DK3908686T3 - Mærkningsscanner - Google Patents

Mærkningsscanner Download PDF

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Publication number
DK3908686T3
DK3908686T3 DK20700111.6T DK20700111T DK3908686T3 DK 3908686 T3 DK3908686 T3 DK 3908686T3 DK 20700111 T DK20700111 T DK 20700111T DK 3908686 T3 DK3908686 T3 DK 3908686T3
Authority
DK
Denmark
Prior art keywords
label scanner
scanner
label
Prior art date
Application number
DK20700111.6T
Other languages
English (en)
Inventor
Morten Hannibal Madsen
Original Assignee
Topsil Globalwafers As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Topsil Globalwafers As filed Critical Topsil Globalwafers As
Application granted granted Critical
Publication of DK3908686T3 publication Critical patent/DK3908686T3/da

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/08—Measuring arrangements characterised by the use of optical techniques for measuring diameters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DK20700111.6T 2019-01-08 2020-01-08 Mærkningsscanner DK3908686T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19150810 2019-01-08
PCT/EP2020/050278 WO2020144212A1 (en) 2019-01-08 2020-01-08 A marking scanner

Publications (1)

Publication Number Publication Date
DK3908686T3 true DK3908686T3 (da) 2024-10-14

Family

ID=65010637

Family Applications (1)

Application Number Title Priority Date Filing Date
DK20700111.6T DK3908686T3 (da) 2019-01-08 2020-01-08 Mærkningsscanner

Country Status (6)

Country Link
EP (1) EP3908686B1 (da)
JP (1) JP7544714B2 (da)
KR (1) KR102773324B1 (da)
CN (1) CN113330148B (da)
DK (1) DK3908686T3 (da)
WO (1) WO2020144212A1 (da)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112415023A (zh) * 2020-11-10 2021-02-26 浙江夏厦精密制造股份有限公司 一种表征柱状零件磨削纹路的检测方法及装置
JP7146988B1 (ja) * 2021-03-19 2022-10-04 Ｄｏｗａエレクトロニクス株式会社 ＧａＡｓウエハの製造方法およびＧａＡｓウエハ群
IT202100014798A1 (it) * 2021-06-07 2022-12-07 One Off Innovation S R L Dispositivo di misura con scanner laser per pezzi cilindrici realizzati in forgia aperta e relativa metodologia di misura
JP7663428B2 (ja) * 2021-06-29 2025-04-16 株式会社ディスコ マーキング装置およびウエーハ生成装置
JP7345765B2 (ja) * 2021-08-18 2023-09-19 三菱電線工業株式会社 リング状製品の寸法測定装置及びリング状製品の寸法測定方法
JP7729292B2 (ja) * 2022-09-08 2025-08-26 株式会社Sumco インゴットのｖノッチ評価装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864043A (ja) * 1981-10-13 1983-04-16 Nippon Telegr & Teleph Corp <Ntt> 円板形状体の位置決め装置
JPH04303702A (ja) * 1991-03-29 1992-10-27 Nkk Corp ロール検査方法および装置
JP2903916B2 (ja) 1992-11-30 1999-06-14 信越半導体株式会社 半導体インゴット加工方法
JP2746511B2 (ja) * 1993-03-04 1998-05-06 信越半導体株式会社 単結晶インゴットのオリエンテーションフラット幅測定方法
US5452078A (en) * 1993-06-17 1995-09-19 Ann F. Koo Method and apparatus for finding wafer index marks and centers
JP3716944B2 (ja) * 1996-01-11 2005-11-16 東芝セラミックス株式会社 Ｖ型ノッチの形状検査装置
JP2882482B1 (ja) * 1997-12-15 1999-04-12 株式会社東京精密 インゴットのオリフラ・ノッチ検出方法及び位置決め方法
JP4792672B2 (ja) 2001-07-24 2011-10-12 信越半導体株式会社 ノッチ検査方法およびノッチ検査装置
WO2004083778A1 (en) * 2003-03-18 2004-09-30 Hermary Alexander Thomas Coded-light dual-view profile scanner
CN103578097B (zh) * 2012-07-30 2017-05-10 中国科学院光电研究院 一种双波段高低分辨率协同目标识别装置
JP5714627B2 (ja) 2013-02-28 2015-05-07 新日本工機株式会社 円筒体検査装置
JP2015222796A (ja) * 2014-05-23 2015-12-10 東京エレクトロン株式会社 ウエハの位置検出装置、ウエハの位置検出方法、及び記憶媒体
CN106323193B (zh) * 2015-06-30 2020-04-17 江苏菲戈勒斯新材料科技有限公司 蓝宝石晶锭外形测定装置
CA2995228A1 (en) 2015-08-21 2017-03-02 Adcole Corporation Optical profiler and methods of use thereof
DE102017129221A1 (de) * 2017-01-23 2018-07-26 Werth Messtechnik Gmbh Verfahren und Vorrichtung zur Bestimmung von geometrischen Merkmalen an Werkstücken

Also Published As

Publication number Publication date
WO2020144212A1 (en) 2020-07-16
JP2022516760A (ja) 2022-03-02
KR20210111800A (ko) 2021-09-13
CN113330148A (zh) 2021-08-31
JP7544714B2 (ja) 2024-09-03
KR102773324B1 (ko) 2025-02-27
CN113330148B (zh) 2025-05-06
EP3908686A1 (en) 2021-11-17
EP3908686B1 (en) 2024-07-24

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