DK2590802T3 - Fremgangsmåde og indretning til plasmabehandling med atmosfærisk tryk - Google Patents

Fremgangsmåde og indretning til plasmabehandling med atmosfærisk tryk

Info

Publication number
DK2590802T3
DK2590802T3 DK11743201.3T DK11743201T DK2590802T3 DK 2590802 T3 DK2590802 T3 DK 2590802T3 DK 11743201 T DK11743201 T DK 11743201T DK 2590802 T3 DK2590802 T3 DK 2590802T3
Authority
DK
Denmark
Prior art keywords
atmospheric pressure
plasma treatment
pressure plasma
treatment
atmospheric
Prior art date
Application number
DK11743201.3T
Other languages
English (en)
Inventor
Dirk Vangeneugden
Hoof Erwin Van
Robby Rego
Original Assignee
Vito Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vito Nv filed Critical Vito Nv
Application granted granted Critical
Publication of DK2590802T3 publication Critical patent/DK2590802T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, e.g. by ultrasonic waves, corona discharge, irradiation, electric currents or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Sonic or ultrasonic waves; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C2059/145—Atmospheric plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B29C2059/147—Low pressure plasma; Glow discharge plasma

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Textile Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Spectroscopy & Molecular Physics (AREA)
DK11743201.3T 2010-07-09 2011-06-29 Fremgangsmåde og indretning til plasmabehandling med atmosfærisk tryk DK2590802T3 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36272910P 2010-07-09 2010-07-09
EP10169063 2010-07-09
PCT/EP2011/060954 WO2012004175A1 (en) 2010-07-09 2011-06-29 Method and device for atmospheric pressure plasma treatment

Publications (1)

Publication Number Publication Date
DK2590802T3 true DK2590802T3 (da) 2014-10-06

Family

ID=43478053

Family Applications (1)

Application Number Title Priority Date Filing Date
DK11743201.3T DK2590802T3 (da) 2010-07-09 2011-06-29 Fremgangsmåde og indretning til plasmabehandling med atmosfærisk tryk

Country Status (4)

Country Link
US (1) US9255330B2 (da)
EP (1) EP2590802B1 (da)
DK (1) DK2590802T3 (da)
WO (1) WO2012004175A1 (da)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9605376B2 (en) * 2011-06-28 2017-03-28 Mtix Ltd. Treating materials with combined energy sources
PL2666544T3 (pl) 2012-05-24 2018-03-30 Vito Nv Proces osadzania i charakterystyka powłoki
JP6089378B2 (ja) * 2013-04-08 2017-03-08 沖野 晃俊 プラズマ処理装置
ITMI20130855A1 (it) * 2013-05-27 2014-11-28 Univ Milano Bicocca Metodo di rivestimento con film polimerico di un substrato mediante deposizione e successiva polimerizzazione per trattamento a plasma di una composizione monomerica.
WO2015187161A1 (en) * 2014-06-05 2015-12-10 Illinois Tool Works Inc. System and method for cleaning an object
DE102014217821A1 (de) * 2014-09-05 2016-03-10 Tesa Se Verfahren zur Erhöhung der Adhäsion zwischen der ersten Oberfläche eines ersten bahnförmigen Materials und einer ersten Oberfläche eines zweiten bahnförmigen Materials
CN207587690U (zh) 2015-01-22 2018-07-06 陈家陞 非热软式等离子清洁系统
GR1009432B (el) * 2015-09-09 2019-01-15 Εθνικο Κεντρο Ερευνας Φυσικων Επιστημων "Δημοκριτος" Διαταξη ατμοσφαιρικου πλασματος για ομοιομορφη επεξεργασια μεγαλων επιφανειων
US11583689B2 (en) * 2016-09-22 2023-02-21 Ajou University Industry-Academic Cooperation Foundation Composition for atopy or psoriasis treatment comprising liquid type plasma
EP3336141B1 (en) 2016-12-19 2019-08-14 The Goodyear Tire & Rubber Company Atmospheric plasma treatment of reinforcement cords and use in rubber articles
EP3336140B1 (en) 2016-12-19 2019-07-24 The Goodyear Tire & Rubber Company Atmospheric plasma treatment of reinforcement cords and use in rubber articles
KR102120552B1 (ko) 2017-09-18 2020-06-08 아주대학교산학협력단 액상 플라즈마를 포함하는 피부 진정용 조성물
JP7048720B2 (ja) * 2018-03-20 2022-04-05 株式会社Fuji プラズマ装置
EP3807445A1 (en) * 2018-06-14 2021-04-21 Applied Materials, Inc. Roller device for guiding a flexible substrate, use of a roller device for transporting a flexible substrate, vacuum processing apparatus, and method of processing a flexible substrate
KR102031713B1 (ko) * 2019-01-29 2019-10-14 (주)에스제이글로벌 창상치료용 플라즈마 전극 패드 및 플라즈마 치료 장치
CN114286836B (zh) * 2019-06-18 2024-08-09 分子等离子集团股份有限公司 抗微生物和/或抗病毒聚合物表面
DE102019007935B4 (de) * 2019-11-14 2023-06-29 Elfolion Gmbh Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens
EP3865292B1 (en) * 2020-02-12 2023-06-07 The Goodyear Tire & Rubber Company A plasma cord coating device
EP3881941A1 (en) * 2020-03-17 2021-09-22 Molecular Plasma Group SA Plasma coating method and apparatus for biological surface modification
JP2024507585A (ja) * 2021-02-26 2024-02-20 メトオックス インターナショナル,インコーポレイテッド 高スループット超電導体製造用マルチスタックサセプタ反応器
US20240162018A1 (en) * 2021-03-16 2024-05-16 Sekisui Chemical Co., Ltd. Surface modification method
US20240066161A1 (en) * 2021-08-09 2024-02-29 TellaPure, LLC Methods and apparatus for generating atmospheric pressure, low temperature plasma
CN113737510B (zh) * 2021-09-30 2024-02-23 昆山豆奇电子科技有限公司 一种冷态等离子体高分子聚合物表面处理方法
CN115142255A (zh) * 2022-06-24 2022-10-04 青岛华世洁环保科技有限公司 碳纤维表面处理装置及对碳纤维进行表面处理的方法
DE102024102118A1 (de) * 2024-01-25 2025-07-31 Syntegon Technology Gmbh Vorrichtung, Set und Verfahren zum Verschweißen mindestens zweier Folienabschnitte miteinander

