DK1994202T4 - Beskyttelsescoating til sølv - Google Patents

Beskyttelsescoating til sølv Download PDF

Info

Publication number: DK1994202T4
Authority: DK; Denmark
Prior art keywords: protection coating; silver protection; metal; coating material; coating
Prior art date: 2006-02-02

Application number

DK07704826.2T

Other languages

English (en)

Other versions

DK1994202T3 (da

Inventor

Milja Mäkelä

Pekka Soininen

Sami Sneck

Original Assignee

Beneq Oy

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-02-02

Filing date

2007-01-31

Publication date

2020-02-03

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35953681&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK1994202(T4) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

2007-01-31 Application filed by Beneq Oy filed Critical Beneq Oy

2012-04-02 Application granted granted Critical

2012-04-02 Publication of DK1994202T3 publication Critical patent/DK1994202T3/da

2020-02-03 Publication of DK1994202T4 publication Critical patent/DK1994202T4/da

Links

239000011248 coating agent Substances 0.000 title abstract 3
238000000576 coating method Methods 0.000 title abstract 3
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title 1
229910052709 silver Inorganic materials 0.000 title 1
239000004332 silver Substances 0.000 title 1
239000000463 material Substances 0.000 abstract 2
229910052751 metal Inorganic materials 0.000 abstract 2
239000002184 metal Substances 0.000 abstract 2
238000000231 atomic layer deposition Methods 0.000 abstract 1
238000000151 deposition Methods 0.000 abstract 1
238000009501 film coating Methods 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
238000000034 method Methods 0.000 abstract 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract 1
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 abstract 1
239000010409 thin film Substances 0.000 abstract 1
229910001928 zirconium oxide Inorganic materials 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
- A—HUMAN NECESSITIES
- A44—HABERDASHERY; JEWELLERY
- A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
- A44C27/00—Making jewellery or other personal adornments
- A44C27/001—Materials for manufacturing jewellery
- A44C27/005—Coating layers for jewellery
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Manufacturing & Machinery (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Preventing Corrosion Or Incrustation Of Metals (AREA)
Physical Vapour Deposition (AREA)
Paints Or Removers (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Chemical Vapour Deposition (AREA)
Surface Treatment Of Glass (AREA)
Laminated Bodies (AREA)
Adornments (AREA)
Organic Insulating Materials (AREA)

DK07704826.2T 2006-02-02 2007-01-31 Beskyttelsescoating til sølv DK1994202T4 (da)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FI20065082A FI121341B (fi)	2006-02-02	2006-02-02	Hopean suojapinnoitus
PCT/FI2007/050056 WO2007088249A1 (en)	2006-02-02	2007-01-31	Protective coating of silver

Publications (2)

Publication Number	Publication Date
DK1994202T3 DK1994202T3 (da)	2012-04-02
DK1994202T4 true DK1994202T4 (da)	2020-02-03

Family

ID=35953681

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DK07704826.2T DK1994202T4 (da)	2006-02-02	2007-01-31	Beskyttelsescoating til sølv

Country Status (12)

