000010948 rhodium Substances 0.000 description 1
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
230000002000 scavenging effect Effects 0.000 description 1
238000005476 soldering Methods 0.000 description 1
239000002904 solvent Substances 0.000 description 1
239000004575 stone Substances 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
238000005303 weighing Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4488—Cathodic paints
- C09D5/4492—Cathodic paints containing special additives, e.g. grinding agents
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

Chemical & Material Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Wood Science & Technology (AREA)
Molecular Biology (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Health & Medical Sciences (AREA)
Paints Or Removers (AREA)
Prevention Of Electric Corrosion (AREA)
Manufacture Of Macromolecular Shaped Articles (AREA)
Basic Packing Technique (AREA)
Physical Vapour Deposition (AREA)
Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Medicines Containing Plant Substances (AREA)
Magnetic Heads (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Electroplating Methods And Accessories (AREA)
Compositions Of Macromolecular Compounds (AREA)
Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Electrodes For Compound Or Non-Metal Manufacture (AREA)

CS912456A 1990-09-20 1991-08-08 Process for reducing or removing defects of a film being caused by hydrogen generation during said film electrodeposition CS245691A3 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/585,428 US5066374A (en)	1990-09-20	1990-09-20	Elimination of film defects due to hydrogen evolution during cathodic electrodeposition

Publications (1)

Publication Number	Publication Date
CS245691A3 true CS245691A3 (en)	1992-04-15

Family

ID=24341393

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CS912456A CS245691A3 (en)	1990-09-20	1991-08-08	Process for reducing or removing defects of a film being caused by hydrogen generation during said film electrodeposition

Country Status (20)

Country	Link
US (1)	US5066374A (de)
EP (1)	EP0476821B1 (de)
JP (1)	JPH04246426A (de)
KR (1)	KR920006387A (de)
CN (1)	CN1061787A (de)
AT (1)	ATE122083T1 (de)
AU (1)	AU8249491A (de)
BR (1)	BR9103276A (de)
CA (1)	CA2047552A1 (de)
CS (1)	CS245691A3 (de)
DE (1)	DE69109416T2 (de)
FI (1)	FI913748A7 (de)
HU (1)	HUT60333A (de)
IE (1)	IE912796A1 (de)
IL (1)	IL99171A0 (de)
MX (1)	MX9101156A (de)
MY (1)	MY106521A (de)
NO (1)	NO913101L (de)
PL (1)	PL291368A1 (de)
ZA (1)	ZA916337B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5266731A (en) *	1991-07-17	1993-11-30	Reilly Industries	Electrocatalytic hydrogenations of nitriles to amines
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1990
- 1990-09-20 US US07/585,428 patent/US5066374A/en not_active Expired - Fee Related
1991
- 1991-07-22 CA CA002047552A patent/CA2047552A1/en not_active Abandoned
- 1991-07-31 BR BR919103276A patent/BR9103276A/pt unknown
- 1991-08-03 CN CN91108656A patent/CN1061787A/zh active Pending
- 1991-08-06 DE DE69109416T patent/DE69109416T2/de not_active Expired - Fee Related
- 1991-08-06 AT AT91307198T patent/ATE122083T1/de not_active IP Right Cessation
- 1991-08-06 EP EP91307198A patent/EP0476821B1/de not_active Expired - Lifetime
- 1991-08-07 FI FI913748A patent/FI913748A7/fi unknown
- 1991-08-07 IE IE279691A patent/IE912796A1/en unknown
- 1991-08-08 PL PL29136891A patent/PL291368A1/xx unknown
- 1991-08-08 CS CS912456A patent/CS245691A3/cs unknown
- 1991-08-09 HU HU912660A patent/HUT60333A/hu unknown
- 1991-08-09 NO NO91913101A patent/NO913101L/no unknown
- 1991-08-12 ZA ZA916337A patent/ZA916337B/xx unknown
- 1991-08-13 MY MYPI91001459A patent/MY106521A/en unknown
- 1991-08-13 IL IL99171A patent/IL99171A0/xx unknown
- 1991-08-16 AU AU82494/91A patent/AU8249491A/en not_active Abandoned
- 1991-09-13 KR KR1019910015954A patent/KR920006387A/ko not_active Ceased
- 1991-09-19 MX MX919101156A patent/MX9101156A/es unknown
- 1991-09-19 JP JP3239675A patent/JPH04246426A/ja not_active Withdrawn

Also Published As

Publication number	Publication date
DE69109416T2 (de)	1996-01-04
FI913748L (fi)	1992-03-21
IL99171A0 (en)	1992-07-15
FI913748A0 (fi)	1991-08-07
BR9103276A (pt)	1992-05-26
EP0476821B1 (de)	1995-05-03
HU912660D0 (en)	1992-01-28
ATE122083T1 (de)	1995-05-15
EP0476821A3 (en)	1992-11-04
FI913748A7 (fi)	1992-03-21
AU8249491A (en)	1992-03-26
CA2047552A1 (en)	1992-03-21
NO913101D0 (no)	1991-08-09
MX9101156A (es)	1992-04-01
PL291368A1 (en)	1992-09-07
IE912796A1 (en)	1992-02-25
CN1061787A (zh)	1992-06-10
DE69109416D1 (de)	1995-06-08
ZA916337B (en)	1992-05-27
US5066374A (en)	1991-11-19
HUT60333A (en)	1992-08-28
KR920006387A (ko)	1992-04-27
JPH04246426A (ja)	1992-09-02
EP0476821A2 (de)	1992-03-25
MY106521A (en)	1995-06-30
NO913101L (no)	1992-03-23

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WO2014150121A1 (en)	2014-09-25	Thiosulfate polymer compositions and articles
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US20140287365A1 (en)	2014-09-25	Forming patterns using thiosulfate polymer compositions
DE3825738C5 (de)	2004-09-09	Lichtempfindliches Gemisch
CS245691A3 (en)	1992-04-15	Process for reducing or removing defects of a film being caused by hydrogen generation during said film electrodeposition
US8916336B2 (en)	2014-12-23	Patterning method using thiosulfate polymer and metal nanoparticles
EP0116341B1 (de)	1986-05-07	Neue 2H-v-Triazolyl(4,5-d)-pyrimidine und deren Verwendung
US9499650B2 (en)	2016-11-22	Thiosulfate polymers
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CA1221333A (en)	1987-05-05	Producing printing plate by electrophoretic deposition or photosensitive coating on hydrophilized metal
US5206277A (en)	1993-04-27	Elimination of film defects due to hydrogen evolution during cathodic electrodeposition
US4840709A (en)	1989-06-20	Single-stage electrochemical image-forming process for reproduction layers
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EP0256255A2 (de)	1988-02-24	Verfahren zur Herstellung elektrophotographischer Aufzeichnungselemente
CN114779579B (zh)	2024-10-01	一种可水显影的热敏版及其制备方法
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DE2225573C3 (de)	1977-04-21	Sulfonsäureamid-Diazooxyd und seine Verwendung
US4012295A (en)	1977-03-15	Electrolytically induced polymerization utilizing bisulfite adduct free radical precursor
JPH0370215B2 (de)	1991-11-06
JPS62215606A (ja)	1987-09-22	感光性樹脂の製造方法