CS76592A3 - Multiple-grain abrasive particles - Google Patents

Multiple-grain abrasive particles Download PDF

Info

Publication number: CS76592A3
Authority: CS; Czechoslovakia
Prior art keywords: coating material; granules; active coating; particles; grain
Prior art date: 1991-03-14

Application number

CS92765A

Other languages

Czech (cs)

English (en)

Inventor

David Earl Slutz

Francis Raymond Corrigan

Original Assignee

Gen Electric

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-03-14

Filing date

1992-03-13

Publication date

1992-11-18

1992-03-13 Application filed by Gen Electric filed Critical Gen Electric

1992-11-18 Publication of CS76592A3 publication Critical patent/CS76592A3/cs

Links

239000002245 particle Substances 0.000 title claims description 96
238000000576 coating method Methods 0.000 claims description 112
239000011248 coating agent Substances 0.000 claims description 100
239000000463 material Substances 0.000 claims description 79
238000000034 method Methods 0.000 claims description 74
239000008187 granular material Substances 0.000 claims description 70
229910052582 BN Inorganic materials 0.000 claims description 48
PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 47
239000010410 layer Substances 0.000 claims description 46
230000008569 process Effects 0.000 claims description 41
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 40
239000010432 diamond Substances 0.000 claims description 33
229910003460 diamond Inorganic materials 0.000 claims description 32
229910052759 nickel Inorganic materials 0.000 claims description 20
150000004767 nitrides Chemical class 0.000 claims description 20
239000000843 powder Substances 0.000 claims description 19
229910052721 tungsten Inorganic materials 0.000 claims description 19
239000010937 tungsten Substances 0.000 claims description 19
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 18
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 17
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 17
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 17
229910052804 chromium Inorganic materials 0.000 claims description 17
239000011651 chromium Substances 0.000 claims description 17
229910052735 hafnium Inorganic materials 0.000 claims description 17
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 17
229910052750 molybdenum Inorganic materials 0.000 claims description 17
239000011733 molybdenum Substances 0.000 claims description 17
229910052758 niobium Inorganic materials 0.000 claims description 17
239000010955 niobium Substances 0.000 claims description 17
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 17
229910052715 tantalum Inorganic materials 0.000 claims description 17
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 17
229910052720 vanadium Inorganic materials 0.000 claims description 17
LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 17
229910052726 zirconium Inorganic materials 0.000 claims description 17
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 16
238000000151 deposition Methods 0.000 claims description 16
230000008021 deposition Effects 0.000 claims description 16
239000011159 matrix material Substances 0.000 claims description 16
229910052710 silicon Inorganic materials 0.000 claims description 16
239000010703 silicon Substances 0.000 claims description 16
238000005245 sintering Methods 0.000 claims description 16
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 15
229910052719 titanium Inorganic materials 0.000 claims description 15
239000010936 titanium Substances 0.000 claims description 15
229910017052 cobalt Inorganic materials 0.000 claims description 14
239000010941 cobalt Substances 0.000 claims description 14
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 13
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
238000005229 chemical vapour deposition Methods 0.000 claims description 11
229910052802 copper Inorganic materials 0.000 claims description 11
239000010949 copper Substances 0.000 claims description 11
239000000126 substance Substances 0.000 claims description 11
239000007931 coated granule Substances 0.000 claims description 10
238000004519 manufacturing process Methods 0.000 claims description 10
239000000956 alloy Substances 0.000 claims description 9
229910045601 alloy Inorganic materials 0.000 claims description 9
239000003054 catalyst Substances 0.000 claims description 9
NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 8
238000000227 grinding Methods 0.000 claims description 8
239000000758 substrate Substances 0.000 claims description 6
239000002131 composite material Substances 0.000 claims description 4
239000012255 powdered metal Substances 0.000 claims description 3
239000011347 resin Substances 0.000 claims description 3
229920005989 resin Polymers 0.000 claims description 3
239000011247 coating layer Substances 0.000 claims description 2
238000005507 spraying Methods 0.000 claims description 2
229910052581 Si3N4 Inorganic materials 0.000 claims 1
238000005422 blasting Methods 0.000 claims 1
SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 claims 1
235000000396 iron Nutrition 0.000 claims 1
239000002071 nanotube Substances 0.000 claims 1
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