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS565975A (en) * 1979-06-27 1981-01-22 Canon Inc Film forming method
US4542711A (en) * 1981-03-16 1985-09-24 Sovonics Solar Systems Continuous system for depositing amorphous semiconductor material
JPS59219927A (ja) * 1983-05-27 1984-12-11 Fuji Electric Corp Res & Dev Ltd プラズマcvd装置
JP2714247B2 (ja) * 1990-10-29 1998-02-16 キヤノン株式会社 マイクロ波プラズマcvd法による大面積の機能性堆積膜を連続的に形成する方法及び装置
US5472509A (en) * 1993-11-30 1995-12-05 Neomecs Incorporated Gas plasma apparatus with movable film liners
EP1073091A3 (en) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
JP2001279457A (ja) 2000-01-24 2001-10-10 Sekisui Chem Co Ltd 常圧プラズマを用いた連続表面処理法又は連続成膜法及び連続表面処理装置又は連続成膜装置
CN1317423C (zh) 2000-11-14 2007-05-23 积水化学工业株式会社 常压等离子体处理方法及其装置
FR2816726B1 (fr) 2000-11-16 2006-06-23 Air Liquide Installation dans laquelle est realisee une operation necessitant un controle de l'atmosphere a l'interieur d'une enceinte
WO2002043781A1 (de) 2000-11-29 2002-06-06 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und vorrichtung zur oberflächenbehandlung von objekten
JP4000830B2 (ja) * 2001-04-27 2007-10-31 コニカミノルタホールディングス株式会社 プラズマ放電処理装置
JP5050299B2 (ja) * 2001-05-17 2012-10-17 コニカミノルタホールディングス株式会社 長尺基材の表面処理方法及びその方法により製造された光学フィルム
US6849306B2 (en) 2001-08-23 2005-02-01 Konica Corporation Plasma treatment method at atmospheric pressure
JP2003168593A (ja) * 2001-11-29 2003-06-13 Sekisui Chem Co Ltd 放電プラズマ処理装置
WO2004028220A1 (en) 2002-09-19 2004-04-01 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) Method and apparatus for generating and maintaining a plasma
EP1609884B1 (en) * 2003-03-31 2013-08-28 Konica Minolta Holdings, Inc. Thin film forming apparatus and method for forming thin film
EP1582270A1 (en) 2004-03-31 2005-10-05 Vlaamse Instelling voor Technologisch Onderzoek Method and apparatus for coating a substrate using dielectric barrier discharge
WO2005098007A2 (en) 2004-04-01 2005-10-20 Ceres, Inc. Promoter, promoter control elements, and combinations, and uses thereof
EP1689216A1 (en) 2005-02-04 2006-08-09 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) Atmospheric-pressure plasma jet
WO2006116828A1 (en) 2005-04-29 2006-11-09 Vlaamse Instelling Voor Technologisch Onderzoek Apparatus and method for purification and disinfection of liquid, solid or gaseous substances
JP2007073333A (ja) 2005-09-07 2007-03-22 Konica Minolta Holdings Inc プラズマ放電処理装置、プラズマ放電処理方法
EP1785198A1 (en) 2005-11-14 2007-05-16 Vlaamse Instelling voor Technologisch Onderzoek A method for atmospheric plasma deposition of conjugated polymer coatings
WO2007089146A1 (en) * 2006-02-02 2007-08-09 Fujifilm Manufacturing Europe B.V. Method for surface treatment by plasma and surface treatment apparatus
JP2007332426A (ja) 2006-06-15 2007-12-27 Kobe Steel Ltd 成膜方法及び装置
JP5262723B2 (ja) 2006-11-27 2013-08-14 コニカミノルタビジネステクノロジーズ株式会社 大気圧プラズマ処理装置及び大気圧プラズマ処理方法
EP1978038A1 (en) 2007-04-02 2008-10-08 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) A method for producing a coating by atmospheric pressure plasma technology
JP2009046710A (ja) * 2007-08-16 2009-03-05 Fuji Electric Systems Co Ltd 半導体素子の連続的製造装置
EP2210321B1 (en) 2007-11-08 2015-06-10 Enercon Industries Corporation Atmospheric treater with roller confined discharge chamber
WO2009104579A1 (ja) 2008-02-22 2009-08-27 コニカミノルタホールディングス株式会社 プラズマ放電処理装置及び薄膜積層体
DE102008027461B4 (de) * 2008-06-09 2011-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 80686 Vorrichtung und Verfahren zur mikrostrukturierten Plasmabehandlung

