DK3455676T3 - Apparat til at præge diskrete substrater med et diskret fleksibelt stempel - Google Patents

Apparat til at præge diskrete substrater med et diskret fleksibelt stempel Download PDF

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Publication number
DK3455676T3
DK3455676T3 DK17735599T DK17735599T DK3455676T3 DK 3455676 T3 DK3455676 T3 DK 3455676T3 DK 17735599 T DK17735599 T DK 17735599T DK 17735599 T DK17735599 T DK 17735599T DK 3455676 T3 DK3455676 T3 DK 3455676T3
Authority
DK
Denmark
Prior art keywords
flexible stamp
discrete substrates
printing discrete
discreet flexible
discreet
Prior art date
Application number
DK17735599T
Other languages
English (en)
Inventor
Meulen Jan Matthijs Ter
Bram Johannes Titulaer
Ludovicus Vugts
Jules Kierkels
Erven Adrianus Johannes Van
Original Assignee
Morphotonics Holding Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morphotonics Holding Bv filed Critical Morphotonics Holding Bv
Application granted granted Critical
Publication of DK3455676T3 publication Critical patent/DK3455676T3/da

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F19/00—Apparatus or machines for carrying out printing operations combined with other operations
    • B41F19/02—Apparatus or machines for carrying out printing operations combined with other operations with embossing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K3/00—Apparatus for stamping articles having integral means for supporting the articles to be stamped
    • B41K3/44—Means for handling copy matter
    • B41K3/50—Means for handling copy matter for conveying during stamping operation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Labeling Devices (AREA)
DK17735599T 2016-07-14 2017-07-11 Apparat til at præge diskrete substrater med et diskret fleksibelt stempel DK3455676T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16179451 2016-07-14
PCT/EP2017/067406 WO2018011208A1 (en) 2016-07-14 2017-07-11 Apparatus for imprinting discrete substrates with a flexible stamp

Publications (1)

Publication Number Publication Date
DK3455676T3 true DK3455676T3 (da) 2019-12-09

Family

ID=56740809

Family Applications (1)

Application Number Title Priority Date Filing Date
DK17735599T DK3455676T3 (da) 2016-07-14 2017-07-11 Apparat til at præge diskrete substrater med et diskret fleksibelt stempel

Country Status (10)

Country Link
US (1) US10875337B2 (da)
EP (1) EP3455676B1 (da)
JP (1) JP6980002B2 (da)
KR (1) KR102328775B1 (da)
CN (3) CN109478014B (da)
DK (1) DK3455676T3 (da)
ES (1) ES2760602T3 (da)
HU (1) HUE046952T2 (da)
TW (1) TWI723198B (da)
WO (1) WO2018011208A1 (da)

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WO2019188932A1 (ja) * 2018-03-30 2019-10-03 富士フイルム株式会社 経皮吸収シート製造用のモールド、針状凸部を有する経皮吸収シートの製造装置及び方法
EP3633453B1 (de) * 2018-10-03 2023-12-27 ZKW Group GmbH Verfahren zur herstellung von (sub-)mikrostrukturen auf gewölbten flächen eines optischen bauteils
US12145308B2 (en) 2019-11-12 2024-11-19 Morphotonics Holding B.V. Apparatus for a roll-to-plate imprinting process comprising a plate carrier with compensating material
EP4300191A3 (de) * 2019-11-19 2024-07-03 EV Group E. Thallner GmbH Vorrichtung und verfahren zum prägen von mikro- und/oder nanostrukturen
JP2023502359A (ja) * 2019-11-26 2023-01-24 モーフォトニクス ホールディング ベスローテン フェノーツハップ 不平衡なローラを有するインプリント、テクスチャ加工またはエンボス加工システム
US11485051B2 (en) 2020-07-23 2022-11-01 Himax Technologies Limited Clamping apparatus of soft film and mounting fixture thereof
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WO2022032204A1 (en) * 2020-08-07 2022-02-10 Magic Leap, Inc. Managing multi-objective alignments for imprinting
CN113031393A (zh) * 2021-03-25 2021-06-25 青岛天仁微纳科技有限责任公司 一种适用于不规则模具的纳米压印设备及其压印方法
CN113953168A (zh) * 2021-10-20 2022-01-21 常州华威新材料有限公司 一种适用于制备深纹理薄膜的表面微交联工艺
CA3237104A1 (en) * 2021-11-15 2023-05-19 Jan Matthijs Ter Meulen Imprinting process
KR20240101679A (ko) * 2021-11-15 2024-07-02 모포토닉스 홀딩 비.브이. 다중 텍스처 스탬프
CN115308993B (zh) * 2022-08-30 2024-05-17 浙江至格科技有限公司 一种纳米压印装置和方法
KR102971795B1 (ko) * 2023-03-08 2026-06-01 (주)세경하이테크 데코레이션 필름 제조장치
JP7656356B1 (ja) 2023-09-29 2025-04-03 Ａｉメカテック株式会社 微細構造転写装置及び微細構造転写方法

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Also Published As

Publication number Publication date
CN109478014A (zh) 2019-03-15
CN116643450A (zh) 2023-08-25
KR102328775B1 (ko) 2021-11-22
WO2018011208A1 (en) 2018-01-18
JP2019522368A (ja) 2019-08-08
ES2760602T3 (es) 2020-05-14
HUE046952T2 (hu) 2020-04-28
TW201808665A (zh) 2018-03-16
US10875337B2 (en) 2020-12-29
EP3455676A1 (en) 2019-03-20
EP3455676B1 (en) 2019-09-11
KR20190028428A (ko) 2019-03-18
TWI723198B (zh) 2021-04-01
US20190329575A1 (en) 2019-10-31
CN109478014B (zh) 2023-04-04
JP6980002B2 (ja) 2021-12-15
CN116736631A (zh) 2023-09-12

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