229910052751 metal Inorganic materials 0.000 description 20
239000002184 metal Substances 0.000 description 20
239000000203 mixture Substances 0.000 description 15
238000005520 cutting process Methods 0.000 description 12
MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 9
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
239000000356 contaminant Substances 0.000 description 7
239000001257 hydrogen Substances 0.000 description 6
229910052739 hydrogen Inorganic materials 0.000 description 6
239000012535 impurity Substances 0.000 description 6
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 5
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 4
229910052796 boron Inorganic materials 0.000 description 4
150000002739 metals Chemical class 0.000 description 4
238000007740 vapor deposition Methods 0.000 description 4
230000015572 biosynthetic process Effects 0.000 description 3
-1 borides Chemical class 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
238000010304 firing Methods 0.000 description 3
238000010438 heat treatment Methods 0.000 description 3
150000001247 metal acetylides Chemical class 0.000 description 3
238000001771 vacuum deposition Methods 0.000 description 3
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
239000003082 abrasive agent Substances 0.000 description 2
239000011149 active material Substances 0.000 description 2
239000000853 adhesive Substances 0.000 description 2
239000011230 binding agent Substances 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
238000002844 melting Methods 0.000 description 2
230000008018 melting Effects 0.000 description 2
229910001092 metal group alloy Inorganic materials 0.000 description 2
NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 2
238000005019 vapor deposition process Methods 0.000 description 2
238000005406 washing Methods 0.000 description 2
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
238000002441 X-ray diffraction Methods 0.000 description 1
238000005299 abrasion Methods 0.000 description 1
239000006061 abrasive grain Substances 0.000 description 1
239000002253 acid Substances 0.000 description 1
239000013543 active substance Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
238000000429 assembly Methods 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
230000008901 benefit Effects 0.000 description 1
230000002051 biphasic effect Effects 0.000 description 1
229910052810 boron oxide Inorganic materials 0.000 description 1
238000005219 brazing Methods 0.000 description 1
230000009172 bursting Effects 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
239000011575 calcium Substances 0.000 description 1
229910052791 calcium Inorganic materials 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
238000005234 chemical deposition Methods 0.000 description 1
239000003153 chemical reaction reagent Substances 0.000 description 1
238000011109 contamination Methods 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000001816 cooling Methods 0.000 description 1
239000013078 crystal Substances 0.000 description 1
239000008367 deionised water Substances 0.000 description 1
229910021641 deionized water Inorganic materials 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000012895 dilution Substances 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000009713 electroplating Methods 0.000 description 1
239000003344 environmental pollutant Substances 0.000 description 1
230000003628 erosive effect Effects 0.000 description 1
239000010419 fine particle Substances 0.000 description 1
239000007789 gas Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
150000002431 hydrogen Chemical class 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
231100000719 pollutant Toxicity 0.000 description 1
239000000047 product Substances 0.000 description 1
OANVFVBYPNXRLD-UHFFFAOYSA-M propyromazine bromide Chemical group [Br-].C12=CC=CC=C2SC2=CC=CC=C2N1C(=O)C(C)[N+]1(C)CCCC1 OANVFVBYPNXRLD-UHFFFAOYSA-M 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
238000010298 pulverizing process Methods 0.000 description 1
238000000197 pyrolysis Methods 0.000 description 1
229910052705 radium Inorganic materials 0.000 description 1
HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
239000007787 solid Substances 0.000 description 1
239000000243 solution Substances 0.000 description 1
238000003892 spreading Methods 0.000 description 1
230000007480 spreading Effects 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000007858 starting material Substances 0.000 description 1
230000002459 sustained effect Effects 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 1
239000002470 thermal conductor Substances 0.000 description 1
238000005979 thermal decomposition reaction Methods 0.000 description 1
210000001685 thyroid gland Anatomy 0.000 description 1
229910052718 tin Inorganic materials 0.000 description 1
239000011135 tin Substances 0.000 description 1
239000004408 titanium dioxide Substances 0.000 description 1
QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Inorganic materials [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 description 1
UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
239000012808 vapor phase Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

