DK1123424T3 - Fremgangsmåde og apparat for elektrodialytisk regenerering af et elektrodeløst metalaflejringsbad - Google Patents

Fremgangsmåde og apparat for elektrodialytisk regenerering af et elektrodeløst metalaflejringsbad

Info

Publication number
DK1123424T3
DK1123424T3 DK99970698T DK99970698T DK1123424T3 DK 1123424 T3 DK1123424 T3 DK 1123424T3 DK 99970698 T DK99970698 T DK 99970698T DK 99970698 T DK99970698 T DK 99970698T DK 1123424 T3 DK1123424 T3 DK 1123424T3
Authority
DK
Denmark
Prior art keywords
electro
metal deposition
deposition bath
metallic metal
electrodialytic
Prior art date
Application number
DK99970698T
Other languages
English (en)
Inventor
Jens Heydecke
Rainer Born
Werner Richtering
Manfred Blaschke
Alexander Kraft
Maja Wuensche
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Application granted granted Critical
Publication of DK1123424T3 publication Critical patent/DK1123424T3/da

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
    • B01D61/44—Ion-selective electrodialysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Urology & Nephrology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Chemically Coating (AREA)
DK99970698T 1998-10-15 1999-09-27 Fremgangsmåde og apparat for elektrodialytisk regenerering af et elektrodeløst metalaflejringsbad DK1123424T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19849278A DE19849278C1 (de) 1998-10-15 1998-10-15 Verfahren und Vorrichtung zum elektrodialytischen Regenerieren eines stromlosen Metallabscheidebades
PCT/DE1999/003186 WO2000023637A1 (de) 1998-10-15 1999-09-27 Verfahren und vorrichtung zum elektrodialytischen regenerieren eines stromlosen metallabscheidebades

Publications (1)

Publication Number Publication Date
DK1123424T3 true DK1123424T3 (da) 2002-06-17

Family

ID=7885653

Family Applications (1)

Application Number Title Priority Date Filing Date
DK99970698T DK1123424T3 (da) 1998-10-15 1999-09-27 Fremgangsmåde og apparat for elektrodialytisk regenerering af et elektrodeløst metalaflejringsbad

Country Status (18)

Country Link
US (1) US6379517B1 (da)
EP (1) EP1123424B1 (da)
JP (1) JP3420570B2 (da)
KR (1) KR100602820B1 (da)
CN (1) CN1205354C (da)
AR (1) AR020842A1 (da)
AT (1) ATE215999T1 (da)
AU (1) AU745255B2 (da)
BR (1) BR9910097B1 (da)
CA (1) CA2343215C (da)
DE (2) DE19849278C1 (da)
DK (1) DK1123424T3 (da)
ES (1) ES2173763T3 (da)
IL (1) IL139063A (da)
MY (1) MY123213A (da)
PT (1) PT1123424E (da)
TW (1) TW467966B (da)
WO (1) WO2000023637A1 (da)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1184487A1 (de) * 2000-08-29 2002-03-06 Enthone-OMI (Deutschland) GmbH Verfahren zur Reinigung eines Elektrolyten
EP1347823B3 (en) * 2000-12-12 2009-07-29 Jurag Separation A/S A method and apparatus for isolation of ionic species from a liquid
US6391177B1 (en) 2001-02-20 2002-05-21 David Crotty High temperature continuous electrodialysis of electroless plating solutions
DE50113264D1 (de) 2001-03-08 2007-12-27 Enthone System zur elektrodialytischen Regeneration eines stromlosen Badelektrolyten
DE10240350B4 (de) * 2002-08-28 2005-05-12 Atotech Deutschland Gmbh Vorrichtung und Verfahren zum Regenerieren eines stromlosen Metallabscheidebades
CN1297691C (zh) * 2003-12-09 2007-01-31 南开大学 电解法制备次磷酸镍的方法
DE502005003655D1 (de) * 2005-05-25 2008-05-21 Enthone Verfahren und Vorrichtung zur Einstellung der Ionenkonzentration in Elektrolyten
KR101189989B1 (ko) * 2005-06-30 2012-10-12 (주)아모레퍼시픽 문형 추출물을 유효성분으로 함유하는 화장료 조성물
JP4799260B2 (ja) * 2006-04-26 2011-10-26 日本カニゼン株式会社 無電解ニッケルめっき液の長寿命化装置
CN101468836A (zh) * 2007-12-25 2009-07-01 通用电气公司 电渗析装置和方法
US8177956B2 (en) * 2008-03-12 2012-05-15 Micyus Nicole J Method of electrolytically dissolving nickel into electroless nickel plating solutions
JP4991655B2 (ja) * 2008-07-22 2012-08-01 キヤノン株式会社 電気透析装置
NL2004510C2 (en) * 2010-04-06 2011-10-10 Redstack B V Membrane stack for a membrane based process and a device and method therefor.
DE102010015361A1 (de) 2010-04-16 2011-10-20 Atotech Deutschland Gmbh Membranelektrolysestapel, diesen enthaltende Elektrodialyseeinrichtung sowie Verfahren zum Regenerieren eines außenstromlos arbeitenden Bades zur Metallabscheidung
GB201102385D0 (en) 2011-02-10 2011-03-30 Biocule Scotland Ltd Two-dimensional gel electrophoresis apparatus and method
FR3066505B1 (fr) * 2017-05-16 2021-04-09 Safran Aircraft Engines Procede et dispositif ameliores de filtration de bain de platine par electrodialyse
CN113003658B (zh) * 2021-01-21 2022-12-20 新疆新鑫矿业股份有限公司阜康冶炼厂 一种镍不溶阳极电积液的处理工艺
CN117026222A (zh) * 2022-05-02 2023-11-10 广东鸿浩半导体设备有限公司 一种耐火金属沉积工艺
CN115961272A (zh) * 2022-12-14 2023-04-14 德星化工(苏州)有限公司 在线净化和回收化学镀镍过程中产生物质的设备及净化工艺

