DE69201219D1 - Lichtempfindliche Beschichtungszusammensetzung. - Google Patents

Lichtempfindliche Beschichtungszusammensetzung.

Info

Publication number: DE69201219D1
Authority: DE; Germany
Prior art keywords: coating composition; photosensitive coating; photosensitive; composition; coating
Prior art date: 1991-06-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69201219T

Other languages

English (en)

Inventor

Shinichi Yamamoto

Masatoshi Tomiki

Naohiko Kiryu

Akiko Yamazaki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Somar Corp

Original Assignee

Somar Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-06-28

Filing date

1992-03-27

Publication date

1995-03-02

1992-03-27 Application filed by Somar Corp filed Critical Somar Corp

1995-03-02 Application granted granted Critical

1995-03-02 Publication of DE69201219D1 publication Critical patent/DE69201219D1/de

2012-03-28 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

DE69201219T 1991-06-28 1992-03-27 Lichtempfindliche Beschichtungszusammensetzung. Expired - Lifetime DE69201219D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP3185214A JPH0816781B2 (ja)	1991-06-28	1991-06-28	感光性組成物

Publications (1)

Publication Number	Publication Date
DE69201219D1 true DE69201219D1 (de)	1995-03-02

Family

ID=16166873

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69201219T Expired - Lifetime DE69201219D1 (de)	1991-06-28	1992-03-27	Lichtempfindliche Beschichtungszusammensetzung.

Country Status (5)

Country	Link
US (1)	US5318874A (de)
EP (1)	EP0520606B1 (de)
JP (1)	JPH0816781B2 (de)
CA (1)	CA2064159A1 (de)
DE (1)	DE69201219D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE69425862T2 (de) *	1993-11-17	2001-05-03	At & T Corp., New York	Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung
GB9517669D0 (en) *	1995-08-30	1995-11-01	Cromax Uk Ltd	A printing apparatus and method
JP4241074B2 (ja) *	2003-02-12	2009-03-18	富士ゼロックス株式会社	画像探索装置
DE10307521A1 (de) *	2003-02-21	2004-09-09	Kodak Polychrome Graphics Gmbh	Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenläufer mit hoher Chemikalienbeständigkeit
EP2335745B1 (de) *	2009-12-21	2017-11-22	Biotronik VI Patent AG	Implantat mit Beschichtung
WO2020262282A1 (ja) *	2019-06-27	2020-12-30	富士フイルム株式会社	保護層形成用組成物の製造方法、保護層形成用組成物の保存方法およびこの保存方法の応用
TWI867013B (zh) *	2019-07-30	2024-12-21	日商富士軟片股份有限公司	保護層形成用組成物、層狀膜、保護層、積層體、套組及半導體器件的製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4076537A (en) *	1976-01-02	1978-02-28	Fuji Photo Film Co., Ltd.	Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers
US4632891A (en) *	1984-10-04	1986-12-30	Ciba-Geigy Corporation	Process for the production of images

1991
- 1991-06-28 JP JP3185214A patent/JPH0816781B2/ja not_active Expired - Fee Related
1992
- 1992-03-25 US US07/857,415 patent/US5318874A/en not_active Expired - Fee Related
- 1992-03-26 CA CA002064159A patent/CA2064159A1/en not_active Abandoned
- 1992-03-27 EP EP92302696A patent/EP0520606B1/de not_active Expired - Lifetime
- 1992-03-27 DE DE69201219T patent/DE69201219D1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
JPH0511405A (ja)	1993-01-22
EP0520606A1 (de)	1992-12-30
EP0520606B1 (de)	1995-01-18
US5318874A (en)	1994-06-07
JPH0816781B2 (ja)	1996-02-21
CA2064159A1 (en)	1992-12-29

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Legal Events

Date	Code	Title	Description
1995-07-13	8332	No legal effect for de