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- C—CHEMISTRY; METALLURGY
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
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- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- B01J3/062—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies characterised by the composition of the materials to be processed
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
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- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
- C04B35/5831—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride based on cubic boron nitrides or Wurtzitic boron nitrides, including crystal structure transformation of powder
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- C04B35/62894—Coating the powders or the macroscopic reinforcing agents with more than one coating layer
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- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
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- C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J2203/06—High pressure synthesis
- B01J2203/0605—Composition of the material to be processed
- B01J2203/0645—Boronitrides
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J2203/00—Processes utilising sub- or super atmospheric pressure
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- B01J2203/065—Composition of the material produced
- B01J2203/066—Boronitrides
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J2203/0675—Structural or physico-chemical features of the materials processed
- B01J2203/0685—Crystal sintering
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
- C04B2235/3852—Nitrides, e.g. oxynitrides, carbonitrides, oxycarbonitrides, lithium nitride, magnesium nitride
- C04B2235/386—Boron nitrides
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/422—Carbon
- C04B2235/427—Diamond
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5436—Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
- C22C2026/005—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes with additional metal compounds being borides

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Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
Manufacturing & Machinery (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Structural Engineering (AREA)
Mechanical Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Metallurgy (AREA)
Crystallography & Structural Chemistry (AREA)
Composite Materials (AREA)
Polishing Bodies And Polishing Tools (AREA)
Ceramic Products (AREA)
Powder Metallurgy (AREA)
Pigments, Carbon Blacks, Or Wood Stains (AREA)
Chemical Vapour Deposition (AREA)
Chemically Coating (AREA)
Physical Vapour Deposition (AREA)

CS92765A 1991-03-14 1992-03-13 Multiple-grain abrasive particles CS76592A3 (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US07/669,124 US5106392A (en)	1991-03-14	1991-03-14	Multigrain abrasive particles
JP4154554A JPH062001A (ja)	1991-03-14	1992-06-15	多粒研磨材成形体の製法およびその製品

Publications (1)

Publication Number	Publication Date
CS76592A3 true CS76592A3 (en)	1992-11-18

Family

ID=26482808

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CS92765A CS76592A3 (en)	1991-03-14	1992-03-13	Multiple-grain abrasive particles

Country Status (12)

Country	Link
US (1)	US5106392A (ja)
EP (1)	EP0503974B1 (ja)
JP (2)	JPH05105560A (ja)
CA (1)	CA2061936A1 (ja)
CS (1)	CS76592A3 (ja)
DE (1)	DE69204089T2 (ja)
ES (1)	ES2077350T3 (ja)
HU (1)	HUT63868A (ja)
IE (1)	IE71663B1 (ja)
PL (1)	PL293840A1 (ja)
RO (1)	RO108874B1 (ja)
ZA (1)	ZA921530B (ja)

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US20070020457A1 (en) *	2005-07-21	2007-01-25	3M Innovative Properties Company	Composite particle comprising an abrasive grit
CA2603458C (en) *	2006-09-21	2015-11-17	Smith International, Inc.	Atomic layer deposition nanocoatings on cutting tool powder materials
US7810588B2 (en) *	2007-02-23	2010-10-12	Baker Hughes Incorporated	Multi-layer encapsulation of diamond grit for use in earth-boring bits
EP2505312B1 (en) *	2007-03-14	2015-11-18	Saint-Gobain Abrasives, Inc.	Method of making a bonded abrasive article
MX2009009845A (es) *	2007-03-14	2010-01-29	Saint Gobain Abrasives Inc	Articulo abrasivo ligado y metodo de fabricacion.
KR101492969B1 (ko) *	2008-11-14	2015-02-16	일진다이아몬드(주)	고경도 피복 분말 및 그 제조 방법
GB201014283D0 (en) *	2010-08-27	2010-10-13	Element Six Production Pty Ltd	Method of making polycrystalline diamond material
US8858693B2 (en) *	2011-01-11	2014-10-14	Omg Electronic Chemicals, Llc	Electroless plating bath composition and method of plating particulate matter
CN102628173B (zh) *	2012-03-23	2016-01-20	河南黄河旋风股份有限公司	一种金刚石表面突起制作方法
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1991
- 1991-03-14 US US07/669,124 patent/US5106392A/en not_active Expired - Lifetime
1992
- 1992-02-19 HU HU9200536A patent/HUT63868A/hu unknown
- 1992-02-27 CA CA002061936A patent/CA2061936A1/en not_active Abandoned
- 1992-02-28 ZA ZA921530A patent/ZA921530B/xx unknown
- 1992-03-12 RO RO92-200311A patent/RO108874B1/ro unknown
- 1992-03-12 JP JP4053006A patent/JPH05105560A/ja active Pending
- 1992-03-13 IE IE920811A patent/IE71663B1/en not_active IP Right Cessation
- 1992-03-13 DE DE69204089T patent/DE69204089T2/de not_active Expired - Fee Related
- 1992-03-13 PL PL29384092A patent/PL293840A1/xx unknown
- 1992-03-13 CS CS92765A patent/CS76592A3/cs unknown
- 1992-03-13 EP EP92302219A patent/EP0503974B1/en not_active Expired - Lifetime
- 1992-03-13 ES ES92302219T patent/ES2077350T3/es not_active Expired - Lifetime
- 1992-06-15 JP JP4154554A patent/JPH062001A/ja not_active Withdrawn

