DE3473291D1 - Methacrylic resin composition - Google Patents

Methacrylic resin composition

Info

Publication number
DE3473291D1
DE3473291D1 DE8484115293T DE3473291T DE3473291D1 DE 3473291 D1 DE3473291 D1 DE 3473291D1 DE 8484115293 T DE8484115293 T DE 8484115293T DE 3473291 T DE3473291 T DE 3473291T DE 3473291 D1 DE3473291 D1 DE 3473291D1
Authority
DE
Germany
Prior art keywords
resin composition
methacrylic resin
methacrylic
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484115293T
Other languages
English (en)
Inventor
Yoshio Nakai
Katsusuke Yamauchi
Masaaki Kishimura
Masamitsu Tateyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26451443&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3473291(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP23370483A external-priority patent/JPS60127345A/ja
Priority claimed from JP11222284A external-priority patent/JPS60258243A/ja
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Application granted granted Critical
Publication of DE3473291D1 publication Critical patent/DE3473291D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/20—Carboxylic acid amides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/52—Phosphorus bound to oxygen only
    • C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/04—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to rubbers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S260/00—Chemistry of carbon compounds
    • Y10S260/15—Antistatic agents not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S260/00—Chemistry of carbon compounds
    • Y10S260/15—Antistatic agents not otherwise provided for
    • Y10S260/16—Antistatic agents containing a metal, silicon, boron or phosphorus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S260/00—Chemistry of carbon compounds
    • Y10S260/15—Antistatic agents not otherwise provided for
    • Y10S260/19—Non-high polymeric antistatic agents/n

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
DE8484115293T 1983-12-13 1984-12-12 Methacrylic resin composition Expired DE3473291D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP23370483A JPS60127345A (ja) 1983-12-13 1983-12-13 メタクリル樹脂組成物
JP11222284A JPS60258243A (ja) 1984-06-02 1984-06-02 メタクリル樹脂組成物

Publications (1)

Publication Number Publication Date
DE3473291D1 true DE3473291D1 (en) 1988-09-15

Family

ID=26451443

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484115293T Expired DE3473291D1 (en) 1983-12-13 1984-12-12 Methacrylic resin composition

Country Status (3)

Country Link
US (1) US4604416A (de)
EP (1) EP0147728B1 (de)
DE (1) DE3473291D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3523319A1 (de) * 1985-06-29 1987-01-08 Basf Ag Bindemittel fuer waessrige, physikalisch trocknende korrosionsschutzanstriche auf basis einer phosphorsaeuremonoalkylester enthaltenden polymer-dispersion
US5599863A (en) * 1994-06-17 1997-02-04 Cyro Industries Gamma radiation sterilizable acrylic polymer
CA2166949A1 (en) * 1995-01-12 1996-07-13 Dan Zimmerman Substantially transparent antistatic acrylic polymer
DE19617068A1 (de) * 1996-04-29 1997-10-30 Basf Ag Formteile, hergestellt aus thermoplastischen Formmassen
EP0818503A1 (de) * 1996-07-13 1998-01-14 Röhm Gmbh Im wesentlichen transparentes antistatisches Acrylpolymer
US6284823B1 (en) * 1997-07-11 2001-09-04 Mitsubishi Gas Chemical Company, Inc. Antistatic acrylic resin composition
IT1301847B1 (it) 1998-07-23 2000-07-07 Atochem Elf Sa Processo di polimerizzazione in sospensione di monomeri acrilici
US20090318617A1 (en) * 2006-03-16 2009-12-24 Basf Se Polymer dispersions comprising effect substances and use thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2710402A (en) * 1950-05-11 1955-06-07 Dictaphone Corp Anti-static sound-recording medium and method of making the same
US2702257A (en) * 1950-12-22 1955-02-15 Chicopee Mfg Corp Application of antistatic materials to dielectrics
US2978440A (en) * 1955-11-29 1961-04-04 Union Carbide Corp Anti-static vinyl chloride copolymer containing salts of dialkyl phosphates
US3400116A (en) * 1965-03-22 1968-09-03 Phillips Petroleum Co Treating polymer compositions and product resulting therefrom
GB1221714A (en) * 1968-10-01 1971-02-10 Ici Ltd Antistatic compositions
CH535316A (de) * 1971-02-16 1973-03-31 Ciba Geigy Ag Verfahren zum gleichzeitigen permanenten antistatischen und schmutzabweisenden Ausrüsten von Textilien
CH583760A5 (de) * 1972-07-11 1977-01-14 Ciba Geigy Ag
US3975325A (en) * 1973-08-27 1976-08-17 Ici United States Inc. Antistatic agent composition
JPS5948001B2 (ja) * 1976-12-27 1984-11-22 三菱レイヨン株式会社 ビニル単量体の乳化重合方法
JPS5469154A (en) * 1977-11-14 1979-06-02 Lion Corp Antistatic finish of polyolefin
JPS55142045A (en) * 1979-04-20 1980-11-06 Mitsubishi Rayon Co Ltd Methacrylic resin material having excellent solar radiation absorptivity, and its preparation
JPS564637A (en) * 1979-06-26 1981-01-19 Lion Corp Antistatic resin composition having excellent nonstickness
CA1188022A (en) * 1981-02-25 1985-05-28 Kazuo Kishida Multi-layer structure polymer composition having an inner two-layer elastic polymer structure
JPS58208345A (ja) * 1982-05-31 1983-12-05 Mitsubishi Rayon Co Ltd 耐衝撃性メタクリル樹脂組成物

Also Published As

Publication number Publication date
EP0147728B1 (de) 1988-08-10
EP0147728A1 (de) 1985-07-10
US4604416A (en) 1986-08-05

Similar Documents

Publication Publication Date Title
DE3371090D1 (en) Resin composition
GB8406663D0 (en) Filler-blended resin compositions
DE3479893D1 (en) Curable composition
DE3476703D1 (en) Photosensitive resin composition
GB8328160D0 (en) Synthetic resin composition
GB8504528D0 (en) Resin composition
DE3371641D1 (en) Methacrylic resin composition
EP0089206A3 (en) Resin composition
DE3476809D1 (en) Moulding composition
GB8427476D0 (en) Resinous composition
EP0139234A3 (en) Resin composition
DE3466240D1 (en) Adhesive resin composition
DE3478812D1 (en) Coating resin composition
EP0136916A3 (en) Anthithrombic resin composition
DE3479665D1 (en) Photocurable resin composition
GB8419563D0 (en) Curable resin composition
DE3480484D1 (en) Resinous composition
DE3379271D1 (en) Impact-resistant methacrylic resin composition
GB8401480D0 (en) Curable resin composition
DE3473654D1 (en) Photosensitive resin composition
DE3467362D1 (en) Polyolefin resin composition
DE3478450D1 (en) Impact-resistant methacrylic resin composition
DE3473291D1 (en) Methacrylic resin composition
GB8400676D0 (en) Solid resin composition
DE3569256D1 (en) Resin composition

Legal Events

Date Code Title Description
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
8339 Ceased/non-payment of the annual fee