Country	Link
US (2)	US8883258B2 (da)
EP (2)	EP1994202B2 (da)
JP (1)	JP5297203B2 (da)
KR (1)	KR101442850B1 (da)
CN (2)	CN103215560A (da)
AT (1)	ATE548482T1 (da)
AU (1)	AU2007211451B2 (da)
DK (1)	DK1994202T4 (da)
EA (1)	EA012990B1 (da)
ES (1)	ES2379892T5 (da)
FI (2)	FI121341B (da)
WO (1)	WO2007088249A1 (da)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200840880A (en) *	2007-04-13	2008-10-16	Hsin-Chih Lin	Method of forming protection layer on contour of workpiece
FI20070991A7 (fi) *	2007-12-19	2009-06-20	Beneq Oy	Lasituote, tuotteen käyttö ja valmistusmenetelmä
PT2303471T (pt)	2008-07-18	2019-07-29	Neogi Suneeta	Processo para produzir revestimentos de diamante nano-cristalino em gemas
DE102009041264A1 (de)	2009-09-11	2011-03-24	IPHT Jena Institut für Photonische Technologien e.V.	Verfahren zur Herstellung von optisch aktiven Nanostrukturen
DE102009053889B4 (de)	2009-11-20	2014-03-27	C. Hafner Gmbh + Co. Kg	Verfahren zur Beschichtung einer metallischen Substratoberfläche mit einer durch einen ALD-Prozess aufgebrachten Materialschicht
US8802202B2 (en)	2010-03-05	2014-08-12	Suneeta S. Neogi	Method for imparting tarnish protection or tarnish protection with color appearance to silver, silver alloys, silver films, silver products and other non precious metals
US20110236654A1 (en) *	2010-03-26	2011-09-29	Wen-Kuang Hsu	Method of surface treatment and surface treated article provied by the same
CN102206810A (zh) *	2010-03-30	2011-10-05	徐文光	一种表面处理方法以及使用该方法的经表面处理的物品
JP5864089B2 (ja)	2010-08-25	2016-02-17	日亜化学工業株式会社	発光装置の製造方法
CN101974734B (zh) *	2010-11-30	2012-11-21	上海纳米技术及应用国家工程研究中心有限公司	具有多层复合防护膜的基底材料的制备方法
ITVR20120007A1 (it) *	2012-01-13	2013-07-14	Patros S R L	Prodotto manufatto per la gioielleria e/o l'orificeria e/o la bigiotteria a base di ossido di zirconio e relativo metodo
US9334573B2 (en)	2012-01-16	2016-05-10	Hitachi Chemical Company, Ltd.	Layered silicate silver surface treatment agent, sulfidation prevention film and light-emitting device with treated silver layer
JP5857786B2 (ja)	2012-02-21	2016-02-10	日亜化学工業株式会社	半導体発光素子の製造方法
DE102013100818B4 (de) *	2013-01-28	2023-07-27	OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung	Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips
CN103757604A (zh) *	2013-12-25	2014-04-30	上海纳米技术及应用国家工程研究中心有限公司	用于银制品表面防护涂层的制备方法
CN105849597A (zh) *	2013-12-31	2016-08-10	美国圣戈班性能塑料公司	具有优良的光学和太阳能性能的复合膜
CN104060239B (zh) *	2014-06-06	2017-05-10	华中科技大学	一种金属物品表面保护方法
EP3166902A4 (en) *	2014-07-07	2018-01-24	Scint-X AB	Production of a thin film reflector
US11365481B2 (en)	2015-10-06	2022-06-21	City University Of Hong Kong	Homogeneous and transparent protective coatings for precious metals and copper alloys
EP3173507A1 (de) *	2015-11-25	2017-05-31	Umicore AG & Co. KG	Verfahren zur metallorganischen gasphasenabscheidung unter verwendung von lösungen von indiumalkylverbindungen in kohlenwasserstoffen
US10303032B2 (en)	2016-05-09	2019-05-28	Sage Electrochromics, Inc.	Electrochromic device including a means for preventing ion migration and a process of forming the same
US10276411B2 (en)	2017-08-18	2019-04-30	Applied Materials, Inc.	High pressure and high temperature anneal chamber
SG11202008268RA (en)	2018-03-19	2020-10-29	Applied Materials Inc	Methods for depositing coatings on aerospace components
EP3784815A4 (en)	2018-04-27	2021-11-03	Applied Materials, Inc.	PROTECTION OF COMPONENTS AGAINST CORROSION
US11009339B2 (en)	2018-08-23	2021-05-18	Applied Materials, Inc.	Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
EP3626854A1 (fr)	2018-09-21	2020-03-25	The Swatch Group Research and Development Ltd	Procede pour ameliorer l'adherence d'une couche de protection contre le ternissement de l'argent sur un substrat comprenant une surface argentee
EP3626856A1 (fr)	2018-09-21	2020-03-25	The Swatch Group Research and Development Ltd	Substrat comprenant une surface argentee protegee contre le ternissement de l'argent et procede de fabrication d'un tel substrat
EP3626855A1 (fr)	2018-09-21	2020-03-25	The Swatch Group Research and Development Ltd	Procede pour ameliorer l'eclat d'une surface argentee finale d'un substrat protegee contre le ternissement de l'argent par une couche de protection
JP7312056B2 (ja) *	2019-01-07	2023-07-20	日機装株式会社	半導体発光素子および半導体発光素子の製造方法
CN109750273B (zh) *	2019-01-25	2020-01-21	中国地质大学（北京）	一种基于原子层沉积法进行镀膜改善银饰品稳定性的方法
US11732353B2 (en)	2019-04-26	2023-08-22	Applied Materials, Inc.	Methods of protecting aerospace components against corrosion and oxidation
US11794382B2 (en)	2019-05-16	2023-10-24	Applied Materials, Inc.	Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en)	2019-06-14	2023-07-11	Applied Materials, Inc.	Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en)	2019-09-06	2022-10-11	Applied Materials, Inc.	Methods for forming protective coatings containing crystallized aluminum oxide
CN111172511A (zh) *	2020-01-17	2020-05-19	胜科纳米（苏州）有限公司	一种在有机材料表面制备金属膜层的方法
US11519066B2 (en)	2020-05-21	2022-12-06	Applied Materials, Inc.	Nitride protective coatings on aerospace components and methods for making the same
EP4175772A4 (en)	2020-07-03	2024-08-28	Applied Materials, Inc.	PROCEDURES FOR REHABILITATION OF AEROSPACE COMPONENTS
KR102392451B1 (ko) *	2020-09-08	2022-04-29	국민대학교산학협력단	시냅틱 트랜지스터 및 이의 제조 방법
US12132110B2 (en)	2020-09-08	2024-10-29	Kookmin University Industry Academy Cooperation Foundation	Synaptic transistor with long-term and short-term memory
EP4001458B1 (fr)	2020-11-17	2024-10-16	The Swatch Group Research and Development Ltd	Procede de depot d'un revetement sur un composant horloger et composant horloger revetu par un tel procede
US11185139B1 (en) *	2021-03-04	2021-11-30	Oujie Kevin Tong	Coating compositions and method for jewelries
CH720939A1 (fr) *	2023-07-12	2025-01-31	Richemont Int Sa	Procédé de fabrication d'un composant horloger comportant une couche métallique de décoration revêtue par une couche de protection céramique transparente
WO2025244588A1 (en)	2024-05-24	2025-11-27	King Mongkut's Institute Of Technology Ladkrabang	Multilayer-structured aluminum nitride and aluminum oxide film coated product and production method thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
SE393967B (sv)	1974-11-29	1977-05-31	Sateko Oy	Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
CH591566A5 (en) *	1975-02-06	1977-09-30	Selve Usines Metallurg Suisses	Transparent layer of amorphous alumina - applied to silver or silver plated objects for decorative or industrial applications
FI57975C (fi)	1979-02-28	1980-11-10	Lohja Ab Oy	Foerfarande och anordning vid uppbyggande av tunna foereningshinnor
US4495254A (en) *	1981-05-18	1985-01-22	Westinghouse Electric Corp.	Protectively-coated gold-plated article of jewelry or wristwatch component
JPS62180071A (ja)	1986-01-31	1987-08-07	Sumitomo Electric Ind Ltd	表面に透明硬質膜を有する貴金属製品
JPS63213655A (ja) *	1987-02-27	1988-09-06	Nippon Dento Kogyo Kk	装身具
DE4415122A1 (de)	1994-04-29	1995-11-02	Wmf Wuerttemberg Metallwaren	Verfahren zur Verhinderung des Anlaufens von Gegenständen
JPH09176868A (ja) *	1995-12-26	1997-07-08	Yoichi Murayama	銀製品への変色防止用透明保護膜形成法
US6897119B1 (en)	1999-12-22	2005-05-24	Genus, Inc.	Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
US7513815B2 (en) *	1999-12-23	2009-04-07	General Electric Company	Optimal silicon dioxide protection layer thickness for silver lamp reflector
KR101183109B1 (ko)	2002-07-30	2012-09-24	에이에스엠 아메리카, 인코포레이티드	캐리어 가스를 이용하는 승화 시스템
US7132697B2 (en) *	2003-02-06	2006-11-07	Weimer Alan W	Nanomaterials for quantum tunneling varistors
US6773757B1 (en) *	2003-04-14	2004-08-10	Ronald Redline	Coating for silver plated circuits
US20100123993A1 (en) *	2008-02-13	2010-05-20	Herzel Laor	Atomic layer deposition process for manufacture of battery electrodes, capacitors, resistors, and catalyzers

2006
- 2006-02-02 FI FI20065082A patent/FI121341B/fi active IP Right Grant
2007
- 2007-01-31 CN CN2013100854271A patent/CN103215560A/zh active Pending
- 2007-01-31 CN CNA2007800040863A patent/CN101379215A/zh active Pending
- 2007-01-31 US US12/162,051 patent/US8883258B2/en active Active
- 2007-01-31 EA EA200870142A patent/EA012990B1/ru not_active IP Right Cessation
- 2007-01-31 EP EP07704826.2A patent/EP1994202B2/en active Active
- 2007-01-31 WO PCT/FI2007/050056 patent/WO2007088249A1/en not_active Ceased
- 2007-01-31 KR KR1020087018930A patent/KR101442850B1/ko active Active
- 2007-01-31 AU AU2007211451A patent/AU2007211451B2/en active Active
- 2007-01-31 JP JP2008552836A patent/JP5297203B2/ja active Active
- 2007-01-31 ES ES07704826T patent/ES2379892T5/es active Active
- 2007-01-31 AT AT07704826T patent/ATE548482T1/de active
- 2007-01-31 DK DK07704826.2T patent/DK1994202T4/da active
- 2007-01-31 EP EP12158081A patent/EP2468921A1/en not_active Withdrawn
2014
- 2014-07-29 US US14/445,651 patent/US20140335272A1/en not_active Abandoned
2015
- 2015-03-17 FI FIU20154053U patent/FI10853U1/fi not_active IP Right Cessation

Also Published As

Publication number	Publication date
FI20065082L (fi)	2007-08-03
EP1994202A1 (en)	2008-11-26
FI20065082A0 (fi)	2006-02-02
EP1994202B2 (en)	2019-12-18
CN103215560A (zh)	2013-07-24
EP2468921A1 (en)	2012-06-27
JP2009525406A (ja)	2009-07-09
AU2007211451A1 (en)	2007-08-09
ATE548482T1 (de)	2012-03-15
CN101379215A (zh)	2009-03-04
ES2379892T3 (es)	2012-05-04
US20140335272A1 (en)	2014-11-13
KR20080103517A (ko)	2008-11-27
US8883258B2 (en)	2014-11-11
KR101442850B1 (ko)	2014-11-19
AU2007211451B2 (en)	2011-08-11
WO2007088249A1 (en)	2007-08-09
ES2379892T5 (es)	2020-06-18
EP1994202A4 (en)	2010-04-14
FI121341B (fi)	2010-10-15
EA012990B1 (ru)	2010-02-26
JP5297203B2 (ja)	2013-09-25
DK1994202T3 (da)	2012-04-02
FI10853U1 (fi)	2015-04-27
US20090004386A1 (en)	2009-01-01
EA200870142A1 (ru)	2009-02-27
EP1994202B1 (en)	2012-03-07

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