DK2425685T3 - In-situ-plasma/laser-hybridsystem - Google Patents

In-situ-plasma/laser-hybridsystem Download PDF

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Publication number
DK2425685T3
DK2425685T3 DK10770480.1T DK10770480T DK2425685T3 DK 2425685 T3 DK2425685 T3 DK 2425685T3 DK 10770480 T DK10770480 T DK 10770480T DK 2425685 T3 DK2425685 T3 DK 2425685T3
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Denmark
Prior art keywords
plasma
precursor
cathode
plasma device
layer
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DK10770480.1T
Other languages
English (en)
Inventor
Pravansu S Mohanty
Nicholas Anton Moroz
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The Regents Of The Univ Of Michigan Office Of Tech Transfer
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3478—Geometrical details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Chemical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Claims (15)

1. Jævnstrømsplasmasindretning, omfattende: et hus (12); en katode (14, 14'), der er anbragt i huset (12); en ringformet kanal (18), der generelt anbringes grænsende op til katoden (14, 14'), hvor den ringformede kanal (18) er konfigureret til at overføre en plasmagas (20) som fluid; en anode (16), der er anbragt driftsmæssigt grænsende op til katoden (14, 14') for at tillade en elektrisk kommunikation derimellem, som er tilstrækkelig til at antænde en plasmastråle (24) i plasmagassen (20); en prækursorkilde, som indeholder et prækursormateriale; en prækursorudledningsledning (30), som strækker sig gennem mindst en del af katoden (14, 14'), hvor prækursorudledningsledningen (30) afsluttes ved mindst én åbning (34), hvor plasmastrålen (24) er i stand til at medføre, smelte og afsætte i det mindst en del af prækursormaterialerne på et mål; kendetegnet ved, at den mindst én åbning (34) er forskudt fra en spids (28) af katoden (14, 14') for generelt at forhindre afsætning af prækursormateria-let ved spidsen (28) af katoden (14,14').
2. Jævnstrømsplasmasindretning ifølge krav 1, hvor den mindst én åbning (34) er forskudt opstrøms for spidsen (28) af katoden (14, 14') og uden for plasmastrålen (24).
3. Jævnstrømsplasmasindretning ifølge krav 1, hvor den mindst én åbning (34) er forskudt nedstrøms for spidsen (28) og strækker sig ud over spidsen (28) og ind i plasmastrålen (24).
4. Jævnstrømsplasmasindretning ifølge krav 1, hvor prækursormaterialet omfatter nanopartikler.
5. Jævnstrømsplasmasindretning ifølge krav 1, hvor prækursormaterialet er et pulver.
6. Jævnstrømsplasmasindretning ifølge krav 1, yderligere omfattende: en dyse (48), gennem hvilken plasmastrålen (24) overføres.
7. Jævnstrømsplasmasindretning ifølge krav 6, hvor dysen (48) er cirkulær, ellipseformet eller rektangulær.
8. Jævnstrømsplasmasindretning ifølge krav 1, hvor en prækursorudledningsenhed er funktionsmæssigt tilkoblet ved en position nedstrøms foranoden (16), hvor prækursorudledningsenheden modtager prækursormaterialet fra prækursorkilden og forstøver prækursormaterialet sammen med en gas ind i plasmastrålen (24).
9. Jævnstrømsplasmasindretning ifølge krav 1 eller 8, yderligere omfattende: en laserkilde (50), som udleder strålingsenergi på målet efter afsætning af i det mindste en del af prækursormaterialerne.
10. Jævnstrømsplasmasindretning ifølge krav 9, hvor laserkilden (50) ændrer en fortætning af mindst en del af prækursormaterialerne, der er afsat på målet.
11. Jævnstrømsplasmasindretning ifølge krav 1 eller 8, hvor prækursormaterialet er en væske eller en gas.
12. Fremgangsmåde til dannelse af en coating på et mål under anvendelse af en indretning (10) ifølge krav 1, hvor fremgangsmåden omfatter: afsætning af et første lag på et mål under anvendelse af jævnstrømsplasmaindretningen ved at sprøjte et plasma, som har indlagte prækursorer; omsmeltning af mindst en del af det første lag under anvendelse af en laserkilde for at opnå in-situ-fortætning deraf.
13. Fremgangsmåde ifølge krav 12, yderligere omfattende: afsætning af et andet lag på det fortættede første lag af målet under anvendelse af jævnstrømsplasmaindretningen ved at sprøjte plasmaet med de indlagte prækursorer.
14. Fremgangsmåde ifølge krav 13, yderligere omfattende: omsmeltning af mindst en del af det andet lag under anvendelse af en laserkilde (50) for at opnå in-situ-fortætning deraf.
15. Fremgangsmåde ifølge krav 12, hvor en laserstrålebølgelængde og effekt af laserkilden (50) udvælges til at graduere tykkelsen på tværs af det første lag for at forbedre varmechokbestandigheden.
DK10770480.1T 2009-05-01 2010-05-03 In-situ-plasma/laser-hybridsystem DK2425685T3 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US17457609P 2009-05-01 2009-05-01
US23386309P 2009-08-14 2009-08-14
PCT/US2010/033383 WO2010127344A2 (en) 2009-05-01 2010-05-03 In-situ plasma/laser hybrid scheme
US12/772,342 US8294060B2 (en) 2009-05-01 2010-05-03 In-situ plasma/laser hybrid scheme

