DK1102305T3 - Plasmabehandlingsapparatur med en elektrisk ledende væg - Google Patents

Plasmabehandlingsapparatur med en elektrisk ledende væg

Info

Publication number
DK1102305T3
DK1102305T3 DK99402845T DK99402845T DK1102305T3 DK 1102305 T3 DK1102305 T3 DK 1102305T3 DK 99402845 T DK99402845 T DK 99402845T DK 99402845 T DK99402845 T DK 99402845T DK 1102305 T3 DK1102305 T3 DK 1102305T3
Authority
DK
Denmark
Prior art keywords
electrically conductive
conductive wall
treatment apparatus
plasma treatment
wall
Prior art date
Application number
DK99402845T
Other languages
English (en)
Inventor
Pascal Colpo
Francois Rossi
Original Assignee
European Community
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Community filed Critical European Community
Application granted granted Critical
Publication of DK1102305T3 publication Critical patent/DK1102305T3/da

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Non-Insulated Conductors (AREA)
DK99402845T 1999-11-17 1999-11-17 Plasmabehandlingsapparatur med en elektrisk ledende væg DK1102305T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP99402845A EP1102305B1 (en) 1999-11-17 1999-11-17 Plasma processing apparatus with an electrically conductive wall

Publications (1)

Publication Number Publication Date
DK1102305T3 true DK1102305T3 (da) 2003-08-04

Family

ID=8242178

Family Applications (1)

Application Number Title Priority Date Filing Date
DK99402845T DK1102305T3 (da) 1999-11-17 1999-11-17 Plasmabehandlingsapparatur med en elektrisk ledende væg

Country Status (14)

Country Link
US (1) US6692622B1 (da)
EP (1) EP1102305B1 (da)
JP (1) JP4568467B2 (da)
KR (1) KR20020079738A (da)
AT (1) ATE239979T1 (da)
CA (1) CA2391911C (da)
DE (1) DE69907687T2 (da)
DK (1) DK1102305T3 (da)
ES (1) ES2197589T3 (da)
IL (1) IL149403A0 (da)
NO (1) NO20022358L (da)
PT (1) PT1102305E (da)
TW (1) TW503433B (da)
WO (1) WO2001037313A1 (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100542740B1 (ko) * 2002-11-11 2006-01-11 삼성전자주식회사 가스 플라즈마 생성 방법 및 장치, 플라즈마 생성용 가스조성물 및 이를 이용한 반도체 장치의 제조 방법
US20050194099A1 (en) * 2004-03-03 2005-09-08 Jewett Russell F.Jr. Inductively coupled plasma source using induced eddy currents
US8357242B2 (en) 2007-05-03 2013-01-22 Jewett Russell F Crystalline film devices, apparatuses for and methods of fabrication
US9607719B2 (en) 2005-03-07 2017-03-28 The Regents Of The University Of California Vacuum chamber for plasma electric generation system
KR101062807B1 (ko) * 2005-03-07 2011-09-07 더 리젠츠 오브 더 유니버시티 오브 캘리포니아 Frc의 자계에서 플라즈마 이온들 및 전자들을 드라이브하는 시스템 및 방법
US20060291529A1 (en) * 2005-05-26 2006-12-28 Haun Robert E Cold wall induction nozzle
US8736177B2 (en) * 2010-09-30 2014-05-27 Fei Company Compact RF antenna for an inductively coupled plasma ion source
GB2582948B (en) * 2019-04-10 2021-12-08 Thermo Fisher Scient Bremen Gmbh Plasma source chamber for a spectrometer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4431901A (en) * 1982-07-02 1984-02-14 The United States Of America As Represented By The United States Department Of Energy Induction plasma tube
JP3458912B2 (ja) * 1994-11-15 2003-10-20 アネルバ株式会社 プラズマ処理装置
US5874014A (en) * 1995-06-07 1999-02-23 Berkeley Scholars, Inc. Durable plasma treatment apparatus and method
JP3825048B2 (ja) * 1995-06-29 2006-09-20 ラム リサーチ コーポレイション 非円筒形ソースチャンバを有したスケーラブルヘリコン波プラズマ処理装置
US5763851A (en) * 1995-11-27 1998-06-09 Applied Materials, Inc. Slotted RF coil shield for plasma deposition system
TW327236B (en) * 1996-03-12 1998-02-21 Varian Associates Inductively coupled plasma reactor with faraday-sputter shield
US5885358A (en) * 1996-07-09 1999-03-23 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
EP0841683A3 (en) * 1996-10-08 1999-12-01 Applied Materials, Inc. Active shield for generating a plasma for sputtering
JPH10255997A (ja) * 1997-03-07 1998-09-25 Anelva Corp 磁場増強型誘導結合平面プラズマ発生装置
JPH10284299A (ja) * 1997-04-02 1998-10-23 Applied Materials Inc 高周波導入部材及びプラズマ装置
US6074514A (en) * 1998-02-09 2000-06-13 Applied Materials, Inc. High selectivity etch using an external plasma discharge
US6080287A (en) * 1998-05-06 2000-06-27 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
US6074516A (en) * 1998-06-23 2000-06-13 Lam Research Corporation High sputter, etch resistant window for plasma processing chambers
US6248251B1 (en) * 1999-02-19 2001-06-19 Tokyo Electron Limited Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma

