CS250295B1 - Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method - Google Patents

Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method Download PDF

Info

Publication number: CS250295B1
Authority: CS; Czechoslovakia
Prior art keywords: template; electrode; vacuum; gas; vacuum vessel
Prior art date: 1985-06-10

Application number

CS411885A

Other languages

Czech (cs)

English (en)

Inventor

Pavel Jancik

Lubos Hes

Milan Malik

Karel Novotny

Vaclav Panoch

Karel Dadourek

Jan Janca

Original Assignee

Pavel Jancik

Lubos Hes

Milan Malik

Karel Novotny

Vaclav Panoch

Karel Dadourek

Jan Janca

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-06-10

Filing date

1985-06-10

Publication date

1987-04-16

1985-06-10 Application filed by Pavel Jancik, Lubos Hes, Milan Malik, Karel Novotny, Vaclav Panoch, Karel Dadourek, Jan Janca filed Critical Pavel Jancik

1985-06-10 Priority to CS411885A priority Critical patent/CS250295B1/cs

1986-06-05 Priority to DE19863618872 priority patent/DE3618872A1/de

1986-06-06 Priority to NL8601466A priority patent/NL8601466A/nl

1986-06-10 Priority to AT157286A priority patent/ATA157286A/de

1987-04-16 Publication of CS250295B1 publication Critical patent/CS250295B1/cs

Links

229920000642 polymer Polymers 0.000 title claims abstract description 27
238000000034 method Methods 0.000 title claims abstract description 21
238000007639 printing Methods 0.000 title abstract description 6
238000007650 screen-printing Methods 0.000 title abstract description 3
239000007789 gas Substances 0.000 claims abstract description 37
239000000126 substance Substances 0.000 claims abstract description 10
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 4
239000001301 oxygen Substances 0.000 claims abstract description 4
229910052760 oxygen Inorganic materials 0.000 claims abstract description 4
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 3
239000003546 flue gas Substances 0.000 claims description 2
239000007787 solid Substances 0.000 claims description 2
238000010022 rotary screen printing Methods 0.000 claims 1
230000008569 process Effects 0.000 abstract description 13
230000008030 elimination Effects 0.000 abstract 1
238000003379 elimination reaction Methods 0.000 abstract 1
239000003973 paint Substances 0.000 description 16
239000012495 reaction gas Substances 0.000 description 14
238000006243 chemical reaction Methods 0.000 description 9
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
238000002485 combustion reaction Methods 0.000 description 4
238000013461 design Methods 0.000 description 4
239000000203 mixture Substances 0.000 description 4
229910052759 nickel Inorganic materials 0.000 description 4
230000008901 benefit Effects 0.000 description 3
239000007795 chemical reaction product Substances 0.000 description 3
239000000498 cooling water Substances 0.000 description 3
230000008878 coupling Effects 0.000 description 3
238000010168 coupling process Methods 0.000 description 3
238000005859 coupling reaction Methods 0.000 description 3
239000012212 insulator Substances 0.000 description 3
MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
239000002245 particle Substances 0.000 description 3
230000001105 regulatory effect Effects 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
230000009471 action Effects 0.000 description 2
231100000481 chemical toxicant Toxicity 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000005684 electric field Effects 0.000 description 2
238000003780 insertion Methods 0.000 description 2
230000037431 insertion Effects 0.000 description 2
230000007246 mechanism Effects 0.000 description 2
238000012544 monitoring process Methods 0.000 description 2
230000005855 radiation Effects 0.000 description 2
239000002904 solvent Substances 0.000 description 2
239000012209 synthetic fiber Substances 0.000 description 2
229920002994 synthetic fiber Polymers 0.000 description 2
239000003440 toxic substance Substances 0.000 description 2
230000000007 visual effect Effects 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
230000006978 adaptation Effects 0.000 description 1
238000005273 aeration Methods 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
238000001636 atomic emission spectroscopy Methods 0.000 description 1
229910002090 carbon oxide Inorganic materials 0.000 description 1
230000008859 change Effects 0.000 description 1
239000013043 chemical agent Substances 0.000 description 1
239000003086 colorant Substances 0.000 description 1
230000001276 controlling effect Effects 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000010616 electrical installation Methods 0.000 description 1
239000004744 fabric Substances 0.000 description 1
-1 freon Chemical compound 0.000 description 1
239000003517 fume Substances 0.000 description 1
239000011521 glass Substances 0.000 description 1
230000036541 health Effects 0.000 description 1
238000009434 installation Methods 0.000 description 1
239000000543 intermediate Substances 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
239000012528 membrane Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
229910052756 noble gas Inorganic materials 0.000 description 1
150000002835 noble gases Chemical class 0.000 description 1
238000006552 photochemical reaction Methods 0.000 description 1
238000007747 plating Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
239000010453 quartz Substances 0.000 description 1
238000009877 rendering Methods 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
238000000926 separation method Methods 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
239000002344 surface layer Substances 0.000 description 1
239000004753 textile Substances 0.000 description 1
230000009466 transformation Effects 0.000 description 1
238000000844 transformation Methods 0.000 description 1
239000002759 woven fabric Substances 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Physical Or Chemical Processes And Apparatus (AREA)

CS411885A 1985-06-10 1985-06-10 Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method CS250295B1 (en)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
CS411885A CS250295B1 (en)	1985-06-10	1985-06-10	Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method
DE19863618872 DE3618872A1 (de)	1985-06-10	1986-06-05	Verfahren und vorrichtung zur beseitigung von musterbildenden polymeren auf druckschablonen
NL8601466A NL8601466A (nl)	1985-06-10	1986-06-06	Werkwijze en inrichting voor het verwijderen van polymeer dat het stencil vormt op een drukplaat.
AT157286A ATA157286A (de)	1985-06-10	1986-06-10	Verfahren zur beseitigung von musterbildenden polymeren auf druckschablonen, insbesondere siebdurckschablonen, und vorrichtung zur durchfuehrung dieses verfahrens

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CS411885A CS250295B1 (en)	1985-06-10	1985-06-10	Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method

Publications (1)

Publication Number	Publication Date
CS250295B1 true CS250295B1 (en)	1987-04-16

Family

ID=5383223

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CS411885A CS250295B1 (en)	1985-06-10	1985-06-10	Method of polymer removal forming pattern of printing plates especially rotating ones for silk-screen printing and device for realization of this method

Country Status (4)

Country	Link
AT (1)	ATA157286A (de)
CS (1)	CS250295B1 (de)
DE (1)	DE3618872A1 (de)
NL (1)	NL8601466A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2285141B (en) *	1993-12-23	1998-03-11	Motorola Ltd	Method of removing photo resist

1985
- 1985-06-10 CS CS411885A patent/CS250295B1/cs unknown
1986
- 1986-06-05 DE DE19863618872 patent/DE3618872A1/de not_active Withdrawn
- 1986-06-06 NL NL8601466A patent/NL8601466A/nl not_active Application Discontinuation
- 1986-06-10 AT AT157286A patent/ATA157286A/de not_active Application Discontinuation

Also Published As

Publication number	Publication date
ATA157286A (de)	1992-06-15
NL8601466A (nl)	1987-01-02
DE3618872A1 (de)	1986-12-11

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