Publications (1)

Publication Number Publication Date
DK2425685T3 true DK2425685T3 (en) 2017-01-30

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Country Link
US (1) US8294060B2 (da)
EP (1) EP2425685B1 (da)
KR (1) KR20120036817A (da)
CN (1) CN102450108B (da)
AU (1) AU2010242747B2 (da)
CA (1) CA2760612A1 (da)
DK (1) DK2425685T3 (da)
ES (1) ES2607704T3 (da)
NZ (1) NZ596174A (da)
WO (1) WO2010127344A2 (da)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5275342B2 (ja) 2007-05-11 2013-08-28 エスディーシー マテリアルズ インコーポレイテッド 粒子生産システム及び粒子生産方法
US8507401B1 (en) 2007-10-15 2013-08-13 SDCmaterials, Inc. Method and system for forming plug and play metal catalysts
NZ600491A (en) * 2009-12-04 2014-09-26 Univ Michigan Coaxial laser assisted cold spray nozzle
US8803025B2 (en) * 2009-12-15 2014-08-12 SDCmaterials, Inc. Non-plugging D.C. plasma gun
US9119309B1 (en) 2009-12-15 2015-08-25 SDCmaterials, Inc. In situ oxide removal, dispersal and drying
US9149797B2 (en) 2009-12-15 2015-10-06 SDCmaterials, Inc. Catalyst production method and system
US8557727B2 (en) 2009-12-15 2013-10-15 SDCmaterials, Inc. Method of forming a catalyst with inhibited mobility of nano-active material
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
US9309619B2 (en) * 2011-06-28 2016-04-12 Mtix Ltd. Method and apparatus for surface treatment of materials utilizing multiple combined energy sources
US9605376B2 (en) * 2011-06-28 2017-03-28 Mtix Ltd. Treating materials with combined energy sources
HK1199222A1 (en) 2011-08-19 2015-06-26 SDCmaterials, Inc. Coated substrates for use in catalysis and catalytic converters and methods of coating substrates with washcoat compositions
ZA201202480B (en) * 2011-10-17 2012-11-28 Int Advanced Res Centre For Power Metallurgy And New Mat (Arci) Dept Of Science And Tech Govt Of Ind An improved hybrid methodology for producing composite,multi-layered and graded coatings by plasma spraying utitilizing powder and solution precurrsor feedstock
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
CN105592921A (zh) 2013-07-25 2016-05-18 Sdc材料公司 用于催化转化器的洗涂层和经涂覆基底及其制造和使用方法
CN106061600A (zh) 2013-10-22 2016-10-26 Sdc材料公司 用于重型柴油机的催化剂设计
CA2926135A1 (en) 2013-10-22 2015-04-30 SDCmaterials, Inc. Compositions of lean nox trap
US9687811B2 (en) 2014-03-21 2017-06-27 SDCmaterials, Inc. Compositions for passive NOx adsorption (PNA) systems and methods of making and using same
US10730798B2 (en) * 2014-05-07 2020-08-04 Applied Materials, Inc. Slurry plasma spray of plasma resistant ceramic coating
GB201409692D0 (en) * 2014-05-31 2014-07-16 Element Six Gmbh Thermal spray assembly and method for using it
DE102014219275A1 (de) * 2014-09-24 2016-03-24 Siemens Aktiengesellschaft Zündung von Flammen eines elektropositiven Metalls durch Plasmatisierung des Reaktionsgases
CN105376921A (zh) * 2015-12-11 2016-03-02 武汉科技大学 一种等离子加工用的内腔供粉钨针
CN111790334B (zh) * 2016-01-05 2021-12-03 螺旋株式会社 涡水流产生器、水等离子体产生装置、分解处理装置
US20170291856A1 (en) * 2016-04-06 2017-10-12 Applied Materials, Inc. Solution precursor plasma spray of ceramic coating for semiconductor chamber applications
WO2021065920A1 (ja) * 2019-09-30 2021-04-08 トーカロ株式会社 減圧プラズマ溶射法
CN111100979B (zh) * 2019-12-26 2021-06-22 上海联影医疗科技股份有限公司 X射线管阳极靶盘的激光冲击强化方法
CN113049256B (zh) * 2019-12-27 2025-03-28 北航（四川）西部国际创新港科技有限公司 一种模拟航空发动机服役环境的高温高速焰流发生装置
AU2022206483A1 (en) 2021-01-11 2023-08-31 6K Inc. Methods and systems for reclamation of li-ion cathode materials using microwave plasma processing
WO2022159401A1 (en) * 2021-01-19 2022-07-28 6K Inc. Single crystal cathode materials using microwave plasma processing
US12525599B2 (en) 2021-12-21 2026-01-13 Our Next Energy, Inc. Manufacturing battery electrodes
CN115537737B (zh) * 2022-10-13 2023-11-17 西南交通大学 一种薄涂层的制备方法及系统