Also Published As

Publication number	Publication date
IE71663B1 (en)	1997-02-26
IE920811A1 (en)	1992-09-23
JPH062001A (ja)	1994-01-11
HU9200536D0 (en)	1992-05-28
HUT63868A (en)	1993-10-28
ES2077350T3 (es)	1995-11-16
ZA921530B (en)	1993-02-24
PL293840A1 (en)	1992-11-30
CA2061936A1 (en)	1992-09-15
DE69204089T2 (de)	1996-04-18
JPH05105560A (ja)	1993-04-27
EP0503974A1 (en)	1992-09-16
DE69204089D1 (de)	1995-09-21
RO108874B1 (ro)	1994-09-30
EP0503974B1 (en)	1995-08-16
US5106392A (en)	1992-04-21

Publication	Publication Date	Title
CS76592A3 (en)	1992-11-18	Multiple-grain abrasive particles
US5211726A (en)	1993-05-18	Products and process for making multigrain abrasive compacts
Artini et al.	2012	Diamond–metal interfaces in cutting tools: a review
CN101321714B (zh)	2012-02-29	金刚石烧结体
JP3472622B2 (ja)	2003-12-02	研磨剤成形体の製造方法
US6540800B2 (en)	2003-04-01	Abrasive particles with metallurgically bonded metal coatings
CA1091043A (en)	1980-12-09	Modifying the surface of diamond particles
EP0467404B1 (en)	1995-03-22	Diamond having multiple coatings, methods for their manufacture and use of same
KR100218606B1 (ko)	1999-09-01	연삭숫돌용 피복 연삭재의 제조방법
US20040206008A1 (en)	2004-10-21	SiCN compositions and methods
EP0012631B1 (en)	1983-01-12	Coated abrasive pellets and method of making same
US8496993B2 (en)	2013-07-30	Nanocomposite coatings on cemented carbide
JPH07178670A (ja)	1995-07-18	研磨剤コンパクトの製造法
CN100543102C (zh)	2009-09-23	涂覆的磨料
Xiao et al.	2024	Interface bonding characteristics and thermal damage behavior of brazed diamond with Nb-added NiCr filler alloys
JPH0568548B2 (ja)	1993-09-29
RU2413699C2 (ru)	2011-03-10	Сверхтвердый материал
KR100260367B1 (ko)	2000-12-01	멀티그레인 연마 입자
JPS5853988B2 (ja)	1983-12-02	研摩材とその製法
US6632477B2 (en)	2003-10-14	SiCN compositions and methods
US20120217436A1 (en)	2012-08-30	Boron suboxide composite material
CN1051691A (zh)	1991-05-29	化学结合的超硬磨料
XiLing et al.	1993	Nucleation and growth observations of diamond grown on cast tungsten carbide (W2C+ WC) particles by low-pressure CVD
Zang et al.	2006	Ti coating of nanocrystalline diamond by atomic layer deposition
JPH0355165A (ja)	1991-03-08	ウイスカー被覆ダイヤモンド粒及びその製造方法