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4324629A (en) 1979-06-19 1982-04-13 Hitachi, Ltd. Process for regenerating chemical copper plating solution
US5221328A (en) 1991-11-27 1993-06-22 Mcgean-Rohco, Inc. Method of controlling orthophosphite ion concentration in hyphophosphite-based electroless plating baths
EP0604968A3 (en) 1992-12-28 1994-12-14 Asahi Glass Co Ltd Process for the production of water with a reduced salt content.
DE4310366C1 (de) * 1993-03-30 1994-10-13 Fraunhofer Ges Forschung Verfahren zum Regenerieren von wässrigen, außenstromlos arbeitenden Beschichtungsbädern
US5419821A (en) * 1993-06-04 1995-05-30 Vaughan; Daniel J. Process and equipment for reforming and maintaining electroless metal baths
US5716512A (en) * 1995-05-10 1998-02-10 Vaughan; Daniel J. Method for manufacturing salts of metals
FR2744463B1 (fr) * 1996-02-02 1998-04-03 Tredi Procede pour la regeneration d'un bain de nickel use pour le revetement de pieces metalliques
US6245389B1 (en) * 1996-12-27 2001-06-12 Nippon Chemical Industrial Co., Ltd. Method for circulating electroless nickel plating solution
FR2787473B1 (fr) * 1998-12-18 2001-03-09 A Richard Ets Procede de fabrication d'hypophosphite de nickel par technique electromembranaire

Also Published As

Publication number Publication date
CN1303447A (zh) 2001-07-11
JP3420570B2 (ja) 2003-06-23
BR9910097B1 (pt) 2009-05-05
AU1373900A (en) 2000-05-08
EP1123424B1 (de) 2002-04-10
ATE215999T1 (de) 2002-04-15
US6379517B1 (en) 2002-04-30
CA2343215A1 (en) 2000-04-27
AU745255B2 (en) 2002-03-14
JP2002527630A (ja) 2002-08-27
MY123213A (en) 2006-05-31
DE59901228D1 (de) 2002-05-16
EP1123424A1 (de) 2001-08-16
HK1036486A1 (en) 2002-01-04
PT1123424E (pt) 2002-09-30
IL139063A (en) 2004-07-25
CN1205354C (zh) 2005-06-08
ES2173763T3 (es) 2002-10-16
KR100602820B1 (ko) 2006-07-19
TW467966B (en) 2001-12-11
BR9910097A (pt) 2000-12-26
IL139063A0 (en) 2001-11-25
AR020842A1 (es) 2002-05-29
CA2343215C (en) 2007-07-10
KR20010043561A (ko) 2001-05-25
DE19849278C1 (de) 2000-07-06
WO2000023637A1 (de) 2000-04-27

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