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3729611A (en) * 1968-04-16 1973-04-24 Centrul De Sudura Si Incercari Plasma generator
US4127760A (en) * 1975-06-09 1978-11-28 Geotel, Inc. Electrical plasma jet torch and electrode therefor
CN1028772C (zh) * 1987-04-03 1995-06-07 富士通株式会社 汽相淀积金刚石的方法
US5296667A (en) * 1990-08-31 1994-03-22 Flame-Spray Industries, Inc. High velocity electric-arc spray apparatus and method of forming materials
US5298714A (en) 1992-12-01 1994-03-29 Hydro-Quebec Plasma torch for the treatment of gases and/or particles and for the deposition of particles onto a substrate
JPH06272012A (ja) 1993-03-19 1994-09-27 Hirofumi Shimura レーザ・プラズマハイブリッド溶射による高機能性被膜の作製方法
JPH07316774A (ja) * 1994-03-31 1995-12-05 Mitsubishi Heavy Ind Ltd 低圧プラズマ溶射方法
JPH08243756A (ja) * 1995-03-03 1996-09-24 Mitsubishi Materials Corp プラズマ肉盛用溶接トーチ及び肉盛溶接方法
EP1301341B1 (en) 2000-06-30 2006-08-23 nGimat Co. Method for applying polymer coatings
JP2002145615A (ja) 2000-11-08 2002-05-22 Japan Science & Technology Corp ＴｉＯ２薄膜及び色素増感太陽電池用作用電極の作製方法
US20020172871A1 (en) 2001-05-18 2002-11-21 Trans Ionics Corporation Thin film composite electrolytes, sodium-sulfur cells including same, processes of making same, and vehicles including same
CN1204979C (zh) * 2001-11-30 2005-06-08 中国科学院力学研究所 层流等离子体喷涂装置及方法
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
US7750265B2 (en) * 2004-11-24 2010-07-06 Vladimir Belashchenko Multi-electrode plasma system and method for thermal spraying
JP4518410B2 (ja) * 2005-03-09 2010-08-04 エボニック デグサ ゲーエムベーハー プラズマ溶射された酸化アルミニウム層
US20100034979A1 (en) * 2006-06-28 2010-02-11 Fundacion Inasmet Thermal spraying method and device
ES2534215T3 (es) * 2006-08-30 2015-04-20 Oerlikon Metco Ag, Wohlen Dispositivo de pulverización de plasma y un método para la introducción de un precursor líquido en un sistema de gas de plasma

Also Published As

Publication number Publication date
US8294060B2 (en) 2012-10-23
KR20120036817A (ko) 2012-04-18
WO2010127344A2 (en) 2010-11-04
EP2425685A4 (en) 2014-11-26
CN102450108A (zh) 2012-05-09
EP2425685A2 (en) 2012-03-07
ES2607704T3 (es) 2017-04-03
EP2425685B1 (en) 2016-10-26
CA2760612A1 (en) 2010-11-04
NZ596174A (en) 2013-07-26
US20100320176A1 (en) 2010-12-23
AU2010242747A1 (en) 2011-11-24
AU2010242747B2 (en) 2014-03-20
WO2010127344A3 (en) 2011-01-13
CN102450108B (zh) 2014-08-20

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