Also Published As

Publication number Publication date
US20130084409A1 (en) 2013-04-04
EP2590802A1 (en) 2013-05-15
US9255330B2 (en) 2016-02-09
EP2590802B1 (en) 2014-07-02
WO2012004175A1 (en) 2012-01-12

Similar Documents

Publication Publication Date Title
BR112014005160A2 (pt) aparelho e método de tratamento de gás
DK3574951T3 (da) Fremgangsmåde og apparat til sensorisk substitution
GB201000097D0 (en) Apparatus and process for treating natural gas
SG11201402768WA (en) Plasma processing apparatus and plasma processing method
GB201213443D0 (en) Apparatus and method for exhaust gas after treatment
TWI560767B (en) Substrate processing apparatus and substrate processing method
EP2864364A4 (en) METHOD AND DEVICE FOR TREATING BIOMASS SUBSTRATES
GB201120278D0 (en) Gas plasma disinfection and sterilisation apparatus
DK3622883T3 (da) Indførerer til medicinsk indretning og fremgangsmåder til at indføre og anvende medicinske indretninger
DK2838467T3 (da) Apparat og fremgangsmåde til endodontisk behandling
DK2440323T3 (da) Fremgangsmåder og indretning til behandling af partikler med plasma
DK2308325T3 (da) Fremgangsmåde til højtryksbehandling af produkter
DK2646064T3 (da) Fremgangsmåder og indretninger til ultraviolet overvågning
DE112010000724T8 (de) Plasmaverarbeitungsvorrichtung und Plasma-CVD-Filmbildungsverfahren
AP3935A (en) Apparatus and method for conducting microbiological processes
EP2647418A4 (en) EXHAUST TREATMENT UNIT
DE112010000869T8 (de) Plasmaverarbeitungsvorrichtung
FI20115073A0 (fi) Laitteisto, menetelmä ja reaktiokammio
GB201500251D0 (en) Method and apparatus for the treatment of scoliosis
TWI370513B (en) Substrate processing apparatus and substrate processing method
GB201018931D0 (en) Apparatus and method of operation of same
KR101197023B9 (ko) 플라즈마 처리 장치 및 플라즈마 처리 방법
PL2926885T3 (pl) Urządzenie do przetwarzania gazu spalinowego oraz sposób przetwarzania gazu spalinowego
EP2637379A4 (en) DECOMPRESSION PROCESS AND DEVICE
DK2473701T3 (da) Forseglingsapparat og fremgangsmåde