Also Published As

Publication number Publication date
NO20022358D0 (no) 2002-05-16
PT1102305E (pt) 2003-09-30
TW503433B (en) 2002-09-21
ES2197589T3 (es) 2004-01-01
EP1102305B1 (en) 2003-05-07
IL149403A0 (en) 2002-11-10
EP1102305A1 (en) 2001-05-23
US6692622B1 (en) 2004-02-17
WO2001037313A1 (en) 2001-05-25
DE69907687T2 (de) 2004-03-11
JP4568467B2 (ja) 2010-10-27
CA2391911C (en) 2009-06-23
ATE239979T1 (de) 2003-05-15
NO20022358L (no) 2002-06-28
DE69907687D1 (de) 2003-06-12
CA2391911A1 (en) 2001-05-25
KR20020079738A (ko) 2002-10-19
JP2003514387A (ja) 2003-04-15

Similar Documents

Publication Publication Date Title
KR970077181A (ko) 이온주입기에서 이온형성을 위한 방법 및 장치
GB9815042D0 (en) Detector
MY126731A (en) Lower electrode design for higher uniformity
KR940020497A (ko) 플라즈마 처리장치(plasma processing apparatus)
TW376547B (en) Method and apparatus for plasma processing
TW200503589A (en) Method and device for producing extreme ultraviolet radiation or soft X-ray radiation
AU1423888A (en) High-frequency ion source
ATE228268T1 (de) Elektrische strahlungsquelle und bestrahlungssystem mit dieser strahlungsquelle
WO2003036700A1 (en) Device and method for microwave plasma processing, and microwave power supply device
DE69923912D1 (de) Gepulste elektrische Feldbehandlungskammer mit integrierter Modulbauweise
ES2061180T5 (es) Procedimiento y aparato para ionizar fluidos mediante efecto capacitivo.
KR950016458A (ko) 고주파 마그네트론 플라즈마 장치
NO20022358D0 (no) Plasmabehandlingsapparat med en elektrisk ledende vegg
KR960039136A (ko) 이온비임 처리장치
SI1356496T1 (sl) Naprava za površinsko obdelavo snovi z naparjenjem
ATE229368T1 (de) Gasbehandlungskomponente
DE60302117D1 (de) Vorrichtung zur Leistungsstabilisierung für elektrische Fahrradkomponenten
EP2110838A3 (en) Current path arrangement for a circuit breaker
DE60128158D1 (de) Haushaltsgerät
GB2332566B (en) Electrical circuit breaker
GB9714990D0 (en) Power control apparatus for an ion source having an indirectly heated cathode
GB2003336A (en) Terminal block
DK0651493T3 (da) Arrangement til generering af elektrisk energi
KR19990036734U (ko) 이온주입장치
KR970052724A (ko) 반도체 에싱장치