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Priority claimed from DE3807929Aexternal-prioritypatent/DE3807929A1/de
Application filed by Basf AgfiledCriticalBasf Ag
Publication of DK178991ApublicationCriticalpatent/DK178991A/da
Publication of DK178991D0publicationCriticalpatent/DK178991D0/da
Application grantedgrantedCritical
Publication of DK172001B1publicationCriticalpatent/DK172001B1/da
Foto-resistor positivo,filme de superficie,foto-resistor de multicamada,processo para a formacao de uma imagem sobre uma superficie e solvente viavel do foto-resistor
Revelador para a revelacao de uma camada de reproducao exposta a luz,que opera negativamente,processo para a preparacao de um molde de impressao,e aplicacao do dito revelador
Photopolymersierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindliches aufzeichnungselements.