DK494889D0 - Toer film og dens fremstilling samt deri indgaaende materiale, hvori der kan dannes et fotobillede - Google Patents

Toer film og dens fremstilling samt deri indgaaende materiale, hvori der kan dannes et fotobillede

Info

Publication number
DK494889D0
DK494889D0 DK494889A DK494889A DK494889D0 DK 494889 D0 DK494889 D0 DK 494889D0 DK 494889 A DK494889 A DK 494889A DK 494889 A DK494889 A DK 494889A DK 494889 D0 DK494889 D0 DK 494889D0
Authority
DK
Denmark
Prior art keywords
carboxyl groups
movies
manufacturing
photoimageable composition
including materials
Prior art date
Application number
DK494889A
Other languages
English (en)
Other versions
DK494889A (da
Inventor
Melvin Alan Lipson
Thomas Paul Carter
James Gerard Shelnut
Leo Roos
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22968948&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK494889(D0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Publication of DK494889D0 publication Critical patent/DK494889D0/da
Publication of DK494889A publication Critical patent/DK494889A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/155—Nonresinous additive to promote interlayer adhesion in element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DK494889A 1988-10-07 1989-10-06 Toer film og dens fremstilling samt deri indgaaende materiale, hvori der kan dannes et fotobillede DK494889A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/255,579 US4943513A (en) 1988-10-07 1988-10-07 Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom

Publications (2)

Publication Number Publication Date
DK494889D0 true DK494889D0 (da) 1989-10-06
DK494889A DK494889A (da) 1990-04-08

Family

ID=22968948

Family Applications (1)

Application Number Title Priority Date Filing Date
DK494889A DK494889A (da) 1988-10-07 1989-10-06 Toer film og dens fremstilling samt deri indgaaende materiale, hvori der kan dannes et fotobillede

Country Status (10)

Country Link
US (1) US4943513A (da)
EP (1) EP0363210B1 (da)
JP (1) JPH02222953A (da)
KR (1) KR930010773B1 (da)
AT (1) ATE120287T1 (da)
AU (1) AU610761B2 (da)
CA (1) CA1334634C (da)
DE (1) DE68921836T2 (da)
DK (1) DK494889A (da)
NO (1) NO894009L (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116601133A (zh) * 2020-12-11 2023-08-15 株式会社自动网络技术研究所 含金属添加剂、交联性高分子组合物、交联高分子材料、金属构件和线束

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5656163A (en) * 1987-01-30 1997-08-12 Baxter International Inc. Chamber for use in a rotating field to separate blood components
US5415749A (en) * 1994-03-04 1995-05-16 E. I. Du Pont De Nemours And Company Process for electrodeposition of resist formulations which contain metal salts of β-diketones
US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) * 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
US6551756B1 (en) * 2000-07-24 2003-04-22 Napp Systems, Inc. Solvent-developable printing formulations with improved processing characteristics
CN101176040A (zh) * 2005-04-14 2008-05-07 哈佛大学 用于微制造的牺牲层中可调整的溶解度
US8007982B2 (en) * 2006-12-20 2011-08-30 Sony Corporation Optical information recording medium
TWI491981B (zh) * 2009-11-04 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP6417669B2 (ja) * 2013-03-05 2018-11-07 東レ株式会社 感光性樹脂組成物、保護膜及び絶縁膜並びにタッチパネルの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3016297A (en) * 1956-02-13 1962-01-09 Du Pont Photopolymerizable compositions comprising polymeric chelates and their use in the preparation of reliefs
DE2106574A1 (de) * 1970-03-03 1971-09-23 Shpley Co Inc Lichtempfindliches Laminat
JPS5035529B2 (da) * 1972-09-19 1975-11-17
US4284744A (en) * 1976-08-16 1981-08-18 Hitco Polymers containing chemically bonded metal atoms
JPS53111719A (en) * 1977-03-11 1978-09-29 Nitto Electric Ind Co Method of forming material
US4332879A (en) * 1978-12-01 1982-06-01 Hughes Aircraft Company Process for depositing a film of controlled composition using a metallo-organic photoresist
JPS59204036A (ja) * 1983-05-06 1984-11-19 Dainippon Ink & Chem Inc レジストパタ−ンの形成法
US4513076A (en) * 1983-05-24 1985-04-23 Gaf Corporation Electron beam sensitive resist
US4693957A (en) * 1985-03-14 1987-09-15 The United States Of America As Represented By The Secretary Of The Navy Transition and inner transition metal chelate polymers for high energy resist lithography
CA1317811C (en) * 1986-04-30 1993-05-18 Richard Douglas Bauer Photohardenable mixture
JPS64949A (en) * 1987-06-23 1989-01-05 Fuji Photo Film Co Ltd Photopolymerizable composition
US4950696A (en) * 1987-08-28 1990-08-21 Minnesota Mining And Manufacturing Company Energy-induced dual curable compositions
AU638258B2 (en) * 1990-06-21 1993-06-24 Edward L Weller III Photoimaging process using water removable coatings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116601133A (zh) * 2020-12-11 2023-08-15 株式会社自动网络技术研究所 含金属添加剂、交联性高分子组合物、交联高分子材料、金属构件和线束

Also Published As

Publication number Publication date
DE68921836T2 (de) 1995-07-27
JPH02222953A (ja) 1990-09-05
NO894009D0 (no) 1989-10-06
EP0363210B1 (en) 1995-03-22
ATE120287T1 (de) 1995-04-15
CA1334634C (en) 1995-03-07
EP0363210A3 (en) 1990-12-05
EP0363210A2 (en) 1990-04-11
KR930010773B1 (ko) 1993-11-10
AU610761B2 (en) 1991-05-23
US4943513A (en) 1990-07-24
KR900006813A (ko) 1990-05-08
DE68921836D1 (de) 1995-04-27
NO894009L (no) 1990-04-09
AU4262089A (en) 1990-04-12
DK494889A (da) 1990-04-08

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment