DK2179437T3 - Transmissionselektronmikroskop - Google Patents

Transmissionselektronmikroskop

Info

Publication number
DK2179437T3
DK2179437T3 DK08762269.2T DK08762269T DK2179437T3 DK 2179437 T3 DK2179437 T3 DK 2179437T3 DK 08762269 T DK08762269 T DK 08762269T DK 2179437 T3 DK2179437 T3 DK 2179437T3
Authority
DK
Denmark
Prior art keywords
electron microscope
transmission electron
transmission
microscope
electron
Prior art date
Application number
DK08762269.2T
Other languages
English (en)
Inventor
John Berriman
Peter Rosenthal
Original Assignee
Medical Res Council
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Medical Res Council filed Critical Medical Res Council
Application granted granted Critical
Publication of DK2179437T3 publication Critical patent/DK2179437T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H01J2237/0045—Neutralising arrangements of objects being observed or treated using secondary electrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DK08762269.2T 2007-07-09 2008-06-05 Transmissionselektronmikroskop DK2179437T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0713276.4A GB0713276D0 (en) 2007-07-09 2007-07-09 Transmission electron microscope
PCT/GB2008/001920 WO2009007668A1 (en) 2007-07-09 2008-06-05 Transmission electron microscope

Publications (1)

Publication Number Publication Date
DK2179437T3 true DK2179437T3 (da) 2012-08-20

Family

ID=38440627

Family Applications (1)

Application Number Title Priority Date Filing Date
DK08762269.2T DK2179437T3 (da) 2007-07-09 2008-06-05 Transmissionselektronmikroskop

Country Status (8)

Country Link
US (1) US8362428B2 (da)
EP (1) EP2179437B1 (da)
JP (1) JP5485149B2 (da)
AU (1) AU2008273992A1 (da)
DK (1) DK2179437T3 (da)
ES (1) ES2387701T3 (da)
GB (1) GB0713276D0 (da)
WO (1) WO2009007668A1 (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017183472A1 (ja) * 2016-04-19 2017-10-26 国立研究開発法人理化学研究所 粒子線装置、観察法、および回折格子
US11460419B2 (en) 2020-03-30 2022-10-04 Fei Company Electron diffraction holography
US11456149B2 (en) * 2020-03-30 2022-09-27 Fei Company Methods and systems for acquiring 3D diffraction data
JP7672351B2 (ja) * 2022-01-25 2025-05-07 株式会社日立ハイテク 観察システム、観察方法およびプログラム

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
US4843330A (en) * 1986-10-30 1989-06-27 International Business Machines Corporation Electron beam contactless testing system with grid bias switching
US4992661A (en) * 1987-08-20 1991-02-12 Hitachi, Ltd. Method and apparatus for neutralizing an accumulated charge on a specimen by means of a conductive lattice deposited on the specimen
US4943769A (en) * 1989-03-21 1990-07-24 International Business Machines Corporation Apparatus and method for opens/shorts testing of capacitively coupled networks in substrates using electron beams
US5057773A (en) * 1989-03-21 1991-10-15 International Business Machines Corporation Method for opens/shorts testing of capacitively coupled networks in substrates using electron beams
EP0417354A1 (en) * 1989-09-15 1991-03-20 Koninklijke Philips Electronics N.V. Electron beam apparatus with charge-up compensation
JPH03285242A (ja) * 1990-04-02 1991-12-16 Hitachi Ltd 試料帯電防止機構付き電子顕微鏡
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
DE4305672A1 (de) 1993-02-24 1994-08-25 Integrated Circuit Testing Verfahren und Vorrichtung zum Testen von Netzwerken auf Kurzschlüsse und/oder Unterbrechungen
JPH09283411A (ja) * 1996-04-16 1997-10-31 Hitachi Ltd イオンビーム投射方法およびその装置
US20010036588A1 (en) * 1998-05-05 2001-11-01 Ims-Ionen Mikrofabrikations Systeme Gmbh Lithographic imaging of a structure pattern onto one or more fields on a substrate
JP4236742B2 (ja) * 1998-10-29 2009-03-11 株式会社日立製作所 走査形電子顕微鏡
WO2001029872A1 (en) * 1999-10-15 2001-04-26 Philips Electron Optics B.V. Particle optical apparatus
JP3773389B2 (ja) * 2000-03-27 2006-05-10 日本電子株式会社 位相差電子顕微鏡用薄膜位相板並びに位相差電子顕微鏡及び位相板帯電防止法
JP4178003B2 (ja) * 2002-06-05 2008-11-12 株式会社日立ハイテクノロジーズ 半導体回路パターンの検査装置
US7511279B2 (en) * 2003-10-16 2009-03-31 Alis Corporation Ion sources, systems and methods
US7321118B2 (en) 2005-06-07 2008-01-22 Alis Corporation Scanning transmission ion microscope
US7235799B2 (en) * 2003-11-28 2007-06-26 Ebara Corporation System and method for evaluation using electron beam and manufacture of devices
US7737412B2 (en) * 2004-07-12 2010-06-15 The Regents Of The University Of California Electron microscope phase enhancement
WO2007067296A2 (en) 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP4831604B2 (ja) 2005-12-14 2011-12-07 独立行政法人物質・材料研究機構 帯電中和電子の斜め照射法を用いた絶縁物試料観察用放射電子顕微鏡
JP4978065B2 (ja) * 2006-06-12 2012-07-18 株式会社日立製作所 電子顕微鏡応用装置

Also Published As

Publication number Publication date
WO2009007668A1 (en) 2009-01-15
US20100230591A1 (en) 2010-09-16
EP2179437A1 (en) 2010-04-28
EP2179437B1 (en) 2012-05-16
AU2008273992A1 (en) 2009-01-15
JP2010533352A (ja) 2010-10-21
ES2387701T3 (es) 2012-09-28
US8362428B2 (en) 2013-01-29
JP5485149B2 (ja) 2014-05-07
GB0713276D0 (en) 2007-08-15

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